1. An azeotrope or near-azeotrope composition comprising Z-HFC-162-13 and hydrogen fluoride.
2. The azeotrope or near-azeotrope composition of claim 1 comprising Z-HFC-162-13 and an effective amount of hydrogen fluoride.
3. The azeotrope or near-azeotrope composition of claim 1 comprising from about 0.8 mole percent to about 9.1 mole percent Z-HFC-162-13 and hydrogen fluoride.
4. The azeotrope or near-azeotrope composition of claim 1 comprising from about 0.8 mole percent to about 9.1 mole percent Z-HFC-162-13 and from about 99.2 mole percent to about 90.1 mole percent hydrogen fluoride.
5. The azeotrope or near-azeotrope composition of claim 1 comprising from about 0.8 mole percent to about 9.1 mole percent Z-HFC-162-13 and from about 99.2 mole percent to about 90.1 mole percent hydrogen fluoride, wherein the vapor pressure is from about 2.9 psi (20.0 kPa) to about 225 psi (1551 kPa) at a temperature of from about -20\xb0 C. to about 108\xb0 C.
6. The azeotrope or near-azeotrope composition of claim 1 wherein said composition consists essentially of from about 0.8 mole percent to about 9.1 mole percent Z-HFC-162-13 and from about 99.2 mole percent to about 90.1 mole percent hydrogen fluoride, wherein the vapor pressure is from about 2.9 psi (20.0 kPa) to about 225 psi (1551 kPa) at a temperature of from about \u221220\xb0 C. to about 108\xb0 C.
7. The azeotrope composition of claim 1 comprising from about 1.3 mole percent to about 9.7 mole percent Z-HFC-162-13 and from about 98.7 mole percent to about 90.3 mole percent hydrogen fluoride, wherein the vapor pressure is from about 2.9 psi (20.0 kPa) to about 225 psi (1551 kPa) at a temperature of from about \u221220\xb0 C. to about 108\xb0 C.
8. The azeotrope composition of claim 1 wherein said composition consists essentially of from about 1.3 mole percent to about 9.7 mole percent Z-HFC-162-13 and from about 98.7 mole percent to about 90.3 mole percent hydrogen fluoride, wherein the vapor pressure is from about 2.9 psi (20.0 kPa) to about 225 psi (1551 kPa) at a temperature of from about \u221220\xb0 C. to about 108\xb0 C.
9. The azeotrope or near-azeotrope composition of claim 1, wherein said composition is characterized by a difference between dew point pressure and bubble point pressure that is less than or equal to 3%, based upon bubble point pressure.
10. A process for the separation of Z-HFC-162-13 from HFC-63-14mcee comprising:
(a) forming a mixture of Z-HFC-162-13, HFC-63-14mcee, and hydrogen fluoride; and
(b) subjecting said mixture to a distillation step from which is formed a column distillate composition comprising an azeotrope or near-azeotrope composition of hydrogen fluoride and Z-HFC-162-13 essentially free of HFC-63-14mcee.
11. The process of claim 10 wherein said distillation step further forms a column-bottoms composition comprising HFC-63-14mcee.
12. The process of claim 11 wherein said column-bottoms composition comprises HFC-63-14mcee essentially free of hydrogen fluoride.
13. The process of claim 10 wherein said mixture of Z-HFC-162-13, HFC-63-14mcee, and hydrogen fluoride comprises equimolar quantities of each component.
14. The process of claim 10 wherein said mixture of Z-HFC-162-13, HFC-63-14mcee, and hydrogen fluoride comprises excess Z-HFC-162-13.
15. A process for the separation of Z-HFC-162-13 from a mixture comprising an azeotrope or near-azeotrope composition of Z-HFC-162-13 and hydrogen fluoride, said process comprising:
a) subjecting said mixture to a first distillation step in which a composition enriched in either (i) hydrogen fluoride or (ii) Z-HFC-162-13 is removed as a first distillate composition with a first bottoms composition being enriched in the other of said components (i) or (ii); and
b) subjecting said first distillate composition to a second distillation step conducted at a different pressure in which the component enriched as first bottoms composition in (a) is removed in a second distillate composition with a second bottoms composition enriched in the same component which was enriched in the first distillate composition.
16. The process of claim 15 wherein said first bottoms composition comprises Z-HFC-162-13 essentially free of hydrogen fluoride.
17. The process of claim 15 wherein said second bottoms composition comprises hydrogen fluoride essentially free of Z-HFC-162-13.
18. The process of claim 15 wherein said first distillation step is carried out at a pressure greater than the pressure of the second distillation step.
19. The process of claim 15 wherein said mixture consists essentially of Z-HFC-162-13 in combination with an effective amount of hydrogen fluoride to form an azeotrope or near-azeotrope composition with hydrogen fluoride, said azeotrope or near-azeotrope composition containing from about 0.8 mole percent to about 9.1 mole percent Z-HFC-162-13.
