1. A micromechanical sound transducer comprising:
a substrate arrangement;
a membrane support structure comprising a layer of first membrane support material adjacent to the substrate arrangement and a layer of second membrane support material at an interface of the layer of first membrane support material opposite to the substrate arrangement, wherein the first membrane support material has a first etching rate relative to a particular etching agent and the second membrane support material has a second etching rate relative to the particular etching agent that is lower than the first etching rate;
an aperture in the membrane support structure delimited by a tapered surface of the layer of second membrane support material; and
a membrane that is exposed to the aperture and is fixed to the layer of second membrane support material at a surface of the second membrane support material opposite to the tapered surface.
2. The micromechanical sound transducer according to claim 1, wherein the substrate arrangement comprises a silicon bulk and an oxide layer adjacent to a main surface of the silicon bulk.
3. The micromechanical sound transducer according to claim 1, wherein the membrane support structure comprises a layer of fifth membrane support material at an interface to the layer of second membrane support material opposite to the layer of first membrane support material, wherein the fifth membrane support material has a fifth etching rate relative to the particular etching agent that is lower than the second etching rate, and wherein the layer of fifth membrane support material comprises a second tapered surface delimiting the aperture and having a different angle than the tapered surface on the layer of second membrane support material.
4. The micromechanical sound transducer according to claim 1, wherein the membrane support structure further comprises a third membrane support material adjacent to the second membrane support material and having a further tapered surface, and wherein the membrane is also fixed to the further tapered surface of the third membrane support material.
5. The micromechanical sound transducer according to claim 1, wherein the first membrane support material has a thickness between 400 nm and 800 nm.
6. The micromechanical sound transducer according to claim 1, wherein the second membrane support material has a thickness between 100 nm and 200 nm.
7. A micromechanical sound transducer comprising:
a substrate;
a membrane support structure overlying the substrate;
an aperture in the membrane support structure disposed such that a tapered surface spaces the membrane support structure from the substrate; and
a membrane that is fixed on and extends beyond the membrane support structure, the membrane being spaced from the substrate at least by the membrane support structure.
8. The micromechanical sound transducer according to claim 7, wherein the membrane support structure comprises a layer of first membrane support material adjacent the substrate and a layer of second membrane support material that is spaced from the substrate by the layer of first membrane support material, the first membrane support material being different than the second membrane support material.
9. The micromechanical sound transducer according to claim 8, wherein the first membrane support material has a thickness between 400 nm and 800 nm.
10. The micromechanical sound transducer according to claim 8, wherein the second membrane support material has a thickness between 100 nm and 200 nm.
11. The micromechanical sound transducer according to claim 8, wherein the first membrane support material comprises at least one of a silicon oxide or tetraethyl orthosilicate and wherein the second membrane support material comprises an oxynitride.
12. The micromechanical sound transducer according to claim 11, wherein the layer of first membrane support material has a thickness between 400 nm and 800 nm and wherein the layer of second membrane support material has a thickness between 100 nm and 200 nm.
13. The micromechanical sound transducer according to claim 8, wherein the tapered surface is formed in the layer of second membrane support material such that the layer of second membrane support material has a decreasing thickness over a lateral extent over the substrate.
14. The micromechanical sound transducer according to claim 13, wherein the membrane support structure comprises a layer of third membrane support material at an interface to the layer of second membrane support material opposite to the layer of first membrane support material, wherein the third membrane support material comprises a second tapered surface delimiting the aperture and having a different angle than the tapered surface on the layer of second membrane support material.
15. The micromechanical sound transducer according to claim 14, wherein the membrane is fixed on the third membrane support material.
16. The micromechanical sound transducer according to claim 15, wherein the third membrane support material comprises an oxynitride and has a thickness between 100 nm and 300 nm.
17. The micromechanical sound transducer according to claim 13, wherein the first membrane support material has a first etching rate relative to a particular etching agent and the second membrane support material has a second etching rate relative to the particular etching agent, the second etching rate lower than the first etching rate.
18. The micromechanical sound transducer according to claim 17, wherein the membrane support structure comprises a layer of third membrane support material at an interface to the layer of second membrane support material opposite to the layer of first membrane support material, wherein the third membrane support material has a fifth etching rate relative to the particular etching agent that is lower than the second etching rate, and wherein the layer of third membrane support material comprises a second tapered surface delimiting the aperture and having a different angle than the tapered surface on the layer of second membrane support material.
