1. A drive unit for moving a movable furniture part, comprising:
a motor for moving the movable furniture part;
a position measurement device for determining a position of the movable furniture part; and
a regulation unit for controlling an operation of said motor, said regulation unit having a plurality of different threshold values each corresponding to a respective position of the movable furniture part, said regulation unit being operable to actuate said motor to move the movable furniture part when a respective one of said threshold values corresponding to the determined position of the movable furniture part is surpassed.
2. The drive unit according to claim 1, further comprising a motion quantity measurement device for determining an amount of at least one motion quantity of the movable furniture part, said threshold values relating to the amount of the at least one motion quantity.
3. The drive unit according to claim 2, wherein the at least one motion quantity is the speed or the acceleration of the movable furniture part.
4. The drive unit according to claim 1, further comprising a force measurement device for determining a force exerted by a user on the movable furniture part, said threshold values relating to the amount of force determined by said force measurement device.
5. The drive unit according to claim 1, wherein said regulation unit has a first one of said threshold values corresponding to a closed end position of the movable furniture part, and has a second one of said threshold values corresponding to a fully-open end position of the movable furniture part, said first one of said threshold values being different than said second one of said threshold values.
6. The drive unit according to claim 5, wherein said first one of said first one of said threshold values is less than said second one of said threshold values.
7. The drive unit according to claim 6, wherein said regulation unit has a third one of said threshold values corresponding to an intermediate position of the movable furniture, part between the closed end position and the fully-open end position, said third one of said threshold values being greater than said first one of said threshold values and said second one of said threshold values.
8. The drive unit according to claim 5, wherein said regulation unit has a third one of said threshold values corresponding to an intermediate position of the movable furniture part between the closed end position and the fully-open end position, said third one of said threshold values being greater than said first one of said threshold values and said second one of said threshold values.
9. The drive unit according to claim 1, wherein said motor comprises an electromotor.
10. A piece of furniture comprising:
a furniture body;
a movable furniture part movable with respect to said furniture body; and
a drive unit for moving said movable furniture part relative to said furniture body, said drive unit including:
a motor for moving said movable furniture part;
a position measurement device for determining a position of said movable furniture part; and
a regulation unit for controlling an operation of said motor, said regulation unit having a plurality of different threshold values each corresponding to a respective position of said movable furniture part, said regulation unit being operable to actuate said motor to move said movable furniture part when a respective one of said threshold values corresponding to the determined position of said movable furniture part is surpassed.
11. The piece of furniture according to claim 10, further comprising a motion quantity measurement device for determining an amount of at least one motion quantity of said movable furniture part, said threshold values relating to the amount of the at least one motion quantity.
12. The piece of furniture according to claim 11, wherein the at least one motion quantity is the speed or the acceleration of said movable furniture part.
13. The piece of furniture according to claim 10, further comprising a force measurement device for determining a force exerted by a user on said movable furniture part, said threshold values relating to the amount of force determined by said force measurement device.
14. The piece of furniture according to claim 10, wherein said regulation unit has a first one of said threshold values corresponding to a closed end position of said movable furniture part, and has a second one of said threshold values corresponding to a fully-open end position of said movable furniture part, said first one of said threshold values being different than said second one of said threshold values.
15. The piece of furniture according to claim 14, wherein said first one of said first one of said threshold values is less than said second one of said threshold values.
16. The piece of furniture according to claim 15, wherein said regulation unit has a third one of said threshold values corresponding to an intermediate position of said movable furniture part between the closed end position and the fully-open end position, said third one of said threshold values being greater than said first one of said threshold values and said second one of said threshold values.
17. The piece of furniture according to claim 14, wherein said regulation unit has a third one of said threshold values corresponding to an intermediate position of said movable furniture part between the closed end position and the fully-open end position, said third one of said threshold values being greater than said first one of said threshold values and said second one of said threshold values.
