1-19. (canceled)
20. A method for regulating an energy input of a pulsed arc plasma during a joining process, in particular during a welding or soldering process, the method comprising the steps of:
detecting first measurement signals for a first temporal response of emission light from an arc plasma of the joining process in a first spectral range with a first photodiode, which has a sensitivity maximum at a first wavelength;
detecting second measurement signals for a second temporal response of emission light from an arc plasma of the joining process in a second spectral range, which is at least partially different from the first spectral range, with a second photodiode having a sensitivity maximum at a second wavelength, which is different from the first wavelength;
generating control signals, by comparing the first measurement signals and the second measurement signals; and
regulating an energy source, which is configured to provide energy in pulsed form for the arc plasma, in accordance with the control signals.
21. The method according to claim 20, wherein the regulating step comprises regulating the temperature of the arc plasma.
22. The method according to claim 20, wherein a rising signal trace is measured for the first measurement signals and a falling signal trace for the second measurement signals.
23. The method according to claim 20, wherein at least the first measurement signals or at least the second measurement signals are converted to a respective comparison measurement signal level before the generation of control signals.
24. The method according to claim 20, wherein during the comparison of the first and the second measurement signals, a difference between the first and second measurement signals is determined.
25. The method according to claim 20, wherein the control signals are generated so as to comprise a signal for switching off the energy source.
26. The method according to claim 25, wherein a sample-and-hold circuit generates a pulse lengthening signal for the switch-off signal when the energy source specifies the start of a pulse.
27. The method according to claim 20, wherein the control signals are generated so as to comprise a signal for switching on the energy source.
28. The method according to claim 20, wherein the control signals are generated so as to comprise counter-regulation signals for the energy source, with which a current level of the energy source is counter-regulated without switching off the source.
29. The method according to claim 20, wherein the control signals are filtered by a low-pass filter.
30. The method according to claim 20, wherein in at least one other spectral range, which is at least partially different from both the first and the second spectral ranges, further measurement signals for a further temporal response of the emission light from the arc plasma of the joining process are detected and applied in generating the control signals.
31. The method according to claim 20, wherein at least the first measurement signals for a first spectral range comprising multiple spectral lines of the emission light, or at least the second measurement signals for a second spectral range comprising multiple spectral lines of the emission light, are detected.
32. An apparatus for regulating an energy input of a pulsed arc plasma during a joining process, in particular in a welding or soldering process, comprising:
a measurement device that is configured to detect first measurement signals for a first temporal response of emission light from an arc plasma of the joining process in a first spectral range with a first photodiode having a sensitivity maximum at a first wavelength, and to detect second measurement signals for a second temporal response of emission light from an arc plasma of the joining process in a second spectral range, which is at least partially different from the first spectral range, with a second photodiode having a sensitivity maximum at a second wavelength, which is different from the first wavelength; and
an analysis device, which is configured to generate control signals by comparing the first measurement signals and the second measurement signals, and to provide the control signals for regulating an energy source for pulsed energy for the arc plasma.
33. The apparatus according to claim 32, wherein the first and the second photodiodes are arranged on a burner head.
34. The apparatus according to claim 32, wherein the first and the second photodiodes are assembled together with a pre-amplifier device and a measurement signal conditioning device in a constructional unit to form a spectral regulator.
35. The apparatus according to claim 32, wherein the first and the second photodiode are arranged on a pre-amplifier board in an exchangeable manner by means of a plug and socket connection.
36. The apparatus according to claim 32, wherein the first and the second photodiodes are coupled to an analogue-digital-converter.
37. The apparatus according to claim 32, wherein the measurement device is configured to detect further measurement signals for a further temporal response of emission light from an arc plasma of the joining process in a further spectral range, which is at least partially different from the first and the second spectral range.
38. The apparatus according to claim 37, further including a further photodiode to detect the further measurement signals, the further photodiode having a sensitivity maximum at a further wavelength, which is different from the first and the second wavelength.
The claims below are in addition to those above.
All refrences to claim(s) which appear below refer to the numbering after this setence.
1. A projection TOF mass spectrum distribution information acquisition method comprising:
a first step of irradiating a first ionizing beam onto a surface of a specimen and acquiring first mass spectrum distribution information on secondary ions generated from the specimen as a result of irradiation of the first ionizing beam;
a second step of irradiating a second ionizing beam onto the surface of the specimen and acquiring second mass spectrum distribution information on secondary ions generated from the specimen as a result of irradiation of the second ionizing beam; and
a third step of correcting the second mass spectrum distribution information, using the first mass spectrum distribution information;
the third step including correcting time-of-flight distribution information in the second mass spectrum distribution information on the basis of detection time distribution of an arbitrary peak in the first mass spectrum distribution information.
