1. An entropy decoding method, the method comprising:
decoding bins of a syntax element; and
obtaining information on the syntax element on the basis of the decoded bins,
wherein the step of decoding the bins includes performing context-based decoding or bypass decoding on a bin of the syntax element.
2. The method of claim 1, wherein the step of decoding the bins includes applying independent context to the bin of the syntax element.
3. The method of claim 1, wherein the step of decoding the bins includes applying a bypass mode to some bins of the bins of the syntax element and applying independent contexts to the other bins.
4. The method of claim 1, wherein the step of decoding the bins includes applying independent context to the bin which is decoded on the basis of context, and
wherein the independent context is a context which is updated independently of the other contexts.
5. The method of claim 1, wherein the step of decoding the bins includes determining whether the bin of the syntax element is to be bypass-decoded and performing decoding based on context when it is determined that the bin is not bypass-decoded.
6. The method of claim 1, wherein the step of decoding the bins includes performing decoding on the basis of context index allocated to the bin of the syntax element with a context index table on which context indices are allocated to bins of the syntax element.
7. The method of claim 6, wherein the context index table allocates the same context index to some bins of the bins of the syntax element.
8. The method of claim 6, wherein the context index table allocates the same context index to some bins of the bins of the syntax element and allocates a bypass mode to some bins.
9. The method of claim 1, wherein the step of decoding the bins includes performing decoding using a context index table,
wherein the context index table allocates context indices and an offset based on a type of a picture to be coded to the bins of the syntax element, and
wherein the bin of the syntax element is decoded on the basis of a context indicated by the sum of the context index and the offset.
10. The method of claim 9, wherein the context index table allocates the same context index to some bins of the bins of the syntax element.
11. The method of claim 9, wherein the context index table allocates the same context index to some bins of the bins of the syntax element and allocates a bypass mode to some bins.
12. An entropy decoding device, the device comprising:
an entropy decoding module that decodes bins of a syntax element; and
a prediction module that generates a prediction block on the basis of the decoded syntax element,
wherein the entropy decoding module performs context-based decoding or bypass decoding on a bin of the syntax element.
13. The device of claim 12, wherein the entropy decoding module applies a bypass mode to some bins of the bins of the syntax element and applies independent contexts to the other bins.
14. The device of claim 12, wherein the entropy decoding module performs decoding based on context index allocated to the bin of the syntax element with a context index table on which the context indices are allocated to the bins.
15. The device of claim 12, wherein the entropy decoding module performs decoding using a context index table,
wherein the context index table allocates context indices and an offset based on the type of a picture to be coded to the bins of the syntax element, and
wherein the bin of the syntax element is decoded on the basis of context indicated by the sum of the context index and the offset.
The claims below are in addition to those above.
All refrences to claim(s) which appear below refer to the numbering after this setence.
1. A substrate processing method using a substrate processing apparatus including:
a process container holding a substrate to be processed therein;
first gas supplying means having flow rate adjusting means for supplying a first process gas to said process container;
gas switching means disposed between said process container and said gas supplying means, said gas switching means switching supplying directions of the first process gas to a first direction for supplying to said process container or to a second direction for supplying to a gas exhaust line; and
second gas supplying means supplying a second process gas to said process container,
said substrate processing method comprising:
a first step of controlling a flow rate of the first process gas to be a first flow rate by said flow rate adjusting means and supplying the first process gas in the first direction;
a second step of discharging the first process gas from said process container;
a third step of supplying the second process gas to said process container; and
a fourth step of discharging the second process gas from said process container, in a repeated manner, wherein
a step of stabilizing the flow rate of the process gas is set between a primary first step and a secondary first step performed subsequently to said primary first step, and
said step of stabilizing the flow rate of the process gas includes:
a step (A) of switching the supplying directions to the second direction by said gas switching means after said primary first step;
a step (B) of reducing the first flow rate to a second flow rate by said flow rate adjusting means after said step (A); and
a step (C) of increasing the second flow rate to the first flow rate by said flow rate adjusting means after said step (B).
