1460746810-eb73002f-be2a-4217-8521-6ef5a3fe19ab

What is claimed is:

1. A positive photosensitive composition comprising (A) an acid generator, which generates an acid upon irradiation with actinic ray or radiation, represented by formula (I) shown below, and (B) a resin having a monocyclic or polycyclic alicyclic hydrocarbon structure and being decomposed by the action of an acid to increase dissolution speed in an alkali developer.
110
wherein R1 to R5, which may be the same or different, each represent a hydrogen atom, a nitro group, a halogen atom, or an unsubstituted or substituted alkyl, alkoxy, alkyloxycarbonyl, aryl or acylamino group, or at least two of R1 to R5 may combine with each other to form a cyclic structure; R6 and R7, which may be the same or different, each represent a hydrogen atom, a cyano group, or an unsubstituted or substituted alkyl or aryl group; Y1 and Y2, which may be the same or different, each represent an unsubstituted alkyl group, an alkyl group having a substituent, an ether linkage group or a sulfide linkage group, or an unsubstituted or substituted alkenyl group, provided that when both Y1 and Y2 are alkyl groups, at least either Y1 or Y2 has a hydroxy group, an ether linkage group or a sulfide linkage group, or each of the alkyl groups contains at least 2 carbon atoms; at least one of R1 to R5 and at least either Y1 or Y2 may combine with each other to complete a ring, at least one of R1 to R5 and at least either R6 or R7 may combine with each other to complete a ring, at least two structures represented by formula (I) may be linked together in any of the positions of R1 to R7, Y1 and Y2 via a linkage group; and X represents a non-nucleophilic anion.
2. The positive photosensitive composition as claimed in claim 1, which further comprises (C) a basic compound and (D) a fluorine-contained andor silicon-contained surfactant.
3. The positive photosensitive composition as claimed in claim 2, wherein the basic compound (C) is a compound having at least one structure selected from an imidazole structure, a diazabicyclo structure, an onium hydroxide structure, an onium carboxylate structure, a trialkylamine structure and an aniline structure.
4. The positive photosensitive composition as claimed in claim 1, which further comprises (F) a dissolution-inhibiting low-molecular compound having a molecular weight of at most 3,000 and a group capable of being decomposed by the action of an acid to increase solubility in an alkali developer.
5. The positive photosensitive composition as claimed in claim 1, wherein the resin (B) further contains a repeating unit having a lactone structure.
6. The positive photosensitive composition as claimed in claim 1, which further comprises (E) a mixture of a hydroxyl group-containing solvent and a hydroxyl group-free solvent.
7. The positive photosensitive composition as claimed in claim 1, wherein the resin (B) is a resin having at least one repeating unit selected from repeating units containing as partial structures alicyclic hydrocarbon moieties represented by formula (pI), (pII), (pIII), (pIV), (pV) or (pVI) shown below and repeating units represented by formula (II-AB) shown below.
111
wherein R11 represents a methyl group, an ethyl group, a n-propyl group, an isopropyl group, a n-butyl group, an isobutyl group or a sec-butyl group; Z represents atoms forming an alicyclic hydrocarbon group together with the carbon atom; R12 to R16 independently represent a C1-C4 linear or branched alkyl group or an alicyclic hydrocarbon group, provided that at least one of R12, R13 and R14 or either R15 or R16 is an aliphatic hydrocarbon group; R17 to R21 independently represent a hydrogen atom, a C1-C4 linear or branched alkyl group or an alicyclic hydrocarbon group, provided that at least one of R17 to R21 is an aliphatic hydrocarbon group and either R19 or R21 is a C1-C4 linear or branched alkyl group or an alicyclic hydrocarbon group; and R22 to R25 independently represent a C1-C4 linear or branched alkyl group or an alicyclic hydrocarbon group, provided that at least one of R22 to R25 is an alicyclic hydrocarbon group, or R23 and R24 may combine with each other to form a ring,
112
wherein R11 and R12 independently represent a hydrogen atom, a cyano group, a halogen atom, or an unsubstituted or substituted alkyl group; and Z represents atoms forming an unsubstituted or substituted alicyclic structure together with the bonded two carbon atoms (CC).
8. The positive photo sensitive composition as claimed in claim 5, wherein the repeating unit having a lactone structure is a repeating unit represented by the following formula (IV):
113
wherein R1a represents a hydrogen atom or a methyl group; W1 represents a single bond, an alkylene group, an ether group, a thioether group, a carbonyl group, an ester group, or a group formed by combining at least two of these groups; Ra1, Rb1, Rc1, Rd1 and Re1 independently represent a hydrogen atom or a C1-C4 alkyl group; and m and n independently represent an integer of 0 to 3, provided that mn is from 2 to 6.
9. The positive photosensitive composition as claimed in claim 1, wherein the resin (B) further contains a repeating unit including a group represented by any one of the following formulae (V-1) to (V-4):
114
wherein R1b to R5b independently represent a hydrogen atom or an unsubstituted or substituted alkyl, cycloalkyl or alkenyl group, or two of R1b to R5b may combine with each other to form a ring.
10. The positive photosensitive composition as claimed in claim 1, wherein the resin (B) further contains a repeating unit represented by the following formula (VI):
115
wherein A6 represents a single bond, an alkylene group, a cycloalkylene group, an ether group, a thioether group, a carbonyl group, an ester group or a group formed by combining any two or more of these groups; and R6a represents a hydrogen atom, a C1-C4 alkyl group, a cyano group, or a halogen atom.
11. The positive photosensitive composition as claimed in claim 1, wherein the resin (B) further contains a repeating unit having a group represented by the following formula (VII):
116
wherein R2c to R4c independently represent a hydrogen atom or a hydroxy group, provided that at least one of R2c to R4c represents a hydroxy group.
12. The positive photosensitive composition as claimed in claim 1, wherein the resin (B) further contains a repeating unit represented by the following formula (VIII):
117
wherein Z2 represents O or N(R41) wherein R41 represents a hydrogen atom, a hydroxy group, an alkyl group, a haloalkyl group or OSO2R42, and R42 represents an alkyl group, a haloalkyl group, a cycloalkyl group or a camphor residue.
13. The positive photosensitive composition as claimed in claim 1, wherein Y1 and Y2 each represent an alkyl group containing at least 3 carbon atoms.
14. The positive photosensitive composition as claimed in claim 1, wherein Y1 and Y2 each represent an alkyl group containing at least 4 carbon atoms.
15. The positive photosensitive composition as claimed in claim 1, wherein Y1 and Y2 each represent a butyl group or a hydroxyethyl group.
16. The positive photosensitive composition as claimed in claim 1, wherein X represents a perfluoroalkanesulfonic acid anion or a benzenesulfonic acid anion substituted with a fluorine atom or a fluorine-containing substituent.

