Author: claimsbot

1. A method for controlling rippling caused by optical proximity correction during an optical lithography process used in manufacturing an integrated circuit, comprising:
selecting a first evaluation point for a given segment that is part of an edge in a layout of the integrated circuit;
selecting a second evaluation point for the given segment;
computing a first deviation from a target location for the given segment at the first evaluation point;
computing a second deviation for the given segment at the second evaluation point; and
controlling rippling for the given segment, if necessary, based upon a measurement of rippling computed from multiple deviations at multiple evaluation points, including the first deviation at the first evaluation point and the second deviation at the second evaluation point, wherein controlling rippling involves breaking the given segments into multiple segments in order to control ripple.
2. The method of claim 1, wherein the second evaluation point is a supplemental evaluation point.
3. The method of claim 1, wherein both the first evaluation point and the second evaluation point are located on the given segment.
4. The method of claim 1, wherein the first evaluation point is located on the given segment and the second evaluation point is located on an adjacent segment.
5. The method of claim 1, further comprising adjusting the bias, if necessary, for each segment that is part of the layout of the integrated circuit.
6. The method of claim 1, further comprising:
selecting a third evaluation point for the given segment; and
computing a third deviation for the given segment at the third evaluation point;
wherein adjusting the bias for the given segment involves considering the third deviation at the third evaluation point.
7. The method of claim 1, wherein computing the first deviation involves using a model-based technique for computing the first deviation.
8. A computer-readable storage medium storing instructions that when executed by a computer cause the computer to perform a method for controlling rippling caused by optical proximity correction during an optical lithography process used in manufacturing an integrated circuit, the method comprising:
selecting a first evaluation point for a given segment that is part of an edge in a layout of the integrated circuit;
selecting a second evaluation point for the given segment;
computing a first deviation from a target location for the given segment at the first evaluation point;
computing a second deviation for the given segment at the second evaluation point; and
controlling rippling for the given segment, if necessary, based upon a measurement of rippling computed from multiple deviations at multiple evaluation points, including the first deviation at the first evaluation point and the second deviation at the second evaluation point, wherein controlling rippling involves breaking the given segments into multiple segments in order to control ripple.
9. The computer-readable storage medium of claim 8, wherein the second evaluation point is a supplemental evaluation point.
10. The computer-readable storage medium of claim 8, wherein both the first evaluation point and the second evaluation point are located on the given segment.
11. The computer-readable storage medium of claim 8, wherein the first evaluation point is located on the given segment and the second evaluation point is located on an adjacent segment.
12. The computer-readable storage medium of claim 8, wherein the method further comprises adjusting the bias, if necessary, for each segment that is part of the layout of the integrated circuit.
13. The computer-readable storage medium of claim 8, wherein the method further comprises:
selecting a third evaluation point for the given segment; and
computing a third deviation for the given segment at the third evaluation point;
wherein adjusting the bias for the given segment involves considering the third deviation at the third evaluation point.
14. The computer-readable storage medium of claim 8, wherein computing the first deviation involves using a model-based technique for computing the first deviation.
15. An apparatus for controlling rippling caused by optical proximity correction during an optical lithography process used in manufacturing an integrated circuit, comprising:
a selection mechanism that is configured to,
select a first evaluation point for a given segment that is part of an edge in a layout of the integrated circuit, and to
select a second, evaluation point for the given segment;

a deviation computing mechanism that is configured to,
compute a first deviation from a target location for the given segment at the first evaluation point, and to
compute a second deviation for the given segment at the second evaluation point; and

