1. An insulation structure comprising:
a quantity of insulation material;
an insulation-containing substructure comprising:
a first layer;
a second layer comprising a batting of insulation;
a plurality of successive compartments bounded by the first and second layers;
the quantity of insulation material being contained within the plurality of compartments.
an outer layer extending over the insulation-containing substructure, the second layer being positioned between the outer layer and the first layer.
2. An insulation structure according to claim 1, wherein:
the insulation structure is a product constructed and arranged to be laid against or worn by a person;
the first layer of the insulation-containing substructure comprises an inner layer for engagement with the person.
3. An insulation structure according to claim 1, wherein:
the outer layer is attached between spaced-apart regions of the insulation structure, a plurality of the compartments of the substructure extending between said regions of the outer layer with the outer layer not being attached to the insulation-containing substructure between said regions.
4. An insulation structure according to claim 3, wherein:
the spaced-apart regions of the insulation structure comprises opposite edges of the insulation structure.
5. An insulation structure according to claim 1, wherein:
the batting of insulation comprises a non-woven material.
6. An insulation structure according to claim 5, wherein:
the batting of insulation has a thickness of at least 3 mm.
7. An insulation structure according to claim 1, wherein:
the batting of insulation comprises fiberfill or fleece.
8. An insulation structure according to claim 7, wherein:
the quantity of insulation material comprises down.
9. An insulation structure according to claim 1, wherein:
the quantity of insulation material comprises down.
10. An insulation structure according to claim 1, wherein:
the batting of insulation comprises a fiberfill material.
11. An insulation structure according to claim 10, wherein:
the fiberfill material has a clo value of at least 0.40, based upon test method ASTM D1518.
12. An insulation structure according to claim 10, wherein:
the fiberfill material has a weight in a range of approximately 40 gm2 to approximately 80 gm2
13. An insulation structure according to claim 1, further comprising:
successive spaced-apart lines of stitching connecting the first and second layers;
the successive lines of stitching defining respective boundaries of the successive compartments.
14. An insulation structure according to claim 1, further comprising:
successive spaced-apart baffles extending between the first and second layers;
the successive baffles defining respective boundaries of the successive compartments.
15. An insulation structure according to claim 1, wherein:
the outer layer is a waterproof material.
16. An insulation structure according to claim 1, wherein:
the outer layer is a waterproof and breathable material.
17. An insulation structure according to claim 1, wherein:
the inner layer made of a tightly woven or knit material.
18. An insulation structure according to claim 17, wherein:
the tightly woven or knit material is a material selected from nylon, polyester, cotton, and polypropylene.
19. An insulation structure according to claim 1, further comprising:
an additional layer positioned between the batting of insulation and the quantity of insulation material.
20. An insulation structure according to claim 19, wherein:
the additional layer comprises a mesh layer.
21. A garment comprising the insulation structure according to claim 1.
22. A blanket or sleeping bag comprising the insulation structure according to claim 1.
The claims below are in addition to those above.
All refrences to claim(s) which appear below refer to the numbering after this setence.
What is claimed is:
1. A glass substrate which is for use in an information recording medium and which has surface roughnesses Ra, Rmax and Rq, where Ra is representative of a center-line mean roughness, Rmax is defined as a maximum height representative of a difference between a highest point and a lowest point and Rq is representative of a root mean square roughness wherein:
the surface roughness is specified by Rmax15 nm, Ra1 nm and Rq1.5 nm.
2. A glass substrate as claimed in claim 1, wherein:
the surface roughness is specified by Rmax10 nm, Ra0.5 nm and Rq0.7 nm.
3. A glass substrate as claimed in claim 1, wherein:
the surface roughness is specified by Rmax5 nm, Ra0.3 nm and Rq0.4 nm.
4. A glass substrate as claimed in claim 1, wherein:
the ratio between the surface roughness Rmax and the surface roughness Ra is specified by RmaxRa30.
5. A magnetic recording medium having a glass substrate as claimed in any one of claims 1 to 4, wherein:
a thin film including at least a magnetic layer is formed on said glass substrate.
6. A magnetic recording medium as claimed in claim 5, wherein:
said thin film is composed of substantially uniform crystal grains by controlling the surface roughness of said glass substrate, and
an average crystal grain size of the crystal grains falls within the range between 5 and 30 nm.
7. A magnetic recording medium which has a thin film including at least a magnetic layer on a glass substrate having surface roughnesses Ra and Rmax, where Ra is representative of a center-line mean roughness and Rmax is defined as a maximum height representative of a difference between a highest point and a lowest point wherein:
the surface roughness is specified by Rmax15 nm, Ra1 nm and RmaxRa30;
said thin film is composed of substantially uniform crystal grains by controlling the surface roughness; and
an average crystal grain size of the crystal grains falls within the range between 5 and 30 nm.
