1. A very high repetition rate gas discharge laser system in a MOPA configuration comprising:
a master oscillator gas discharge laser system producing a beam of oscillator laser output light pulses at a very high pulse repetition rate;
at least two power amplification gas discharge laser systems receiving laser output light pulses from the master oscillator gas discharge laser system and each of the at least two power amplification gas discharge laser systems amplifying some of the received laser output light pulses at a pulse repetition that is a fraction of the very high pulse repetition rate equal to one over the number of the at least two power amplification gas discharge laser systems to form an amplified output laser light pulse beam at the very high pulse repetition rate.
2. The apparatus of claim 1 further comprising:
the at least two power amplification gas discharge laser systems comprises two power amplification gas discharge laser systems.
3. The apparatus of claim 1 further comprising:
the at least two power amplification gas discharge lasers systems are positioned in series with respect to the oscillator laser output light pulse beam.
4. The apparatus of claim 2 further comprising:
the at least two power amplification gas discharge lasers systems are positioned in series with respect to the oscillator laser output light pulse beam.
5. The apparatus of claim 3 further comprising:
the master oscillator gas discharge laser system fires at a pulse repetition rate of x\u22674000 Hz;
each power amplification gas discharge laser fires at \xbd x.
6. The apparatus of claim 4 further comprising: the master oscillator gas discharge laser system fires at a pulse repetition rate of x\u22674000 Hz;
each power amplification gas discharge laser fires at \xbd x.
7. The apparatus of claim 3 further comprising:
the master oscillator gas discharge laser system fires at a pulse repetition rate of x\u22675000 Hz;
each power amplification gas discharge laser fires at \xbd x.
8. The apparatus of claim 4 further comprising:
the master oscillator gas discharge laser system fires at a pulse repetition rate of x\u22675000 Hz;
each power amplification gas discharge laser fires at \xbd x.
9. The apparatus of claim 5 further comprising:
a beam delivery unit connected to the laser light output of the power amplification laser system and directing to output of the power amplification laser system to an input of a light utilization tool and providing at least beam pointing and direction control.
10. The apparatus of claim 6 further comprising:
a beam delivery unit connected to the laser light output of the power amplification laser system and directing to output of the power amplification laser system to an input of a light utilization tool and providing at least beam pointing and direction control.
11. The apparatus of claim 7 further comprising:
a beam delivery unit connected to the laser light output of the power amplification laser system and directing to output of the power amplification laser system to an input of a light utilization tool and providing at least beam pointing and direction control.
12. The apparatus of claim 8 further comprising:
a beam delivery unit connected to the laser light output of the power amplification laser system and directing an output of the power amplification laser system to an input of a light utilization tool and providing at least beam pointing and direction control.
13. A lithography tool comprising:
a very high repetition rate gas discharge laser system in a MOPA configuration comprising:
a master oscillator gas discharge laser system producing a beam of oscillator laser output light pulses at a very high pulse repetition rate;
at least two power amplification gas discharge laser systems receiving laser output light pulses from the master oscillator gas discharge laser system and each of the at least two power amplification gas discharge laser systems amplifying some of the received laser output light pulses at a pulse repetition that is a fraction of the very high pulse repetition rate, equal to one over the number of the at least two power amplification gas discharge laser systems, to form an amplified output laser light pulse beam at the very high pulse repetition rate.
14. The apparatus of claim 13 further comprising:
the at least two power amplification gas discharge laser systems is two power amplification gas discharge laser systems.
15. The apparatus of claim 13 further comprising:
the at least two power amplification gas discharge lasers systems are positioned in series with respect to the oscillator laser output light pulse beam.
16. The apparatus of claim 14 further comprising:
the at least two power amplification gas discharge lasers systems are positioned in series with respect to the oscillator laser output light pulse beam.
17. The apparatus of claim 15 further comprising:
the master oscillator gas discharge laser system fires at a pulse repetition rate of x\u22674000 Hz;
each power amplification gas discharge laser fires at \xbd x.
18. The apparatus of claim 16 further comprising:
the master oscillator gas discharge laser system fires at a pulse repetition rate of x\u22674000 Hz;
each power amplification gas discharge laser fires at \xbd x.