19. The micromechanical sound transducer according to claim 8, wherein the aperture in the membrane support structure is delimited by a tapered surface of the layer of second membrane support material.
20. The micromechanical sound transducer according to claim 19, wherein the membrane is exposed to the aperture and is fixed to the layer of second membrane support material at a surface of the second membrane support material opposite to the tapered surface.
21. The micromechanical sound transducer according to claim 8, wherein the membrane is exposed to the aperture and is fixed to the layer of second membrane support material.
22. The micromechanical sound transducer according to claim 7, wherein the substrate comprises a silicon bulk.
23. The micromechanical sound transducer according to claim 22, wherein the substrate further comprises an oxide layer adjacent to a main surface of the silicon bulk.
24. The micromechanical sound transducer according to claim 7, wherein the membrane support structure comprises a second tapered surface opposite the tapered surface.
25. The micromechanical sound transducer according to claim 24, wherein the second tapered surface has a different angle than the tapered surface.
26. The micromechanical sound transducer according to claim 24, wherein the membrane is fixed to the second tapered surface.
The claims below are in addition to those above.
All refrences to claim(s) which appear below refer to the numbering after this setence.
1. Method of detecting implants in a jaw or a implant impression in a jaw impression, comprising the steps of:
inserting a gauging member into the implant or into the implant impression
scanning the jaw or the impression thereof together with the gauging member
detecting the position and orientation of the implant in the jaw or the jaw impression with the scan data obtained
wherein
a set of data representing the individual shape of the gauging member is used for determining the position and orientation.
2. Method as claimed in claim 1, wherein a gauging member is scanned independent of a jaw or a jaw impression at least in a portion that can be inserted into an implant or an implant impression, and at least in a portion which is scanned after insertion to determine the individual shape of the gauging member.
3. Method as claimed in claim 2, wherein the scanning is implemented in that the shape of the gauging member is determined at an accuracy of up to 5 \u03bcm.
4. Method as claimed in claim 1, wherein the determination of the position and orientation of the implant or the implant impression is carried out by a computer which is informed by a user which among a plurality of sets of data represents the individual shape of the gauging member.
5. Method as claimed in claim 1, wherein the determination of the position and orientation of the implant or the implant impression is carried out by a computer, wherein the computer is adapted such that by a comparison of the data obtained by scanning the jaw or the impression thereof together with the gauging member with the sets of data stored on the computer the set of data is determined that represents the individual shape of the gauging member.
6. Method as claimed in claim 1, wherein the steps of claim 1 are carried out successively for at least two implants or implant impressions.
7. Method as claimed in claim 1, wherein a plurality of gauging members are inserted simultaneously and are scanned.
8. Method for determining the shape of a gauging member by scanning at least one portion which can be inserted into an implant or an implant impression, and at least a second portion which can be scanned after insertion to determine the individual shape of the gauging member.
9. Gauging member for insertion into an implant andor an impression thereof in combination with a set of data, which represents the individual shape of the gauging member.
10. Gauging member as claimed in claim 9, wherein the gauging member is rotationally symmetrical at least in the portion that can be inserted into an implant or an impression thereof.
11. Gauging member as claimed in claim 9, wherein the gauging member is not rotationally symmetrical in the portion that can be inserted into an implant or an impression thereof.
12. Gauging member as claimed in claim 9, wherein the gauging member comprises at least two planar surfaces.
13. Gauging member as claimed in claim 9, wherein the gauging member comprises at least one spherical shape or at least parts thereof, including a hemi-spherical shape.
14. Gauging member as claimed in claim 9, wherein the gauging member comprises an identification, wherein the identification is preferably given by the shape of the gauging member.
15. Set of different gauging members as claimed in claim 9.
16. Method, comprising the following steps:
determining the position and orientation of a portion of a gauging member in a set of scanning data, and
determining the position and orientation of an implant in the set of scanning data by using a set of data representing the individual shape of the gauging member.
17. Computer-readable data carrier with instructions for a computer for carrying out a method as claimed in claim 16.