The claims below are in addition to those above.
All refrences to claim(s) which appear below refer to the numbering after this setence.

1. A composite laminate comprising:
a fabric sheet which is surface-treated with an amine-containing surface agent;
a thermoplastic sheet having a thickness ranging from 0.5 to 3 mm; and
a polyurethane elastomer film interposed between said fabric sheet and said thermoplastic sheet, and penetrating into and through said fabric sheet so as to react with said surface agent on said fabric sheet and so as to be bonded to said thermoplastic sheet in an amount such that said composite laminate has a Barcol’s hardness ranging from HBI-A6 to HBI-A16, a flexure strength ranging from, 30 to 250 Nmm2, a flexure modulus ranging from 700 to 5000 Nmm2, and an impact resistance ranging from 100 to 800 Jm.
2. The composite laminate of claim 1, wherein said thermoplastic sheet is made from a material selected from the group consisting of polyvinyl chloride, acrylonitrile-butadiene-styrene copolymer, polystyrene, polycarbonate, and polyester.
3. The composite laminate of claim 1, wherein said fabric sheet is made from a material selected from the group consisting of carbon fiber and glass fiber.
4. A rigid molded article comprising:
a fabric sheet which is surface-treated with an amine-containing surface agent;
a thermoplastic sheet having a thickness ranging from 0.5 to 3 mm; and
a polyurethane elastomer film interposed between said fabric sheet and said thermoplastic sheet, and penetrating into and through said fabric sheet so as to react with said surface agent on said fabric sheet and so as to be bonded to said thermoplastic sheet in an amount such that said composite laminate has a Barcol’s hardness ranging from HBI-A6 to HBI-A16, a flexure strength ranging from 30 to 250 Nmm2, a flexure modulus ranging from 700 to 5000 Nmm2, and an impact resistance ranging from 100 to 800 Jm.

