1. A photolithographic bilayer coated substrate comprising: a substrate, a thermally cured film of an Underlayer composition coated on the substrate, and a radiation-sensitive chemically amplified resist coated over the thermally cured Underlayer composition, the Underlayer composition comprising:
(a) a polymer comprising repeating units of Structures I, II and III
wherein R1, R2, R3 and R4 individually are selected from the group consisting of a hydrogen atom, a halogen atom, a linear, branched or cyclic C1-C10 alkyl group, a C6-C20 aryl group, a halogenated or partially halogenated linear, branched or cyclic C1-C10 alkyl group, and a polar group represented by (CH2)nR5, with the proviso that R2 and R4 may be bonded to each other to form a bivalent group selected from the group consisting of \u2014C(O)\u2014Z\u2014C(O)\u2014 and \u2014(CH2)pOC(O)\u2014, wherein Z is selected from the group consisting of \u2014O\u2014 and \u2014N(R13)\u2014, p is an integer from 1 to about 3 and R13 is selected from the group consisting of a hydrogen atom and a C1-C10 alkyl group; R5 is selected from the group consisting of \u2014OR6, \u2014(OR12)oOR7, \u2014C(O)OR8,
\u2014C(O)(OR12)oOR9 or \u2014OC(O)R10 and n is an integer from 0 to 5; wherein R6, R7, R8, R9 and R10 each independently are selected from the group consisting of a hydrogen atom, a substituted or unsubstituted linear, branched or cyclic C1-C20 alkyl group, and a substituted or unsubstituted C6-C20 aryl group; R12 is a C2-C6 linear, branched or cyclic alkylene group; o is an integer from 1 to about 5; m is an integer from 0 to about 4; and X and Y are independently selected from the group consisting of \u2014CH2\u2014, \u2014O\u2014, and \u2014S\u2014; R14 is selected from the group consisting of a hydrogen atom, a C1-C3 alkyl group, a fully or partially halogen substituted C1-C3 alkyl group, and a halogen atom; A is selected from the group consisting of a C6-C20 arylene group and a A1-W-A2 group wherein A1 is a C6-C10 arylene group, A2 is a C6-C10 aryl group and W is selected from the group consisting of a single bond, \u2014S\u2014, \u2014O\u2014, \u2014C(O)\u2014, \u2014C(O)O\u2014, \u2014C(R16R17)\u2014, \u2014C(\u2550CR18R19)\u2014 and
\u2014CR18\u2550CR19\u2014, wherein R16, R17, R18 and R19 are independently selected from the group consisting of a hydrogen atom, a halogen atom, a cyano group, a C1-C10 alkyl group, and a partial or complete halogen substituted C1-C10 alkyl group; R15 is selected from the group consisting of a halogen atom, a linear, branched or cyclic C1-C10 alkyl group, and a partial or complete halogen substituted C1-C10 alkyl group; q is an integer from 1 to 2; and r is an integer from 0 to about 3; R21 is selected from the group consisting of a hydrogen atom, a C1-C3 alkyl group, and a halogen atom; L is selected from the group consisting of a single bond, a \u2014C(O)O\u2014, \u2014C(O)O(R23O)s\u2014, and a \u2014C(O)NR24\u2014 group, wherein R23 is a C2-C6 alkyene group; R24 is selected from the group consisting of a hydrogen atom and a linear, branched or cyclic C1-C10 alkyl group; s is an integer from 1 to about 4; M is selected from the group consisting of a C5-C20 cycloalkylene group and a C6-C18 arylene group; E is selected from the group consisting of a single bond, \u2014O\u2014, \u2014C(O)O\u2014, \u2014C(O)\u2014, and \u2014S(O2)\u2014; R22 is selected from the group consisting of a hydrogen atom, a substituted or unsubstituted linear, branched or cyclic C1-C10 alkyl group, alicyclic C5-C15 hydrocarbon group, a C6-C18 aryl group, and a C7-C18 alkylaryl group and t is an integer from 1 to about 4; with the proviso that when L is a single bond and M is an arylene group E-R22 is not \u2014OH; and with the proviso that none of the repeating units of Structure I or II or III contain acid sensitive groups;
(b) at least one crosslinking agent;
(c) at least one thermal acid generator; and
(d) at least one solvent.
