Author: claimsbot

1. A liquid crystal display device comprising a TFT substrate in which an alignment film is formed on a pixel comprising a pixel electrode, a common electrode and a TFT, a counter substrate opposed to the TFT substrate in which an alignment film is formed on a color filter, and liquid crystals put between the alignment film of the TFT substrate and the alignment film of the counter substrate,
wherein the alignment film of the TFT substrate is formed directly either on the pixel electrode or on the common electrode,
wherein an alignment film of the TFT substrate and the alignment film of the counter substrate includes a polyamide acid ester having a structure of the chemical formula (1), the liquid crystals contain an antioxidant within a range from 0.0005 to 10 wt %, and a dielectric constant anisotropy of the liquid crystals is positive and is 5 or less,
wherein a specific resistivity of the liquid crystals is 1014 \u03a9cm or higher,
wherein the alignment film of the TFT substrate and the alignment film of the counter substrate includes the polyamide acid ester as a precursor,
wherein the device is a liquid crystal display device of an IPS system in which a common electrode opposed to the pixel electrode is formed to the TFT substrate,
wherein black unevenness attributable to impurities in the liquid crystal and DC image retention attributable to impurities at the boundary of the alignment film are reduced,
wherein the alignment film of the TFT substrate and the alignment film of the counter substrate is aligned by optical alignment:
where R1 represents each independently an alkyl group having 1 to 8 carbon atoms, R2 represents each independently a hydrogen atom, a fluorine atom, a chlorine atom, a bromine atom, a phenyl group, an alkyl group having 1 to 6 carbon atoms, an alkoxy group having 1 to 6 carbon atoms, a vinyl group (\u2014(CH2)m\u2014CH\u2261CH2, m=0, 1, 2) or an acetyl group (\u2014(CH2)m\u2014C\u2261CH, m=0, 1, 2) and Ar represents an aromatic compound.
2. A liquid crystal display device including a TFT substrate comprising a first electrode formed in a planar shape, a second electrode disposed above the first electrode by way of an insulative film, and an alignment film formed above a pixel formed with a TFT, a counter substrate opposed to the TFT substrate in which an alignment film is formed on a color filter, and liquid crystals put between the alignment film of the TFT substrate and the alignment film of the counter substrate,
wherein the alignment film of the TFT substrate is formed directly on the second electrode,
wherein an alignment film of the TFT substrate and the alignment film of the counter substrate includes a polyamide acid ester having a structure of the chemical formula (1), the liquid crystals contain an antioxidant within a range from 0.0005 to 10 wt %, and a dielectric constant anisotropy of the liquid crystals is positive and is 5 or less, wherein a specific resistivity of the liquid crystals is 1014 \u03a9cm or higher,
wherein the alignment film of the TFT substrate and the alignment film of the counter substrate includes the polyamide acid ester as a precursor,
wherein black unevenness attributable to impurities in the liquid crystal and DC image retention attributable to impurities at the boundary of the alignment film are reduced,
wherein the alignment film of the TFT substrate and the alignment film of the counter substrate is aligned by optical alignment:
where R1 represents each independently an alkyl group having 1 to 8 carbon atoms, R2 represents each independently a hydrogen atom, a fluorine atom, a chlorine atom, a bromine atom, a phenyl group, an alkyl group having 1 to 6 carbon atoms, an alkoxy group having 1 to 6 carbon atoms, a vinyl group (\u2014(CH2)m\u2014CH\u2550CH2, m=0, 1, 2) or an acetyl group (\u2014(CH2)m\u2014C\u2261CH, m=0, 1, 2), and Ar represents an aromatic compound.
3. The liquid crystal display device according to claim 2, wherein the first electrode is a common electrode and the second electrode is a pixel electrode formed in an interdigitated shape.
4. The liquid crystal display device according to claim 2, wherein the first electrode is a pixel electrode and the second electrode is a common electrode formed in an interdigitated shape.
5. The liquid crystal display device according to claim 1, wherein the liquid crystals contain the antioxidant within a range from 0.001 to 5 wt %.
