1. An image processing apparatus for generating a signal value of a pixel of interest in an image, which is captured by an image sensor having a color filter, by using a signal value of a peripheral pixel of the pixel of interest, comprising:
a first direction determination unit adapted to determine whether a direction, in which a pixel highly correlated with the signal value of the pixel of interest exists, is a first or second direction or a third or fourth direction from signal values of a plurality of peripheral pixels of the pixel of interest that are of the same color as the pixel of interest;
a second direction determination unit adapted to determine, from signal values of a plurality of peripheral pixels of the pixel of interest that are of a different color from the pixel of interest, whether a direction, in which the pixel highly correlated with the signal value of the pixel of interest exists, is the first direction or the second direction if it is determined by the first direction determination unit that the direction, in which the pixel highly correlated with the signal value of the pixel of interest exists, is the first or second direction, and determine, from the signal values of the plurality of peripheral pixels of the pixel of interest that are of a different color from the pixel of interest, whether the direction, in which the pixel highly correlated with the signal value of the pixel of interest exists, is the third direction or the fourth direction if it is determined by the first direction determination unit that the direction in which the pixel highly correlated with the signal value of the pixel of interest exists is the third or fourth direction; and
a calculation unit adapted to calculate the signal value of the pixel of interest by using the signal values of a plurality of pixels, among the peripheral pixels of the pixel of interest, that exist in the direction determined by the second direction determination unit relative to the pixel of interest.
2. The image processing apparatus according to claim 1,
wherein the first direction determination unit is adapted to:
obtain a difference between signal values of two pixels of the same color as the pixel of interest that are located so as to sandwich the pixel of interest, for each of the first direction, the second direction, the third direction, and the fourth direction;
determine that the direction in which the pixel highly correlated with the signal value of the pixel of interest exists is the first or second direction if a sum of the differences for the first direction and the second direction is smaller than a sum of the differences for the third direction and the fourth direction; and
determine that the direction in which the pixel highly correlated with the signal value of the pixel of interest exists is the third or fourth direction if the sum of the differences for the first direction and the second direction is equal to or larger than the sum of the differences for the third direction and the fourth direction.
3. The image processing apparatus according to claim 1,
wherein the second direction determination unit is adapted to:
obtain, for each of the peripheral pixels of the pixel of interest that are of a different color from the pixel of interest, a difference between signal values of two pixels that are of a different color from the pixel of interest and located in the first direction with respect to the peripheral pixel and a difference between signal values of two pixels that are of a different color from the pixel of interest and located in the second direction with respect to the peripheral pixel, obtain an average value of the differences for each of the directions, and determine a direction corresponding to a smaller value of the average values; and
obtain, for each of the peripheral pixels of the pixel of interest that are of a different color from the pixel of interest, a difference between signal values of two pixels that are of a different color from the pixel of interest and located in the third direction with respect to the peripheral pixel and a difference between signal values of two pixels that are of a different color from the pixel of interest and located in the fourth direction with respect to the peripheral pixel, obtain an average value of the differences for each of the directions, and determine a direction corresponding to a smaller value of the average values.
4. The image processing apparatus according to claim 1, wherein the image sensor has a Bayer pattern color filter.
5. The image processing apparatus according to claim 1, wherein the image sensor has a Bayer pattern primary color filter, and the pixel of interest is a pixel corresponding to a red or blue color filter.
6. The image processing apparatus according to claim 5, wherein the second direction determination unit performs the determination by using signal values of a plurality of peripheral green pixels of the pixel of interest.
7. The image processing apparatus according to claim 1, wherein the first direction is a vertical direction, the second direction is a horizontal direction, the third direction is a 45-degree direction, and the fourth direction is a 135-degree direction.
8. An image capture apparatus comprising:
an image sensor having a Bayer pattern primary color filter; and
the image processing apparatus according to claim 1,
wherein in an image captured by the image sensor, a signal value of a red or blue defective pixel in the image sensor is acquired by the image processing apparatus.
9. A method for controlling an image processing apparatus for generating a signal value of a pixel of interest in an image, which is captured by an image sensor having a color filter, by using a signal value of a peripheral pixel of the pixel of interest, the method comprising:
a first direction determination step of determining whether a direction, in which a pixel highly correlated with the signal value of the pixel of interest exists, is a first or second direction or a third or fourth direction from signal values of a plurality of peripheral pixels of the pixel of interest that are of the same color as the pixel of interest;
a second direction determination step of determining, from signal values of a plurality of peripheral pixels of the pixel of interest that are of a different color from the pixel of interest, whether a direction, in which the pixel highly correlated with the signal value of the pixel of interest exists, is the first direction or the second direction if it is determined in the first direction determination step that the direction, in which the pixel highly correlated with the signal value of the pixel of interest exists, is the first or second direction, and determining, from the signal values of the plurality of peripheral pixels of the pixel of interest that are of a different color from the pixel of interest, whether the direction, in which the pixel highly correlated with the signal value of the pixel of interest exists, is the third direction or the fourth direction if it is determined in the first direction determination step that the direction, in which the pixel highly correlated with the signal value of the pixel of interest exists, is the third or fourth direction; and
a calculation step of calculating the signal value of the pixel of interest by using the signal values of a plurality of pixels, among the peripheral pixels of the pixel of interest, that exist in the direction determined in the second direction determination step relative to the pixel of interest.