18. The piece of furniture according to claim 10, wherein said motor comprises an electromotor.
19. The piece of furniture according to claim 10, further comprising a cable pull connecting said drive unit to said movable furniture part.
20. The piece of furniture according to claim 10, wherein said drive unit further includes:
an output device for transmitting a drive of said motor to said movable furniture part; and
an engaging and disengaging clutch for allowing said motor to engage and disengage from said output device based on a regulation signal from said regulation unit.
The claims below are in addition to those above.
All refrences to claim(s) which appear below refer to the numbering after this setence.
1. A support table for a lithographic apparatus, the support table comprising:
a support section, configured to support a lower surface of a substrate on an upper face thereof;
a conditioning system, configured to supply heat energy to andor remove heat energy from the support section; and
a control system structured or programmed to control the conditioning system to supply the heat energy to andor remove the heat energy from the support section;
wherein, when a substrate is supported by the support section, it is thermally coupled to the support section such that, when the conditioning system supplies heat energy to or removes heat energy from the support section, energy in turn transfers from the support section to the substrate or to the support section from the substrate, respectively,
wherein the support section, the conditioning system, or both, has a first portion thereof in a first region of the substrate that is adjacent the edge of the substrate and is on opposite sides of the center of the substrate and a second portion thereof in a second region of the substrate that is at the center of the substrate,
wherein (i) the first portion is structurally different than the second portion such that, for a common heat transfer energy input to the first and second portions, the heat transfer to or from the substrate per unit area of the substrate as a result of the operation of the conditioning system is greater in the first region for a given heat load andor temperature change than it is in the second region for the given heat load andor temperature change, or (ii) the control system is further structured or programmed to control the conditioning system such that the heat transfer to or from the substrate per unit area of the substrate as a result of the operation of the conditioning system is greater in the first region for a given heat load andor temperature change than it is in the second region for the given heat load andor temperature change, or (iii) both (i) and (ii), and
wherein the control system is configured to control the conditioning system to provide the heat transfer to or from the substrate per unit area of the substrate that is greater in the first region than it is in the second region at least during a radiation beam exposure process applied to the substrate.
2. The support table according to claim 1, wherein the conditioning system comprises a heater system, configured such that it can provide to the support section more heat energy per unit area of the upper face of the support section in a first region of the support section, thermally coupled to the first region of the substrate, than in a second region of the support section, thermally coupled to the second region of the substrate.
3. The support table according to claim 2, wherein the heater system comprises a plurality of independently controllable heater units; and
at least one heater unit is provided in the first region of the support section and at least one other heater unit is provided in the second, region of the support section.
4. The support table according to claim 2, wherein the heater system comprises an elongate electric heating element having a first portion thereof in the first region of the support section and a second portion thereof in the second region of the support section, and the first and second portions of the elongate electric heating element are arranged such that there is a greater length of heating element per unit area of the upper face of the support section in the first region of the support section than in the second region of the support section.
5. The support table according to claim 1, wherein the conditioning system comprises a channel within the support section, configured to convey a conditioning fluid; and the channel is configured to pass through a first region of the support section, thermally coupled to the first region of the substrate, and a second region of the support section, thermally coupled to the second region of the substrate.
6. The support table according to claim 5, wherein the cross-sectional area of the channel is smaller in the first region of the support section than in the second region of the support section.
7. The support table according to claim 5, wherein the surface roughness of the channel is greater in the first region of the support section than in the second region of the support section.
8. The support table according to claim 5, wherein the channel has a greater number of corners andor has sharper corners in the first region of the support section than in the second region of the support section.
9. The support table according to claim 5, wherein the perimeter of the cross-section of the channel is greater in the first region of the support section than in the second region of the support section.
10. The support table according to claim 5, wherein the separation between a first section of the channel and an adjacent second section of the channel is less in the first region of the support section than in the second region of the support section.
11. The support table according to claim 5, wherein the total volume of the channel corresponding to a given area of the upper face of the support section is greater in the first region of the support section than in the second region of the support section.