1460746801-5db0fc22-6f61-4f8f-a333-87b12b183188

What is claimed is:

1. A chemical decontamination method of chemically decontaminating radioactive nuclides from a metallic material surface contaminated by the radioactive nuclides, the method comprising the steps of:
reductively decontaminating using a reductive decontaminating agent containing at least two kinds of components; and then
decomposing said reductive decontaminating agent using a decomposing apparatus for decomposing at least two kinds of chemical substances in said reductive decontaminating agent.
2. A chemical decontamination method according to claim 1, wherein in said step of decomposing said reductive decontaminating agent using the decomposing apparatus, said at least two kinds of chemical substances in said reductive decontaminating agent are decomposed at a time.
3. A chemical decontamination method according to claim 1, wherein when said apparatus for decomposing at least two kinds of chemical substances in said reductive decontaminating agent cleanses radioactive nuclides from the decontaminating agent using a cation resin column during decontaminating, a composition trapped by said cation resin column at an inlet side of a cleaning apparatus is selectively decomposed.
4. A chemical decontamination method according to claim 3, wherein in a decomposing apparatus for the reductive decontaminating agent, a composition trapped by said cation resin column at the inlet side of the cleaning apparatus is selectively decomposed when the radioactive nuclides in the decontaminating agent are cleansed using the cation resin column during decontaminating, and said at least two kinds of compositions are decomposed at a time by controlling an adding amount of hydrogen peroxide after completion of the decontaminating step.
5. A chemical decontamination method according to anyone of claim 1 to claim 4, wherein compositions of said reductive decontaminating agent include oxalic acid and hydrazine.
6. A chemical decontamination method of chemically decontaminating radioactive nuclides from a metallic material surface contaminated by the radioactive nuclides, the method comprising the steps of:
reductively decontaminating using a reductive decontaminating agent; and then
decomposing said reductive decontaminating agent using a decomposing apparatus for decomposing at least oxalic acid and hydrazine in said reductive decontaminating agent.
7. A chemical decontamination method according to any one of claim 1 to claim 6, wherein said reductive decontaminating agent contains oxalic acid and hydrazine, and is a reductive acid solution of which a concentration of oxalic acid is 0.05 to 0.3 wt % and a pH is 2 to 3.
8. A chemical decontamination method according to any one of claim 1 to claim 6, which further comprises an oxidative dissolving process for oxidatively dissolving chromium in a metal oxide on the metallic material surface contaminated by the radioactive nuclides into hexadic chromium using permanganate before or after the reductive dissolving process for dissolving and removing the metal oxide.
9. A chemical decontamination method according to claim 8, wherein said reductive dissolving process and said oxidative dissolving process are alternatively performed, and said reductive dissolving process is performed at least twice.
10. A chemical decontamination method according to any one of claim 1 to claim 9, wherein a catalyst decomposition column is used as the decomposing apparatus for the reductive decontaminating agent.
11. A chemical decontamination method according to claim 10, wherein at least one element selected from the group consisting of platinum, ruthenium, vanadium, palladium, iridium and rhodium is used as a catalyst filled in said catalyst column, and an oxidizing agent is supplied in an inlet side of said catalyst column.
12. A chemical decontamination method according to any one of claim 1 to claim 11, wherein a quantity of hydrogen peroxide added is less than an equivalent weight of the components trapped in the cation resin column when components trapped in the cation resin column is selectively decomposed, and a quantity of hydrogen peroxide added is more than an equivalent weight react with the components trapped in the cation resin column when components trapped in the cation resin column and components trapped in the anion resin column are decomposed at a time.
13. A chemical decontaminating system, which comprises a catalyst decomposition column in an upstream side of an ion exchange resin column and a hydrogen peroxide injection apparatus in a further upstream side in order to reduce an amount of waste products caused by a chemical decontaminating agent in a case where a mixed decontaminating agent for a composition trapped in a cation resin column and for a composition trapped in an anion exchange resin is used for the chemical decontaminating agent, and in order to selectively decompose the composition trapped in a cation resin column in an inlet side of a cleaning apparatus when radioactive nuclides in the decontaminating agent are cleansed using the cation resin column during decontaminating and decompose the both compositions after completion of decontaminating process.
14. A chemical decontaminating system according to claim 13, which further comprises a gas-liquid separating apparatus for separating decomposed gas in an upstream side of the catalyst decomposition column and in a downstream side of the ion exchange resin.

