1. An optical writing device comprising:
a photosensitive element whose surface relatively moves with respect to a light source by rotation;
a pixel information acquiring unit that acquires pixel information which is information of pixels forming an image to be formed on the photosensitive element as an electrostatic latent image;
a line pixel information storing unit that stores the acquired pixel information for every main scanning line;
a light emission control unit that causes a light source to emit light based on the stored pixel information;
a rotation position recognizing unit that recognizes a rotation position of the photosensitive element; and
a light quantity control unit that controls a light quantity of when the light emission control unit causes the light source to emit light based on the pixel information of every one main scanning line in accordance with the recognized rotation position, with reference to correction value information in which the rotation position of the photosensitive element and information related to a correction of the light quantity of when causing the light source to emit light are associated.
2. The optical writing device according to claim 1, wherein
the correction value information includes information of an increase degree of when increasing the light quantity, a maximum value of the light quantity, a decrease degree of when decreasing the light quantity, a period of increasing the light quantity, a period of maintaining the light quantity at a maximum value, and a period of decreasing the light quantity, and
wherein the light quantity control unit determines one of the period of increasing the light quantity, the period of maintaining the light quantity at the maximum value, and the period of decreasing the light quantity in accordance with the recognized rotation position, and controls the light quantity based on the information of the increase degree of when increasing the light quantity, the maximum value of the light quantity, and the decrease degree of when decreasing the light quantity in accordance with the determination result.
3. The optical writing device according to claim 2, wherein the light emission control unit increases or decreases the light quantity of when the light emission control unit causes the light source to emit light for every one main scanning line according to the control of the light quantity control unit in the period of increasing the light quantity and the period of decreasing the light quantity.
4. The optical writing device according to claim 2, wherein
the period of increasing the light quantity, the period of maintaining the light quantity at the maximum value, and the period of decreasing the light quantity are information in a rotation period of the photosensitive element are set; and
the light quantity control unit carries out a control corresponding to the setting of the period of increasing the light quantity, the period of maintaining the light quantity at the maximum value, and the period of decreasing the light quantity every time the rotation position recognizing unit recognizes the period of the photosensitive element.
5. The optical writing device according to claim 1, wherein
the correction value information is information in which the rotation position of the photosensitive element and information for specifying the light quantity are associated; and
the light quantity control unit controls the light quantity based on the information for specifying the light quantity associated with the recognized rotation position.
6. The optical writing device according to claim 5, wherein
the correction value information is information in which the rotation position in the rotation of the photosensitive element and a difference amount for correcting the light quantity are associated; and
the light quantity control unit controls the light quantity based on the difference amount associated with the recognized rotation position.
7. The optical writing device according to claim 5, wherein
the correction value information is information in which a plurality of ranges into which a range of the photosensitive element is divided in the rotating direction and pieces of information for specifying the light quantity are associated, respectively; and
the light quantity control unit executes the control of the light quantity for the respective ranges in which the rotation position recognizing unit recognizes the period of the photosensitive element, and then controls the light quantity based on a piece of information for specifying the light quantity associated with a last range of the plurality of ranges until the rotation position recognizing unit recognizes a start of a next period of the photosensitive element.
8. The optical writing device according to claim 1,
wherein the photosensitive element includes a periodic detection marker which is arranged thereon to detect the period of the photosensitive element, and
wherein the rotation position recognizing unit recognizes the period of the photosensitive element by detecting the periodic detection marker, and recognizes the rotation position of the photosensitive element based on a count value of count starting according to the recognition of the period of the photosensitive element.
9. The optical writing according to claim 1,
wherein the photosensitive element includes a periodic detection marker which is arranged thereon to detect the period of the photosensitive element and a rotation position detection marker which is arranged thereon at a predetermined interval in a sub-scanning direction of the photosensitive element to detect the rotation position of the photosensitive element, and
wherein the rotation position recognizing unit recognizes the period of the photosensitive element by detecting the periodic detection marker, and recognizes the rotation position of the photosensitive element by detecting the rotation position detection marker.
10. The optical writing device according to claim 9,
wherein the periodic detection marker and the rotation position detection marker have different width in the sub-scanning direction, and
wherein the rotation position recognizing unit identifies the periodic detection marker and the rotation position detection marker from a difference in a detection signal generated by the difference in the width in the sub-scanning direction of the periodic detection marker and the rotation position detection marker.
11. The optical writing device according to claim 1,
wherein the light emission control unit forms a pattern over one period of the photosensitive element by controlling the light source, and
wherein the rotation position recognizing unit recognizes the rotation position of the photosensitive element based on a fluctuation in a density of the pattern in a reading result of the pattern with reference to information in which a density fluctuation corresponding to the rotation position for one period of the photosensitive element is stored in advance.