a ripple controlling mechanism that is configured to control ripple for the given segment, if necessary, based upon a measurement of rippling computed from multiple deviations at multiple evaluation points, including the first deviation at the first evaluation point and the second deviation at the second evaluation point, wherein controlling rippling involves breaking the given segments into multiple segments in order to control ripple.
16. The apparatus of claim 15, wherein the second evaluation point is a supplemental evaluation point.
17. The apparatus of claim 15, wherein both the first evaluation point and the second evaluation point are located on the given segment.
18. The apparatus of claim 15, wherein the first evaluation point is located on the given segment and the second evaluation point is located on an adjacent segment.
19. The apparatus of claim 15, wherein the bias adjustment mechanism is configured to adjust the bias, if necessary, for each segment that is part of the layout of the integrated circuit.
20. The apparatus of claim 15,
wherein the selection mechanism is additionally configured to select a third evaluation point for the given segment; and
wherein the deviation computing mechanism is additionally configured to compute a third deviation for the given segment at the third evaluation point;
wherein the bias adjustment mechanism is configured to consider the third deviation at the third evaluation point in adjusting the bias for the given segment involves.
21. The apparatus of claim 15, wherein the deviation computing mechanism is configured to compute use a model-based technique in computing the first deviation.
22. A mask to be used in an optical lithography process for manufacturing an integrated circuit, wherein the mask is created through a process that controls rippling caused by optical proximity correction, the process comprising:
selecting a first evaluation point for a given segment that is part of an edge in a layout of the integrated circuit;
selecting a second evaluation point for the given segment;
computing a first deviation from a target location for the given segment at the first evaluation point;
computing a second deviation for the given segment at the second evaluation point; and
controlling rippling for the given segment, if necessary, based upon a measurement of rippling computed from multiple deviations at multiple evaluation points, including the first deviation at the first evaluation point and the second deviation at the second evaluation point, wherein controlling rippling involves breaking the given segments into multiple segments in order to control ripple.
23. An integrated circuit created through an optical lithography process using a mask, wherein the mask is created through a process that controls rippling caused by optical proximity correction, the process comprising:
selecting a first evaluation point for a given segment that is part of an edge in a layout of the integrated circuit;
selecting a second evaluation point for the given segment;
computing a first deviation from a target location for the given segment at the first evaluation point;
computing a second deviation for the given segment at the second evaluation point; and
controlling rippling for the given segment, if necessary, based upon a measurement of rippling computed from multiple deviations at multiple evaluation points, including the first deviation at the first evaluation point and the second deviation at the second evaluation point, wherein controlling rippling involves breaking the given segments into multiple segments in order to control ripple.
24. A means for controlling rippling caused by optical proximity correction during an optical lithography process used in manufacturing an integrated circuit, comprising:
a selection means for,
selecting a first evaluation point for a given segment that is part of an edge in a layout of the integrated circuit, and for
selecting a second evaluation point for the given segment;

a deviation computing means for,
computing a first deviation from a target location for the given segment at the first evaluation point, and for
computing a second deviation for the given segment at the second evaluation point; and

a ripple controlling means for controlling ripple for the given segment, if necessary, based upon a measurement of rippling computed from multiple deviations at multiple evaluation points, including the first deviation at the first evaluation point and the second deviation at the second evaluation point, wherein controlling rippling involves breaking the given segments into multiple segments in order to control ripple.

The claims below are in addition to those above.
All refrences to claim(s) which appear below refer to the numbering after this setence.

