Author: claimsbot

1. A drive comprising:
an electric motor having a motor shaft;
a gearbox;
a housing holding the motor; and
a direction-dependent brake operatively connected to the motor and the gearbox, the direction dependent brake including
a driver connected to the motor shaft,
a drive output connected to the gearbox and coupled to the driver and freely pivotable around a small angle,
a plurality of clamping devices, and
a clamping ring cooperating with the plurality of clamping devices so that the brake conveys a torque originating in the electric motor to the drive output and halts a back-driving torque of the drive output, wherein the clamping ring is connected radially movable relative to the housing so that the clamping ring can be moved radially by at least one of the clamping devices after overcoming a specified force.
2. The drive according to claim 1, wherein the clamping ring is elastically connected to the motor housing or the gearbox.
3. The drive according to claim 1, wherein the clamping ring is frictionally connected to the motor housing or the gearbox.
4. The drive according to claim 1, further comprising a spring for spring-loading the clamping ring against a part attached to the housing.
5. The drive according to claim 1, wherein the clamping ring lies against a cover or an end plate provided in the direction-dependent brake.
6. The drive according to claim 1, further comprising a brake housing, wherein the clamping ring and the clamping devices are arranged in a brake housing, in which the clamping ring is radially movable within the brake housing.
7. The drive according to claim 1, wherein there are three clamping devices with two clamping devices being rigid support devices and one clamping device being a movable clamping device.
8. The drive according to claim 7, wherein the angular distance of the rigid support devices relative to each other is greater than the angular distance between a support device and the movable clamping device.
9. The drive according to claim 8, wherein the angular distance of the rigid support devices lies in the range between 120\xb0 and 175\xb0.
10. The drive according to claim 7, wherein the movable clamping device is formed by two roller bodies, which are spaced from each other with a spring.
11. The drive according to claim 1, wherein the number of clamping device is three and wherein one clamping device is a roll body and the other two clamping devices are rigid support devices.
12. The drive according to claim 1, wherein the drive output has a recess with a control surface, the movable clamping device being accommodated in the recess.
13. The drive according to claim 1, wherein the clamping devices each have an outer friction surface in the form of a circular ring segment, each ring segment being frictionally connected tangentially to the clamping ring in a radially loaded state.
14. The drive according to claim 1, wherein one of the clamping devices faces the motor shaft and has two surfaces sloped toward a tangent, which cooperates with complementary mating surfaces of the drive output, a maximum of one slope surface per clamping device being engaged with a corresponding mating surface of the drive output.
15. The drive according to claim 14, wherein the drive output is crown-like and has three coupling protrusions protruding axially from a ring area on which the corresponding mating surfaces are formed.
16. The drive according to claim 1, wherein the drive output has two coupling surfaces per coupling protrusion, which cooperate with mating coupling surfaces of the driver.
17. The drive according to claim 16, wherein the driver has at least two radial protrusions on which the mating coupling surfaces are formed.
18. The drive according to claim 16, wherein the driver has at least one drive surface that cooperates tangentially with a mating drive surface of at least one clamping device.
19. The drive according to claim 1, wherein during operation of the motor at least one drive surface of the driver lies against a mating drive surface of at least one of the clamping devices and against a coupling surface of the drive output, in which the sloped surfaces and the at least one clamping device and the complementary mating surfaces of drive output are arranged relative to each other so that no radial force component is exerted on the at least one clamping device.
20. The drive according to claim 1, further comprising: a coupling device, wherein, during operation, at least one sloped surface of at least one clamping device lies against a complementary mating surface of the driver output so that, during further pivoting, a radial force component is exerted on the at least one clamping device and the outer surface of the coupling device, which represents a braking surface, and rubs against a mating braking surface of the clamping ring or frictionally connects the corresponding surfaces so that the rotational movement of the drive output is braked.

The claims below are in addition to those above.
All refrences to claim(s) which appear below refer to the numbering after this setence.