19. The apparatus of claim 15 further comprising:
the master oscillator gas discharge laser system fires at a pulse repetition rate of x\u22675000 Hz;
each power amplification gas discharge laser fires at \xbd x.
20. The apparatus of claim 16 further comprising:
the master oscillator gas discharge laser system fires at a pulse repetition rate of x\u22675000 Hz;
each power amplification gas discharge laser fires at \xbd x.
21. The apparatus of claim 15 further comprising:
a beam delivery unit connected to the laser light output of the power amplification laser system and directing an output of the power amplification laser system to an input of a light utilization tool and providing at least beam pointing and direction control.
22. The apparatus of claim 16 further comprising:
a beam delivery unit connected to the laser light output of the power amplification laser system and directing to output of the power amplification laser system to an input of a light utilization tool and providing at least beam pointing and direction control.
23. The apparatus of claim 17 further comprising:
a beam delivery unit connected to the laser light output of the power amplification laser system and directing to output of the power amplification laser system to an input of a light utilization tool and providing at least beam pointing and direction control.
24. The apparatus of claim 18 further comprising:
a beam delivery unit connected to the laser light output of the power amplification laser system and directing an output of the power amplification laser system to an input of a light utilization tool and providing at least beam pointing and direction control.
25. A laser produced plasma EUV light source comprising:
a very high repetition rate gas discharge laser system in a MOPA configuration comprising:
a master oscillator gas discharge laser system producing a beam of oscillator laser output light pulses at a very high pulse repetition rate;
at least two power amplification gas discharge laser systems receiving laser output light pulses from the master oscillator gas discharge laser system and each of the at least two power amplification gas discharge laser systems amplifying some of the received laser output light pulses at a pulse repetition that is a fraction of the very high pulse repetition rate, equal to one over the number of the at least two power amplification gas discharge laser systems, to form an amplified output laser light pulse beam at the very high pulse repetition rate.
26. The apparatus of claim 25 further comprising:
the at least two power amplification gas discharge laser systems is two power amplification gas discharge laser systems.
27. The apparatus of claim 25 further comprising:
the at least two power amplification gas discharge lasers systems are positioned in series with respect to the oscillator laser output light pulse beam.
28. The apparatus of claim 26 further comprising:
the at least two power amplification gas discharge lasers systems are positioned in series with respect to the oscillator laser output light pulse beam.
29. The apparatus of claim 27 further comprising:
the master oscillator gas discharge laser system fires at a pulse repetition rate of x\u22674000 Hz;
each power amplification gas discharge laser fires at \xbd x.
30. The apparatus of claim 28 further comprising:
the master oscillator gas discharge laser system fires at a pulse repetition rate of x\u22674000 Hz;
each power amplification gas discharge laser fires at \xbd x.
31. The apparatus of claim 27 further comprising:
the master oscillator gas discharge laser system fires at a pulse repetition rate of x\u22675000 Hz;
each power amplification gas discharge laser fires at \xbd x.
32. The apparatus of claim 28 further comprising:
the master oscillator gas discharge laser system fires at a pulse repetition rate of x\u22675000 Hz;
each power amplification gas discharge laser fires at \xbd x.
33. The apparatus of claim 29 further comprising:
a beam delivery unit connected to the laser light output of the power amplification laser system and directing to output of the power amplification laser system to an input of a light utilization tool and providing at least beam pointing and direction control.
34. The apparatus of claim 30 further comprising:
a bean delivery unit connected to the laser light output of the power amplification laser system and directing an output of the power amplification laser system to an input of a light utilization tool and providing at least beam potting and direction control.
35. The apparatus of claim 31 further comprising:
a beam delivery unit connected to the laser light output of the power amplification laser system and directing an output of the power amplification laser system to an input of a light utilization tool and providing at least beam pointing and direction control.
36. The apparatus of claim 32 further comprising:
a beam delivery unit connected to the laser light output of the power amplification laser system and directing an output of the power amplification laser system to an input of a light utilization tool and providing at least beam pointing and direction control.
37. A method of producing a very high repetition rate gas discharge laser system in a MOPA configuration comprising:
utilizing a master oscillator gas discharge laser system, producing a beam of oscillator laser output light pulses at a very high pulse repetition rate;
utilizing at least two power amplification gas discharge laser systems, receiving laser output light pulses from the master oscillator gas discharge laser system and, in each of the at least two power amplification gas discharge laser systems, amplifying some of the received laser output light pulses at a pulse repetition that is a fraction of the very high pulse repetition rate equal to one over the number of the at least two power amplification gas discharge laser systems to form an amplified output laser light pulse beam at the very high pulse repetition rate.