6. The liquid crystal display device according to claim 2, wherein the liquid crystals contain the antioxidant within a range from 0.001 to 5 wt %.
7. The liquid crystal display device according to claim 1, wherein both the alignment film of the TFT substrate and the alignment film of the counter substrate include the polyamide acid ester.
8. The liquid crystal display device according to claim 2, wherein both the alignment film of the TFT substrate and the alignment film of the counter substrate include the polyamide acid ester.
9. The liquid crystal display device according to claim 1, wherein the antioxidant prevents oxidation of the liquid crystals.
10. The liquid crystal display device according to claim 1, wherein the antioxidant prevents oxidation of the liquid crystals.
11. The liquid crystal display device according to claim 1, wherein the antioxidant is one selected from the group consisting of phenol, phosphate, phosphite, and sulfur type materials.
12. The liquid crystal display device according to claim 2, wherein the antioxidant is one selected from the group consisting of phenol, phosphate, phosphite, and sulfur type materials.

The claims below are in addition to those above.
All refrences to claim(s) which appear below refer to the numbering after this setence.

What is claimed is:

1. A method for manufacturing a liquid crystal display providing a wide viewing angle in which a display with a wide viewing angle is enabled by placing a common electrode and a pixel electrode on a protecting film of a thin film transistor and by rotating a direction of a molecular axis of a liquid crystal molecule making up of a liquid crystal layer in a hermetically sealed manner on a surface being parallel to a surface of an active matrix substrate, said method comprising:
a process of sequentially forming a gate electrode metal layer, a gate insulator, and an a-Si (amorphous silicon) layer on a transparent insulating substrate and forming an island comprising a gate electrode, a gate insulating film, and a semiconductor layer by patterning using photolithography;
a process of sequentially forming an interlayer insulating film and a drain electrode metal layer on said transparent insulating substrate and forming a drain line by removing a specified portion of said drain electrode metal layer by patterning using photolithography;
a process of forming an insulating film on said transparent insulating substrate and forming an insulating film contact which passes through said insulating film and is used to provide a connection to a source electrode and a drain electrode at a specified position by patterning using photolithography; and
a process of forming a transparent conductive film on said transparent insulating substrate and forming said pixel electrode and said common electrode each having a comb-teeth-like configuration by removing unwanted portions of said transparent conductive film so that said pixel electrode and said common electrode are arranged in a staggered manner by patterning using photolithography and of connecting said source electrode to said pixel electrode and connecting said drain electrode to said drain line.
2. The method for manufacturing the liquid crystal display providing said wide viewing angle according to claim 1, wherein said insulating film is made up of an inorganic insulating film existing at a lower portion of said insulating layer and of an organic insulating film existing at a upper portion of said insulating layer and wherein, after an aperture portion is formed at a specified position of said organic insulating film existing at said upper portion of said insulating film by photolithography, etching is performed on said inorganic insulating film existing at said lower portion of said insulating film using said organic insulating film existing at said upper portion of said insulating film as a mask.
3. The method for manufacturing the liquid crystal display providing said wide viewing angle according to claim 1, wherein said gate electrode is a single layer made of a metal having a high melting point or is a two-layered film containing an upper layer made of a metal having a high melting point and a lower layer made of Al (aluminum) or an Al alloy.
4. The method for manufacturing the liquid crystal display providing said wide viewing angle according to claim 1, wherein each of said source electrode and said drain electrode is a single layer made of a metal having a high melting point or a two-layered film containing an upper layer made of a metal having a high melting point and a lower layer made of Al (aluminum) or an Al alloy, or a three-layered film containing an upper layer made of a metal having a high melting point, an intermediate layer made of Al (Aluminum) or an Al alloy and a lower layer made of a metal having a high melting point.
5. The method for manufacturing the liquid crystal display providing said wide viewing angle according to claim 3, wherein said metal having a high melting point is Cr (chromium) or Mo (molybdenum).
6. The method for manufacturing the liquid crystal display providing said wide viewing angle according to claim 4, wherein said metal having a high melting point is Cr (chromium) or Mo (molybdenum).