1. A compound comprising a first ligand L1;
wherein L1 comprises the following formula:
wherein E1 is N;
wherein E2 is B;
wherein R3 and R4 represent mono, di, tri, tetra substitutions or no substitution;
wherein R1, R2, R3 and R4 are each independently selected from the group consisting of hydrogen, deuterium, halide, alkyl, cycloalkyl, heteroalkyl, arylalkyl, alkoxy, aryloxy, amino, silyl, alkenyl, cycloalkenyl, heteroalkenyl, alkynyl, aryl, heteroaryl, acyl, carbonyl, carboxylic acids, ester, nitrile, isonitrile, sulfanyl, sulfinyl, sulfonyl, phosphino, and combinations thereof;
wherein any two adjacent R1, R2, R3, and R4 are optionally joined to form a ring, which may be further substituted;
wherein (i) at least one R1, R2, R3, or R4 is a 5-or 6-membered heteroaryl ring A containing a nitrogen, (ii) at least one pair of adjacent substituents R1, R2, R3, and R4 form a fused ring B that includes E1 or E2, or (iii) both (i) and (ii);
wherein ring A, ring B, or both ring A and ring B are coordinated to metal M;
wherein ring A and ring B can be further substituted;
wherein L1 is coordinated to a metal M, provided that the metal M does not form bond with E1 and E2; and
wherein L1 may be linked with other ligands to comprise a bidentate, tridentate, tetradentate, pentadentate or hexadentate ligand.
2. The compound of claim 1, wherein the metal M is a metal selected from the group consisting of Ir, Pt, Re, Os, Ru, Rh, Pd, Cu, Ag, and Au.
3. The compound of claim 1, wherein the metal M is Ir.
4. The compound of claim 1, wherein the metal M is Pt.
5. The compound of claim 1, wherein at least one of R1 and R2 is aryl or substituted aryl.
6. The compound of claim 5, wherein at least one of R1 and R2 is phenyl, or 2,6-disubstituted phenyl.
7. The compound of claim 1, wherein the compound is homoleptic.
8. The compound of claim 1, wherein the compound is heteroleptic.
9. The compound of claim 8, wherein the compound comprises a second ligand L2;
wherein the ligand L2 or part of the ligand L2 if the ligand is more than bidentate is selected from the group consisting of:
wherein Ra, Rb, Rc, and Rd may represent mono, di, tri, or tetra substitution, or no substitution;
wherein Ra, Rb, Rc, and Rd are independently selected from the group consisting of hydrogen, deuterium, halide, alkyl, cycloalkyl, heteroalkyl, arylalkyl, alkoxy, aryloxy, amino, silyl, alkenyl, cycloalkenyl, heteroalkenyl, alkynyl, aryl, heteroaryl, acyl, carbonyl, carboxylic acids, ester, nitrile, isonitrile, sulfanyl, sulfinyl, sulfonyl, phosphino, and combinations thereof; and
wherein two adjacent substituents of Ra, Rb, Rc, and Rd are optionally joined to form a fused ring or form a multidentate ligand.
10. The compound of claim 1, wherein the compound having the formula:
wherein L2 is a second ligand coordinated to the metal M;
wherein each L2 can be same or different;
wherein m is a value from 1 to the maximum number of ligands that may be attached to the metal M;
wherein m+n is the maximum number of ligands that may be attached to the metal M; and
wherein any of R1, R2, and R3 are optionally linked to L2 to comprise a bidentate, tridentate, tetradentate, pentadentate or hexadentate ligand.
11. The compound of claim 10, wherein at least one of R1, R2, and R3 are linked to L2 to comprise a bidentate, tridentate, tetradentate, pentadentate or hexadentate ligand.
12. The compound of claim 10, wherein the compound is selected from the group consisting of:
wherein X1, X2 is selected from the group consisting of C, N, O, P, S, and B;
wherein A is a 5-membered or 6-membered carbocyclic or heterocyclic ring;
wherein R5 represents mono, di, tri, tetra substitutions or no substitution;
wherein R5 is selected from the group consisting of hydrogen, deuterium, halide, alkyl, cycloalkyl, heteroalkyl, arylalkyl, alkoxy, aryloxy, amino, silyl, alkenyl, cycloalkenyl, heteroalkenyl, alkynyl, aryl, heteroaryl, acyl, carbonyl, carboxylic acids, ester, nitrile, isonitrile, sulfanyl, sulfinyl, sulfonyl, phosphino, and combinations thereof; and
wherein any two adjacent R1, R2, R3, R4, and R5 are optionally joined to form a ring, which may be further substituted.