20. A process for the purification of Z-HFC-162-13 from a mixture of Z-HFC-162-13, HFC-63-14mcee, and hydrogen fluoride, said process comprising:
a) subjecting said mixture to a first distillation step to form a first distillate comprising an azeotrope or near-azeotrope composition containing Z-HFC-162-13 and hydrogen fluoride and a first bottoms comprising HFC-63-14mcee;
b) subjecting said first distillate to a second distillation step from which a composition enriched in either (i) hydrogen fluoride or (ii) Z-HFC-162-13 is removed as a second distillate composition with a second bottoms composition being enriched in the other of said components (i) or (ii); and
c) subjecting said second distillate composition to a third distillation step conducted at a different pressure than the second distillation step in which the component enriched in the second bottoms composition in (b) is removed in a third distillate composition with a third bottoms composition enriched in the same component that was enriched in the second distillate composition.
21. A process to produce Z-HFC-162-13 comprising:
a) feeding HFC-63-14mcee to a reaction zone for dehydrofluorination to form a reaction product composition comprising Z-HFC-162-13, unreacted HFC-63-14mcee and hydrogen fluoride;
b) subjecting said reaction product composition to a first distillation step to form a first distillate composition comprising an azeotrope or near-azeotrope composition containing Z-HFC-162-13 and hydrogen fluoride and a first bottoms composition comprising HFC-63-14mcee;
c) subjecting said first distillate composition to a second distillation step from which a composition enriched in either (i) hydrogen fluoride or (ii) Z-HFC-162-13 is removed as a second distillate composition with a second bottoms composition being enriched in the other of said components (i) or (ii); and
d) subjecting said second distillate composition to a third distillation step conducted at a different pressure than the second distillation step in which the component enriched in the second bottoms composition in (c) is removed in a third distillate composition with a third bottoms composition enriched in the same component that was enriched in the second distillate composition.
22. The process of claim 21, further comprising recycling at least some portion of said first bottoms composition to said reaction zone.
23. The process of claim 21, further comprising recycling at least some portion of said second bottoms composition or said third bottoms composition to said reaction zone.
24. The process of claim 21, further comprising recovering at least some portion of said second bottoms composition or said third bottoms composition as Z-HFC-162-13 essentially free of HFC-63-14mcee and hydrogen fluoride.
25. The process of claim 21, further comprising recycling at least some portion of said second bottoms composition or said third bottoms composition to said first distillation step.
26. A process for the separation of HFC-63-14mcee from a mixture comprising an azeotrope or near-azeotrope composition of HFC-63-14mcee and hydrogen fluoride, said process comprising:
a) subjecting said mixture to a first distillation step in which a composition enriched in either (i) hydrogen fluoride or (ii) HFC-63-14mcee is removed as a first distillate composition with a first bottoms composition being enriched in the other of said components (i) or (ii); and
b) subjecting said first distillate composition to a second distillation step conducted at a different pressure in which the component enriched as first bottoms composition in (a) is removed in a second distillate composition with a second bottoms composition enriched in the same component which was enriched in the first distillate composition.
27. The process of claim 26 wherein said first bottoms composition comprises HFC-63-14mcee essentially free of hydrogen fluoride.
28. The process of claim 26 wherein said second bottoms composition comprises hydrogen fluoride essentially free of HFC-63-14mcee.
29. The process of claim 26 wherein said second distillation step is carried out at a pressure greater than the pressure of the first distillation step.
30. An azeotrope or near-azeotrope composition comprising HFC-63-14mcee and hydrogen fluoride.
31. The azeotrope or near-azeotrope composition of claim 30 comprising HFC-63-14mcee and an effective amount of hydrogen fluoride.
32. The azeotrope or near-azeotrope composition of claim 30 comprising from greater than zero mole percent to about 5.7 mole percent HFC-63-14mcee and hydrogen fluoride.
33. The azeotrope or near-azeotrope composition of claim 30 comprising from greater than zero mole percent to about 5.7 mole percent HFC-63-14mcee and from less than 100 mole percent to about 94.3 mole percent hydrogen fluoride.
34. The azeotrope or near-azeotrope composition of claim 30 comprising from greater than zero mole percent to about 5.7 mole percent HFC-63-14mcee and from less than 100 mole percent to about 94.3 mole percent hydrogen fluoride, wherein the vapor pressure is from about 11.9 psi (82.0 kPa) to about 264 psi (1820 kPa) at a temperature of from about 13.5\xb0 C. to about 120\xb0 C.
35. The azeotrope or near-azeotrope composition of claim 30 wherein said composition consists essentially of from greater than zero mole percent to about 5.7 mole percent HFC-63-14mcee and from less than 100 mole percent to about 94.3 mole percent hydrogen fluoride, wherein the vapor pressure is from about 11.9 psi (82.0 kPa) to about 264 psi (1820 kPa) at a temperature of from about 13.5\xb0 C. to about 120\xb0 C.
