What is claimed is:
1. A magnetic head suspension comprising:
an insulating base;
a wiring provided on one surface of the insulating base, including a conductive metal layer;
an elastic metal plate provided on the other surface of the insulating base; and
a wiring protecting layer covering the wiring;
wherein the wiring protecting layer is formed by subjecting a photosensitive resin film to exposure and developing processes.
2. The magnetic head suspension according to claim 1, wherein
the photosensitive resin film is a dry film containing an epoxy resin, an acrylic resin and a polymer containing aromatic rings.
3. The magnetic head suspension according to claim 1, wherein
the wiring protecting layer protects the wiring with a part of the wiring being exposed outside.
4. The magnetic head suspension according to claim 3, wherein
the exposed part of the wiring is cleaned by plasma cleaning.
5. A magnetic head suspension fabricating method comprising the steps of:
preparing an insulating base;
forming wiring including a conductive metal layer on one surface of the insulating base;
providing an elastic metal plate to the other surface of the insulating base; and
forming a wiring protecting layer over the wiring so that a part of the wiring is exposed outside.
6. The magnetic head suspension fabricating method according to claim 5, wherein
the wiring protecting layer is formed by forming a film of a photosensitive resin containing an epoxy resin, an acrylic resin and a polymer containing aromatic rings, and subjecting the film of the photosensitive resin to exposing and developing processes.
7. The magnetic head suspension fabricating method according to claim 5 further comprising:
the step of cleaning the exposed part of the wiring by a plasma cleaning process.
8. The magnetic head suspension fabricating method according to claim 7, wherein
time of the plasma cleaning process is in the range of 0.1 s to 30 min.
9. The magnetic head suspension fabricating method according to claim 7, wherein
the plasma cleaning process is performed under a negative pressure.
10. The magnetic head suspension fabricating method according to claim 7, wherein
the plasma cleaning process is performed under a normal pressure.
11. The magnetic head suspension fabricating method according to claim 7, wherein
the plasma cleaning process uses one of or a mixture of some of perfluorocarbon gas, an inorganic halogen gas, a rare gas, a hydrocarbon gas and oxygen gas.
12. The magnetic head suspension fabricating method according to claim 7, wherein
the plasma cleaning process is performed with component members of the magnetic head suspension excluding the exposed part of the wiring being covered.
The claims below are in addition to those above.
All refrences to claim(s) which appear below refer to the numbering after this setence.
1. An apparatus for water descaling, said apparatus comprising:
e. at least one inlet for introducing hard water stream containing soluble salts in the apparatus;
f. a hydrodynamic cavitation reactor communicating with said at least one inlet, said cavitation reactor comprising a cavitator;
g. at least one infrared radiation emitter, said emitter placed in a location selected from the group consisting of, inside the cavitation reactor and outside the cavitation reactor; and
h. a filter assembly fitted downstream of the emitter.
2. The apparatus as claimed in claim 1, wherein the cavitator is at least one selected from the group consisting of an orifice plate, venturi and a rotating cavitator.
3. The apparatus as claimed in claim 1, wherein the cavitator is at least one venturi configured within the cavitation reactor.
4. The apparatus as claimed in claim 1, wherein the cavitator is at least one orifice plate.
5. The apparatus as claimed in claim 1, wherein the orifice plate is a multihole orifice plate.
6. The apparatus as claimed in claim 1, wherein the cavitator is a combination of at least one venturi configured within the cavitation reactor and at least one multihole orifice plate arranged in series with the configured venturi.
7. The apparatus as claimed in claim 1, wherein the emitter is placed inside the cavitation reactor on the cavitating side of the cavitator.
8. The apparatus as claimed in claim 1, wherein the emitter is placed outside the cavitation reactor in a chamber arranged downstream to the cavitation reactor.
9. The apparatus as claimed in claim 1, wherein the emitter is a medium pressure ultraviolet lamp emitting ultra violet and infrared radiations.
10. The apparatus as claimed in claim 1, wherein the emitter is at least one selected from the group consisting of a spiral array of IR light emitting diodes (LEDs), radial array of IR LEDs and axial array of IR LEDs.
11. The apparatus as claimed in any one of the preceding claims, wherein the array of IR LED s is arranged on the cavitating side of the multihole orifice plate.
12. The apparatus as claimed in any one of the preceding claim, wherein the emitter is placed between consecutive multihole orifice plates.
13. The apparatus as claimed in claim 1, wherein the IR LEDs are of multiple mono wavelengths, each specific to maximum CO2 absorption and maximum water absorption.
14. The apparatus as claimed in claim 1, wherein the cavitation reactor has at least one reflector coating to reflect infrared radiation from the emitter.
15. The apparatus as claimed in claim 14, wherein the reflector coating is a vacuum deposition of a metal selected from the group consisting of gold, aluminium and silver.
16. The apparatus as claimed in claim 1, wherein the cavitation reactor further comprises at least one gas or steam inlet, for injecting air or gas or steam bubbles in the cavitation reactor for varying the intensity of cavitation.
17. The apparatus as claimed in claim 1, wherein the apparatus further includes a degassifier placed between emitter and the filter assembly.
18. A process for descaling hard water containing soluble salts, said process comprising passing hard water containing soluble salts through the apparatus of claim 1.