2. The photolithographic bilayer coated substrate of claim 1, wherein the polymer comprises repeating units of Structures Ia, IIa and IIIa-1
wherein R1, R2, R3, R4, x and X are as defined for Structure I; R14, R15, r and q are as defined for Structure II; A is selected from the group consisting of a naphthyl and a phenyl group; M is a C6-C18 arylene group, R21 is defined for Structure III; L is selected from the group consisting of a single bond and \u2014C(O)O\u2014; E is selected from the group consisting of a single bond, \u2014O\u2014 and \u2014C(O)O\u2014; R22 is selected from the group consisting of a hydrogen atom, a substituted or unsubstituted linear branched or cyclic C1-C10 alkyl group and a substituted or unsubstituted alicyclic C5-C15 group; and t is an integer from 1 to about 3; with the proviso that when L is a single bond E-R22 is not \u2014OH; and with the proviso that none of the repeating units of Structure Ia or IIa or IIIa-1 contain acid sensitive groups.
3. The photolithographic bilayer coated substrate of claim 1, wherein the polymer comprises repeating units of Structures Ia, IIa and IIIa-2
R1, R2, R3, R4, and X are as defined for Structure I; R14, R15, r and q are as defined for Structure II, A is selected from the group consisting of a naphthyl or phenyl group; M is a C5-C20 cycloalkylene group, R21 is as defined for Structure III, E is selected from the group consisting of a single bond, \u2014O\u2014 and \u2014C(O)O\u2014; R22 is selected from the group consisting of a hydrogen atom, a substituted or unsubstituted linear branched or cyclic C1-C10 alkyl group, and a substituted or unsubstituted alicyclic C5-C15 group; and t is an integer from 1 to about 3; with the proviso that none of the repeating units of Structure Ia or IIa or IIIa-2 contain acid sensitive groups.
4. The photolithographic bilayer coated substrate of claim 1, wherein the polymer comprises repeating units of Structures Ib, IIb and IIIb-1
wherein R1, R2, R3 and R4 individually are selected from the group consisting of a hydrogen atom, a halogen atom, a linear, branched or cyclic C1-C10 alkyl group, a halogenated or partially halogenated linear, branched or cyclic C1-C10 alkyl group, and a polar group (CH2)nR5 wherein R5 is selected from the group consisting of \u2014OR6, \u2014C(O)OR8, \u2014C(O)(OR12)oOR9 or \u2014OC(O)R10 and n is an integer from 0 to 2; R6, R8, R9 and R10 are individually selected from the group consisting of a hydrogen atom, a substituted or unsubstituted linear, branched or cyclic C1-C20 alkyl group and a substituted or unsubstituted C6-C20 aryl group; R12 is a C2-C6 linear, branched or cyclic alkylene group; o is an integer from 1 to about 5; R14, r and q are as defined for Structure II; R15 is selected from the group consisting of a halogen atom, a linear, branched or cyclic C1-C4 alkyl group, and a partial or complete halogen substituted C1-C4 alkyl group; R21 is defined as in Structure III; L is selected from the group consisting of a single bond and \u2014C(O)O\u2014; E is selected from the group consisting of a single bond and oxygen atom; R22 is selected from the group consisting of a hydrogen atom, a substituted or unsubstituted linear branched or cyclic C1-C10 alkyl group, and a substituted or unsubstituted alicyclic C5-C15 group; and t is an integer from 1 to about 2; with the proviso that when L is a single bond -E-R22 is not \u2014OH and with the proviso that none of the repeating units of Structure Ib or IIb or IIIb-1 contain acid sensitive groups.
