Author: claimsbot

1. In data processing apparatus wherein information in processing is arranged with the data having an address portion and a to be stored portion,
the improvement comprising:
said processing including a selective capability of directing information in said address portion in a separate processing path without disturbing information in said to be stored portion.
2. The improvement of claim 1 wherein said processing includes:
a separate path in said apparatus for said information address portion, said separate path passing around addressable storage locations for said to be stored information portion, and,
implementation means adapted to direct said information address portion to said separate path.
3. The improvement of claim 2 further including in said processing, a further processing capability
said further processing capability being responsive to data arriving at said addressable storage locations through said separate path.
4. The improvement of claim 3 wherein said separate path for said information address portion includes
address includes address register means for correlation with memory locations in a memory assembly through a serializer with an output buffer, and, said further processing capability including timing register through serializer and output buffer means.
5. The improvement of claim 2 wherein said implementation means operates to disable entry of said to be stored information portion into said memory assembly.
6. In a data processing memory assembly of the type having an input port, an output port, and containing information stored in a plurality of addressable storage locations,
said memory assembly being responsive in processing to data having an address information portion and a to be stored portion,

the improvement comprising
said processing including a selective capability of directing said address information portion of said data appearing in a data path to said plurality of addressable storage locations in a separate processing path without disturbing said information stored in said plurality of addressable storage locations.
7. In a data processing memory assembly of the type having an input port, an output port, and containing information stored in a plurality of addressable storage locations,
said memory assembly being responsive in processing to data having an address information portion and a to be stored portion,

the improvement comprising
said processing including a selective capability of directing said address information portion of said data appearing in a data path to said plurality of addressable storage locations in a separate processing path without disturbing said information stored in said plurality of addressable storage locations.
8. The improvement of claim 7 wherein said selective capability includes
a separate address information path around said addressable storage locations to said output port, and,
a processing instruction implementing the directing of said address information portion of said data to said separate path.
9. The improvement of claim 8 including a data processing capability responsive to data through said separate path delivered to said output port.
10. The improvement of claim 9 wherein said separate address information path is from an address register in said memory assembly through a serializer to an output buffer in said memory assembly, and said processing instruction is from a timing register through a serializer to said output buffer in said memory assembly.
11. The improvement of claim 8 wherein said processing instruction disables entry of to be stored information into said plurality of addressable storage locations.
12. The improvement of claim 8 wherein said processing instruction employs an unused in a standard storage event condition on a terminal in combination with a burst stop command in said memory assembly.

The claims below are in addition to those above.
All refrences to claim(s) which appear below refer to the numbering after this setence.

1. An arrangement for reducing transmitting end losses in a radio apparatus which comprises a receiver and at least one transmitter which, when the apparatus is being used, are occasionally simultaneously in signal transfer state, the arrangement comprising a radio-frequency power amplifier, a transmitting end filter and an antenna, wherein the transmitting end filter comprises at least two antenna filters wholly separated from said receiver, the stop-band attenuation of one of the antenna filters in the operating band of the receiver differing substantially from that of another antenna filter in the operating band of the receiver, and the arrangement further comprises switches to form the transmitting end filter of said antenna filters.
2. An arrangement according to claim 1, said switches being MEMS switches.
3. An arrangement according to claim 1, said switches being arranged to form the transmitting end filter using that one of first and second antenna filters which has a lower stop-band attenuation, when the receiver is in passive state.
4. An arrangement according to claim 1, said switches being arranged to include in the transmitting-end filter that one of first and second antenna filters which has a higher stop-band attenuation only when the receiver is in receive state.
5. An arrangement according to claim 3, the antenna filter of said antenna filters which has a lower stop-band attenuation being a low-pass-type filter and the one with a higher stop-band attenuation being a band-pass filter.
6. An arrangement according to claim 5, said transmitting end filter being the band-pass filter when the receiver is in receive state.
7. An arrangement according to claim 5, said transmitting end filter being a series connection of the low-pass-type filter and the band-pass filter when the receiver is in receive state.
8. An arrangement according to claim 1, at the transmitting end of the radio apparatus being in addition to the first and second antenna filters at least one bandpass filter, any one of which filters can be connected as the transmitting end filter by means of said switches.
9. An arrangement according to claim 1, said transmitter being one that operates at a frequency above 1.7 GHz and the receiver is a GPS receiver.
10. An arrangement according to claim 1, said transmitter and said receiver being a transmitter and a receiver in one and the same radio system.
11. An arrangement according to claim 1, said radio apparatus being arranged to operate in a first system and in a second system, which both use a same frequency band non-simultaneously, and the power amplifier is common to the transmitters conform to the both systems and the receiver is a receiver conform to the first system, the antenna end of which receiver is shared with the receiver conform to the second system.
12. An arrangement according to claim 11, the first system being WCDMA and the second system being GSM.
13. A method for reducing transmitting end losses in a radio apparatus having a receiver and at least one transmitter which, when the apparatus is being used, are occasionally simultaneously in signal transfer state, a radio-frequency power amplifier, a transmitting end filter comprising at least two antenna filters wholly separate from said receiver, and an antenna, the stop-band attenuation of one of the antenna filters in the operating band of the receiver differing substantially from that of another antenna filter in the operating band of the receiver, the method comprising:
that one of the antenna filters which has the lowest stop-band attenuation is switched as the transmitting end filter when the receiver is in passive state,
that one of the antenna filters which has a higher stop-band attenuation is switched as at least part of the transmitting end filter when the receiver is in receive state, and
the power of the power amplifier is adjusted after each change of transmitting end filter to keep the transmitting power within allowed limits.
14. A mobile station comprising a receiver and at least one transmitter which, when the apparatus is being used, are occasionally simultaneously in signal transfer state, a radio frequency power amplifier, a transmitting end filter, and an antenna, wherein the transmitting end filter comprises at least two antenna filters wholly separated from said receiver, the stop-band attenuation of one of the antenna filters in the operating band of the receiver differing substantially from that of another antenna filter in the operating band of the receiver, the mobile station further comprising at the transmitting end MEMS switches arranged to switch that one of said antenna filters which has the lowest stop-band attenuation as the transmitting end filter when the receiver is in passive state, and to switch that one of said antenna filters which has the higher stop-band attenuation as at least part of the transmitting end filter when the receiver is in receive state.