12. The optical writing device according to claim 1, wherein
the correction value information is information in which rotation positions of the photosensitive element and pieces of information related to correction of a light quantity for respective ranges into which the light source is divided in the main scanning direction are associated, respectively, and
wherein the light quantity control unit controls the light quantity for each of the ranges of the light source.
13. The optical writing device according to claim 1,
wherein the light emission control unit forms a pattern over one period of the photosensitive element by controlling the light source, and
wherein the optical writing device further comprises:
a pattern reading unit that reads the pattern; and
a correction value information generating unit that generates the correction value information based on the reading result of the pattern and the recognition result of the rotation position of the photosensitive element recognized by the rotation position recognizing unit, and stores the generated correction value information in a storage medium.
14. The optical writing device according to claim 13,
wherein the light emission control unit controls forms a plurality of lines parallel to the main scanning direction at a predetermined interval over one period of the photosensitive element for the pattern, by controlling the light source, and
wherein the correction value information generating unit,
stores number of formations of the line and the rotation position of the photosensitive element recognized by the rotation position recognizing unit in association to each other every time the light emission control unit forms the line,
stores number of reading of the line and a density of the line in the reading result of the line in association to each other every time the pattern reading unit reads the line,
associates the rotation position of the photosensitive element associated with the number of formations of the line and the density of the line associated with the number of reading of the line by corresponding the number of formations of the line and the number of reading of the line, and
generates the correction value information by converting the density to information related to correction of the light quantity by calculating information related to the correction of the light quantity based on the density of the line.
15. An image forming apparatus comprising the optical writing device according to claim 1.
16. A method of controlling an optical writing device for forming an electrostatic latent image on a photosensitive element whose surface relatively moves with respect to a light source by rotation, the method comprising:
acquiring pixel information, which is information of a pixel configuring an image to be formed as the electrostatic latent image, and storing in a first storage unit;
storing the acquired pixel information in a second storage unit for every main scanning line;
recognizing a rotation position of the photosensitive element;
referencing correction value information in which the rotation position of the photosensitive element and information related to correction of a light quantity of when causing the light source to emit light are associated to each other, and controlling the light quantity of when causing the light source to emit light based on the pixel information of one main scanning line according to the recognized rotation position; and
causing the light source to emit light based on the stored pixel information in accordance with the control of the light quantity.
The claims below are in addition to those above.
All refrences to claim(s) which appear below refer to the numbering after this setence.
1. Cosmetic makeup composition andor care composition for the skin, comprising at least one dispersion of particles in a cosmetically acceptable medium, the particles comprising at least one at least partially internal supple phase comprising at least one supple polymer having at least one glass transition temperature of less than or equal to 60 C., and at least one at least partially external rigid phase, the rigid phase being an amorphous material having at least one glass transition temperature of greater than 60 C., the supple polymer being at least partially attached by chemical grafting onto the rigid phase.
2. Composition according to claim 1, characterized in that the supple polymer has a glass transition temperature ranging from 120 C. to 60 C.
3. Composition according to claim 1 or 2, characterized in that the supple polymer has a glass transition temperature of less than or equal to 45 C.
4. Composition according to any one of the preceding claims, characterized in that the supple polymer has a glass transition temperature ranging from 120 C. to 45 C.
5. Composition according to any one of the preceding claims, characterized in that the supple polymer has a glass transition temperature of less than or equal to 30 C.
6. Composition according to any one of the preceding claims, characterized in that the supple polymer has a glass transition temperature ranging from 120 C. to 30 C.
7. Composition according to any one of the preceding claims, characterized in that the supple polymer is chosen from polyacrylics, polymethacrylics, polyamides, polyurethanes, polyolefins, polyesters, polyvinyl ethers, polyvinylthio ethers, polyoxides and polysiloxanes, and combinations thereof.
8. Composition according to any one of the preceding claims, characterized in that the supple polymer is chosen from poly(meth)acrylics, polyurethanes, polyolefins and polysiloxanes.
9. Composition according to any one of the preceding claims, characterized in that the amorphous material of the rigid phase has a glass transition temperature of greater than 60 C. and less than or equal to 200 C.
10. Composition according to any one of the preceding claims, characterized in that the amorphous material of the rigid phase has a glass transition temperature of greater than or equal to 70 C.
11. Composition according to any one of the preceding claims, characterized in that the amorphous material of the rigid phase has a glass transition temperature ranging from 70 C. to 200 C.
12. Composition according to any one of the preceding claims, characterized in that the amorphous material of the rigid phase has a glass transition temperature of greater than 90 C.
