Author: claimsbot

1. An image-content dependent system for cutting a print in response to content of an image disposed on the print, the system comprising:
a print cutter to cut a print according to an image-content dependent cut pattern;
a computer storage device to store image component metadata created from image content of an image disposed on the print to be cut; and
a processing device using the image component metadata to generate the image-content dependent cut pattern to be used by the print cutter to cut the print.
2. The system of claim 1, wherein the print cutter cuts a plurality of prints and the processing device configures the image-content dependent cut pattern used by the print cutter on a print-by-print basis.
3. The system of claim 1, wherein the image component metadata includes information about an image component identified in the image disposed on the print.
4. The system of claim 3, wherein the image components are identified using an image segmentation process.
5. The system of claim 3, wherein the image components are predefined components inserted into the image by a variable data image generator.
6. The system of claim 3, wherein the image-content dependent cut pattern is configured to correspond to the image component.
7. The system of claim 6, wherein the image-content dependent cut pattern is configured to cut the print about an outline of the image component.
8. The system of claim 1, further comprising a scanning device to scan the image disposed on the print, the image scanned from the print being processed to identify image component metadata for the image to be used to configure the image-content dependent cut pattern.
9. An image-content dependent system for cutting a print in response to content of an image disposed on the print, the system comprising:
a job configuration system to generate a print job including images, the job configuration system generating image component metadata from image content of each of the images of the print job;
a printing system to print the images of the print job on substrate media to form prints; and
a cutting system to generate image-content dependent cut patterns for each of the prints received from the printing system using the image component metadata corresponding to the images printed on the prints and to cut each of the prints according to the image-content dependent cut patterns.
10. The system of claim 9, wherein the job configuration system is configured to identify image components in the images using one or more image segmentation processes, the image components being identified in the image component metadata.
11. The system of claim 10, wherein the one or more image segmentation processes include object recognition.
12. The system of claim 9, wherein the job configuration unit is configured to generate an image using a variable data image generator, wherein image components are inserted into the images, information about the image components being included in the image component metadata.
13. The system of claim 9, wherein the cutting system comprises:
a print cutter to cut the prints according to the image-content dependent cut patterns;
a computer storage device to store the image component metadata corresponding to the images disposed on the prints to be cut; and
a processing device to configure the image-content dependent cut patterns used by the print cutter in response to the images disposed on the prints and the image information so that the image-content dependent cut patterns are dependent on content of the images disposed on the prints.
14. The system of claim 9, wherein the cutting system includes a scanning device to scan the images disposed on the prints, the images scanned from the prints being processed to identify image components for the images to be used to configure the image-content dependent cut patterns.
15. A method for cutting a print comprising:
generating image component metadata from image content of an image disposed on the print to be cut;
generating an image-content dependent cut pattern using the image component metadata;
configuring a print cutter to cut a print according to the image-content dependent cut pattern; and
cutting the print with the print cutter according to the image-content dependent cut pattern.
16. The method of claim 15, further comprising segmenting the image into one or more image components, information concerning the image the one or more image components being included in the image component metadata.
17. The method of claim 15, further comprising generating the image using a variable data image generator, the variable data image generated inserting one or more image components into the image, information concerning the one or more image components being included in the image component metadata.
18. The method of claim 15, further comprising cutting a plurality of prints, wherein a plurality of image-content dependent cut patterns are specified for the prints in response to images disposed on the prints and the image information associated with each of the prints so that the image-content dependent cut patterns are dependent on content of the images disposed on the prints.
19. The method of claim 15, further comprising scanning the print to scan the image disposed on the print, the image scanned from the print being processed to identify image component metadata for the image to be used to configure the image-content dependent cut pattern.
20. The method of claim 15, wherein the image-content dependent cut pattern is specified on a print-by-print basis.
The claims below are in addition to those above.
All refrences to claim(s) which appear below refer to the numbering after this setence.

