1. An electrosurgical device, comprising a jaw assembly structure which includes an upper jaw assembly, and a lower jaw assembly each having at least one electrode wherein at least one standoff member is provided on at least one of the upper jaw assembly and the lower jaw assembly.
2. The electrosurgical device of claim 1, wherein the standoff member is a single, preferable unitary, U-shaped standoff member provided on a jaw of the upper jaw assembly or the lower jaw assembly, so as to maintain a predetermined gap between upper and lower electrodes of the upper and lower jaw assembly, respectively.
3. The electrosurgical device of claim 1, wherein the standoff member comprises a longitudinal slot provided down through its middle so as to allow a cutting element such as a knife to be advanced through a material such as a tissue grasped between the jaws.
4. The electrosurgical device of claim 1, wherein at least one, or both, of the upper jaw assembly and lower jaw assembly comprises a jaw arm, a carrier and electrodes wherein the carrier is provided with a longitudinal, optionally dove-tailed, ridge along its surface, and the jaw arm is provided with a mating, optionally dove-tailed, slot along its lower surface for receiving the ridge.
5. The electrosurgical device of claim 4, wherein at least one, or optionally two slots, which may optionally be dove-tailed, are provided in a surface of the carrier for securing electrodes therein, wherein the electrodes may optionally have a dove-tail shape.
6. The electrosurgical device of claim 4, wherein the standoff member is formed integrally with a center portion of the carrier, preferably the lower carrier.
7. The electrosurgical device of claim 1, wherein pivotable vertebrae are provided for allowing the jaw assembly structure to articulate.
8. The electrosurgical device of claim 1, wherein a U-shaped region of the standoff resides between upper electrodes and lower electrodes so as to keep the upper and lower electrodes a uniform distance apart of about 0.125 to 0.225 mm, or about 0.125 to 0.175 mm, or about 0.150 to 0.175 mm.
9. The electrosurgical device of claim 1, wherein one of the jaw assemblies is provided with a central conductive body which is overmolded with a non-conductive portion including a raised lip.
10. The electrosurgical device of claim 9, wherein the raised lip extends around the periphery of the conductive body and covers an edge portion of the face of the conductive body, the overmolded lip being configured to be interposed between an upper electrode or conductive body and a lower electrode or lower jaw when the upper and lower jaws are in a closed position.
11. The electrosurgical device of claim 9, wherein cross straps are provided across portions of an electrode face.
12. The electrosurgical device of claim 11, wherein overmolded plugs are connected with the cross straps which overmolded plugs pass through the central conductive body.
13. The electrosurgical device of claim 1, comprising peripheral standoff members over electrode edges with inwardly protruding fingers.
14. An electrosurgical device, comprising a jaw assembly structure which includes an upper jaw assembly, and a lower jaw assembly each having at least one electrode wherein at least one standoff member is provided on at least one of the upper jaw assembly and the lower jaw assembly,
wherein one of the jaw assemblies is provided with a central conductive body which is overmolded with a non-conductive portion including a raised lip,
wherein cross straps are provided across portions of an electrode face,
wherein overmolded plugs are connected with the cross straps which overmolded plugs pass through the central conductive body.
15. The electrosurgical device of claim 14, wherein the raised lip extends around the periphery of the conductive body and covers an edge portion of the face of the conductive body, the overmolded lip being configured to be interposed between an upper electrode or conductive body and a lower electrode or lower jaw when the upper and lower jaws are in a closed position.
16. The electrosurgical device of claim 14, wherein the standoff member is a single, preferably unitary, U-shaped standoff member provided on a jaw of the upper jaw assembly or the lower jaw assembly, so as to maintain a predetermined gap between upper and lower electrodes of the upper and lower jaw assembly, respectively.
17. The electrosurgical device of claim 14, wherein the standoff member comprises a longitudinal slot provided down through its middle so as to allow a cutting element such as a knife to be advanced through a material such as a tissue grasped between the jaws.
18. The electrosurgical device of claim 14, wherein at least one, or both, of the upper jaw assembly and lower jaw assembly comprises a jaw arm, a carrier and electrodes wherein the carrier is provided with a longitudinal, optionally dove-tailed, ridge along its surface, and the jaw arm is provided with a mating, optionally dove-tailed, slot along its lower surface for receiving the ridge.
19. The electrosurgical device of claim 18, wherein at least one, or optionally two slots, which may optionally be dove-tailed, are provided in a surface of the carrier for securing electrodes therein, wherein the electrodes may optionally have a dove-tail shape.
20. The electrosurgical device of claim 18, wherein the standoff member is formed integrally with a center portion of the carrier, preferably the lower carrier.
The claims below are in addition to those above.
All refrences to claim(s) which appear below refer to the numbering after this setence.
1. A powder comprising particles with a core of titanium dioxide and a coating of silicon dioxide, wherein
the silicon dioxide is present in an amount of between 0.5 and 40 wt. %,
the particles have a BET surface of between 5 and 300 m2g, and
the particles are primary particles that have a coating of silicon dioxide and a core of titanium dioxide.
2. The powder according to claim 1, wherein the primary particles can grow together to form aggregates.
3. The powder according to claim 1, wherein the silicon dioxide is present in the powder in an amount of 1 to 20 wt. %.
4. The powder according to claim 1, wherein the titanium dioxide core has a ratio of the rutileanatase modifications of 1:99 to 99:1.
5. The powder according to claim 1, wherein an aqueous dispersion of the powder with a solids content of 3 wt. % has an absorption of at least 95% at 320 nm and an absorption of at least 90% at 360 nm.
6. The powder according to claim 1, which has a photoactivity index of less than 0.5.
7. The powder according to claim 1, which has an isoelectric point at a pH value of between 1 and 4.
8. The powder according to claim 1, wherein the BET surface is between 40 and 120 m2g.
9. An aggregate of particles comprising the powder according to claim 2 and wherein the primary particles have grown together via the silicon dioxide coating.
10. A sunscreen agent comprising the powder according to claim 1 in an amount of between 0.01 and 25 wt. % based on the weight of the sunscreen agent; and one or more of a UV-absorbing pigment, chemical UV filter, and a solvent.
11. A process for the production of the powder according to claim 1, comprising
mixing a vaporisable silicon compound and a vaporisable titanium compound corresponding to a subsequently desired ratio of SiO2 and TiO2 in the powder,
vaporizing the mixture at a temperature of 200\xb0 C. or less transferring the vaporized mixture in an inert gas stream together with hydrogen and air or with oxygen-enriched air into a central pipe of a burner forming a reaction mixture,
igniting the reaction mixture at mouth of the burner in the presence of additional, secondary air,
combusting the reaction mixture in a cooled flame pipe generating gaseous reaction products, removing the titanium dioxide powder coated with silicon dioxide from the gaseous reaction products, wherein the ratio of
air to secondary air is greater than 0.3,
hydrogen to secondary air is greater than 1,
vaporisable titanium dioxide compound to secondary air is greater than 0.5.
12. The process according to claim 11, wherein titanium tetrachloride is the titanium compound.
13. The process according to claim 11, wherein silicon tetrachloride is the silicon compound.
14. The process according to claim 11, further comprising freeing the gaseous reaction product from adhering hydrogen chloride following the removal of the titanium dioxide powder coated with silicon dioxide from the gaseous reaction products.
15. A method of making a dispersion, comprising mixing the powder according to claim 1 with a solvent.