36. The azeotrope composition of claim 30 comprising from greater than zero mole percent to about 5.3 mole percent HFC-63-14mcee and from less than 100 mole percent to about 94.7 mole percent hydrogen fluoride, wherein the vapor pressure is from about 11.9 psi (82.0 kPa) to about 264 psi (1820 kPa) at a temperature of from about 13.5\xb0 C. to about 120\xb0 C.
37. The azeotrope composition of claim 30 wherein said composition consists essentially of from greater than zero mole percent to about 5.3 mole percent HFC-63-14mcee and from about less than 100 mole percent to about 94.7 mole percent hydrogen fluoride, wherein the vapor pressure is from about 11.9 psi (82.0 kPa) to about 264 psi (1820 kPa) at a temperature of from about 13.5\xb0 C. to about 120\xb0 C.
The claims below are in addition to those above.
All refrences to claim(s) which appear below refer to the numbering after this setence.
1. A charged particle beam device provided with a deflector for deflectively scanning a charged particle beam, a display unit for detecting particles generated by irradiation of a charged particle beam and displaying an image, and computation means for controlling a deflection pattern of the charged particle beam, the charged particle beam device comprising:
a first memory for storing a first image obtained by scanning a scanning region set outside an ion beam irradiation-prohibited region with an ion beam;
a second memory for storing a second image obtained by scanning a capturing region set so as to overlap with part of the scanning region and including the irradiation-prohibited region with a charged particle beam other than an ion beam, or a second image obtained as external data corresponding to the capturing region; and
means for complementarily superimposing and displaying the first image and the second image.
2. The charged particle beam device according to claim 1, further comprising means for controlling the attitude of a sample stage, on the basis of an angle formed by the observation directions of the first image and the second image, if the observation direction of the first image based on the ion beam and the observation direction of the second image based the charged particle beam differ from each other.
3. The charged particle beam device according to claim 1, wherein the deflection pattern of the ion beam is converted to the deflection pattern of the charged particle beam and vice versa, on the basis of an angle formed by the observation directions of the first image and the second image, a perpendicular line of a plane formed by the first observation direction and the second observation direction, and an angle formed by the deflection scanning directions of the ion beam or the charged particle beam other than the ion beam, if the observation direction of the first image based on the ion beam and the observation direction of the second image based the charged particle beam differ from each other.
4. The charged particle beam device according to claim 1, wherein the first and second images are superimposed so that an image of a first position correction mark acquired from the first image and a second position correction mark acquired from the second image align with each other.
5. The charged particle beam device according to claim 4, wherein the first and second images are superimposed on each other by moving one of the first and second images.
6. The charged particle beam device according to claim 4, wherein the first and second images are superimposed on each other by expansionally transforming one of the first and second images.
7. The charged particle beam device according to claim 4, wherein the first and second images are superimposed on each other by contractionally transforming one of the first and second images.
8. The charged particle beam device according to claim 4, wherein the first and second images are superimposed on each other by rotationally transforming one of the first and second images.
9. The charged particle beam device according to claim 1, wherein the processing position of a processing pattern for extracting a minuscule test piece from a sample mounted on the sample stage can be registered.
10. The charged particle beam device according to claim 1, wherein a fabrication position of a protective film pattern for extracting a minuscule test piece from a sample mounted on the sample stage can be registered.
11. A position specification method used in a charged particle beam device provided with a deflector for deflectively scanning a charged particle beam, a display unit for detecting particles generated by irradiation of a charged particle beam and displaying an image, and computation means for controlling a deflection pattern of the charged particle beam, the method comprising the steps of:
acquiring a first image obtained by scanning a scanning region set outside an ion beam irradiation-prohibited region with an ion beam;
acquiring a second image by scanning a capturing region set so as to overlap with part of the scanning region and including the irradiation-prohibited region with a charged particle beam other than an ion beam, or acquiring a second image as external data corresponding to the capturing region; and
complementarily superimposing and displaying the first image and the second image.
12. A program configured to allow a computer for executing position specification processing of a charged particle beam device provided with a deflector for deflectively scanning a charged particle beam, a display unit for detecting particles generated by irradiation of a charged particle beam and displaying an image, and computation means for controlling a deflection pattern of the charged particle beam, to perform the steps of:
acquiring a first image obtained by scanning a scanning region set outside an ion beam irradiation-prohibited region with an ion beam;
acquiring a second image by scanning a capturing region set so as to overlap with part of the scanning region and including the irradiation-prohibited region with a charged particle beam other than an ion beam, or acquiring a second image as external data corresponding to the capturing region; and
complementarily superimposing and displaying the first image and the second image.