1. A composition for forming porous film obtainable by hydrolysis and condensation, in an acidic or alkaline condition, of a mixture of
100 parts by weight of one or more compounds selected of the group consisting of hydrolysable silicon compounds represented by Formulas (1) and (2) and partially hydrolyzed and condensed products of the hydrolysable silicon compounds represented by Formulas (1) and (2):
R1aSiZ14-a(1)R2b(Z2)3-bSiySi(R3)cZ33-c(2)
wherein R1, R2 and R3 each independently represents a monovalent hydrocarbon group which may be substituted or non-substituted; Z1, Z2 and Z3 each independently represents a hydrolysable group; Y is independently selected from the group consisting of an oxygen atom, a phenylene group and an alkylene group having carbon atom number of 1 to 6; a independently represents an integer of 0 to 3; b and c each independently represents an integer of 0 to 2;
and 0.1 to 20 parts by weight of one or more cross-linking agents selected from the group consisting of structure-controlled cyclic or multi-branched oligomers represented by Formulas (3) to (8):
R4(H)SiOeR5(Z4)SiOf(3)(R6SiO32)gR7(H)SiOhR8(Z5)SiOi(4)(HSiO32)j(Z6SiO32)k(5)H(Me)2SiO12LZ7(Me)2SiO12m(R9SiO32)nR10(Z8)SiOo(6)H(Me)2SiO12)pZ9(Me)2SiO12q(SiO2) r(Z10SiO32)s(7)(Z113SiO12)t(R112SiO)u(R12SiO32)vR13Z(12)SiOw(SiO2)x(Z13SiO32)y(8)
wherein Me represents a methyl group; R4 to R13 each independently represents a monovalent hydrocarbon group which may be substituted or non-substituted; Z4 to Z13 each independently represents a hydrolysable group; e, f, g, h, i, j and k each independently represents an integer of 0 to 10 with proviso that ef3, ghi4 and jk4; L, m, n, o, p, q, r, s, t, u, v, w, x and y each represents an integer of 0 to 20 with proviso that Lmno4, pqrs4 and tuvwxy3.
2. The composition for forming film according to claim 1 further comprising a solvent.
3. A method for forming porous film comprising a step of coating a substrate with said composition of claim 1 to form film and a step of forming pores in the film.
4. The method for forming porous film according to claim 3 wherein said step of forming pores comprise a first heating treatment at temperature high enough to evaporate the solvent in said film and a second heating treatment.
5. A porous film obtainable from said composition of claim 1.
6. An interlevel insulator film formable by said composition of claim 1.
7. A semiconductor device comprising internal porous film which is formable by a composition for forming porous film obtainable by hydrolysis and condensation, in an acidic or alkaline condition, of a mixture of
100 parts by weight of one or more compounds selected of the group consisting of hydrolysable silicon compounds represented by Formulas (1) and (2) and partially hydrolyzed and condensed products of the hydrolysable silicon compounds represented by Formulas (1) and (2):
R1aSiZ14-a (1)R2b(Z2)3-bS1-Y-S1(R3)cZ33-c(2)
wherein R1, R2 and R3 each independently represents a monovalent hydrocarbon group which may be substituted or non-substituted; Z1, Z2 and Z3 each independently represents a hydrolysable group; Y is independently selected from the group consisting of an oxygen atom, a phenylene group and an alkylene group having carbon atom number of 1 to 6; a independently represents an integer of 0 to 3; b and c each independently represents an integer of 0 to 2;
and 0.1 to 20 parts by weight of one or more cross-linking agents selected from the group consisting of structure-controlled cyclic or multi-branched oligomers represented by Formulas (3) to (8):
R4(H)SiOeR5(Z4)SiOf(3)(R6SiO32)gR7(H)SiOhR8(Z5)SiOi(4)(HSiO32)j(Z6SiO32)k(5)H(Me)2SiO12LZ7(Me)2SiO12m(R9SiO32)nR10(Z8)SiOo(6)(H(Me)2SiO12)pZ9(Me)2SiO12q(SiO2)r(Z10SiO32)s(7)(Z113SiO12)t(R112SiO)u(R12SiO32)vR13(Z12)SiOw(SiO2)(Z13SiO32)y(8)
wherein Me represents a methyl group; R4 to R13 each independently represents a monovalent hydrocarbon group which may be substituted or non-substituted; Z4 to Z13 each independently represents a hydrolysable group; e, f, g, h, i, j and k each independently represents an integer of 0 to 10 with proviso that ef3, ghi4 and jk4; L, m, n, o, p, q, r, s, t, u, v, w, x and y each represents an integer of 0 to 20 with proviso that Lmno4, pqrs>4 and tuvwy3.
8. The semiconductor device according to claim 7 wherein said porous film is between metal interconnections in a same layer of multi-level interconnections, or is between upper and lower metal interconnection layers.
The claims below are in addition to those above.
All refrences to claim(s) which appear below refer to the numbering after this setence.
What I claim and desire to secure by Letters Patent is:
1. A device which is arranged in a stapler for locking a member (8) displaceable along a bar (4) in an optional displacement position, said member carrying a catch (6) for the object to be stapled, and said device having a locking means (21) connected to the displaceable member and displaceable together with the same, said locking means having a through hole (22), through which the bar (4) extends and which is designed such that the locking means (21) is tiltable along the bar between a front position, pinch position, in which the locking means portion defining the hole (22) engages the bar (4) and pinches the locking means thereto, and a rear position, free position, in which this hole-defining portion goes clear of the bar, the locking means (21) being spring-biased towards its pinch position, characterized in that the device further has an operating handle (26) which is mounted on the displaceable member (8) and operable from the outside of the stapler, said operating handle being displaceable to a limited extent in relation to the displaceable member (8) and essentially parallel with the bar (4) in order to move, in connection with forwards displacement, the displaceable member (8) end, thus, the catch (6) forwards along the bar (4) and in order to be engaged, in connection with backwards displacement, with the locking means (21) and tilt the same towards its free position and thereby move the displaceable member (8) and, thus, the catch (6) backwards along the bar (4).
2. A device as claimed in claim 1, in which the locking means (21) is a blade-shaped arm, which is tiltably fixed in the displaceable member (8) at its one end and is arranged to cooperate with the operating handle (26) at its other end.
3. A device as claimed in claim 2, in which the hole (22) extends through the arm perpendicular to the plane sides thereof, and the arm extends essentially perpendicular to the bar (4) in its free position.
4. A device as claimed in claim 2 or 3, in which the arm is a piece of sheet metal.
5. A device as claimed in any one of the preceding claims, in which the operating handle (26) is displaceable relative to the displaceable member (8) between a front end position, in which it engages the displaceable member in order to displace this forwards, and a rear end position, in which it retains the locking means (21) in its free position.
6. A device as claimed in claim 5, in which the operating handle (26) is spring-biased towards its front position.