7. The method for manufacturing the liquid crystal display providing said wide viewing angle according to claim 1, wherein said insulating film is photosensitive.
8. A method for manufacturing a liquid crystal display providing a wide viewing angle in which a display with a wide viewing angle is enabled by placing a common electrode and a pixel electrode on a protecting film of a thin film transistor and by rotating a direction of a molecular axis of a liquid crystal molecule making up of a liquid crystal layer in a hermetically sealed manner on a surface being parallel to a surface of an active matrix substrate, said method comprising:
a process of forming a gate electrode metal layer on a transparent insulating substrate and forming a gate electrode by patterning using photolithography;
a process of sequentially forming an interlayer insulating film, an a-Si layer (amorphous silicon), an n a-Si (high concentration n-type amorphous silicon) layer, and a drain electrode metal layer on said transparent insulating substrate and forming a drain line and an island by removing an unwanted portion of said drain electrode metal layer and performing patterning and then ashing processing on portions being not exposed and performing reflow processing using photolithography employing a photo resist having a plurality of regions each having a different thickness and then by removing a part of said n a-Si layer and a part of said a-Si layer and then by peeling said photo resist having undergone said reflow processing;
a process of forming an insulating film on said transparent insulating substrate and forming an insulating film contact which passes through said insulating film and is used to provide a connection to a source electrode of said island at a specified position by patterning using photolithography; and
a process of forming a transparent conductive film which becomes a pixel electrode on said transparent insulating substrate and forming said pixel electrode and said common electrode by removing unwanted portions of said transparent conductive film by patterning using photolithography and of connecting said pixel electrode to said source electrode.
9. The method for manufacturing the liquid crystal display providing said wide viewing angle according to claim 8, wherein said insulating film is made up of an inorganic insulating film existing at a lower portion of said insulating layer and of an organic insulating film existing at a upper portion of said insulating layer and wherein, after an aperture portion is formed at a specified position of said organic insulating film existing at said upper portion of said insulating film by photolithography, etching is performed on said inorganic insulating film existing at said lower portion of said insulating film using said organic insulating film existing at said upper portion of said insulating film as a mask.
10. The method for manufacturing the liquid crystal display providing said wide viewing angle according to claim 8, wherein said gate electrode is a single layer made of a metal having a high melting point or is a two-layered film containing an upper layer made of a metal having a high melting point and a lower layer made of Al (aluminum) or an Al alloy.
11. The method for manufacturing the liquid crystal display providing said wide viewing angle according to claim 8, wherein each of said source electrode and said drain electrode is a single layer made of a metal having a high melting point or a two-layered film containing an upper layer made of a metal having a high melting point and a lower layer made of Al (aluminum) or an Al alloy, or a three-layered film containing an upper layer made of a metal having a high melting point, an intermediate layer made of Al (Aluminum) or an Al alloy and a lower layer made of a metal having a high melting point.
12. The method for manufacturing the liquid crystal display providing said wide viewing angle according to claim 10, wherein said metal having a high melting point is Cr (chromium) or Mo (molybdenum).
13. The method for manufacturing the liquid crystal display providing said wide viewing angle according to claim 11, wherein said metal having a high melting point is Cr (chromium) or Mo (molybdenum).
14. The method for manufacturing the liquid crystal display providing said wide viewing angle according to claim 8, wherein said insulating film is photosensitive.