5. The photolithographic bilayer coated substrate of claim 1, wherein the polymer comprises repeating units of Structures Ib, IIb and IIIb-2,
wherein R1, R2, R3 and R4 individually are selected from the group consisting of a hydrogen atom, a halogen atom, a linear, branched or cyclic C1-C10 alkyl group, a halogenated or partially halogenated linear, branched or cyclic C1-C10 alkyl group, and a polar group (CH2)nR5 wherein R5 is selected from the group consisting of \u2014OR6, \u2014C(O)OR8, \u2014C(O)(OR12)oOR9 and \u2014OC(O)R10, n is an integer from 0 to 2; R6, R8, R9 and R10 are individually selected from the group consisting of a hydrogen atom, a substituted or unsubstituted linear, branched or cyclic C1-C20 alkyl group and a substituted or unsubstituted C6-C20 aryl group; R12 is a C2-C6 linear, branched or cyclic alkylene group; o is an integer from 1 to about 5; R14, r and q are as defined for Structure II; R15 is selected from the group consisting of a halogen atom, a linear, branched or cyclic C1-C4 alkyl group, and a partial or complete halogen substituted C1-C4 alkyl group; R21 is as defined for Structure III, E is selected from the group consisting of a single bond and an oxygen atom; R22 is selected from the group consisting of a hydrogen atom, a substituted or unsubstituted, linear, branched or cyclic C1-C6 alkyl group, and a substituted or unsubstituted alicyclic C5-C15 group; and t is an integer from 1 to about 2; M is a C5-C20 cycloalkylene group; and with the proviso that none of the repeating units of Structure Ib or IIb or IIIb-2 contain acid sensitive groups.
6. The photolithographic bilayer coated substrate of claim 1, wherein the polymer comprises repeating units of Structures Ic, IIc and IIIc,
wherein R1 is selected from the group consisting of a hydrogen atom, a halogen atom, a linear, branched or cyclic C1-C6 alkyl group, a halogenated or partially halogenated linear, branched or cyclic C1-C6 alkyl group, and a polar group (CH2)nR5 wherein R5 is \u2014OC(O)R10, wherein R10 is a substituted or unsubstituted linear, branched or cyclic C1-C6 alkyl group, n is an integer of 0 or 1; R14 is selected from the group consisting of a hydrogen atom and a methyl group; M is a C5-C20 cycloalkylene group, R21 is selected from the group consisting of a hydrogen atom and a methyl group, E is selected from the group consisting of a single bond and oxygen atom; R22 is selected from the group consisting of a hydrogen atom, a substituted or unsubstituted linear branched or cyclic C1-C6 alkyl group, and a substituted or unsubstituted alicyclic C5-C15 group; and t is an integer from 1 to about 2; and with the proviso that none of the repeating units of Structure Ic or IIc or IIIc contain acid sensitive groups.
7. The photolithographic bilayer coated substrate of claim 1, wherein the repeating units of Structures I, II and III are generated from the monomers norbornene, acetoxy styrene and tricyclo5,2,1,02,6decylmethacrylate.
8. The photolithographic bilayer coated substrate of claim 1, wherein the repeating units of Structures I, II and III are generated from the monomers norbornene, acetoxy styrene and tricyclo5,2,1,02,6decylacrylate.
The claims below are in addition to those above.
All refrences to claim(s) which appear below refer to the numbering after this setence.
1. An enhanced performance earstem for eyeglasses, comprising:
an elongate body, having an anterior end and a posterior end; and
at least a first segment and a second segment on the body, separated by a flex zone or point;
wherein a center of the flex zone or point is within the range of from about 20 mm to about 70 mm from the anterior end of the elongate body.
2. An enhanced performance earstem as in claim 1, wherein the first segment and the second segment are separated at the flex zone or point by a first gap, and wherein deflection of the earstem at the flex zone or point changes a width of the first gap.
3. An enhanced performance earstem as in claim 2, wherein deflection of the earstem is operative to reduce the first gap such that the first segment and the second segment contact each other to prevent further deflection of the earstem.
4. An enhanced performance earstem as in claim 3, wherein the earstem is operative to deflect at the flex zone or point until the first segment contacts the second segment.
5. An enhanced performance earstem as in claim 4, wherein the first gap separates the first segment and the second segment such that the first segment and the second segment do not touch when the earstem is in an undeflected position.
6. An enhanced performance earstem as in claim 1, wherein the elongate body deflects relative to at least a portion of one of the first and second segments.
7. An enhanced performance earstem as in claim 6, wherein one of the first and second segments comprises a recess configured to receive at least a portion of the elongate body for allowing deflection of the elongate body relative to the respective one of the first and second segments.