8. A magnetic recording medium as claimed in claim 7, wherein:
the surface roughness is specified by Rmax10 nm and Ra0.5 nm, and the ratio between the surface roughness Rmax and the surface roughness Ra is specified by RmaxRa30.
9. A magnetic recording medium as claimed in claim 7, wherein:
the surface roughness is specified by Rmax5 nm and Ra0.3 nm, and
the ratio between the surface roughness Rmax and the surface roughness Ra is specified by RmaxRa30.
10. A magnetic recording medium as claimed in any one of claims 5 to 9, wherein:
where the crystal grains of said thin film are measured with respect to distribution of crystal grain sizes in a square of 1 m, a half band width of a point in which the crystal grain sizes are mostly distributed is 20 nm or less.
11. A magnetic recording medium as claimed in any one of claims 5 to 10, wherein:
an underlying layer is formed between said glass substrate and said magnetic layer.
12. A magnetic recording medium as claimed in any one of claims 5 to 11, wherein:
an irregularity forming layer consisting of a low melting point metal is formed between said glass substrate and said magnetic layer.
13. A magnetic recording medium as claimed in claim 12, wherein:
RqRa of said irregularity forming layer is 1.5 or less.
14. A magnetic recording medium as claimed in claim 12 or 13, wherein:
the surface roughness Rmax of said irregularity forming layer falls within the range between 10 and 15 nm.
15. A method of manufacturing a glass substrate having a principle surface for an information recording medium, comprising the steps of:
lapping said glass substrate; and
polishing the principle surface by using a polishing liquid including a polishing grain, the polishing grain having a predetermined grain size;
the grain size being selected so that said glass substrate has surface roughness which is specified by Rmax15 nm, Ra1 nm and Rq1.5 nm, where Ra is representative of a center-line mean roughness, Rmax is defined as a maximum height representative of a difference between a highest point and a lowest point and Rq is representative of a root mean square roughness.
16. A method of manufacturing a glass substrate for an information recording medium, comprising the steps of:
lapping said glass substrate;
polishing, as a first polishing step, said glass substrate by using a first polishing liquid including a first polishing grain, the first polishing grain having a first grain size between 1 and 3 m;
polishing, as a second polishing step, said glass substrate by using a second polishing liquid including a second polishing grain, the second polishing grain having a second grain size between 0.5 and 2 m;
polishing, as a third polishing step, said substrate by using a third polishing liquid including a third polishing grain, the third polishing grain having a third grain size of 0.5 m or less.
17. A method as claimed in claim 16, wherein:
the third polishing grain comprises a colloidal silica grain having a grain size of 0.2 m or less.
18. A method as claimed in any one of claims 15 to 17, further comprising the step of:
forming a thin film including at least a magnetic layer on said glass substrate;
said thin film being composed of substantially uniform crystal grains, an average crystal grain size of the crystal grains falling within the range between 5 and 30 nm.
19. A method of manufacturing a magnetic recording medium having a glass substrate, comprising the steps of:
processing a principle surface of said glass substrate so that surface roughness is specified by Rmax>15 nm, Ra1 nm and Rq1.5 nm, where Ra is representative of a center-line mean roughness, Rmax is defined as a maximum height representative of a difference between a highest point and a lowest point and Rq is representative of a root mean square roughness; and
depositing a thin film including at least a magnetic layer on the principle surface of said glass substrate so that said thin film is composed of substantially uniform crystal grains and an average crystal grain size of the crystal grains falls within the range between 5 and 30 nm.
20. A method of manufacturing a magnetic recording medium having a glass substrate, comprising the steps of:
processing a principle surface of said glass substrate so that surface roughness is specified by Rmax15 nm, Ra1 nm and RmaxRa30, where Ra is representative of a center-line mean roughness and Rmax is defined as a maximum height representative of a difference between a highest point and a lowest point; and
depositing a thin film including at least a magnetic layer on the principle surface of said glass substrate so that said thin film is composed of substantially uniform crystal grains and an average crystal grain size of the crystal grains falls within the range between 5 and 30 nm.
21. A glass substrate which is for use in an information recording medium and which has surface roughnesses Ra and Rmax where Ra is representative of a center-line mean roughness, Rmax is defined as a maximum height representative of a difference between a highest point and a lowest point, wherein:
the surface roughness is specified by Rmax15 nm, Ra1.3 nm and RmaxRa10.
22. A glass substrate as claimed in claim 21, wherein:
the surface roughness is specified by Rmax10 nm, Ra0.8 nm and Rmax Ra10.5.
23. A magnetic recording medium having a glass substrate as claimed in claim 21 or 22, wherein:
a thin film including at least a magnetic layer is formed on said glass substrate.
24. A method of manufacturing a magnetic recording medium having a glass substrate as claimed in claim 21 or 22, comprising the steps of:
preparing said glass substrate; and
forming a thin film including at least a magnetic layer on said glass substrate.
25. A method as claimed in claim 24, wherein:
said thin film is formed by the use of the in-line type successive sputtering method.