1. A method, comprising:
processing a plurality of workpieces using a processing tool;
acquiring a continuous value relating to said processing of said plurality of workpieces;
defining an area common to said plurality of workpieces, said area comprising at least one common die location of said workpieces;
determining whether a predetermined percentage of continuous value results respectively corresponding to said plurality of workpieces are above a desired level;
assigning a first binary value to said area based upon determining that said predetermined percentage of continuous value results respectively corresponding to said plurality of workpieces are above a desired level;
assigning a second binary value to said area based upon determining that said predetermined percentage of continuous value results respectively corresponding to said plurality of workpieces are below a desired level; and
adjusting said processing of said plurality of workpieces in response to at least one of the first binary value being assigned to said area of the plurality of workpieces or the second binary value being assigned to said area of the plurality of workpieces.
2. The method of claim 1, further comprising performing at least one of a feedback process and a feed-forward process adjustment based upon said pattern recognition analysis.
3. The method of claim 2, further comprising processing a subsequent workpiece based upon said at least one of said feedback process and said feed-forward process.
4. The method of claim 1, further comprising generating a wafer map using said area.
5. The method of claim 1, wherein acquiring a continuous value comprises acquiring at least one of a performance characteristic associated with said area, a parametric data, and a metrology data associated with said area.
6. The method of claim 5, wherein acquiring said metrology data associated with said area comprises acquiring data relating to at least one of a thickness of a layer, a photolithography process parameter, an etch result parameter, a chemical-mechanical polishing result parameter, a deposition process result parameter, and an ion implant process result parameter.
7. The method of claim 5, wherein acquiring a performance characteristic associated with said area further comprises acquiring information regarding speed associated with a die region associated with said area.
8. A method, comprising:
processing a plurality of workpieces using a processing tool;
acquiring a continuous value data relating to processing a plurality of workpieces;
defining a region common to said plurality of workpieces, said region comprising at least one common die region of said workpieces;
determining whether a predetermined percentage of continuous value data results respectively corresponding to said plurality of workpieces are above a desired level;
assigning a first binary value to said region based upon determining that said predetermined percentage of continuous value data results respectively corresponding to said plurality of workpieces are above a desired level;
assigning a second binary value to said region based upon determining that said predetermined percentage of continuous value data results respectively corresponding to said plurality of workpieces are below a desired level;
performing a pattern recognition analysis based upon said first and second binary values; and
adjusting said processing of said plurality of workpieces in response to at least one of the first binary value being assigned to said area of the plurality of workpieces or the second binary value being assigned to said area of the plurality of workpieces.
9. The method of claim 8, further comprising performing at least one of a feedback process and a feed-forward process adjustment based upon said pattern recognition analysis.
10. The method of claim 9, further comprising processing a subsequent workpiece based upon said at least one of said feedback process and said feed-forward process.
11. The method of claim 2, further comprising generating a wafer map using said region.
12. The method of claim 2, wherein acquiring a continuous value comprises acquiring at least one of a performance characteristic associated with said region, a parametric data, and a metrology data associated with said region.
13. The method of claim 12, wherein acquiring said metrology data associated with said region comprises acquiring data relating to at least one of a thickness of a layer, a photolithography process parameter, an etch result parameter, a chemical-mechanical polishing result parameter, a deposition process result parameter, and an ion implant process result parameter.
14. The method of claim 12, wherein acquiring a performance characteristic associated with said region further comprises acquiring information regarding speed associated with a die region associated with said region.
15. A system, comprising:
a plurality of workpieces;
a processing tool to process said plurality of workpieces;
a measurement tool to acquire continuous value data relating to said plurality of workpieces;
a controller to organize said continuous value data to associated results relating to said continuous value data into a region common to said plurality of workpiece, said controller to also determine whether a predetermined percentage of organized continuous value data associated with said region is above a predetermined level, said controller to assign a first binary value to said region based upon determining that said predetermined percentage of organized continuous value data is above a desired level and assign a second binary value to said region based upon determining that said predetermined percentage of organized continuous value data is below a predetermined level;
wherein said processing of said plurality of workpieces further comprises adjusting said processing of said plurality of workpieces in response to at least one of the first binary value being assigned to said area of the plurality of workpieces or the second binary value being assigned to said area of the plurality of workpieces.
16. The system of claim 15, wherein said processing tool is adapted to process a subsequent workpiece.
17. The system of claim 15, further comprising a pattern recognition unit to perform a pattern recognition analysis based upon said first and said second binary values.
18. The system of claim 17, wherein said controller also to perform at least one of a feedback adjustment and a feed-forward adjustment to a subsequent process based upon said pattern recognition analysis.
19. The system of claim 15, further comprising database to store said continuous value data.
20. A non-transitory, computer readable storage device adapted to store instructions that, when executed, perform a method, the method comprising:
processing a plurality of workpieces;
acquiring a continuous value data relating to processing a plurality of workpieces;
defining a region common to said plurality of workpieces, said region comprising at least one common die region of said workpieces;
determining whether a predetermined percentage of continuous value data results respectively corresponding to said plurality of workpieces are above a desired level;
assigning a first binary value to said region based upon determining that said predetermined percentage of continuous value data results respectively corresponding to said plurality of workpieces are above a desired level;
assigning a second binary value to said region based upon determining that said predetermined percentage of continuous value data results respectively corresponding to said plurality of workpieces are below a desired level;
performing a pattern recognition analysis based upon said first and second binary values; and
adjusting said processing of said plurality of workpieces in response to at least one of the first binary value being assigned to said region of the plurality of workpieces or the second binary value being assigned to said region of the plurality of workpieces.

