1. An endoscopic bipolar forceps, comprising:
a housing having a handle attached thereto;
an elongated shaft attached to a distal end of said housing, said elongated shaft having opposing jaw members at a distal end thereof, at least one of said jaw members being movable relative to the other jaw member by said actuator from a first position wherein the jaw members are disposed in spaced relation relative to one another to a second position wherein the jaw members cooperate to grasp tissue therebetween, at least one jaw member being adapted to connect to an electrical energy source; and
an outer sleeve which mechanically cooperates with said actuator and said at least one movable jaw member to selectively pivot said at least one movable jaw member from the first to second positions, said outer sleeve being configured to provide electrical continuity between said jaw members and said electrical energy source upon activation of the forceps.
2. An endoscopic bipolar forceps according to claim 1 further comprising a switch disposed on said housing for energizing said jaw members through said outer sleeve.
3. An endoscopic bipolar forceps according to claim 1 wherein said actuator is configured to simultaneously move the jaw members and electrically activate the jaw members by way of said outer sleeve.
4. An endoscopic bipolar forceps according to claim 1 wherein said at least one movable jaw member includes a protrusion which mechanically interfaces with said outer sleeve such that when said sleeve moves in a first direction, said movable jaw member pivots to the first position and is electrically isolated from said outer sleeve and when said sleeve moves in a second direction, said movable jaw member pivots into the second position and said outer sleeve electrosurgically energizes said movable jaw member.
5. An endoscopic bipolar forceps according to claim 1 wherein at least one of said jaw members includes a knife channel for reciprocating a knife therethrough.
6. An endoscopic bipolar forceps according to claim 5 wherein said distal end of said elongated shaft houses said knife within a corresponding knife cavity.
7. An endoscopic bipolar forceps according to claim 6 wherein said knife is prevented from reciprocating through said knife channel when said jaw member is in the first position and said knife channel and said knife cavity are out of alignment.
8. An endoscopic bipolar forceps, comprising:
an elongated shaft having opposing jaw members at a distal end thereof, the jaw members being movable relative to one another from a first position wherein the jaw members are disposed in spaced relation relative to one another to a second position wherein the jaw members cooperate to grasp tissue therebetween;
at least one jaw member adapted to connect to an electrical energy source such that the jaw members are capable of conducting energy through tissue held therebetween to effect a seal; and
a generally tube-like cutter slidably engaged about said elongated shaft which is selectively movable about said elongated shaft to engage and cut tissue on at least one side of the jaw members while the tissue is engaged between jaw members.
9. An endoscopic bipolar forceps according to claim 8 wherein said cutter includes a U-shaped notched blade.
10. An endoscopic bipolar forceps according to claim 9 wherein said U-shaped notched blade is recessed from an outer periphery of said cutter.
11. An endoscopic bipolar forceps according to claim 9 wherein said U-shaped notched blade includes a bevel.
12. An endoscopic bipolar forceps according to claim 9 wherein said U-shaped notched blade includes opposing serrated cutting edges.
13. An endoscopic bipolar forceps according to claim 8 wherein said cutter includes a remotely operable actuator for selectively deploying said cutter to sever tissue.
14. An endoscopic bipolar forceps according to claim 13 wherein said actuator is a trigger.
15. An endoscopic bipolar forceps according to claim 13 wherein said actuator includes means for rapidly advancing said cutter to sever tissue.
16. An endoscopic bipolar forceps according to claim 8 wherein said cutter includes a substantially dull U-shaped notched blade which is rapidly advanced through the tissue.
17. An endoscopic bipolar forceps according to claim 8 wherein said cutter rotates as said cutter severs tissue on at least one side of the jaw members while the tissue is engaged between jaw members.
18. An endoscopic bipolar forceps according to claim 8 wherein said cutter is connected to a source of electrosurgical energy and said cutter severs tissue in an electrosurgical manner.
19. An endoscopic bipolar forceps according to claim 8 wherein said cutter is heated by a resistive heating source.
20. An endoscopic bipolar forceps according to claim 8 wherein said cutter includes a non-stick coating to reduce tissue adhesion during cutting.
21. An endoscopic bipolar forceps according to claim 8 wherein said cutter includes a cutting area having a U-shaped notched blade at a proximal end thereof and a pair of arms at a distal end thereof, said arms being dimensioned to feed tissue into said cutting area into contact with said U-shaped notched blade upon distal movement of said cutter.
The claims below are in addition to those above.
All refrences to claim(s) which appear below refer to the numbering after this setence.