15. A method for manufacturing a liquid crystal display providing a wide viewing angle in which a display with a wide viewing angle is enabled by placing a common electrode and a pixel electrode on a protecting film of a thin film transistor and by rotating a direction of a molecular axis of a liquid crystal molecule making up of a liquid crystal layer in a hermetically sealed manner on a surface being parallel to a surface of an active matrix substrate, said method comprising:
a process of forming a gate electrode metal layer on a transparent insulating substrate and forming a gate electrode by patterning using photolithography;
a process of sequentially forming an interlayer insulating film, an a-Si layer (amorphous silicon), an n a-Si layer (high concentration n-type amorphous silicon), and a drain electrode metal layer on said transparent insulating substrate and forming a drain line and an island by removing unwanted portions of said a-Si layer, said n a-Si layer, and said drain electrode metal layer and performing patterning and then performing ashing processing on portions being not exposed employing photo-lithography using a photo resist having a plurality of regions each having a different thickness and then by removing a specified part of said a-Si layer, said n a-Si layer and said drain electrode metal layer and then by peeling said portions being not exposed;
a process of forming an insulating film on said transparent insulating substrate and forming an insulating film contact which passes through said insulating film and is used to provide a connection to a source electrode of said island at a specified position by patterning using photolithography; and
a process of forming a transparent conductive film which becomes a pixel electrode on said transparent insulating substrate and forming said pixel electrode and said common electrode by removing unwanted portions of said transparent conductive film by patterning using photolithography and of connecting said pixel electrode to said source electrode.
16. The method for manufacturing the liquid crystal display providing said wide viewing angle according to claim 15, wherein said insulating film is made up of an inorganic insulating film existing at a lower portion of said insulating layer and of an organic insulating film existing at a upper portion of said insulating layer and wherein, after an aperture portion is formed at a specified position of said organic insulating film existing at said upper portion of said insulating film by photolithography, etching is performed on said inorganic insulating film existing at said lower portion of said insulating film using said organic insulating film existing at said upper portion of said insulating film as a mask.
17. The method for manufacturing the liquid crystal display providing said wide viewing angle according to claim 15, wherein said gate electrode is a single layer made of a metal having a high melting point or is a two-layered film containing an upper layer made of a metal having a high melting point and a lower layer made of Al (aluminum) or an Al alloy.
18. The method for manufacturing the liquid crystal display providing said wide viewing angle according to claim 15, wherein each of said source electrode and said drain electrode is a single layer made of a metal having a high melting point or a two-layered film containing an upper layer made of a metal having a high melting point and a lower layer made of Al (aluminum) or an Al alloy, or a three-layered film containing an upper layer made of a metal having a high melting point, an intermediate layer made of Al (Aluminum) or an Al alloy and a lower layer made of a metal having a high melting point.
19. The method for manufacturing the liquid crystal display providing said wide viewing angle according to claim 17, wherein said metal having a high melting point is Cr (chromium) or Mo (molybdenum).
20. The method for manufacturing the liquid crystal display providing said wide viewing angle according to claim 1, wherein said metal having a high melting point is Cr (chromium) or Mo (molybdenum).
21. The method for manufacturing the liquid crystal display providing said wide viewing angle according to claim 15, wherein said insulating film is photosensitive.
22. A method for manufacturing a liquid crystal display providing a wide viewing angle in which a display with a wide viewing angle is enabled by placing a common electrode and a pixel electrode on a protecting film of a thin film transistor and by rotating a direction of a molecular axis of a liquid crystal molecule making up of a liquid crystal layer in a hermetically sealed manner on a surface being parallel to a surface of an active matrix substrate, said method comprising:
a process of sequentially forming a gate electrode metal layer, a gate insulator, and an a-Si (amorphous silicon) layer on a transparent insulating substrate and forming an island made up of a gate electrode, a gate insulating film, and a semiconductor layer by patterning using photolithography;
a process of sequentially forming an interlayer insulating film and a drain electrode metal layer on said transparent insulating substrate and forming a drain line by removing a specified region of said drain electrode metal layer by patterning using photolithography;
a process of forming an insulating film on said transparent insulating substrate and forming an insulating film contact which passes through said insulating film and is used to provide a connection to a source electrode and a drain electrode at a specified position by a printing method; and
a process of forming a transparent conductive film on said transparent insulating substrate and forming said pixel electrode and said common electrode each having a comb-teeth-like configuration by removing unwanted portions of said transparent conductive film so that said pixel electrode and said common electrode are arranged in a staggered manner by patterning using photolithography and of connecting said source electrode to said pixel electrode and connecting said drain electrode to said drain line.