13. The compound of claim 12, wherein A is selected from the group consisting of:
wherein Y is selected from the group consisting of BR, NR, PR, O, S, Se, C\u2550O, S\u2550O, SO2, CRR\u2032, SiRR\u2032, and GeRR\u2032;
wherein R, R\u2032 are independently selected from the group consisting of hydrogen, deuterium, halide, alkyl, cycloalkyl, heteroalkyl, arylalkyl, alkoxy, aryloxy, amino, silyl, alkenyl, cycloalkenyl, heteroalkenyl, alkynyl, aryl, heteroaryl, acyl, carbonyl, carboxylic acids, ester, nitrile, isonitrile, sulfanyl, sulfinyl, sulfonyl, phosphino, and combinations thereof; and
wherein R, R\u2032 are optionally joined to form a ring with any adjacent substituent.
14. The compound of claim 10, wherein the compound is selected from the group consisting of:
15. The compound of claim 14, wherein m is 3, and n is 0.
16. The compound of claim 14, wherein m is 1, and n is 2.
17. The compound of claim 14, wherein L2 is selected from the group consisting of:
18. The compound of claim 10, wherein the compound is selected from the group consisting of:
19. The compound of claim 1, wherein R1 comprises a 5-membered or 6-membered carbocyclic or heterocyclic aromatic ring; and
wherein R1 is coordinated to the metal M.
20. The compound of claim 1, wherein R2 comprises a 5-membered or 6-membered carbocyclic or heterocyclic aromatic ring; and
wherein R2 is coordinated to the metal M.
21. The compound of claim 19, wherein R1 comprises at least one of the chemical groups selected from the group consisting of:
22. The compound of claim 20, wherein R2 comprises at least one of the chemical groups selected from the group consisting of:
23. A first device comprising a first organic light emitting device, further comprising:
an anode;
a cathode; and
an organic layer, disposed between the anode and the cathode, comprising a compound comprising a ligand L1;
wherein L1 comprises the following formula:
wherein E1 is N;
wherein E2 is B;
wherein R3 and R4 represent mono, di, tri, tetra substitutions or no substitution;
wherein R1, R2, R3 and R4 are each independently selected from the group consisting of hydrogen, deuterium, halide, alkyl, cycloalkyl, heteroalkyl, arylalkyl, alkoxy, aryloxy, amino, silyl, alkenyl, cycloalkenyl, heteroalkenyl, alkynyl, aryl, heteroaryl, acyl, carbonyl, carboxylic acids, ester, nitrile, isonitrile, sulfanyl, sulfinyl, sulfonyl, phosphino, and combinations thereof;
wherein any two adjacent R1, R2, R3, and R4 are optionally joined to form a ring, which may be further substituted;
wherein (i) at least one R1, R2, R3, or R4 is a 5-or 6-membered heteroaryl ring A containing a nitrogen, (ii) at least one pair of adjacent substituents R1, R2, R3, and R4 form a fused ring B that includes E1 or E2, or (iii) both (i) and (ii);
wherein ring A, ring B, or both ring A and ring B are coordinated to metal M;
wherein ring A and ring B can be further substituted;
wherein L1 is coordinated to a metal M having an atomic weight higher than 40, provided that the metal M does not form bond with E1 and E2; and
wherein L1 may be linked with other ligands to comprise a bidentate, tridentate, tetradentate, pentadentate or hexadentate ligand.
24. The first device of claim 23, wherein the first device is a consumer product.
25. The first device of claim 23, wherein the first device is an organic light-emitting device.
26. The first device of claim 23, wherein the first device comprises a lighting panel.
27. The first device of claim 23, wherein the organic layer is an emissive layer and the compound is an emissive dopant.
28. The first device of claim 23, wherein the organic layer is an emissive layer and the compound is a non-emissive dopant.