1. An ion implanting apparatus comprising:
an ion source part generating an ion beam;
a substrate holding part holding a substrate, the ion beam irradiated onto the substrate so that ions are implanted into the substrate;
a beam current adjusting part disposed between the ion source part and the substrate holding part, to adjust a beam current according to a position of the ion beam;
a doping quantity measuring part disposed on substantially the same surface as the substrate, to measure ion doping quantity in real time; and
an ion beam control part connected to the doping quantity measuring part, to control the ion source part and the beam current adjusting part according to the ion doping quantity.
2. The ion implanting apparatus of claim 1, wherein the doping quantity measuring part comprises:
a plurality of first measurement cells disposed along a first side of the substrate substantially parallel with a scanning direction of the ion beam; and
a plurality of second measurement cells disposed along a second side of the substrate opposite to the first side of the substrate.
3. The ion implanting apparatus of claim 2, wherein the first and second measurement cells are substantially symmetric with respect to a central axis of the substrate substantially parallel with the scanning direction.
4. The ion implanting apparatus of claim 3, wherein the first and second measurement cells respectively output first and second measured values that are dependent on the ion doping quantity.
5. The ion implanting apparatus of claim 4, wherein the first and second measured values are outputted as voltage.
6. The ion implanting apparatus of claim 4, wherein the ion beam control part comprises a beam current control part through which a first difference between the first and second measured values corresponding to substantially same ion beam is fed back to the beam current adjusting part.
7. The ion implanting apparatus of claim 6, wherein the beam current adjusting part comprises a plurality of magnetic poles enclosing the ion beam and applying a magnetic force differently based on the first difference to enhance uniformity of the beam current according to the position of the ion beam.
8. The ion implanting apparatus of claim 6, wherein the ion beam control part further comprises an ion quantity control part through which a second difference between an average of the first and second measured values corresponding to substantially same ion beam and a predetermined reference is fed back to the ion source part.
9. The ion implanting apparatus of claim 8, wherein the ion source part comprises:
a gas injection part differently injecting a reactive gas, based on the second difference;
an ion generating part generating the ions from the reactive gas; and
an ion beam generating part classifying the ions based on a mass to generate the ion beam.
10. The ion implanting apparatus of claim 8, further comprising a beam scanning part scanning the ion beam to uniformize the beam current according to the position of the ion beam, so that the ion beam is fed back to the beam current adjusting part before the ions are implanted into the substrate.
11. The ion implanting apparatus of claim 2, further comprising:
first and second measurement cell holding parts respectively holding the first and second measurement cells; and
a transferring apparatus transferring the substrate holding part and the first and second measurement cells at the same time.
12. The ion implanting apparatus of claim 11, wherein the first and second measurement cell holding parts are fixed to the substrate holding part, and
the transferring apparatus comprises:
a driving part; and
a power transmitting part transmitting the power of the driving part, to transfer the substrate holding part into a direction substantially opposite to the scanning direction.
13. The ion implanting apparatus of claim 12, wherein the driving part comprises one of a driving motor and a cylinder.
14. The ion implanting apparatus of claim 11, wherein the first and second measurement cell holding parts are separated from the substrate holding part, and
the transferring apparatus comprises:
a driving part; and
first, second and third power transmitting parts transmitting the power of the driving part, to respectively transfer the first and second measurement cell holding parts and the substrate holding part into a direction substantially opposite to the scanning direction at the same time.
15. A method for implanting ions, the method comprising:
generating an ion beam;
measuring ion doping quantity in real time during irradiating of the ion beam to a substrate; and
controlling a beam current based on the measured doping quantity according to a position of the ion beam.
16. The method of claim 15, further comprising controlling ion quantity of the ion beam based on the measured doping quantity.
17. The method of claim 16, wherein the ion doping quantity is measured by:
measuring a first measured value at a first side of the substrate substantially parallel with a scanning direction of the ion beam;
outputting the first measured value;
measuring a second measured value at a second side of the substrate opposite to the first side of the substrate; and
outputting the second measured value.
18. The method of claim 17, wherein the beam current according to the position of the ion beam is controlled by uniformizing the beam current according to the position of the ion beam in real time through a difference between the first and second measured values.
19. The method of claim 18, wherein the ion beam is uniformized by:
applying a lower intensity of a magnetic force to a position where a higher ion doping quantity is measured than the previous position; and
applying a higher intensity of the magnetic force to a position where a lower ion doping quantity is measured than the previous position.
20. The method of claim 17, wherein the ion quantity of the ion beam is controlled by changing the ion quantity of the ion beam in real time through a difference between an average of the first and second measured values corresponding to substantially same ion beam and a predetermined reference.
21. The method of claim 20, wherein the ion quantity of the ion beam is controlled by:
increasing the ion quantity when the average is lower than the predetermined reference; and
decreasing the ion quantity when the average is higher than the predetermined reference.
22. The method of claim 15, further comprising measuring and adjusting the beam current according to the position of the ion beam to increase uniformity of the ion beam before the ion beam is irradiated onto the substrate.