1. A method for semiconductor fabrication, comprising:
forming an amorphous carbon layer over a substrate;
forming a lower hard mask layer over the amorphous carbon layer; forming an upper hard mask layer on the lower hard mask layer;
forming a temporary layer over the upper hard mask layer; forming a first hard mask layer over the temporary layer; processing through the first hard mask layer;
forming a temporary level pattern on a level of the temporary layer;
etching through the level of the temporary layer to form an upper hard mask pattern in the upper hard mask layer, the upper hard mask pattern substantially identical to the temporary level pattern; and
transferring the upper hard mask pattern to the lower hard mask layer to form a lower hard mask pattern substantially identical to the upper hard mask pattern.
2. The method of claim 1, wherein forming the upper hard mask layer and the lower hard mask layer are performed at about 550\xb0 C. or less.
3. The method of claim 1, wherein forming the upper hard mask layer and the lower hard mask layer are performed at about 400\xb0 C. or less.
4. The method of claim 1, wherein the lower hard mask is formed of a low silane oxide.
5. The method of claim 4, wherein the upper hard mask is formed of silicon.
6. The method of claim 5, wherein the upper hard mask is formed of amorphous silicon.
7. The method of claim 5, wherein forming the upper hard mask layer comprises performing chemical vapor deposition.
8. The method of claim 5, wherein the temporary layer is formed of amorphous carbon.
9. The method of claim 8, wherein the first hard mask layer is formed of an anti-reflective coating.
10. A method for semiconductor fabrication, comprising:
forming an amorphous carbon layer over a substrate;
forming a lower hard mask layer over the amorphous carbon layer;
forming an upper hard mask layer on the lower hard mask layer;
forming a temporary layer over the upper hard mask layer;
forming a first hard mask layer over the temporary layer;
forming photoresist layer over the first hard mask layer;
patterning the photoresist layer to form a photoresist pattern; and
transferring the photoresist pattern to the first hard mask layer, thereby forming the first hard mask layer pattern;
processing through the first hard mask layer to form a temporary level pattern on a level of the temporary layer;
etching through the level of the temporary layer to form an upper hard mask pattern in the upper hard mask layer, the upper hard mask pattern substantially identical to the temporary level pattern; and
transferring the upper hard mask pattern to the lower hard mask layer to form a lower hard mask pattern substantially identical to the upper hard mask pattern.
11. The method of claim 10 wherein forming the pattern in the first hard mask layer further comprises widening openings in the photoresist pattern by isotropically etching the photoresist pattern before transferring the photoresist pattern to the first hard mask layer.
12. The method of claim 10, wherein forming the temporary level pattern comprises transferring the first hard mask layer pattern to the temporary layer, thereby forming mandrels in the temporary layer.
13. The method of claim 12, wherein forming the temporary level pattern further comprises forming spacers on sidewalls of the mandrels.
14. The method of claim 13, wherein the spacers and the lower hard mask layer are formed of silicon oxide.
15. The method of claim 13, wherein forming the temporary level pattern further comprises preferentially removing the temporary layer relative to the spacers to form a spacer pattern.
16. The method of claim 15, wherein forming the temporary level pattern further comprises depositing a planarizing layer around the spacers, depositing a photoresist layer over the planarizing layer and forming a second pattern in the photoresist layer.
17. The method of claim 16, wherein forming the temporary level pattern further comprises transferring the second pattern to the planarizing layer.
18. The method of claim 17, wherein etching through the level of the temporary layer comprises transferring the spacer and second patterns to the upper hard mask layer, wherein the spacer and the second patterns form the upper hard mask pattern.
19. The method of claim 18, further comprising transferring the lower hard mask pattern to the amorphous carbon layer to form an amorphous carbon pattern.
20. The method of claim 19, further comprising transferring the amorphous carbon pattern to the substrate.
The claims below are in addition to those above.
All refrences to claim(s) which appear below refer to the numbering after this setence.
What is claimed is:
1. A medicine bag comprising:
a bag body having a medicine storage chamber that stores a medicine in such a way that the medicine is visually confirmed through a light-transmission portion provided in at least one part thereof, the bag body having a weak seal portion that divides the medicine storage chamber into a plurality of division spaces, and the sealing of the weak seal portion adjacent to a specific division space being removed by increasing the internal pressure of that division space;
a cover sheet which is peelably attached to the bag body; and
a requisitely-used portion which is used in the process shortly before the medicine is administered,
wherein the cover sheet includes:
a light-shielding portion which shields from the light the medicine stored in at least one division space by covering a predetermined part of the light-transmission portion; and
a continuously-formed portion which is continuously formed in the light-shielding portion and is placed so that the requisitely-used portion is prevented from being used with the cover sheet kept attached.