1. A synchronous sequential access latch array generated by an automated system for generating master-slave latch structures, said latch array comprising:
N2 rows of master-slave pairs wherein N is equal to the number of addresses that are included in said latch array;
an N2 to 1 multiplexer coupled to said N2 rows of master-slave pairs; and
control logic.
2. The latch array of claim 1 wherein said automated system is a logic gate synthesis system that automatically generates master-slave latch structures.
3. The latch array of claim 2 wherein said logic gate synthesis system is invoked from a logic gate synthesis system that generates FIFO structures based on configuration parameter settings.
4. The latch array of claim 1 wherein said control logic is configured to implement data flow to fill latch pairs of respective rows in sequence from row 1 to row N.
5. The latch array of claim 1 wherein said control logic is configured to implement data flow to fill the master latch of respective rows in sequence from row 1 to row N.
6. The latch array of claim 1 wherein said control logic is operable wherein data received by said latch array flows from a master latch in a first half of a clock cycle to a slave latch in a second half of a subsequent clock cycle.
7. The latch array of claim 1 wherein master and slave latches of said latch array comprise random access memory (RAM) addresses.
8. The latch array of claim 1 wherein master and slave latches of said latch array are separately enabled.
9. The latch array of claim 1 providing fully-registered flow control.
10. The latch array of claim 1 being a flow control component of a graphics processing unit (GPU).
11. A method of operating a sequential access memory comprising a master-slave latch pair array, the method comprising:
in a second half of a clock cycle, receiving data into an empty and open master latch in a first row of said master-slave latch pair array, if master-slave latch pairs of other rows are empty or if master-slave latch pairs of other rows are full,
or receiving data into an empty master latch of a subsequent row of said master-slave latch pair array if a master latch and a slave latch of a row or rows preceding said subsequent row are full;
in a first half of a cycle subsequent to a clock cycle in which data is received by a master latch in a row of said master-slave latch pair array, receiving data into a slave latch of said row of said master-slave latch pair array; and
providing access to said data received by said slave latch of said row of said master-slave latch pair array.
12. The method of claim 11 wherein slave latches of said sequential access memory are maintained open and data received by said slave latches flow from master latches of said sequential access memory into said slave latches uninhibited.
13. The method of claim 11 wherein said sequential access memory has N2 rows where N is equal to the number of addresses in said sequential access memory.
14. The method of claim 11 wherein said providing access to said data comprises using an N2:1 multiplexor.
15. The method of claim 11 wherein said sequential access memory provides fully registered flow control.
16. The method of claim 11 wherein said sequential access memory is a FIFO buffer.
17. The method of claim 11 wherein said sequential access memory is a part of a GPU.
18. A method of operating a sequential access memory comprising a master-slave latch pair array, the method comprising:
receiving data into respective master latches in a second half of first respective clock cycles, wherein data that is received in said second half of said first respective clock cycles is allowed to flow uninhibited from respective master latches to respective corresponding slave latches;
receiving data into respective master latches in a second half of second respective clock cycles; and
providing access to data in said respective corresponding slave latches.
19. The method of claim 18 wherein said sequential access memory has N2 rows where N is equal to the number of latches in said sequential access memory.
20. The method of claim 18 said providing access to said data comprises using an N2:1 multiplexor.