13. Composition according to any one of the preceding claims, characterized in that the amorphous material of the rigid phase has a higher glass transition temperature ranging from 90 C. to 150 C.
14. Composition according to any one of the preceding claims, characterized in that the amorphous material of the rigid phase is a polymer.
15. Composition according to any one of the preceding claims, characterized in that the amorphous material of the rigid phase is a polymer chosen from polyacrylics, polymethacrylics, poly(meth)acrylamides, polyvinyls, polyvinyl esters, polyolefins, polystyrenes, polyvinyl halides, polyvinylnitriles, polyurethanes, polyesters, polyamides, polycarbonates, polysulfones, polysulfonamides, polycyclics containing a carbon-based ring in the main chain, and polyoxyphenylenes, and combinations thereof.
16. Composition according to any one of the preceding claims, characterized in that the amorphous material of the rigid phase is a polymer chosen from polyacrylics, polymethacrylics, poly(meth)acrylamides, polyvinyls, polyvinyl esters, polyolefins, polystyrenes, polyvinyl halides, polyvinylnitriles, polyurethanes, polyamides and polyesters.
17. Composition according to any one of the preceding claims, characterized in that the supple and rigid phases of the particles comprise at least one free-radical polymer obtained by polymerization of monomers chosen from the group formed by:
alkyl (meth)acrylates containing a C1-C8 alkyl group,
vinyl esters of linear or branched carboxylic acids,
styrene and its derivatives,
conjugated dienes,
acrylamide, methacrylamide and acrylonitrile,
vinyl chloride,
(meth)acrylic acid.
18. Composition according to any one of the preceding claims, characterized in that the rigid andor supple phases comprise a polymer crosslinked using a monomer containing at least two copolymerizable double bonds.
19. Composition according to the preceding claim, characterized in that the polymer is crosslinked with a monomer chosen from:
conjugated dienes;
allylic esters of ,-unsaturated carboxylic acids;
allylic esters of ,-unsaturated dicarboxylic acids;
polyacrylics or polymethacrylics generally comprising at least two ethylenic unsaturations;
polyvinyls;
polyallylics.
20. Composition according to claim 18 or 19, characterized in that the polymer is crosslinked with a monomer chosen from butadiene, isoprene, allyl acrylate, allyl methacrylate, diallyl maleate, ethylene glycol dimethacrylate, 1,3-butylene glycol dimethacrylate, 1,4-butanediol diacrylate, pentaerythritol tetraacrylate, divinylbenzene, trivinylbenzene and triallyl cyanurate.
21. Composition according to any one of the preceding claims, characterized in that the chemical grafting is formed by covalent bonding of the rigid phase and of the supple phase of the particles.
22. Composition according to any one of the preceding claims, characterized in that the amorphous material of the rigid phase is a polymer and in that the chemical grafting is performed by block free-radical polymerization.
23. Composition according to any one of the preceding claims, characterized in that the amorphous material of the rigid phase is a polymer and in that the chemical grafting is performed by a grafting monomer.
24. Composition according to claim 23, characterized in that the grafting monomer is a monomer containing two ethylenic double bonds.
25. Composition according to claim 23 or 24, characterized in that the grafting monomer is chosen from conjugated dienes and allylic esters of ,-unsaturated dicarboxylic acids.
26. Composition according to any one of claims 14 to 21, characterized in that the supple polymer or the polymer of the rigid phase is a polycondensate containing at least one ethylenic unsaturation capable of reacting with a monomer also comprising an ethylenic unsaturation to form a covalent bond with the polycondensate.
27. Composition according to claim 26, characterized in that the polycondensate comprising at least one ethylenic unsaturation is obtained by polycondensation of monomers chosen from allyl alcohol, vinylamine and fumaric acid.
28. Composition according to any one of the preceding claims, characterized in that the particles containing rigid and supple phases are film-forming.
29. Composition according to the preceding claim, characterized in that the particles have a minimum film-forming temperature of less than or equal to 30 C., preferably ranging from 120 C. to 30 C.
30. Composition according to any one of the preceding claims, characterized in that the particles have a size ranging from 1 nm to 10 m and preferably ranging from 10 nm to 1 m.
31. Composition according to any one of the preceding claims, characterized in that the supple phase represents at least 25% by volume, relative to the total volume of the particle, preferably from 50% to 99% by volume, and preferentially from 50% to 90% by volume.
32. Composition according to any one of the preceding claims, characterized in that the particles are dispersed in an aqueous medium.
33. Composition according to the preceding claim, characterized in that the aqueous medium comprises water and optionally a water-miscible solvent.