8. An enhanced performance earstem as in claim 7, wherein the recess comprises a contact surface configured to at least partially abut the elongate body for constraining deflection of the elongate body.
9. An enhanced performance earstem as in claim 1, further comprising another flex zone or point, the other flex zone or point being disposed between about 30 mm to about 70 mm from the anterior end.
10. An enhanced performance earstem as in claim 9, wherein the other flex zone or point comprises the posterior end of the elongate body of the earstem.
11. An enhanced performance earstem as in claim 1, wherein the first segment and the second segment are disposed externally along the elongate body.
12. An enhanced performance earstem as in claim 1, wherein the first segment and the second segment are formed separately from and coupled to the elongate body of the earstem.
13. An enhanced performance earstem as in claim 1, wherein the first segment and the second segment are generally rigid relative to the elongate body.
14. An earstem having differential flexibility, comprising:
a flexible, elongate body having an anterior end and a posterior end, the body having a plurality of relatively flexible zones, each flexible zone separated from an adjacent flexible zone by a relatively rigid zone;
wherein the relatively flexible zones have different stiffnesses.
15. An earstem as in claim 14, wherein the stiffness of a first relatively flexible zone is greater than the stiffness of a second relatively flexible zone to provide progressive deflection of the earstem upon exertion of bending stress on the earstem.
16. An earstem as in claim 15, wherein the first relatively flexible zone is disposed anteriorly relative to the second relatively flexible zone.
17. An earstem as in claim 14, wherein the first relatively flexible zone finishes deflecting before the second relatively flexible zone finishes deflecting.
18. An earstem as in claim 14, further comprising at least one segment attached to the elongate body, the segment configured to constrain deflection of the elongate body along at least a portion of the elongate body to form the relatively rigid zone.
19. An earstem for providing an adjustable and personalized fit for an eyeglass, the earstem comprising:
an elongate body defining an anterior end being attachable to the eyeglass and a posterior end extending rearwardly from the eyeglass; and
at least a first segment disposed along the earstem, the first segment comprising a contact surface, the contact surface being positioned adjacent to the elongate body such that deflection of the elongate body causes relative movement between the contact surface and the elongate body, the contact surface being configured to constrain deflection of the elongate body upon contact between the contact surface and the elongate body, the contact surface permitting relative movement between the first segment and the elongate body within a given range.
20. An eyeglass for providing enhanced retention on the head of a wearer, the eyeglass comprising:
a frame for supporting at least one lens in the wearer’s field of view;
a pair of earstems attached to the frame for supporting the frame on the head of the wearer, each earstem comprising at least first and second flex zones or points whereat the earstems can bend, the first flex zone or point providing a first degree of deflection, the second flex zone or point providing a second degree of deflection;
wherein the first degree of deflection is different from the second degree of deflection such that the earstems provide progressive bending along a longitudinal axis of the earstems for providing a secure and conforming fit over a range of head sizes.
21. An eyeglass as in claim 20, wherein the first degree of deflection defines a stiffness of the first flex zone or point and the second degree of deflection defines a stiffness of the second flex zone or point.
22. An eyeglass as in claim 20, wherein the first degree of deflection defines a maximum deflection of the earstem about the first flex zone or point and the second degree of deflection defines a maximum deflection of the earstem about the second flex zone or point.
23. An eyeglass as in claim 22, wherein the earstems comprise a plurality of segments being interconnected at the first and second flex zones or points, the maximum deflection of the earstem at a given flex zone or point being limited by physical contact of adjacent segments at the given flex zone or point during deflection of the earstem at the given flex zone or point.
24. An eyeglass as in claim 20, wherein the earstems each comprise a plurality of rigid segments with at least one segment extending generally between the first flex zone or point and the second flex zone or point of each earstem.
25. An eyeglass as in claim 24, wherein the rigid segments are removably attachable to the earstems.
26. An eyeglass as in claim 25, wherein the rigid segments comprise contact surfaces that are disposed adjacent to each other at the first and second flex zones or points, each earstem being configured such that deflection of the earstem is limited upon abutment of the contact surfaces of the adjacent segments.