29. The first device of claim 23, wherein the organic layer further comprises a host.
30. The first device of claim 29, wherein the host comprises a triphenylene containing benzo-fused thiophene or benzo-fused furan;
wherein any substituent in the host is an unfused substituent independently selected from the group consisting of Cn, H2n+1, OCnH2n+1, OAr1, N(CnH2n+1)2, N(Ar1)(Ar2), CH\u2550CH\u2014CnH2n+1, C\u2261C\u2014CnH2n+1, Ar1, Ar1\u2014Ar2, CnH2n\u2014Ar1, or no substitution;
wherein n is from 1 to 10; and
wherein Ar1 and Ar2 are independently selected from the group consisting of benzene, biphenyl, naphthalene, triphenylene, carbazole, and heteroaromatic analogs thereof.
31. The first device of claim 29, wherein the host comprises at least one of the chemical groups selected from the group consisting of carbazole, dibenzothiphene, dibenzofuran, dibenzoselenophene, azacarbazole, aza-dibenzothiophene, aza-dibenzofuran, and aza-dibenzoselenophene.
32. The first device of claim 29, wherein the host is selected from the group consisting of:
and combinations thereof.
33. The first device of claim 29, wherein the host comprises a metal complex.
34. A formulation comprising a compound according to claim 1.

1. An ionization gauge comprising:
an electron source that generates electrons;
a collector electrode disposed in an ionization volume, the collector electrode configured to collect ions formed by the impact between the electrons and gas molecules; and
an electrostatic shutter configured to control the flow of electrons between the electron source and the ionization volume.
2. The ionization gauge according to claim 1 wherein the electron source is a cold cathode gauge.
3. The ionization gauge according to claim 1 wherein the electrostatic shutter is configured to control the flow of electrons based on the number of electrons in the ionization volume.
4. The ionization gauge according to claim 1 further comprising an anode defining the ionization volume.
5. The ionization gauge according to claim 4 wherein the electrostatic shutter is configured to control the flow of electrons based on the electron current generated in the anode.
6. The ionization gauge according to claim 5 wherein the electron current generated in the anode is measured by an ammeter.
7. A method of measuring a gas pressure from gas molecules and atoms, comprising:
generating electrons in an electron source;
regulating the flow of electrons between the electron source and an ionization volume; and
collecting ions formed by an impact between the electrons and the gas molecules and atoms in the ionization volume.
8. The method according to claim 3 wherein the electron source is a cold cathode gauge.
9. An ionization gauge comprising:
an electron source that generates electrons;
a first collector electrode, and a second collector electrode with both being disposed in an ionization volume, the first and second collector electrodes configured to collect ions formed by the impact between the electrons and gas molecules; and
an electrostatic shutter configured to control the flow of electrons between the electron source and the ionization volume.
10. The ionization gauge according to claim 9 wherein the electrostatic shutter is configured to control the flow of electrons based on the number of electrons in the ionization volume.
11. The ionization gauge according to claim 9 further comprising an anode defining the ionization volume.
12. The ionization gauge according to claim 11 wherein the electrostatic shutter is configured to control the flow of electrons based on the electron current generated in the anode.
13. The ionization gauge according to claim 11 wherein the electron current generated in the anode is measured by an ammeter.
14. The ionization gauge according to claim 9 wherein the electrostatic shutter is pulsed to control the flow of electrons between the electron source and the ionization volume.
15. The method according to claim 7, further comprising regulating the flow of electrons between the electron source and the ionization volume by filtering the flow to limit the flow to a predetermined energy range between the source and the ionization volume.
16. The method according to claim 15, further comprising filtering the flow by electrostatic filtering.
17. The method according to claim 15, further comprising filtering the flow by modulating a geometry of the ionization gauge.
18. The method according to claim 7, further comprising regulating the flow of electrons between the electron source and the ionization volume by modulating a voltage of the electron source in response to pressure.
19. The method according to claim 7, further comprising regulating the flow of electrons between the electron source and the ionization volume by modulating an ionization gauge geometry to produce an electron current in response to a pressure.
20. An ionization gauge comprising:
an electron source that generates electrons;
a collector electrode disposed in an ionization volume, the collector electrode configured to collect ions formed by the impact between the electrons, and gas molecules;
an electrostatic shutter configured to control the flow of electrons between the electron source, and the ionization volume; and
an envelope surrounding the electron source, the electrostatic shutter and the envelope permitting electrons from a predetermined electric potential to enter into the ionization volume.