23. The method for manufacturing the liquid crystal display providing said wide viewing angle according to claim 22, wherein said insulating film is made up of an inorganic insulating film existing at a lower portion of said insulating layer and of an organic insulating film existing at a upper portion of said insulating layer and wherein, after an aperture portion is formed at a specified position of said organic insulating film existing a at said upper portion of said insulating film by photolithography, etching is performed on said inorganic insulating film existing at said lower portion of said insulating film using said organic insulating film existing at said upper portion of said insulating film as a mask.
24. The method for manufacturing the liquid crystal display providing said wide viewing angle according to claim 22, wherein said gate electrode is a single layer made of a metal having a high melting point or is a two-layered film containing an upper layer made of a metal having a high melting point and a lower layer made of Al (aluminum) or an Al alloy.
25. The method for manufacturing the liquid crystal display providing said wide viewing angle according to claim 22, wherein each of said source electrode and said drain electrode is a single layer made of a metal having a high melting point or a two-layered film containing an upper layer made of a metal having a high melting point and a lower layer made of Al (aluminum) or an Al alloy, or a three-layered film containing an upper layer made of a metal having a high melting point, an intermediate layer made of Al (Aluminum) or an Al alloy and a lower layer made of a metal having a high melting point.
26. A method for manufacturing a liquid crystal display providing a wide viewing angle in which a display with a wide viewing angle is enabled by placing a common electrode and a pixel electrode on a protecting film of a thin film transistor and by rotating a direction of a molecular axis of a liquid crystal molecule making up of a liquid crystal layer in a hermetically sealed manner on a surface being parallel to a surface of an active matrix substrate, said method comprising:
a process of forming a gate electrode metal layer on a transparent insulating substrate and forming a gate electrode by patterning using photolithography;
a process of sequentially forming an interlayer insulating film, an a-Si layer (amorphous silicon), an n a-Si layer (high concentration n-type amorphous silicon), and a drain electrode metal layer on said transparent insulating substrate and forming a drain line and an island by removing unwanted portions of said drain electrode metal layer and performing patterning and then ashing and reflow processing on portions being not exposed employing photolithography using a photo resist having a plurality of regions each having a different thickness and then by removing a part of said n a-Si layer and a part of said a-Si layer and by peeling said photo resist having undergone said reflow processing;
a process of forming an insulating film on said transparent insulating substrate and forming an insulating film contact which passes through said insulating film and is used to provide a connection to a source electrode of said island at a specified position by a printing method; and
a process of forming an transparent conductive film which becomes said pixel electrode on said transparent insulating substrate and forming said pixel electrode and said common electrode by removing unwanted portions of said transparent conductive film by patterning using photolithography and of connecting said pixel electrode to said source electrode.
27. The method for manufacturing the liquid crystal display providing said wide viewing angle according to claim 26, wherein said insulating film is made up of an inorganic insulating film existing at a lower portion of said insulating layer and of an organic insulating film existing at a upper portion of said insulating layer and wherein, after an aperture portion is formed at a specified position of said organic insulating film existing at said upper portion of said insulating film by photolithography, etching is performed on said inorganic insulating film existing at said lower portion of said insulating film using said organic insulating film existing at said upper portion of said insulating film as a mask.
28. The method for manufacturing the liquid crystal display providing said wide viewing angle according to claim 26, wherein said gate electrode is a single layer made of a metal having a high melting point or is a two-layered film containing an upper layer made of a metal having a high melting point and a lower layer made of Al (aluminum) or an Al alloy.
29. The method for manufacturing the liquid crystal display providing said wide viewing angle according to claim 26, wherein each of said source electrode and said drain electrode is a single layer made of a metal having a high melting point or a two-layered film containing an upper layer made of a metal having a high melting point and a lower layer made of Al (aluminum) or an Al alloy, or a three-layered film containing an upper layer made of a metal having a high melting point, an intermediate layer made of Al (Aluminum) or an Al alloy and a lower layer made of a metal having a high melting point.