2. The substrate processing method according to claim 1, wherein
the first process gas contains vaporized material made of a liquid material,
said first gas supplying means has a vaporizer vaporizing the liquid material, and
a flow rate of the liquid material to be supplied to said vaporizer is controlled by said flow rate adjusting means.
3. The substrate processing method according to claim 2, wherein
the flow rate of the liquid material corresponding to the second flow rate is not less than 5% of a maximum flow rate setting of said flow rate adjusting means.
4. The substrate processing method according to claim 3, wherein
the flow rate of the liquid material corresponding to the second flow rate is not less than 10% of the maximum flow rate setting of said flow rate adjusting means.
5. The substrate processing method according to claim 1, wherein
said gas exhaust line is connected to a process container exhaust line disposed on said process container, said process container exhaust line exhausting said process container.
6. The substrate processing method according to claim 1, wherein
said step (B) is performed before said third step is started.
7. The substrate processing method according to claim 6, wherein
said step (C) is performed after said third step is ended.
8. The substrate processing method according to claim 2, wherein
the liquid material contains a metallic element and the second process gas contains oxidation gas oxidizing the metallic element.
9. The substrate processing method according to claim 1, wherein
said second step includes a purge step of supplying a purge gas to said process container.
10. The substrate processing method according to claim 1, wherein
said fourth step includes a purge step of supplying a purge gas to said process container.
11. A computer-readable storage medium storing a computer-readable program which, when executed by a computer, causes the computer to perform a substrate processing method using a substrate processing apparatus including:
a process container holding a substrate to be processed therein;
first gas supplying means having flow rate adjusting means for supplying a first process gas to said process container;
gas switching means disposed between said process container and said gas supplying means, said gas switching means switching supplying directions of the first process gas to a first direction for supplying to said process container or to a second direction for supplying to a gas exhaust line; and
second gas supplying means supplying a second process gas to said process container,
said substrate processing method comprising:
a first step of controlling a flow rate of the first process gas to be a first flow rate by said flow rate adjusting means and supplying the first process gas in the first direction;
a second step of discharging the first process gas from said process container;
a third step of supplying the second process gas to said process container; and
a fourth step of discharging the second process gas from said process container, in a repeated manner, wherein
a step of stabilizing the flow rate of the process gas is set between a primary first step and a secondary first step performed subsequently to said primary first step, and
said step of stabilizing the flow rate of the process gas includes:
a step (A) of switching the supplying directions to the second direction by said gas switching means after said primary first step;
a step (B) of reducing the first flow rate to a second flow rate by said flow rate adjusting means after said step (A); and
a step (C) of increasing the second flow rate to the first flow rate by said flow rate adjusting means after said step (B).
12. The computer-readable storage medium according to claim 11, wherein
the first process gas contains vaporized material made of a liquid material,
said first gas supplying means has a vaporizer vaporizing the liquid material, and
a flow rate of the liquid material to be supplied to said vaporizer is controlled by said flow rate adjusting means.
13. The computer-readable storage medium according to claim 12, wherein
the flow rate of the liquid material corresponding to the second flow rate is not less than 5% of a maximum flow rate setting of said flow rate adjusting means.
14. The computer-readable storage medium according to claim 13, wherein
the flow rate of the liquid material corresponding to the second flow rate is not less than 10% of the maximum flow rate setting of said flow rate adjusting means.
15. The computer-readable storage medium according to claim 11, wherein
said gas exhaust line is connected to a process container exhaust line disposed on said process container, said process container exhaust line exhausting said process container.
16. The computer-readable storage medium according to claim 11, wherein
said step (B) is performed before said third step is started.
17. The computer-readable storage medium according to claim 16, wherein
said step (C) is performed after said third step is ended.
18. The computer-readable storage medium according to claim 12, wherein
the liquid material contains a metallic element and the second process gas contains oxidation gas oxidizing the metallic element.
19. The computer-readable storage medium according to claim 11, wherein
said second step includes a purge step of supplying a purge gas to said process container.
20. The computer-readable storage medium according to claim 11, wherein
said fourth step includes a purge step of supplying a purge gas to said process container.