1. A communications system operable with a welding-type apparatus comprising:
a user interface to accept a user input at a portable location;
a gas state modifier to systematically alter a state of gas flow in a gas line based on the user input, the gas line connecting the portable location to a remote location and used to facilitate a welding-type application;
a sensor to sense gas flow state changes in the gas line at the remote location; and
a processor configured to convert the gas flow state changes to a representation of the user input to modify operation of the welding-type application.
2. The communications system of claim 1 wherein the processor is located at the remote location.
3. The communications system of claim 1 further comprising an encoder configured to encode the user input as a series of gas flow state changes representing the user input.
4. The communications system of claim 3 wherein the series of gas flow state changes include a purge period and pressure period and wherein the series of gas flow state changes is free of consecutive purge periods.
5. The communications system of claim 3 wherein the gas state modifier includes a valve configured to purge the gas from the gas line according to the encoded series of gas flow state changes.
6. The communications system of claim 5 wherein the sensor includes a pressure sensor configured to identify variations in flow of the gas from the gas line indicative of the encoded series of state changes and wherein the processor is configured to sample the identified variations in flow of the gas to decode the user input.
7. The communications system of claim 1 further comprising a fixed orifice and wherein the sensor is configured to monitor the fixed orifice to sense the gas flow state changes in the gas line at the remote location.
8. The communications system of claim 1 wherein the user interface includes at least one of a welding-type voltage selection input, a send welding-type voltage selection input, and a display.
9. The communications system of claim 1 wherein the user interface is integrated with at least one of portable welding wire feeder, a portable welding torch, and a portable plasma-cutting torch.
10. The communications system of claim 1 wherein the user input includes a welding-type operational parameter and wherein the processor is further configured to communicate the user input to a welding-type power source located at the remote location.
11. The communications system of claim 1 wherein the gas flow state changes include \u2018ON\u2019 and \u2018OFF\u2019 modes of gas flow through a shielding gas cable.
12. The communications system of claim 1 wherein the gas is pressurized in the gas line.
13. A welding-type communications transmitter comprising:
a gas flow controller configured to control shielding gas flow to a torch from a gas supply line connected to a gas source to provide shielding gas to the torch;
at least one user interface configured to accept at least one desired operational parameter of a desired welding-type process;
an electronic transmission controller configured to:
accept the at least one operational parameter; and
control the gas flow controller to communicate the at least one operational parameter across the gas supply line.
14. The welding-type communications transmitter of claim 13 wherein the transmission controller is further configured to control the gas flow controller to stabilize gas flow prior to communicating the at least one operational parameter across the gas supply line.
15. The welding-type communications transmitter of claim 13 wherein the transmission controller is further configured to communicate a preamble across the gas supply line prior to communicating the at least one operational parameter to indicate to a receiver that a valid operational parameter will follow thereafter.
16. The welding-type communications transmitter of claim 13 wherein the gas flow controller includes a solenoid configured to actuate a valve configured to purge gas flow from the gas supply line.
17. The welding-type communications transmitter of claim 13 wherein the at least one user interface includes at least one of a voltage selection input, a send transmission input, and a voltage selection display.
18. The welding-type communications transmitter of claim 17 further comprising a converter configured to accept a selected voltage from the voltage selection input and communicate the selected voltage to the transmission controller and wherein, upon receiving the selected voltage, the transmission controller is configured to communicate the selected voltage to the voltage selection display and prepare the selected voltage for transmission across the gas supply line.
19. The welding-type communications transmitter of claim 13 wherein the transmission controller is further configured to encode the at least one operational parameter for transmission across the gas supply line to a remote receiver.
20. The welding-type communications transmitter of claim 19 wherein the receiver is integral with a welding-type power source and is configured to monitor variations in flow rate of the gas through the gas supply line to receive the encoded at least one operational parameter from the transmission controller.
21. The welding-type communications transmitter of claim 13 wherein the transmission controller is configured to control the gas flow controller to communicate the at least one operational parameter to a welding-type power source.
22. A welding-type power source control module comprising:
an inlet configured to receive gas from a gas source;
an outlet configured to allow the gas to pass from the control module;
a passage connecting the inlet and the outlet; and
a controller configured to:
monitor the passage to determine variations in a flow rate of the gas indicative of a communications bit stream;
read the communications bit stream;
determine a user-selected operational parameter from the communications bit stream; and
communicate the user-selected operational parameter to a welding-type power source.
23. The control module of claim 22 wherein the passage includes a fixed orifice and wherein the controller includes a differential pressure transducer configured to determine variations the flow rate of the gas through the fixed orifice.
24. The control module of claim 22 wherein the controller is further configured to decode the communications bit stream to determine the user-selected operational parameter.
25. The control module of claim 22 wherein the controller is further configured to determine a validating preamble from the communications bit stream prior to determining the user-selected operational parameter.
26. The control module of claim 22 further comprising a remote transmitter configured to be integrated with a remote wire feeder to cause variations in flow rate of the gas indicative of the communications bit stream.
27. A communications kit configured to retrofit a welding-type system comprising:
a transmission module configured to accept a user-selected welding-type parameter and control a flow of gas to encode the user-selected welding-type parameter thereon; and
a receiver module configured to monitor the flow of gas to receive and decode the user-selected welding-type parameter therefrom and communicate the user-selected welding-type parameter to a welding-type power source.
28. The communications kit of claim 27 wherein the transmission module is further configured to encode the user-selected welding-type parameter as a bit stream free of consecutive true bits.
29. The communications kit of claim 28 wherein the receiver module includes a fixed orifice configured to allow the gas to flow from a gas supply to the transmission module and a differential pressure transducer configured to determine variations in a flow rate of the gas through the fixed orifice corresponding to the bit stream.
30. The communications kit of claim 28 wherein the receiver module is further configured to decode the bit stream to interpret the user-selected welding-type parameter.
31. The communications kit of claim 27 wherein the transmission module is configured to be integrated with a remote wire feeder system to control a purge valve in the remote wire feeder system to thereby communicate the user-selected welding-type parameter.
32. The communications kit of claim 27 wherein the transmission module further comprises:
a user interface including at least one of a voltage selection input, a send transmission input, and a voltage selection display; and
a converter configured to accept a selected voltage from the voltage selection input and communicate the selected voltage to the voltage selection display and encode the selected voltage for transmission to the receiver module.
33. The communications kit of claim 27 wherein the user-selected operational parameter includes at least one of welding-type power source output commands, onoff commands, and mode control commands.
34. A method of communicating data over a welding-type gas line comprising:
receiving a user input at a portable location;
systematically purging pressurized gas from a gas line connecting the portable location to a remote location based on the user input;
sensing pressure changes in the gas line at the remote location; and
interpreting the sensed pressure changes to a digital representation of the user input.
35. A welding-type communications transmitter comprising:
a gas flow controller configured to control gas flow from a gas supply line connected to a gas source;
at least one user interface configured to accept at least one desired operational parameter of a desired welding-type process, the at least one user interface having a voltage selection input;
a transmission controller configured to:
accept the at least one operational parameter; and
control the gas flow controller to communicate the at least one operational parameter across the gas supply line.
36. The welding-type communications transmitter of claim 35 wherein the at least one user interface further includes at least one of a send transmission input and a voltage selection display.
37. The welding-type communications transmitter of claim 36 further comprising a converter configured to accept a selected voltage from the voltage selection input and communicate the selected voltage to the transmission controller and wherein, upon receiving the selected voltage, the transmission controller is configured to communicate the selected voltage to the voltage selection display and prepare the selected voltage for transmission across the gas supply line.