21. The ionization gauge of claim 20, wherein the electron source has an anode connected to ground, and wherein the envelope is connected to a negatively charged voltage potential to permit electrons located near the anode of the electron source to enter the ionization volume.
22. The ionization gauge of claim 20, wherein the electron source is a cold cathode ionization source, and wherein the cold cathode source includes an anode connected to an anode voltage source, and wherein the envelope is grounded allowing electrons located near the envelope to enter the ionization volume.
23. The ionization gauge of claim 22, further comprising an annular ring of electrostatic shutters being located at substantially a periphery of the envelope.
24. A method of measuring a gas pressure from gas and atoms comprising:
generating electrons from a source;
regulating the flow of electrons from the source to the ionization volume;
controlling the electron energy from the electron source; and
collecting ions formed by an impact between the electrons and gas molecules, and atoms in the ionization volume.
25. The method of claim 24, further comprising controlling the electron energy from the electron source by operating an anode of the electron source at a ground potential, and operating an envelope that surrounds the anode of the electron source at a predetermined negative voltage potential.
26. The method of claim 24, further comprising controlling the electron energy from the electron source by operating an anode of the electron source at a predetermined voltage potential, and operating an envelope that surrounds the anode at a ground potential.
27. The ionization gauge according to claim 1 wherein the electrostatic shutter is pulsed to control the flow of electrons between the electron source and the ionization volume.

The claims below are in addition to those above.
All refrences to claim(s) which appear below refer to the numbering after this setence.

1. A surface modification process for an immersion photoresist comprising:
a) coating a photoresist layer onto a substrate;
b) applying a topcoat layer onto the photoresist layer: and
c)applying a fluorinated polymer onto the topcoat layer on the photoresist layer.
2. The surface modification process of claim 1 wherein the deposited fluorinated polymer is selected from the group consisting of homopolymers or copolymers of poly(fluoroacrylates), poly(fluoromethacrylates), poly(fluorodioxolanes), poly(tetrafluoroethylenes), poly(tetrafluoroethylene oxides), and poly(difluoromethylene oxides) and combinations thereof.
3. The surface modification process of claim 1 wherein the fluorinated polymer is a composition comprised of a fluorinated resin and a fluorinated solvent.
4. The surface modification process of claim 3 wherein the fluorinated resin is selected from the group consisting of homopolymers or copolymers of poly(fluoroacrylates), poly(fluoromethacrylates), poly(fluorodioxolanes), poly(tetrafluoroethylenes), poly(tetrafluoroethylene oxides), and poly(difluoromethylene oxides), and combinations thereof.
5. The surface modification process of claim 3 wherein the fluorinated solvent is selected from the group consisting of perfluorotributylamine, perfluoro-2-butyltetrahydrofuran, mixtures of perfluorohydrocarbons and combinations thereof.
6. The surface modification process of claim 2 wherein the fluorinated polymer is (Poly(1,1,2 4,4,5,5,6,7,7-decafluoro-3-oxa-1,6-heptadiene).
7. The surface modification process of claim 1 further comprising the step of diluting the fluorinated polymer before deposition.
8. The surface modification process of claim 7 wherein the fluorinated polymer is diluted with a fluorinated organic solvent.
9. The surface modification process of claim 8 wherein the fluorinated organic solvent is selected from the group consisting of perfluorotributylamine, perfluoro-2-butyltetrahydrofuran, mixtures of perfluorohydrocarbons and combinations thereof.
10. The surface modification process of claim 8 wherein the fluorinated organic solvent is perfluoro-2-butyltetrahydrofuran.
11. The surface modification process of claim 8 wherein the fluorinated organic solvent is perfluorotributylamine.
12. The surface modification process of claim 1 wherein the fluorinated polymer layer is less than about 5 nm.
13. (canceled)
14. A radiation-sensitive multi-layer structure comprising:
a) a substrate;
b) a photoresist layer on top of the substrate;
c) a topcoat layer on top of the photoresist layer; and
d) a fluorinated polymer layer on top of the topcoat layer.
15. The radiation-sensitive multi-layer structure of claim 14 wherein the fluorinated polymer layer is a fluorinated polymer composition and a diluter.