10. A non-transitory computer-readable recording medium storing a program for causing a computer to function as the image processing apparatus according to claim 1.
The claims below are in addition to those above.
All refrences to claim(s) which appear below refer to the numbering after this setence.
1. A film deposition apparatus for depositing a film on a substrate by performing a cycle of alternately supplying at least two kinds of reaction gases that react with each other on the substrate to produce a layer of a reaction product in a vacuum chamber, the film deposition apparatus comprising:
a turntable provided in the vacuum chamber;
a substrate receiving portion in which the substrate is placed, the substrate receiving portion being provided in the turntable;
a first reaction gas supplying portion that supplies a first reaction gas to a surface where the substrate receiving portion is provided in the turntable;
a second reaction gas supplying portion that supplies a second reaction gas to the surface where the substrate receiving portion is provided in the turntable, the second reaction gas supplying portion being away from the first reaction gas supplying portion in a rotation direction of the turntable;
a separation area located between a first process area where the first reaction gas is supplied and a second process area where the second reaction gas is supplied, thereby separating atmospheres of the first process area and the second process area;
a center area that is located at substantially a center of the vacuum chamber and has an ejection hole through which a separation gas is ejected to the surface where the substrate receiving portion is provided in the turntable, thereby separating the atmospheres of the first process area and the second process area;
a transfer mechanism that transfers the substrate to and from the turntable in the vacuum chamber;
a locking member that locks a part of an upper surface of the substrate in order to keep the substrate in the substrate receiving portion of the turntable; and
an elevation mechanism that moves the locking member and the substrate upward from and downward to the turntable.
2. The film deposition apparatus of claim 1, wherein the substrate receiving portion is a concave portion, and wherein an upper surface of the turntable is substantially at the same elevation as an upper surface of the substrate placed in the substrate receiving portion.
3. The film deposition apparatus of claim 1, wherein the elevation mechanism includes three or more first lift pins that move the substrate upward and downward, and three or more second lift pins that move the locking member upward and downward.
4. The film deposition apparatus of claim 1, wherein the locking member has a streamline shape that reduces gas flow turbulence when the turntable is rotated.
5. A film deposition apparatus for depositing a thin film on a substrate by placing plural of the substrates in corresponding plural concave portions provided in an upper surface of a turntable, and rotating the turntable to alternately expose the plural substrates to different reaction gases supplied to corresponding process areas, the film deposition apparatus comprising:
plural reaction gas supplying portions that are provided away from ceilings of the corresponding process areas, and supply corresponding reaction gases toward the substrates;
an inert gas supplying portion that supplies an inert gas to a separation area provided between the process areas;
at least two evacuation portions that evacuate the vacuum chamber to reduced pressures through corresponding evacuation ports provided outside of the corresponding process areas and along a circumferential direction of the turntable, wherein one of the evacuation portions evacuates one of the reaction gases supplied to a corresponding one of the process areas and the separation gas supplied to the separation area by way of the corresponding one of the process areas; and
locking members provided in or around the corresponding concave portions of the turntable in order to keep the substrates in the concave portions.
6. A film deposition apparatus for depositing a thin film on a substrate by placing plural of the substrates in corresponding plural concave portions provided in an upper surface of a turntable, and rotating the turntable to alternately expose the plural substrates to different reaction gases supplied to corresponding process areas, the film deposition apparatus comprising:
plural reaction gas supplying portions that are introduced from a side wall of the vacuum chamber toward a rotation center of the turntable, arranged away from a ceiling of the vacuum chamber, and supply corresponding reaction gases toward the substrates placed on the turntable;
an inert gas supplying portion that supplies an inert gas toward the substrates placed on the turntable, in a separation area provided between the process areas;
at least two evacuation portions that evacuate the vacuum chamber to reduced pressures through corresponding evacuation ports provided outside of the corresponding process areas and along a circumferential direction of the turntable, wherein one of the evacuation portions evacuates one of the reaction gases supplied to corresponding one of the process areas and the separation gas supplied to the separation area by way of the corresponding one of the process areas; and
locking members provided in or around the corresponding concave portions of the turntable so that the locking members leave gaps with respect to the substrates placed in the concave portions but lock the substrates in case the substrates may be moved up when the turntable is being rotated.