1. A method for forming an image sensor device, comprising:
forming an alignment mark overlying or in a substrate, wherein distance from the alignment mark to the substrate edge is less than about 3 mm;
forming an array of active photosensing pixels overlying the substrate;
forming at least one dielectric layer overlying the substrate, covering the array;
forming a color filter photoresist overlying the at least one dielectric layer;
removing the color filter photoresist over the alignment mark; and
exposing the color filter photoresist aligned with the alignment mark.
2. The method according to claim 1, further comprising forming microlenses on the color filter corresponding to the array.
3. The method according to claim 1, further comprising:
forming a light shield layer over the color filter photoresist;
removing the light shield layer over the alignment mark; and
patterning the light shield layer to cover a periphery area of the image sensor device.
4. The method according to claim 3, wherein the light shield layer comprises black photoresist.
5. The method according to claim 1, wherein removal of the color filter photoresist from the alignment mark, comprises the steps of:
placing the substrate on a platform and spinning at a predetermined rotational speed; and
injecting a chemical solution on to the color filter photoresist at an edge of the substrate.
6. The method according to claim 1, wherein removing the color filter photoresist over the alignment mark, comprises the steps of:
placing the substrate on a supporting means of a rotating chuck;
emitting light to expose the color filter photoresist over the edge of the substrate; and
developing the color filter photoresist.
7. The method according to claim 1, further comprising developing the color filter photoresist.
8. A method for forming an image sensor device, comprising:
forming an alignment mark overlying or in a substrate, wherein distance from the alignment mark to the substrate edge is less than about 3 mm;
coating a photoresist with low transmittance at wavelength of 550\u02dc650 nm overlying the substrate;
removing the photoresist at the substrate edge; and
using an exposure apparatus to expose the photoresist with alignment to the alignment mark.
9. The method according to claim 8, further comprising:
forming a light shield layer over the photoresist;
removing the light shield layer over the alignment mark; and
patterning the light shield layer to cover a periphery area of the image sensor device.
10. The method according to claim 8, wherein the light shield layer comprises black photoresist.
11. The method according to claim 8, wherein removing the photoresist at the substrate edge comprises the steps of:
placing the substrate on a platform and spinning at a predetermined rotational speed; and
injecting a chemical solution on the photoresist at edge of the substrate.
12. The method according to claim 8, wherein removing the photoresist at the substrate edge comprises the steps of:
placing the substrate on a supporting means of a rotating chuck;
emitting light to expose the photoresist over the edge of the substrate; and
developing the photoresist.
13. The method according to claim 8, wherein the photoresist comprises a color filter photoresist.
14. The method according to claim 13, further comprising, prior to coating the photoresist:
forming an array of active photosensing pixels on the substrate;
forming at least one dielectric layer on the substrate, covering the array.
15. An image sensing devices, comprising:
a wafer comprising a plurality of image sensing devices;
an alignment mark overlying or in the wafer, wherein distance from the alignment mark to the wafer edge is less than about 3 mm;
wherein the image sensing devices comprise a color filter photoresist covering the wafer without covering the alignment-mark.
16. The image sensing devices according to claim 15, wherein each image sensing device comprises:
an array of active photosensing pixels disposed on the wafer;
at least one dielectric layer disposed on the wafer covering the array;
the color filter photoresist on the least one dielectric layer; and
a microlens on the color filter photoresist.
17. The image sensing devices according to claim 15, wherein the color filter photoresist exposes the edge of the wafer.
18. The image sensing devices according to claim 15, further comprising a light shield layer disposed over the color filter photoresist to cover a periphery area of each image sensing device, wherein the light shield layer exposes the alignment mark.
19. The image sensing devices according to claim 18, wherein the light shield layer comprises black photoresist.
The claims below are in addition to those above.
All refrences to claim(s) which appear below refer to the numbering after this setence.