The claims below are in addition to those above.
All refrences to claim(s) which appear below refer to the numbering after this setence.

1. A process for preparing butadiene from n-butane comprising the steps of
(A) providing an n-butane-containing feed gas stream,
(B) feeding the n-butane-containing feed gas stream into a first dehydrogenation zone and nonoxidatively catalytically dehydrogenating n-butane to 1-butene, 2-butene and optionally butadiene to obtain a first product gas stream comprising n-butane, 1-butene and 2-butene, with or without butadiene and secondary components,
(C) feeding the first product gas stream comprising n-butane, 1-butene and 2-butene, with or without butadiene and secondary components, into a second dehydrogenation zone and oxidatively dehydrogenating 1-butene and 2-butene to butadiene to give a second product gas stream comprising butadiene, n-butane and steam, with or without secondary components,
(D) recovering butadiene from the second product gas stream.
2. The process as claimed in claim 1, wherein the provision of the n-butane-containing feed gas stream comprises the steps of
(A1) providing a liquefied petroleum gas (LPG) stream,
(A2) removing propane and optionally methane, ethane and pentanes from the LPG stream to obtain a butane-containing stream,
(A3) removing isobutane from the butane-containing stream to obtain the n-butane-containing feed gas stream and optionally isomerizing the removed isobutane to an n-butaneisobutane mixture and recycling the n-butaneisobutane mixture into the isobutane removal.
3. The process as claimed in claim 1 or 2, wherein the nonoxidative catalytic dehydrogenation (B) of n-butane is carried out as an autothermal catalytic dehydrogenation.
4. The process as claimed in any of claims 1 to 3, wherein the oxidative dehydrogenation (C) is carried out in more than one stage.
5. The process as claimed in any of claims 1 to 4, wherein the recovery (D) of butadiene from the second product gas stream comprises the steps:
(D1) cooling the product gas stream with water to condense out steam and any high-boiling organic secondary components;
(D2) removing the low-boiling secondary components contained in the second product gas stream which are selected from the group consisting of hydrogen, carbon monoxide, carbon dioxide, nitrogen, methane, ethane, ethene, propane and propene, to obtain a stream comprising butadiene and n-butane, with or without 1-butene and 2-butene, and with or without oxygenates as further secondary components;
(D3) optionally removing the oxygenates to obtain a stream comprising butadiene and n-butane, with or without 1-butene and 2-butene;
(D4) separating the stream comprising butadiene and n-butane, with or without 1-butene and 2-butene, into a stream comprising n-butane, with or without 1-butene and 2-butene, and a stream comprising butadiene;
(D5) optionally recycling the stream comprising n-butane, with or without 1-butene and 2-butene, into the nonoxidative catalytic dehydrogenation (B).