1. A hose assembly comprising:
a hose having an end;
a fitting having an interior portion, an exterior portion, and a cavity therebetween, the end of the hose being located within the cavity and compressed between the interior and exterior portions, the exterior portion of the fitting having at least first and second circumferential crimped portions axially spaced apart along a length of the fitting, first and second portions of the hose being compressed within, respectively, the first and second circumferential crimped portions, the exterior portion of the fitting further having an annular-shaped bubble portion between the first and second circumferential crimped portions, the bubble portion having a diameter that is larger than diameters of the first and second circumferential crimped portions, the hose having a portion radially expanded into an annular-shaped cavity surrounded by the bubble portion due to the hose being compressed at the first and second portions thereof.
2. The hose assembly of claim 1, wherein the hose has a diameter of at least 5 cm.
3. The hose assembly of claim 1, wherein the fitting has a length of more than 10 cm.
4. The hose assembly of claim 1, wherein the hose is a rotary hose.
5. A process of securing a fitting to an end of a hose, the fitting having an axial extent, the process comprising:
crimping a first circumferential portion of the fitting from an initial diameter to a final crimping diameter to thereby define a first crimp; and then
crimping a second circumferential portion of the fitting axially spaced apart from the first circumferential portion, the second circumferential portion being crimped from an initial diameter to a final crimping diameter to thereby define a second crimp; and then
optionally performing at least a third crimping operation on a third circumferential portion of the fitting from an initial diameter to a final crimping diameter;
whereby the fitting is secured to the hose by the crimps.
6. The process of claim 5, further comprising locating the second circumferential portion at an axial location such that once the second circumferential portion is crimped an uncrimped circumferential portion of the fitting remains between the first crimp and the second crimp, the uncrimped circumferential portion defining a bubble portion of the fitting after crimping the second circumferential portion.
7. The process of claim 6, wherein the hose has a portion radially expanded into an annular-shaped cavity surrounded by the bubble portion due to first and second portions of the hose being compressed at the first and second circumferential portions of the fitting.
8. The process of claim 5, further comprising performing the third crimping operation, the third circumferential portion being axially spaced apart from the first and second circumferential portions.
9. The process of claim 8, further comprising locating the third circumferential portion at an axial location such that once the third circumferential portion is crimped an uncrimped circumferential portion of the fitting remains between the second crimp and the third crimp, the uncrimped circumferential portion defining a bubble portion of the fitting after crimping the second circumferential portion.
10. The process of claim 5, wherein the hose is not skived prior to crimping the first circumferential portion.
11. The process of claim 5, wherein the crimping of the first and second circumferential portions are performed simultaneously with a crimping die comprising more than one crimping surface in an axial direction of the hose.
12. The hose assembly produced by the process of claim 5.
The claims below are in addition to those above.
All refrences to claim(s) which appear below refer to the numbering after this setence.
1. An ion source having a discharge chamber which has first and second ends and encloses a discharge region, wherein said first end is closed, and wherein said second end is open;
a means for introducing an ionizable gas into said discharge region;
a high-electrical-conductivity material of an inductor proximate said discharge region, said inductor having first and second ends through which a radio-frequency current is introduced, and said inductor also having a plurality of turns between said inductor ends;
a means for electrostatically accelerating ions that leave said open end of said discharge chamber into a beam of energetic ions;
a means for adding electrons to said beam of energetic ions; and
a high-electrical-conductivity material of a closed circuit proximate said first end of said inductor and having a shape approximating only that of said turn of said inductor closest to said first end of said inductor; and wherein said high-electrical-conductivity material is continuous over said closed circuit and is not connected to a power source.
2. The ion source as defined in claim 1 wherein said first end of said inductor is closer to said second end of said discharge chamber than said second end of said inductor.
3. The ion source as defined in claim 1 wherein said high-electrical-conductivity material of said closed circuit is in electrical contact with said turn of said plurality of turns of said inductor closest to said first end of said inductor at one or more locations.
4. The ion source as defined in claim 1 wherein said inductor is in the shape of a helix.
5. The ion source as defined in claim 1 wherein said high-electrical-conductivity material of said inductor is copper.
6. The ion source as defined in claim 1 wherein said high-electrical-conductivity material of said closed circuit is copper.