38. The method of claim 37 further comprising:
the at least two power amplification gas discharge laser systems comprises two power amplification gas discharge laser systems.
39. The method of claim 37 further comprising:
the at least two power amplification gas discharge lasers systems are positioned in series with respect to the oscillator laser output light pulse beam.
40. The method of claim 38 further comprising:
the at least two power amplification gas discharge lasers systems are positioned in series with respect to the oscillator laser output light pulse beam.
41. The method of claim 37 further comprising:
utilizing a beam delivery unit connected to the laser light output of the power amplification laser system, directing an output of the power amplification laser system to an input of a light utilization tool and providing at least beam pointing and direction control.
42. The method of claim 38 further comprising:
utilizing a beam delivery unit connected to the laser light output of the power amplification laser system, directing an output of the power amplification laser system to an input of a light utilization tool and providing at least beam pointing and direction control.
43. The method of claim 39 further comprising:
utilizing a beam delivery unit connected to the laser light output of the power amplification laser system, directing to output of the power amplification laser system to an input of a light utilization tool and providing at least beam pointing and direction control.
44. The method of claim 40 further comprising:
utilizing a beam delivery unit connected to the laser light output of the power amplification laser system, directing an output of the power amplification laser system to an input of a light utilization tool and providing at least beam pointing and direction control.
45. A method of performing integrated circuit lithography comprising:
utilizing a method for producing a very high repetition rate gas discharge laser system in a MOPA configuration comprising the steps of:
utilizing a master oscillator gas discharge laser system, producing a beam of oscillator laser output light pulses at a very high pulse repetition rate;
utilizing at least two power amplification gas discharge laser systems, receiving laser output light pulses from the master oscillator gas discharge laser system and, in each of the at least two power amplification gas discharge laser systems, amplifying some of the received laser output light pulses at a pulse repetition that is a fraction of the very high pulse repetition rate equal to one over the number of the at least two power amplification gas discharge laser systems to form an amplified output laser light pulse beam at the very high pulse repetition rate.
46. The method of claim 45 further comprising:
the at least two power amplification gas discharge laser systems comprises two power amplification gas discharge laser systems.
47. The method of claim 45 further comprising:
the at least two power amplification gas discharge lasers systems are positioned in series with respect to the oscillator laser output light pulse beam.
48. The method of claim 46 further comprising:
the at least two power amplification gas discharge lasers systems are positioned in series with respect to the oscillator laser output light pulse beam.
49. The method of claim 45 further comprising:
utilizing a beam delivery unit connected to the laser light output of the power amplification laser system, directing an output of the power amplification laser system to an input of a light utilization tool and providing at least beam pointing and direction control.
50. The method of claim 46 further comprising:
utilizing a beam delivery unit connected to the laser light output of the power amplification laser system, directing an output of the power amplification laser system to an input of a light utilization tool and providing at least beam pointing and direction control.
51. The method of claim 47 further comprising:
utilizing a beam delivery unit connected to the laser light output of the power amplification laser system, directing an output of the power amplification laser system to an input of a light utilization tool and providing at least beam pointing and direction control.
52. The method of claim 48 further comprising:
utilizing a beam delivery unit connected to the laser light output of the power amplification laser system, directing an output of the power amplification laser system to an input of a light utilization tool and providing at least beam pointing and direction control.
53. A method of producing EUV light utilizing a laser produced plasma comprising:
utilizing a very high repetition rate gas discharge laser system in a MOPA configuration comprising:
utilizing a master oscillator gas discharge laser system, producing a beam of oscillator laser output light pulses at a very high pulse repetition rate;
utilizing at least two power amplification gas discharge laser systems, receiving laser output light pulses from the master oscillator gas discharge laser system and, in each of the at least two power amplification gas discharge laser systems, amplifying some of the received laser output light pulses at a pulse repetition that is a fraction of the very high pulse repetition rate equal to one over the number of the at least two power amplification gas discharge laser systems to form an amplified output laser light pulse beam at the very high pulse repetition rate.