2. The method according to claim 1, wherein
the third step includes acquiring height difference information of the surface of the specimen from the detection time distribution of the arbitrary peak in the first mass spectrum distribution information.
3. The method according to claim 1, wherein
the third step includes correcting secondary ion detection time information in the second mass spectrum distribution information on the basis of time-of-flight difference information reduced from height difference information of the surface of the specimen.
4. The method according to claim 1, wherein
the velocity of the first ionizing beam is not less than 1\xd7106 ms.
5. The method according to claim 1, wherein
the velocity of the first ionizing beam is greater than the velocity of the second ionizing beam.
6. The method according to claim 5, wherein
the first ionizing beam is a beam formed by using an ion species that is different from the ion species of the second ionizing beam.
7. The method according to claim 5, wherein
the first ionizing beam is a beam formed by using an ion species that is the same as the ion species of the second ionizing beam.
8. The method according to claim 1, wherein
the first ionizing beam is a pulsed laser beam or a pulsed electron beam.
9. The method according to claim 1, wherein
the second ionizing beam is a pulsed ion beam.
10. The method according to claim 9, wherein
the second ionizing beam is a beam of cluster ions.
11. The method according to claim 10, wherein
the cluster ions are selected from metal cluster ions, gas cluster ions, carbon based cluster ions, and water based cluster ions.
12. The method according to claim 1, wherein
the first mass spectrum distribution information is obtained for a substance arranged on the specimen.
13. The method according to claim 12, wherein
the first mass spectrum distribution information is obtained for a substance adsorbed to the surface of the specimen or a substance contained in the specimen.
14. A projection TOF mass microscope comprising:
a specimen stage for receiving a specimen to be mounted thereon;
a first ionizing beam irradiation unit for irradiating a first ionizing beam onto the specimen mounted on the specimen stage;
a second ionizing beam irradiation unit for irradiating a second ionizing beam onto the specimen mounted on the specimen stage;
a secondary ion detection unit for separating secondary ions generated from the specimen as a result of irradiations of the ionizing beams by mass-to-charge ratio and two-dimensionally detecting the secondary ions;
a mass spectrum distribution information acquisition unit for acquiring mass spectrum distribution information from a secondary ion detection signal output from the secondary ion detection unit;
a specimen unevenness information acquisition unit for acquiring specimen unevenness information from the mass spectrum distribution information output from the mass spectrum distribution information acquisition unit;
a mass spectrum distribution information correction unit for correcting the mass spectrum distribution information on the basis of the specimen unevenness information output from the specimen unevenness information acquisition unit; and
an output unit for outputting acquired information,
the microscope being configured to
acquiring first mass spectrum distribution information by irradiation of the first ionizing beam;
acquiring second mass spectrum distribution information by irradiation of the second ionizing beam;
acquiring specimen unevenness information from the first mass spectrum distribution information;
correcting time-of-flight distribution information of secondary ions in the second mass spectrum distribution information on the basis of the specimen unevenness information; and
outputting information including at least one of the second mass spectrum distribution information corrected, the first mass spectrum distribution information used for the correction, and the specimen unevenness information acquired.
15. The apparatus according to claim 14, wherein
the first ionizing beam is a pulsed ion beam.
16. The apparatus according to claim 14, wherein
the first ionizing beam is a pulsed laser beam or a pulsed electron beam.
17. The apparatus according to claim 14, wherein
the second ionizing means is a pulsed ion beam.
18. The apparatus according to claim 17, wherein
the second ionizing beam is a beam of cluster ions.
19. The apparatus according to claim 18, wherein
the cluster ions are selected from metal cluster ions, gas cluster ions, carbon based cluster ions, and water based cluster ions.
20. The apparatus according to claim 14, wherein
a single ionizing beam irradiation unit is employed both as the first ionizing beam irradiation unit and as the second ionizing beam irradiation unit.
21. The apparatus according to claim 14, wherein
the secondary ion detection unit comprises an extraction electrode for accelerating secondary ions, a flight tube in which accelerated secondary ions fly at a constant velocity and a two-dimensional ion detection section to which secondary ions are projected after flying through the flight tube.