30. A method for manufacturing a liquid crystal display providing a wide viewing angle in which a display with a wide viewing angle is enabled by placing a common electrode and a pixel electrode on a protecting film of a thin film transistor and by rotating a direction of a molecular axis of a liquid crystal molecule making up of a liquid crystal layer in a hermetically sealed manner on a surface being parallel to a surface of an active matrix substrate, said method comprising
a process of forming a gaze electrode metal layer on a transparent insulating substrate and forming a gate electrode by patterning using photolithography;
a process of sequentially forming an interlayer insulating film, an a-Si layer (amorphous silicon), an n a-Si (high concentration n-type amorphous silicon) layer, and a drain electrode metal layer on said transparent insulating substrate and forming a drain line and an island by removing unwanted portions of said a-Si layer, said no a-Si layer and said drain electrode metal layer and performing patterning and then ashing on portions being not exposed employing photolithography using a photo resist having a plurality of regions each having a different thickness and then by removing a specified part of said a-Si layer, said n a-Si layer, and said drain electrode metal layer and then by peeling said portions being not exposed;
a process of forming an insulating film on said transparent insulating substrate and forming an insulating film contact which passes through said insulating film and is used to provide a connection to a source electrode of said island at a specified position by a printing method; and
a process of forming a transparent conductive film which becomes said pixel electrode on said transparent insulating substrate and forming said pixel electrode and said common electrode by removing unwanted portions of said transparent conductive film by patterning using photolithography and of connecting said pixel electrode to said source electrode.
31. The method for manufacturing the liquid crystal display providing said wide viewing angle according to claim 30, wherein said insulating film is made up of an inorganic insulating film existing at a lower portion of said insulating layer and of an organic insulating film existing at a upper portion of said insulating layer and wherein, after an aperture portion is formed at a specified position of said organic insulating film existing at said upper portion of said insulating film by photolithography, etching is performed on said inorganic insulating film existing at said lower portion of said insulating film using said organic insulating film existing at said upper portion of said insulating film as a mask.
32. The method for manufacturing the liquid crystal display providing said wide viewing angle according to claim 30, wherein said gate electrode is a single layer made of a metal having a high melting point or is a two-layered film containing an upper layer made of a metal having a high melting point and a lower layer made of Al (aluminum) or an Al alloy.
33. The method for manufacturing the liquid crystal display providing said wide viewing angle according to claim 30, wherein each of said source electrode and said drain electrode is a single layer made of a metal having a high melting point or a two-layered film containing an upper layer made of a metal having a high melting point and a lower layer made of Al (aluminum) or an Al alloy, or a three-layered film containing an upper layer made of a metal having a high melting point, an intermediate layer made of Al (Aluminum) or an Al alloy and a lower layer made of a metal having a high melting point.

I claim:

1. A cable guide for guiding lines or cables in a guide channel, comprising a plurality of guide links, adjacent guide links being pivotable relative to one another around a pivoting axis, the guide links having side parts to limit movement of a guided line transverse to the cable guide, wherein the cable guide is disposable in a curved orientation, forming opposite upper and lower strands and a deflection zone between them, and wherein the pivoting axis is located below (as seen from the upper strand) a middle of the guide links in a region of the guide links facing the opposite strand when the cable guide is disposed in the curved orientation, and the guide links having tensile force-absorbing elements that absorb tensile forces acting in a longitudinal direction of the cable guide when the cable guide is in an essentially extended position.
2. The cable guide according to claim 1, wherein the tensile force-absorbing elements are designed as positive locking elements.
3. The cable guide according to claim 1, wherein the tensile force-absorbing elements are arranged on the side parts.
4. The cable guide according to claim 1, wherein the tensile force-absorbing elements are arranged on an area of the guide links below the middle of the guide link in a half of the guide link which is directed toward a bottom side of the guide link, as seen from the upper strand of the cable guide in the curved orientation.
5. The cable guide according to claim 2, wherein with adjacent guide links in an angled position relative to one another, an effect of the positive locking elements can be disabled as intended by at least one pivoting motion of the guide links.
6. The cable guide according to claim 5, wherein the positive locking elements are designed such that, in order to disconnect a positive connection, the guide links are pivotable about an axis parallel to the pivoting axis of the guide links during a travel motion of the cable guide.