The claims below are in addition to those above.
All refrences to claim(s) which appear below refer to the numbering after this setence.

1. Sensor apparatus for measuring the temperature of a pane surface comprising:
a temperature sensor mounted to a circuit board and positioned in a front end of the circuit board in the direct vicinity of the pane surface to be measured; and
a flexible heat conducting clement disposed between the surface to be measured and the circuit board in order that heat from the pane surface is transferred to the temperature sensor via the flexible heat conducting element and the circuit board and the temperature sensor measures the temperature of the pane surface.
2. Sensor apparatus according to claim 1, wherein the flexible heat conducting element is L-shaped and has a leg that is in contact with the surface to be measured, and a leg that is in flat contact with the circuit board.
3. Sensor apparatus according to claim 2, wherein a front side of the flexible heat conducting element, associated with the surface, has a smooth surface and is rounded at least at edges thereof.
4. Sensor apparatus according to claim 2, wherein the flexible heat conducting element comprises a heat conducting metal selection from a group consisting of copper, aluminium, brass, and bronze.
5. Sensor apparatus according to claim 2, further comprising means for providing resilient abutment of the heat conducting element on the surface.
6. Sensor apparatus according to claim 2, wherein the circuit board and the flexible heat conducting element flatly abut each other in the area of the temperature sensor.
7. Sensor apparatus according to claim 1, wherein the heat conducting element is displaceable with respect to the surface.
8. Sensor apparatus according to claim 1, wherein the circuit board is metalized at the front end, on a side opposite to the temperature sensor and on side surfaces and includes conductor paths for the temperature sensor.
9. Sensor apparatus according to claim 8, further comprises through connections in the circuit board in the vicinity of the temperature sensor.
10. Sensor apparatus according to claim 1 further comprising an evaluation unit disposed on the circuit board.