7. A film deposition apparatus for depositing a thin film on an upper surface of a substrate by placing plural of the substrates in corresponding plural concave portions provided in an upper surface of a turntable, and rotating the turntable to alternately expose the plural substrates to different reaction gases supplied to corresponding process areas, the film deposition apparatus comprising:
plural reaction gas supplying portions that are provided away from ceilings of the corresponding process areas, and supply corresponding reaction gases toward the substrates;
an inert gas supplying portion that supplies an inert gas to a separation area provided between the process areas;
at least two evacuation portions that evacuate the vacuum chamber to reduced pressures through corresponding evacuation ports provided outside of the corresponding process areas and along a circumferential direction of the turntable, wherein one of the evacuation portions evacuates one of the reaction gases supplied to a corresponding one of the process areas and the separation gas supplied to the separation area by way of the corresponding one of the process areas;
locking members that are provided in or around the corresponding concave portions of the turntable and lock upper surfaces of the substrates placed in the concave portions; and
a control portion that enables placing the substrates in the concave portions so that centers of the substrates deviate from centers of the corresponding concave portions, before rotating the turntable.
8. A film deposition apparatus for depositing a thin film on an upper surface of a substrate by placing plural of the substrates in corresponding plural concave portions provided in an upper surface of a turntable, and rotating the turntable to alternately expose the plural substrates to different reaction gases supplied to corresponding process areas, the film deposition apparatus comprising:
plural reaction gas supplying portions that are provided away from ceilings of the process areas, and supply corresponding reaction gases toward the substrates;
an inert gas supplying portion that supplies an inert gas to a separation area provided between the process areas;
at least two evacuation portions that evacuate the vacuum chamber to reduced pressures through corresponding evacuation ports provided outside of the corresponding process areas and along a circumferential direction of the turntable, wherein one of the evacuation portions evacuates one of the reaction gases supplied to a corresponding one of the process areas and the separation gas supplied to the separation area by way of the corresponding one of the process areas; and
locking members that are provided in or around the corresponding concave portions of the turntable and lock the substrates by contacting upper circumferential portions of the substrates, thereby keeping the substrates in the concave portions.
9. A film deposition apparatus for depositing a thin film on an upper surface of a substrate by placing plural of the substrates in corresponding plural concave portions provided in an upper surface of a turntable, and rotating the turntable to alternately expose the plural substrates to different reaction gases supplied to corresponding process areas, the film deposition apparatus comprising:
plural reaction gas supplying portions that are provided away from ceilings of the corresponding process areas, and supply corresponding reaction gases toward the substrate;
a first inert gas supplying portion that supplies an inert gas to a separation area provided between the process areas;
a second inert gas supplying portion that supplies an inert gas from a center portion of the vacuum chamber;
at least two evacuation portions that evacuate the vacuum chamber to reduced pressures through corresponding evacuation ports provided outside of the corresponding process areas and along a circumferential direction of the turntable, wherein one of the evacuation portions evacuates one of the reaction gases supplied to a corresponding one of the process areas, the inert gas supplied from the first inert gas supplying portion to the corresponding separation area, and the inert gas supplied from the center area, by way of the corresponding one of the process areas; and
locking members that are provided in or around the corresponding concave portions and lock upper surfaces of the substrates in the concave portions.
10. A film deposition method for depositing a film on a substrate by carrying out plural cycles of alternately supplying at least two kinds of reaction gases that react with each other on the substrate to produce a layer of a reaction product in a vacuum chamber, the film deposition method comprising steps of:
transferring the substrate into the vacuum chamber through a transfer opening formed in the vacuum chamber, and placing the substrate in a substrate receiving portion of a turntable in the vacuum chamber so that the substrate is placed in an outermost position with respect to a center of the turntable;
rotating the turntable; and
depositing a film on the substrate by supplying a first reaction gas from a first reaction gas supplying portion toward a surface where the substrate receiving portion is formed in the turntable, supplying a second reaction gas from a second reaction gas supplying portion located away from the first reaction gas supplying portion, toward the surface where the substrate receiving portion is formed in the turntable, and supplying a separation gas from a separation area located between the first reaction gas supplying portion and the second reaction gas supplying portion.
11. A film deposition method for depositing a film on a substrate by carrying out a cycle of alternately supplying at least two kinds of reaction gases that react with each other on the substrate to produce a layer of a reaction product in a vacuum chamber, the film deposition method comprising steps of:
transferring the substrate into the vacuum chamber through a transfer opening formed in the vacuum chamber and placing the substrate on lift pins provided in a substrate receiving portion having a concave shape in a turntable in order to place the substrate in the substrate receiving portion;
moving the lift pins downward so that the substrate is moved downward below an upper surface of the turntable;
moving the lift pins horizontally outward in a radius direction of the turntable so that an outermost part of the substrate contacts or is positioned close to an inner circumferential surface of the substrate receiving portion;
moving the lift pins further downward so that the substrate is placed on a bottom surface of the substrate receiving portion;
rotating the turntable; and
depositing a film on the substrate by supplying a first reaction gas from a first reaction gas supplying portion toward a surface where the substrate receiving portion is formed in the turntable, supplying a second reaction gas from a second reaction gas supplying portion located away from the first reaction gas supplying portion, toward the surface where the substrate receiving portion is formed in the turntable, and supplying a separation gas from a separation area located between the first reaction gas supplying portion and the second reaction gas supplying portion.