What is claimed is:
1. A method of producing a semiconductor device, comprising:
sequentially forming an interlayer insulating film and a barrier film on a semiconductor substrate;
making a contact hole in the barrier film and the interlayer insulating film and forming a plug within the contact hole;
forming an insulation film on the plug and the barrier film and then forming a hole leading to the plug in the insulation film such that an upper surface of the plug is exposed;
forming a first conductive film on the insulation film such that the hole is filled with the first conductive film, and then etching the first conductive film by a chemical mechanical polishing method to thereby form a lower electrode within the hole;
etching the insulation film until the barrier film is exposed, so as to leave the lower electrode in a protuberant manner;
forming a dielectric film that covers the protuberant lower electrode and the barrier film, and then forming a second conductive film that covers the dielectric film, said dielectric film being made of a ferroelectric or high-dielectric-constant substance; and
patterning the dielectric film and the second conductive film simultaneously to thereby form a capacitor dielectric film and an upper electrode.
2. The method according to claim 1, wherein said barrier film is made of TiO2 or Al2O3 or SiN.
3. The method according to claim 1, further comprising, after forming the insulation film, forming a Ti film or a TiO2 film on the insulation film.
4. A method of producing a semiconductor device, comprising:
sequentially forming an interlayer insulating film and a barrier film on a semiconductor substrate;
making a contact hole in the barrier film and the interlayer insulating film and forming a plug within the contact hole;
forming a first insulation film on the plug and the barrier film and then forming a hole leading to the plug in the first insulation film such that an upper surface of the plug is exposed;
forming a first conductive film over the first insulation film and within the hole such that the first conductive film within the hole does not fill the hole but covers surfaces defining the hole, and then forming a second insulation film on the first conductive film so as to fill the hole;
etching the second insulation film until an upper surface of the first conductive film is reached, and then etching the first conductive film and the second insulation film in the hole by a chemical mechanical polishing method until the first insulation film is exposed, to thereby form a cup-shaped lower electrode within the hole;
etching the first insulation film and the second insulation film within the hole until the barrier film and the lower electrode are exposed;
forming a dielectric film over the cup-shaped lower electrode such that the dielectric film covers inner and outer peripheries and an inner bottom surface of the cup-shaped lower electrode, and then forming a second conductive film that covers the dielectric film, said dielectric film being made of a ferroelectric or high-dielectric-constant substance; and
patterning the dielectric film and the second conductive film simultaneously to thereby form a capacitor dielectric film and an upper electrode.
5. The method according to claim 4, wherein said barrier film is made of TiO2 or Al2O3 or SiN.
6. The method according to claim 4, further comprising, after forming the first insulation film, forming a Ti film or a TiO2film on the first insulation film.
7. The method according to claim 4, wherein the second conductive film is formed such that a gap defined between opposite surfaces of the dielectric film within the hole is filled with a part of the second conductive film.
8. A semiconductor device, comprising:
an interlayer insulating film formed on a semiconductor substrate;
a barrier film formed on the interlayer insulating film;
a contact hole made in the barrier film and the interlayer insulating film;
a plug formed within the contact hole and having a barrier metal buried in an upper portion thereof;
a cup-shaped lower electrode opening upward, said cup-shaped lower electrode being positioned on the barrier film and the contact hole;
a dielectric film made of a ferroelectric or high-dielectric-constant substance, said dielectric film covering inner and outer peripheries and an inner bottom surface of the cup-shaped lower electrode; and
an upper electrode covering the dielectric film,
the lower electrode, the dielectric film and the upper electrode constituting a capacitor.
9. The method according to claim 4, wherein a part of the upper electrode fills a gap defined between opposite surfaces of the dielectric film within the hole.
The claims below are in addition to those above.
All refrences to claim(s) which appear below refer to the numbering after this setence.
We claim as our invention:
1. A golf club head comprising:a face member composed of a vitreous metal material, the face member comprising a face plate for striking a golf ball having an exterior surface and an interior surface, the face plate extending from a heel section of the golf club head to a toe section of the golf club head, a face extension extending laterally rearward from a perimeter of the face plate;a crown secured to the upper portion of the face extension at a distance ranging from 0.2 inch to 1.0 inch from the perimeter of the face plate; and a sole plate secured to the lower portion of the face extension at a distance ranging from 0.2 inch to 1.0 inch from the perimeter of the face plate.
2. The golf club head according to claim 1 wherein the vitreous metal is selected from the group consisting of iron-boron, nickel-copper, nickel-zirconium and nickel-phosphorous.
3. A golf club head comprising:a face member composed of a vitreous metal material, the face member comprising a face plate for striking a golf ball having an exterior surface and an interior surface, the face plate extending from a heel section of the golf club head to a toe section of the golf club head, a face extension extending laterally rearward from a perimeter of the face plate; a crown secured to the upper portion of the face extension at a distance ranging from 0.2 inch to 1.0 inch from the perimeter of the face plate; and a sole plate secured to the lower portion of the face extension at a distance ranging from 0.2 inch to 1.0 inch from the perimeter of the face plate; wherein the face plate comprises a central circular region having a base thickness ranging from 0.090 inch to 0.110 inch, a first concentric region having a first thickness ranging from 0.082 inch to 0.097 inch wherein the base thickness is greater than the first thickness, a second concentric region having a second thickness ranging from 0.070 inch to 0.94 inch wherein the first thickness is greater than the second thickness, a third concentric region having a third thickness ranging from 0.0.70 to 0.090 inch wherein the second thickness is greater than the third thickness, and a periphery region having a fourth thickness ranging from 0.061 inch to 0.069 inch wherein the fourth thickness is less than the third thickness.
4. A golf club head comprising:a face member composed of a vitreous metal material, the face member comprising a face plate for striking a golf ball having an exterior surface and an interior surface, the face plate extending from a heel section of the golf club head to a toe section of the golf club head, a face extension extending laterally rearward from a perimeter of the face plate, and an interior tubing for receiving a shaft, the interior tubing engaging an upper portion of the face extension and a lower portion of the face extension;a crown secured to the upper portion of the face extension at a distance ranging from 0.2 inch to 1.0 inch from the perimeter of the face plate; and a sole plate secured to the lower portion of the face extension at a distance ranging from 0.2 inch to 1.0 inch from the perimeter of the face plate; wherein the face plate has concentric regions of varying thickness with the thickest region in the center, and wherein the golf club head has a volume no greater than 400 cubic centimeters and a coefficient of restitution of ranging from 0.80 to 0.93 under standard USGA conditions.
5. A golf club head comprising:a face member composed of a vitreous metal material, the face member comprising a face plate for striking a golf ball having an exterior surface and an interior surface, the face plate extending from a heel section of the golf club head to a toe section of the golf club head, a face extension extending laterally inward from a perimeter of the face plate, and an interior tubing for receiving a shaft, the interior tubing engaging an upper portion of the face extension and a lower portion of the face extension;a crown secured to the upper portion of the face extension at a distance ranging from 0.2 inch to 1.0 inch from the perimeter of the face plate; and a sole plate secured to the lower portion of the face extension at a distance ranging from 0.2 inch to 1.0 inch from the perimeter of the face plate;wherein the lower portion of the face extension has a bore section extending about the interior tubing, the bore section having a width greater than the entirety of the lower portion of the face extension; and wherein the golf club head has a volume no greater than 400 cubic centimeters and a coefficient of restitution of ranging from 0.80 to 0.93 under standard USGA conditions.