54. The method of claim 53 further comprising:
the at least two power amplification gas discharge laser systems comprises two power amplification gas discharge laser systems.
55. The method of claim 54 further comprising:
the at least two power amplification gas discharge lasers systems are positioned in series with respect to the oscillator laser output light pulse beam.
56. The apparatus of claim 55 further comprising:
the at least two power amplification gas discharge lasers systems are positioned in series with respect to the oscillator laser output light pulse beam.
57. The method of claim 53 further comprising:
utilizing a beam delivery unit connected to the laser light output of the power amplification laser system, directing an output of the power amplification laser system to an input of a light utilization tool and providing at least beam pointing and direction control.
58. The method of claim 54 further comprising:
utilizing a beam delivery unit connected to the laser light output of the power amplification laser system, directing to output of the power amplification laser system to an input of a light utilization tool and providing at least beam pointing and direction control.
59. The meted of claim 55 further comprising:
utilizing a beam delivery unit connected to the laser light output of the power amplification laser system, directing an output of the power amplification laser system to an input of a light utilization tool and providing at least beam pointing and direction control.
60. The method of claim 56 further comprising:
utilizing a beam delivery unit connected to the laser light output of the power amplification laser system, directing an output of the power amplification laser system to an input of a light utilization tool and providing at least beam pointing and direction control.
The claims below are in addition to those above.
All refrences to claim(s) which appear below refer to the numbering after this setence.
1.-9. (canceled)
10. A floating-caliper disc brake of a motor vehicle
with a component fixed to the vehicle,
with a floating caliper (2) and
with at least two pin guides (10, 20) for the displaceable arrangement of the floating caliper (2) at the component fixed to the vehicle, each of the pin guides having a guiding portion and a pin and being attached with a first end (12) by means of the pin (11, 21, 21\u2032, 41) to the component fixed to the vehicle or at the floating caliper (2), respectively, while being arranged with a second end (13) provided by the guiding portion (15, 29, 39), in a displaceable manner, in a bore (4) of the floating caliper (2) or of the component fixed to the vehicle,
with a first pin guide (10) for the transmission of brake circumferential forces and a second pin guide (20) for positioning the floating caliper (2) perpendicular to its direction of displacement,
wherein the second pin guide (20) includes a multipart guide pin (21, 21\u2032, 41), with a pin (22, 22\u2032, 42), an elastic sleeve (23, 45, 50, 55) encompassing the pin (22, 22\u2032, 42), and with a sliding bushing (28, 28\u2032, 38) encompassing the elastic sleeve (23, 45, 50, 55).
11. The floating-caliper disc brake as claimed in claim 10,
wherein the first pin guide (10) includes a one-piece carrier pin (11).
12. The floating-caliper disc brake as claimed in claim 11,
wherein the carrier pin (11) at its first end (12) is defined by way of a conical surface (17) at the component fixed to the vehicle or at the floating caliper (2), respectively.
13. The floating-caliper disc brake as claimed in claim 10,
wherein the guiding portion (15) of the first pin guide (10) and the guiding portion (29, 39) of the second pin guide (20) have the same outside diameter.
14. The floating-caliper disc brake as claimed in claim 10,
wherein the multipart guide pin (21, 21\u2032, 41) has a conical surface (27, 27\u2032, 37) at the first end.
15. The floating-caliper disc brake as claimed in claim 10,
wherein the elastic sleeve (23, 45, 50, 55) is provided on at least an inside or an outside surface with an appropriate profiling (25, 47, 51, 57) for an adjustment of an elastic effect perpendicular to the direction of displacement.
16. The floating-caliper disc brake as claimed in claim 10,
wherein the elastic sleeve (23), at least in sections, is composed of an elastic material, in particular rubber material.
17. The floating-caliper disc brake as claimed in claim 10,
wherein the elastic sleeve is designed as a tolerance sleeve (45, 50, 55), which is made of a material of low elastic properties at least in sections, and permits a limited elastic deformation in a radial direction due to its appropriate configuration.
18. The floating-caliper disc brake as claimed in claim 10,
wherein the elastic sleeve (23, 45, 50, 55) permits a limited elastic deformation in a radial direction with respect to the pin axis, and includes a radial stop.