34. Composition according to the preceding claim, characterized in that the water-miscible solvent is chosen from polyols containing from 2 to 8 carbon atoms, C2 to C5 lower monoalcohols and C2-C4 ketones, and mixtures thereof.
35. Composition according to any one of claims 32 to 34, characterized in that the aqueous medium represents from 5% to 75% by weight and better still from 5% to 50% by weight, relative to the total weight of the composition.
36. Composition according to any one of claims 1 to 31, characterized in that the particles are dispersed in a nonaqueous medium that is liquid at room temperature and atmospheric pressure.
37. Composition according to claim 34, characterized in that the nonaqueous medium comprises an oil.
38. Composition according to claim 36 or 37, characterized in that the nonaqueous medium comprises a volatile oil.
39. Composition according to the preceding claim, characterized in that the volatile oil is chosen from octamethylcyclotetrasiloxane, decamethylcyclopentasiloxane, hexadecamethylcyclohexa-siloxane, heptamethylhexyltrisiloxane, heptamethyl-octyltrisiloxane, isododecane, isooctane, isodecane and isohexadecane.
40. Composition according to any one of claims 37 to 39, characterized in that the oil is present in a content ranging from 5% to 97.5% by weight and better still from 20% to 75% by weight relative to the total weight of the composition.
41. Composition according to any one of the preceding claims, characterized in that the particles containing rigid and supple phases are present in a content ranging from 0.1% to 70% by weight of particle solids relative to the total weight of the composition, preferably ranging from 0.5% to 55% by weight and preferentially ranging from 1% to 40% by weight.
42. Composition according to any one of the preceding claims, characterized in that the composition is capable of forming a film having a maximum tensile stress, for a percentage of elongation of less than 100%, of less than or equal to 10 MPa, preferably ranging from 0.1 MPa to 10 MPa.
43. Composition according to the preceding claim, characterized in that the film has a maximum stress of less than or equal to 5 MPa, preferably ranging from 0.1 MPa to 5 MPa.
44. Composition according to any one of the preceding claims, characterized in that it comprises a dyestuff.
45. Composition according to the preceding claim, characterized in that the dyestuff is chosen from lipophilic dyes, hydrophilic dyes, pigments and nacres.
46. Composition according to claim 44 or 45, characterized in that the dyestuff is present in a proportion of from 0.01% to 50% by weight and preferably from 1% to 30% by weight relative to the total weight of the composition.
47. Composition according to any one of the preceding claims, characterized in that it comprises an additive chosen from plasticizers, coalescers, fillers, waxes, pasty fatty substances, surfactants, antioxidants, essential oils, preserving agents, fragrances, neutralizers, emollients, moisturizers, vitamins, essential fatty acids, sunscreens, free-radical scavengers and dispersants.
48. Composition according to any one of the preceding claims, characterized in that it is in the form of a simple or multiple emulsion containing an oily or aqueous continuous phase, a cream, a gel, a paste, a solid, a mousse, a two-phase or multiphase lotion, or a spray.
49. Composition according to any one of the preceding claims, characterized in that the composition is a foundation, a blusher, a face powder, an eyeshadow, a concealer product, an eyeliner or a body makeup product.
50. Composition according to any one of the preceding claims, characterized in that the composition is a foundation.
51. Composition according to any one of claims 1 to 48, characterized in that the composition is in the form of a care composition andor treatment composition for the skin, especially a skincare base, an antisun composition or a deodorant.
52. Cosmetic care process andor makeup process for the human skin, comprising the application to the skin of a cosmetic composition according to any one of the preceding claims.
53. Use, in a cosmetic composition, of a dispersion of particles comprising at least one at least partially internal supple phase comprising at least one supple polymer having at least one glass transition temperature of less than or equal to 60 C., and at least one at least partially external rigid phase, the rigid phase being an amorphous material having at least one glass transition temperature of greater than 60 C., the supple polymer being at least partially attached by chemical grafting onto the rigid phase, to improve the staying power and comfort of a film of the composition, applied to the skin, the particles being dispersed in a cosmetically acceptable medium.
54. Use, in a cosmetic composition, of a dispersion of particles comprising at least one at least partially internal supple phase comprising at least one supple polymer having at least one glass transition temperature of less than or equal to 60 C., and at least one at least partially external rigid phase, the rigid phase being an amorphous material having at least one glass transition temperature of greater than 60 C., the supple polymer being at least partially attached by chemical grafting onto the rigid phase, to reduce the transfer andor deposition of marks from a film of the composition, applied to the skin, onto a support placed in contact with said film, the particles being dispersed in a cosmetically acceptable medium.