16. The radiation-sensitive multi-layer structure of claim 15 wherein the fluorinated polymer composition is selected from the group consisting of homopolymers or copolymers of poly(fluoroacrylates), poly(fluoromethacrylates), poly(fluorodioxolanes), poly(tetrafluoroethylenes), poly(tetrafluoroethylene oxides), and poly(difluoromethylene oxides) and combinations thereof.
17. The radiation-sensitive multi-layer structure of claim 15 wherein the fluorinated polymer composition is comprised of a fluorinated resin and a fluorinated solvent.
18. The radiation-sensitive multi-layer structure of claim 17 wherein the fluorinated resin is selected from the group consisting of homopolymers or copolymers of poly(fluoroacrylates), poly(fluoromethacrylates), poly(fluorodioxolanes), poly(tetrafluoroethylenes), poly(tetrafluoroethylene oxides), and poly(difluoromethylene oxides), and combinations thereof.
19. The radiation-sensitive multi-layer structure of claim 17 wherein the fluorinated solvent is selected from the group consisting of perfluorotributylamine, perfluoro-2-butyltetrahydrofuran mixtures of perfluorohydrocarbons and combinations thereof.
20. The radiation-sensitive multi-layer structure of claim 15 wherein the diluter is selected from the group consisting of perfluorotributylamine, perfluoro-2-butyltetrahydrofuran, mixtures of perfluorohydrocarbons and combinations thereof.
21. The radiation-sensitive multi-layer structure of claim 14 wherein the fluorinated layer is (Poly(1,1,2,4,4,5,5,6,7,7-decafluoro-3-oxa-1,6-heptadiene) and perfluorotributylamine.
22. The radiation-sensitive multi-layer structure of claim 14 wherein the fluorinated layer is less than about 5 nm.
23. A process for tuning a contact angle of a photoresist layer comprising:
a) providing a substrate;
b) applying a photoresist layer onto the substrate;
c) applying a topcoat layer onto the photoresist layer; and
d) applying a fluorinated polymer onto the topcoat layer on the photoresist layer in order to tune the contact angle of the top surface of the photoresist layer.
24. The tuning process of claim 23 wherein the contact angle is from about 60 to about 120 degrees.
25. The tuning process of claim 23 wherein the fluorinated polymer layer is less than about 5 nm.
26. The tuning process of claim 23 wherein the fluorinated polymer is selected from the group consisting of homopolymers or copolymers of poly(fluoroacrylates), poly(fluoromethacrylates), poly(fluorodioxolanes), poly(tetrafluoroethylenes), poly(tetrafluoroethylene oxides), poly(difluoromethylene oxides), and combinations thereof.
27. The tuning process of claim 23 wherein the fluorinated polymer is comprised of a fluorinated resin and a fluorinated solvent.
28. The tuning process of claim 27 wherein the fluorinated resin is selected from the group consisting of homopolymers or copolymers of poly(fluoroacrylates), poly(fluoromethacrylates), poly(fluorodioxolanes), poly(tetrafluoroethylenes), poly(tetrafluoroethylene oxides), poly(difluoromethylene oxides) and combinations thereof.
29. The tuning process of claim 27 wherein the fluorinated solvent is selected from the group consisting of perfluorotributylamine, perfluoro-2-butyltetrahydrofuran mixtures of perfluorohydrocarbons, and combinations thereof.
30. The tuning process of claim 23 further comprising the step of diluting the fluorinated polymer before application.
31. The tuning process of claim 30 wherein the diluter is selected from the group consisting of perfluorotributylamine, perfluoro-2-butyltetrahydrofuran, mixtures of perfluorohydrocarbons, and combinations thereof.
32. The tuning process of claim 30 wherein the diluter is perfluorotributylamine.
33. The tuning process of claim 30 wherein the diluter is perfluoro-2-butyltetrahydrofuran.
34. (canceled)
35. A process for manufacturing a radiation-sensitive multi-layer structure comprising:
a) providing a substrate;
b) applying a photoresist layer;
c) baking the photoresist layer;
d) optionally applying a topcoat layer and baking the topcoat layer;
e) applying a fluorinated polymer layer;
f) exposing the fluorinated layer to radiation;
g) baking the radiation-sensitive multi-layer structure;
h) developing the radiation-sensitive multi-layer structure; and
i) rinsing the radiation-sensitive multi-layer structure.