7. The cable guide according to claim 2, wherein, with adjacent guide links in an angled position relative to one another, an effect of the positive locking elements can be disabled as intended by at least one translatory motion of the guide links.
8. The cable guide according to claim 7, wherein the positive locking elements are designed such that, in order to disconnect a positive connection, the adjacent guide links are movable in translatory fashion relative to one another in a direction perpendicular to the pivoting axis of the guide links.
9. The cable guide according to claim 2, wherein the tensile force-absorbing, positive locking elements are provided on adjacent guide links as projections extending parallel to the side parts and protruding into a plane perpendicular to the pivoting axis and into corresponding recesses.
10. The cable guide according to claim 1, wherein elements are provided to guide adjacent guide links on one another over at least a segment of a pivoting angle of the guide links.
11. The cable guide according to claim 10, wherein the tensile force-absorbing elements are arranged where the guide links come into tensile force-absorbing engagement with each other spaced from the pivoting axis.
12. The cable guide according to claim 11, wherein the guides are designed as corresponding arc segment-shaped guide surfaces extending in a plane perpendicular to the pivoting axis, which surfaces are guided on one another over at least a segment of the pivoting angle engaging each other, and wherein the guide surfaces are arranged on the tensile force-absorbing elements.
13. The cable guide according to claim 1, wherein the guide links have stops that limit mutual vertical displacement of the guide links relative to one another over at least part of a pivoting motion of the guide links.
14. The cable guide according to claim 13, wherein the stops are arranged below the middle of the side parts in a region of the side parts facing the opposite strand when the cable guide is disposed in the curved orientation.
15. The cable guide according to claim 1, wherein at least two corresponding pairs of stops are provided that limit the pivoting motion of adjacent guide links in at least one pivoting direction and come into contact one after another.
16. The cable guide according to claim 15, wherein one of the at least two pairs of stops that comes into contact first during the pivoting motion is adjacent to the pivoting axis of adjacent guide links, and another of the at least two pairs of stops that comes into contact at a later point during the pivoting motion is at a greater distance from the pivoting axis.
17. The cable guide according to claim 1, wherein run-up surfaces and corresponding areas that run up on them are provided on surfaces of adjacent guide links that move relative to one another, and wherein a run-up motion has a braking effect on a pivoting motion around the pivoting axis of adjacent guide links.
18. The cable guide according to claim 1, wherein the side parts of adjacent guide links have corresponding projections and recesses that engage one another and are dimensioned such that the guide links are fixed in a press fit in at least one limit position of a pivoting motion of the guide links.
19. The cable guide according to claim 1, wherein a guide strip is provided, which connects the plurality of guide links to one another and extends in the longitudinal direction of the cable guide, and on which the guide links are mounted.

The claims below are in addition to those above.
All refrences to claim(s) which appear below refer to the numbering after this setence.

1. An apparatus comprising:
a light source module configured to be disposed within a dispensing container, wherein;
said light source module is configured to contain a chemiluminescent light source therein; and
said apparatus is configured to activate said chemiluminescent light source upon opening said dispensing container.
2. An apparatus in accordance with claim 1, further comprising said dispensing container.
3. An apparatus in accordance with claim 1, further comprising said chemiluminescent light source.
4. An apparatus in accordance with claim 1, further comprising:
a support structure positioned with said dispensing container, said light source module being positioned within said support structure; and
a dispensing container cap configured to seal said dispensing container, wherein:
said cap is rotationally coupled to said light source module, and
rotational displacement of said dispensing container cap relative to said light source module results in activation of said chemiluminescent light source.
5. An apparatus in accordance with claim 4, wherein each of said container and said light source module is at least one of transparent and translucent to visible light.
6. An apparatus in accordance with claim 4, wherein said rotational displacement further causes a linear displacement of said light source module relative to said support structure.
7. An apparatus in accordance with claim 6, said light source module and said dispensing container cap comprise conformably helix-shaped cams, wherein:
said linear displacement is responsive to said rotational displacement of said conformably helix-shaped cams;
said chemiluminescent light source is compressed in response to said linear displacement;
said chemiluminescent light source is configured to activate upon compression of said chemiluminescent light source; and
said chemiluminescent light source is activated in response to said linear displacement.