2. The medicine bag according to claim 1, wherein: the requisitely-used portion is a hanger-hooked portion which is provided in the bag body and is used for hanging the bag body; and the continuously-formed portion is peelably attached to the bag body so that the hanger-hooked portion is prevented from being used.
3. The medicine bag according to claim 2, wherein the hanger-hooked portion is defined by a hole which is formed beforehand in the bag body, and the continuously-formed portion is connected to the bag body with the hole kept closed.
4. The medicine bag according to claim 3, wherein the continuously-formed portion is connected to the bag body, at least in a position opposite to the light-shielding portion with respect to the hole.
5. The medicine bag according to claim 3, wherein the continuously-formed portion is connected in a position apart from the periphery of the hole.
6. The medicine bag according to claim 2, wherein: on the periphery of the hanger-hooked portion, a cut portion is made beforehand along a part to become the periphery of the hole; the continuously-formed portion is connected to the inside of the cut portion; and a part of the bag body inside of the cut portion is cut off by peeling the continuously-formed portion to form the hole.
7. The medicine bag according to claim 6, wherein the cut portion is perforations.
8. The medicine bag according to claim 2, wherein the light-shielding portion and the continuously-formed portion are integral with each other.
9. The medicine bag according to claim 2, wherein the light-shielding portion is provided so as to lie over the division space which stores the medicine to be shielded by the light-shielding portion, in the hanging direction.
10. The medicine bag according to claim 2, wherein the light-shielding portion covers the light-transmission portion provided in the division space near the hole.
11. The medicine bag according to claim 1, wherein: the requisitely-used portion is a discharge port which is formed in the lower part of the bag body and discharges the medicine in the medicine storage chamber; and the continuously-formed portion is peelably attached to at least one part of the discharge port so that the medicine is prevented from being discharged from the discharge port.
12. The medicine bag according to claim 11, wherein the continuously-formed portion is attached to close the outlet of the discharge port.
13. The medicine bag according to claim 12, wherein: the continuously-formed portion includes a tamper seal which is detached when the discharge port is used; and the tamper seal is attached to close the outlet of the discharge port.
14. The medicine bag according to claim 11, wherein the division space which leads to the discharge port is formed in an empty space where the medicine is not filled.
15. The medicine bag according to claim 11, wherein on the surface on the side opposite to the bag body in the continuously-formed portion, a notification column is formed which displays the fact that the cover sheet needs to be peeled from the bag body.
16. The medicine bag according to claim 1, wherein: the requisitely-used portion is a discharge port which is formed in the lower part of the bag body and discharges the medicine in the medicine storage chamber; and the continuously-formed portion is disposed to cover the discharge port so that the medicine is prevented from being discharged from the discharge port.
17. The medicine bag according to claim 16, wherein: both surfaces of the bag body is covered with a pair of opposite cover sheets; and a pair of opposite continuously-formed portions of the cover sheets are peelably connected to each other to cover the discharge port.
18. The medicine bag according to claim 16, wherein the division space which leads to the discharge port is formed in an empty space where the medicine is not filled.
19. The medicine bag according to claim 16, wherein on the surface on the side opposite to the bag body in the continuously-formed portion, a notification column is formed which displays the fact that the cover sheet needs to be peeled from the bag body.
20. The medicine bag according to claim 1, wherein: the requisitely-used portion is a remaining-quantity displaying portion which is provided on the surface of the bag body and displays a remaining quantity of the medicine stored in the medicine storage chamber; and the continuously-formed portion conceals at least one part of the remaining-quantity displaying portion which is provided in the division space except the division space shielded by the light-shielding portion.
21. The medicine bag according to claim 20, wherein: the remaining-quantity displaying portion includes a calibration portion which indicates the height level of the remaining quantity of medicine, and a remaining-quantity numerical-value portion which corresponds to the calibration portion and shows a numerical value of the remaining quantity of medicine; and the continuously-formed portion conceals at least one part of the calibration portion, at least one part of the remaining-quantity numerical-value portion, or at least one part of both of these.
22. The medicine bag according to claim 20, wherein the continuously-formed portion conceals at least one calibration portion, and the remaining-quantity numerical-value portion which corresponds to this calibration portion.
23. The medicine bag according to claim 20, wherein the continuously-formed portion conceals the whole calibration portion, the whole remaining-quantity numerical-value portion, or the whole of both of these.
24. The medicine bag according to claim 20, wherein on the surface on the side opposite to the bag body in the continuously-formed portion, a notification column is formed which displays the fact that the cover sheet needs to be peeled from the bag body, the fact that the continuously-formed portion conceals the remaining-quantity displaying portion, or both of these.
25. The medicine bag according to claim 20, wherein the continuously-formed portion is peelably attached to the bag body.