7. A plasma source having a discharge chamber which has first and second ends and encloses a discharge region, wherein said first end is closed, and wherein said second end is open;
a means for introducing an ionizable gas into said discharge region;
a high-electrical-conductivity material of an inductor proximate said discharge chamber, said inductor having first and second ends through which a radio-frequency current is introduced, and said inductor also having a plurality of turns between said inductor ends;
a means for accelerating ions that leave said open end of said discharge chamber into a beam of electrons and energetic ions; and
a high-electrical-conductivity material of a closed circuit proximate said first end of said inductor and having a shape approximating only that of said turn of said inductor closest to said first end of said inductor; and wherein said high-electrical-conductivity material is continuous over said closed circuit and is not connected to a power source.
8. The plasma source as defined in claim 7 wherein said first end said inductor is closer to said second end of said discharge chamber than said second end of said inductor.
9. The plasma source as defined in claim 7 wherein said high-electrical-conductivity material of said closed circuit is in electrical contact with said turn of said plurality of turns of said inductor closest to said first end of said inductor at one or more locations.
10. The plasma source as defined in claim 7 wherein said inductor is in the shape of a helix.
11. The plasma source as defined in claim 7 wherein said high-electrical-conductivity material in said inductor is copper.
12. The plasma source as defined in claim 7 wherein said high-electrical-conductivity material of said closed circuit is copper.
13. A method for constructing an ion source, the method comprising the steps of:
(a) providing a discharge chamber which has first and second ends and encloses a discharge region, wherein said first end is closed, and wherein said second is open;
(b) providing a means for introducing an ionizable gas into said discharge region;
(c) providing a high-electrical-conductivity material of an inductor proximate said discharge chamber, said inductor having first and second ends through which a radio-frequency current is introduced, and said inductor also having a plurality of turns between said inductor ends;
(d) providing a means for electrostatically accelerating ions that leave said open end of said discharge chamber into a beam of energetic ions;
(e) providing a means for adding electrons to said beam of energetic ions; and
(f) providing a high-electrical-conductivity material of a closed circuit proximate said first end of said inductor and having a shape approximating only that of said turn of said inductor closest to said first end of said inductor; and wherein said high-electrical-conductivity material is continuous over said closed circuit and is not connected to a power source.
14. The method in accordance with claim 13 wherein said first end of said inductor is closer to said second end of said discharge chamber than said second end of said inductor.
15. The method in accordance with claim 13 wherein said high-electrical-conductivity material of said closed circuit is in electrical contact with said turn of said plurality of turns of said inductor closest to said first end of said inductor at one or more locations.
16. The method in accordance with claim 13 wherein said inductor is in the shape of a helix.
17. The method in accordance with claim 13 wherein said high-electrical-conductivity material of said inductor is copper.
18. The method in accordance with claim 13 wherein second high-electrical-conductivity material of said closed circuit is copper.
19. A method for constructing a plasma source, the method comprising the steps of:
(a) providing a discharge chamber which has first and second ends and encloses a discharge region, wherein said first end is closed, and wherein said second end is open;
(b) providing a means for introducing an ionizable gas into said discharge region;
(c) providing a high-electrical-conductivity material of an inductor proximate said discharge chamber, said inductor having first and second ends through which a radio-frequency current is introduced, and said inductor also having a plurality of turns between said inductor ends;
(d) providing a means for accelerating ions that leave said open end of said discharge chamber into a beam of electrons and energetic ions; and
(e) providing a high-electrical-conductivity material of a closed circuit proximate said first end of said inductor and having a shape approximating only that of said turn of said inductor closest to said first end of said inductor; and wherein said high-electrical-conductivity material is continuous over said closed circuit and is not connected to a power source.
20. The method in accordance with claim 19 wherein said first end of said inductor is closer to said second end of said discharge chamber than said second end of said inductor.
21. The method in accordance with claim 19 wherein said high-electrical-conductivity material of said closed circuit is in electrical contact with said turn of said plurality of turns of said inductor closest to said first end of said inductor at one or more locations.
22. The method in accordance with claim 19 wherein said inductor is in the shape of a helix.
23. The method in accordance with claim 19 wherein said high-electrical-conductivity material of said inductor is copper.
24. The method in accordance with claim 19 wherein said high-electrical-conductivity material of said closed circuit is copper.