12. The support table according to claim 5, further comprising a channel heater configured to supply heat to the conditioning fluid in the channel.
13. The support table according to claim 5, wherein the conditioning system is configured such that conditioning fluid is provided to an end of the channel located within the first region of the support section and extracted from an end of the channel located within the second region of the support section.
14. The support table according to claim 1, wherein the upper face of the support section comprises a base surface, configured to be substantially parallel to a lower surface of a substrate supported on the support section, and a plurality of burls, protruding from the surface, wherein, when a substrate is supported by the support section, it is only in contact with the upper surface of the burls, wherein the support section is configured such that the total area of burls in contact with a substrate that is supported by the support section per unit area of the substrate is greater in the first region of the substrate than in the second region of the substrate.
15. The support table according to claim 1, further comprising a gas handling system configured to provide a gas to a space between the support section and the first region of the substrate that has higher thermal conductivity than a gas in the space between the support section and the second region of the substrate.
16. The support table according to claim 15, wherein the gas provided to the space between the support section and the first region of the substrate comprises at least one selected from the following: He, H2 andor water vapor.
17. A device manufacturing method, comprising using a lithographic apparatus to transfer a pattern from a patterning device to a substrate, wherein the lithographic apparatus comprises a support table configured to support the substrate, and a conditioning system configured to supply heat energy to andor remove heat energy from the support table, wherein the conditioning system has a first portion thereof in a first region of the substrate that is adjacent the edge of the substrate and is on opposite sides of the center of the substrate and a second portion thereof in a second region of the substrate, the method comprising:
at least during a pattern transfer process in the lithographic apparatus to transfer the pattern to the substrate, providing heat transfer to or from the substrate per unit area of the substrate as a result of the operation of the conditioning system that is greater in the first region for a given heat load andor temperature than it is in the second region for the given heat load andor temperature change.
18. The method of claim 17, wherein providing heat transfer to or from the substrate per unit area of the substrate that is greater in the first region than it is in the second region is as a result of the first portion being structurally different than the second portion.
19. The method of claim 17, wherein providing heat transfer to or from the substrate per unit area of the substrate that is greater in the first region than it is in the second region is due to a control system programmed to control the conditioning system to provide different heat transfer at the first region compared to the second region.
20. A lithographic apparatus, comprising:
a projection system configured to project a beam of radiation onto a radiation-sensitive substrate; and
a support table comprising:
a support section, configured to support a lower surface of the substrate on an upper face thereof;
a conditioning system, configured to supply heat energy to andor remove heat energy from the support section; and
a control system structured or programmed to control the conditioning system to supply the heat energy to andor remove the heat energy from the support section,
wherein, when a substrate is supported by the support section, it is thermally coupled to the support section such that, when the conditioning system supplies heat energy to or removes heat energy from the support section, energy in turn transfers from the support section to the substrate or to the support section from the substrate, respectively,
wherein the conditioning system has a first portion thereof in a first region of the substrate that is adjacent the edge of the substrate and is on opposite sides of the center of the substrate and a second portion thereof in a second region of the substrate,
wherein (i) the first portion is structurally different than the second portion such that, for a common heat transfer energy input to the first and second portions, the heat transfer to or from the substrate per unit area of the substrate as a result of the operation of the conditioning system is greater in the first region for a given heat load andor temperature change than it is in the second region for the given heat load andor temperature change, or (ii) the control system is further programmed to control the conditioning system such that the heat transfer to or from the substrate per unit area of the substrate as a result of the operation of the conditioning system is greater in the first region for a given heat load andor temperature change than it is in the second region for the given heat load andor temperature change, or (iii) both (i) and (ii), and
wherein the control system is configured to control the conditioning system to provide the heat transfer to or from the substrate per unit area of the substrate that is greater in the first region than it is in the second region at least during a radiation beam exposure process applied to the substrate.