8. An apparatus in accordance with claim 7, said chemiluminescent light source further comprising at least one light source module constriction region projecting outwardly from said chemiluminescent light source module toward said support structure, said support structure comprising at least one support structure restriction region projecting inwardly from said support structure toward said light source module, wherein:
said linear displacement causes said at least one light source module constriction region to cooperate with said at least one support structure constriction region to compress and activate said chemiluminescent light source.
9. An apparatus in accordance with claim 8, wherein said at least one light source constriction region and said at least one module restriction region are configured to restrict said chemiluminescent light source from being displaced in a direction opposite said linear displacement.
10. An apparatus in accordance with claim 1, wherein said container is configured to contain a liquid.
11. A method for illuminating a chemiluminescent light source, said method comprising:
rotationally displacing a dispensing container cap relative to a dispensing container comprising said chemiluminescent light source therein, wherein said cap is rotationally coupled to said container.
12. A method in accordance with claim 11, further comprising:
linearly displacing a light source module relative to a support structure in response to said rotational displacement for activating said chemiluminescent light source, wherein:
said support structure is disposed within said container;
said light source module is disposed within said support structure; and
said chemiluminescent light source is disposed within said light source module.
13. A method in accordance with claim 12, wherein each of said container and said light source module is at least one of transparent and translucent to visible light.
14. A method in accordance with claim 12, further comprising:
compressing said chemiluminescent light source in response to said linear displacement.
15. A method in accordance with claim 14, wherein:
said light source module comprises at least one light source module constriction region projecting outwardly from said light source module toward said light support structure;
said support structure comprises at least one support structure restriction region projecting inwardly from said support structure toward said light source module; and
said chemiluminescent light source is activated in response to said at least one light source module constriction region cooperating with said at least one support structure restriction region in response to said linear displacement to compress said chemiluminescent light source.
16. A container for dispensing liquid, said container comprising:
a container portion configured to contain a liquid therein, said container portion defining a container opening at one end of said container portion;
a support structure having a first end and a second end, said support structure being disposed within said container portion, wherein:
said first end of said support structure is concentrically disposed within said container opening;
said second end of said support structure is positioned further within said container portion; and
said second end of said support structure is more narrow than said first end of said support structure;

a light source module disposed within said support structure, wherein:
said light source module comprises a first end and a second end;
said first end of said light source module is concentrically disposed within said first end of said support structure;
said second end of said light source module is concentrically disposed within said second end of said support structure; and
said light source module comprises at least one helix-shaped cam formed on an outer surface of said first end of said light source module;

a chemiluminescent light source disposed within said light source module, wherein:
said chemiluminescent light source is sealed within said light source module; and
said chemiluminescent light source is configured to activate upon compression of said chemiluminescent light source; and

a container cap configured to contain liquid within said container, said container cap comprising at least one helix-shaped cam formed on an inner surface of said container cap, wherein:
when said container cap is positioned over said container opening to seal said container, said at least one helix-shaped cam formed on said inner surface of said container cap and said at least one helix-shaped cam formed on said outer surface of said first end of said light source module, are opposingly positioned such that rotational displacement of said container cap relative to said light source module causes a linear displacement of said light source module relative to said support structure in a direction toward said second end of said support structure, resulting in compression of said light source module and said chemiluminescent light source, resulting in activation of said chemiluminescent light source.
17. A container in accordance with claim 16, wherein:
said light source module comprises at least one light source module constriction region projecting outwardly from said light source module toward said support structure;
said support structure comprises at least one support structure constriction region projecting inwardly toward said light source module; and
said linear displacement causes said at least one light source module constriction region to cooperate with said at least one support structure restriction region to compress and activate said chemiluminescent light source.
18. An apparatus in accordance with claim 4, wherein the support structure includes an inner module and an outer module.
19. An apparatus in accordance with claim 18, wherein the inner module includes splines formed at one end thereof.
20. An apparatus in accordance with claim 19, wherein the splines substantially prevent movement of the end of the inner module.