1. A method for making a fibrous layer, comprising:
refining cellulosic fibers to provide refined fibers, wherein the cellulosic fibers comprise crosslinked cellulosic fibers;
combining the refined fibers with a dispersion medium to provide a fibrous slurry;
depositing the fibrous slurry on a foraminous support to provide a wet composite;
introducing an adsorbent material into said wet composite at a plurality of points, said absorbent material having an absorbent capacity greater than the refined cellulosic fibers; and
drying the wet composite to provide a fibrous layer.
2. The method of claim 1, wherein the cellulosic fibers comprise a blend of crosslinked cellulosic fibers and noncrosslinked cellulosic fibers.
3. The method of claim 2, wherein the noncrosslinked fibers are at least one of softwood fibers or hardwood fibers.
4. The method of claim 2, wherein the noncrosslinked fibers comprise southern pine fibers.
5. The method of claim 1, wherein the cellulosic fibers comprise a blend of crosslinked cellulosic fibers and southern pine fibers.
6. The method of claim 1, wherein the cellulosic fibers comprise a refined blend of said crosslinked cellulosic fibers and southern pine fibers.
7. The method of claim 1, wherein the cellulosic fibers comprise a blend of crosslinked cellulosic fibers and refined southern pine fibers.
8. The method of claim 1, wherein the cellulosic fibers comprise a refined blend of crosslinked cellulosic fibers and refined southern pine fibers.
9. The method of claim 1, wherein the method is carried out on at least one of a Fourdrinier or a twin-wire papermaking machine.
10. The method of claim 1, wherein the method is at least one of a wetlaid method and a foam-forming method.
11. A method for making a fibrous layer, comprising:
refining cellulosic fibers to provide refined fibers, wherein the cellulosic fibers comprise
combining the refined fibers with a dispersion medium to provide a fibrous slurry;
moving a first foraminous element in a first path;
moving a second foraminous element in a second path;
passing a first portion of the fibrous slurry into contact with the first foraminous element;
passing a second portion of the fibrous slurry into contact with the second foraminous element;
forming a fibrous web from the slurry by withdrawing liquid from the slurry through the first and second foraminous elements;
introducing and absorbent material into said fibrous web at a plurality of points, said absorbent material having an absorbant capacity greater than the refined cellulosic fibers; and
drying the web provide a fibrous layer.
12. The method of claim 11, wherein the cellulosic fibers comprise a blend of crosslinked cellulosic fibers and noncrosslinked cellulosic fibers.
13. The method of claim 12, wherein the noncrosslinked fibers are at least one of softwood fibers or hardwood fibers.
14. The method of claim 12, wherein the noncrosslinked fibers comprise southern pine fibers.
15. The method of claim 11, wherein the cellulosic fibers comprise a blend of crosslinked cellulosic fibers and southern pine fibers.
16. The method of claim 11, wherein the cellulosic fibers comprise a refined blend of said crosslinked cellulosic fibers and southern pine fibers.
17. The method of claim 11, wherein the cellulosic fibers comprise a blend of crosslinked cellulosic fibers and refined southern pine fibers.
18. The method of claim 11, wherein the cellulosic fibers comprise a refined blend of crosslinked cellulosic fibers and refined southern pine fibers.
19. The method of claim 11, wherein the method is at least one of a wetlaid method or a foam-forming method.

The claims below are in addition to those above.
All refrences to claim(s) which appear below refer to the numbering after this setence.

What is claimed is:

1. An optical head, comprising:
a transparent condensing medium which has a condensed surface and condenses the laser beam to form a beam spot on the condensed surface;
a shade provided on the transparent condensing medium and having an aperture at a position where the beam spot is formed, the area of the aperture being smaller than the size of the beam spot; and
a micro metal member at least part of which is positioned in the aperture.
2. The optical head according to claim 1, wherein the shape of the aperture is round or rectangular.
3. The optical head according to claim 1, wherein the shape of the micro metal member is round or rectangular.
4. The optical head according to claim 1, wherein the micro metal member is thinner than the thickness of the shade.
5. The optical head according to claim 1, wherein the shade has an tilted surface, in an edge of the aperture, which reflects the laser beam forming the light spot toward the aperture.
6. The optical head according to claim 1, wherein the transparent condensing medium has a convex part in a periphery of the micro metal member, and the convex part has an tilted surface that reflects toward the aperture the laser beam forming the light spot.
7. The optical head according to claim 1, wherein bottom surfaces of the shade and the micro metal member are flat with a surrounding surface of the transparent condensing medium.
8. The optical head according to claim 1, wherein the micro metal member is protruded from the light-condensed surface of the transparent condensing medium.
9. The optical head according to claim 1, wherein the optical head comprises a plurality of the micro metal members, and at least a pair of the micro metal members face each other with a gap positioned in the aperture therebetween.
10. The optical head according to claim 1, wherein the shade is made of metal and the micro metal member is connected to the shade.
11. An optical head, comprising:
a transparent condensing medium which has a condensed surface and condenses the laser beam to form a beam spot on the condensed surface;
a shade provided on the transparent condensing medium and having an aperture at a position where the beam spot is formed, the area of the aperture being smaller than the size of the beam spot; and
a micro metal member at least a part of which is positioned in the aperture, wherein the metal shade and the micro metal member have the thickness of one-half or larger of a wavelength of the laser beam in the transparent condensing medium.
12. The optical head according to claim 11, wherein the transparent condensing medium surrounds a periphery of the micro metal member, and provides a convex part positioned in the aperture.
13. The optical head according to claim 11, wherein the metal shade has an tilted surface in an edge of the aperture, and the tilted surface reflects the laser beam forming the light spot toward the micro metal member.
14. The optical head according to claim 11, wherein the micro metal member has an tilted surface in its periphery, and the tilted surface reflects the laser beam forming the light spot toward the aperture.
15. The optical head according to claim 11, wherein the metal shade and the micro metal member constitute one of mirrors of an optical resonator of a laser emitting the laser beam forming the light spot.
16. A magneto-optical head comprising:
a transparent condensing medium which has a condensed surface and condenses the laser beam to form a beam spot on the condensed surface;
a shade provided on the transparent condensing medium and having an aperture at a position where the beam spot is formed, the area of the aperture being smaller than the size of the beam spot; and
a micro metal member at least a part of which is positioned in the aperture; and
a magneto-resistive sensor having a detecting part on a plane being flat with a bottom surface of the micro metal member.
17. The magneto-optical head according to claim 16,
wherein the shade comprises a metal film,
the shade and the micro metal member have the thickness of one-half or larger of a wavelength of the laser beam in the transparent condensing medium, and
the micro metal member has the size lager than the light spot.
18. A disk apparatus comprising:
a disk having a recording medium formed on its surface;
a laser emitting a laser beam;
an optical system having a transparent condensing medium which has a condensed surface and condenses the laser beam to form a beam spot on the condensed surface;
a shade provided on the transparent condensing medium and having an aperture at a position where the beam spot is formed, the area of the aperture being smaller than the size of the beam spot;
a micro metal member at least part of which is positioned in the aperture; and
a shifting mechanism that shifts a light emitted from the aperture relative to the recording medium.
19. A disk apparatus, comprising:
a disk having a recording medium formed on its surface;
a laser emitting a laser beam;
an optical system having a transparent condensing medium which has a condensed surface and condenses the laser beam to form a beam spot on the condensed surface;
a shade provided on the transparent condensing medium and having an aperture at a position where the beam spot is formed, the area of the aperture being smaller than the size of the beam spot; and
a micro metal member at least part of which is positioned in the aperture; and
a shifting mechanism that shifts a light emitted from the aperture relative to the recording medium,
wherein the metal shade and the micro metal member have the thickness of one-half or larger of a wavelength of the laser beam in the transparent condensing medium.
20. The disk apparatus according to claim 19,
wherein the micro metal member has a narrow shape such as rectangular or elliptical, and
the shifting mechanism performs tracking of the emitting-light from the aperture to a direction which is orthogonal to the major axis of the micro metal member.
21. The disk apparatus according to claim 19,
wherein the transparent condensing medium is scanned in a direction orthogonal to a track by piezoelectric elements provided in both sides of the transparent condensing medium for tracking the emitting-light from the aperture.
22. A manufacturing method of an optical head, comprising the steps of:
preparing a transparent condensing medium having a light-condensed surface where a light spot is formed by an incident laser beam;
covering with photoresist a doughnut-shaped area having a size smaller than that of the light spot in a bottom surface of the transparent condensing medium;
forming a concave part whose bottom surface is the light-condensed surface by removing an area, where the photoresist is not present, on the bottom surface of the transparent condensing medium in a predetermined depth which is equal to or smaller than a wavelength of the laser beam by etching; and
forming a metal body having the doughnut-shaped aperture by depositing a metal material in the concave part.
23. The manufacturing method of an optical head according to claim 22, further comprising the step of forming a micro metal member by depositing a metal material in a central part of the aperture of the metal body by a focused ion beam method.