We claim:

1. A method for treating HIV infection in a subject comprising administering to said subject an anti-HIV effective amount of a compound of formula I.

7
wherein:
n is 0 to 6;
R is an electron donating group; and
R1 is cyclo(C3-C12) alkyl, cyclo(C3-C12) alkenyl, isothiazolyl, tetrazolyl, triazolyl, pyridyl, imidazolyl, phenyl, napthyl, benzoxazolyl, benzimidazolyl, thiazolyl, oxazolyl, benzothiazolyl, pyrazinyl, pyridazinyl, thiadiazolyl, benzotriazolyl, pyrolyl, indolyl, benzothienyl, thienyl, benzofuryl, quinolyl, isoquinolyl, or pyrazolyl.
2. The method of claim 1, wherein R1 is substituted with H, methyl, methoxy, or halo.
3. The method of claim 1, wherein n is 1.
4. The method of claim 1, wherein R is methyl or methoxy.
5. The method of claim 1, wherein R1 is pyridyl.
6. The method of claim 1, wherein R1 is 5-bromo-pyridyl.
7. The method of claim 1, wherein R is para-methyl.
8. The method of claim 1, wherein R is para-methoxy.
9. A method for inhibiting replication of HIV comprising contacting said HIV with an inhibitory amount of a compound of formula 1:

8
wherein:
n is 0 to 6;
R is an electron donating group; and
R1 is cyclo(C3-C12) alkyl, cyclo(C3-C12) alkenyl, isothiazolyl, tetrazolyl, triazolyl, pyridyl, imidazolyl, phenyl, napthyl, benzoxazolyl, benzimidazolyl, thiazolyl, oxazolyl, benzothiazolyl, pyrazinyl, pyridazinyl, thiadiazolyl, benzotriazolyl, pyrolyl, indolyl, benzothienyl, thienyl, benzofuryl, quinolyl, isoquinolyl, or pyrazoly.
10. The method of claim 9, wherein R1 is substituted with H, methyl, methoxy, or halo.
11. A method for inhibiting HIV reverse transcriptase comprising contacting said HIV an effective inhibitory amount of a compound of formula I:

9
wherein:
n is 0 to 6;
R is an electron donating group; and
R1 is cyclo(C3-C12) alkyl, cyclo(C3-C12) alkenyl, isothiazolyl, tetrazolyl, triazolyl, pyridyl, imidazolyl, phenyl, napthyl, benzoxazolyl, benzimidazolyl, thiazolyl, oxazolyl, benzothiazolyl, pyrazinyl, pyridazinyl, thiadiazolyl, benzotriazolyl, pyrolyl, indolyl, benzothienyl, thienyl, benzofuryl, quinolyl, isoquinolyl, or pyrazolyl.
12. The method of claim 11, wherein R1 is substituted with H, methyl, methoxy, or halo.
13. The method of any of claims 1, 8, or 9, wherein the compound is:
2-(4-methoxyphenethyl)-N-2-(5-bromopyridyl)thiourea (HI-23 8); or
N-2-(4-methylphenethyl)-N-2-(5-bromopyridyl)thiourea (HI-244).
14. A compound comprising the structure of formula I:

10
wherein:
n is 0 to 6;
R is an electron donating group; and
R1 is cyclo(C3-C12) alkyl, cyclo(C3-C12) alkenyl, isothiazolyl, tetrazolyl, triazolyl, pyridyl, imidazolyl, phenyl, napthyl, benzoxazolyl, benzimidazolyl, thiazolyl, oxazolyl, benzothiazolyl, pyrazinyl, pyridazinyl, thiadiazolyl, benzotriazolyl, pyrolyl, indolyl, benzothienyl, thienyl, benzofuryl, quinolyl, isoquinolyl, or pyrazolyl.
15. The compound of claim 14, wherein R1 is substituted with H, methyl, methoxy, or halo.
16. The compound of claim 14, wherein n is 1, R is methyl or methoxy, and R1 is pyridyl.