Author: claimsbot

What is claimed is:

1. A portable vibrator for relaxation and meditation comprising:
an internal vibrator including a vibration motor, a charging battery connected to a charging terminal block for activating the vibration motor, and a one-touch on-off switch of the vibration motor;
an upper cover for covering the internal vibrator to a sealed state and which is made of foamed polyurethane; and
a lower cover having a hole for exposing the charging terminal block to the outside and formed by foaming to be attached to the upper cover;
wherein the internal vibrator is covered to a sealed state by the upper cover and the lower cover.
2. The portable vibrator in claim 1, wherein said vibration motor is activated by pressing a part of the upper cover and the activated motor is stopped by pressing the part again with the one-touch switch situated inside the upper cover in one hand.
3. The portable vibrator in claim 1, wherein said upper cover and said lower cover have brain-shaped surfaces.
4. The portable vibrator in claim 1, wherein said vibration motor is an eccentric motor with about 6,0008,000 rpm.
5. A portable vibrator for relaxation and meditation comprising:
an internal vibrator including a vibration motor, dry cells for activating the vibration motor, and a one-touch on-off switch of the vibration motor;
an outer cover for covering the internal vibrator to a sealed state, which is made of a soft material; and
an opening lid formed at one part of the outer cover and made of a soft material;
wherein the internal vibrator is covered to a sealed state by the upper cover and the lower cover.
6. The portable vibrator in claim 5, wherein said soft material is silicon or a soft plastic material.
7. The portable vibrator in claim 5, wherein said vibration motor is activated by pressing a part of the upper cover and the activated motor is stopped by pressing the part again with the one-touch switch situated inside the upper cover in one hand.
8. The portable vibrator in claim 5, wherein said upper cover and said lower cover have brain-shaped surfaces.
9. The portable vibrator in claim 5, wherein said vibration motor is an eccentric motor with about 6,0008,000 rpm.
10. The portable vibrator in claim 5, wherein said soft material is translucent or transparent.
11. The portable vibrator in claim 10 further comprising a light emitting diode that is installed at the top of the internal vibrator, being activated with the vibration motor.
12. The portable vibrator in claim 5, wherein said internal vibrator includes a constant voltage circuit for maintaining the voltage of the vibration motor constantly.

The claims below are in addition to those above.
All refrences to claim(s) which appear below refer to the numbering after this setence.

1. A composition comprising: at least one B vitamin; vitamin C; vitamin E; a creatine compound; leucine; taurine; a carbohydrate; Gamma-Immunobutyric Acid (GABA); acetylcarnitine or carnitine; and a fat andor protein source.
2. The composition of claim 1, wherein the composition is a liquid composition, wherein the liquid composition further comprises water andor alcohol in a quantity sufficient to provide a beverage for consumption by humans.
3. The composition of claim 2, wherein the liquid composition contains: 10 g of carbohydrate; 500 mg of acetylcarnitine; 1000 mg of taurine, 1 g of creatine; 1 g of leucine and 2.5 g of GABA.
4. The composition of claim 2, wherein the liquid composition contains: 20 g of carbohydrate; 20 g of protein; 5 g of fat (medium chain triglycerides); 5 g of leucine; 7.5 g of creatine; 5 g of GABA; 5 g of taurine; 1000 mg of choline; 3 g of acetylcarnitine; 500 mg of vitamin D and calcium.
5. The composition of claim 2, wherein the liquid composition further comprises one or more essential fatty acids, caffeine, choline, vitamin D, calcium, coenzyme Q10, a ribose, and a short term energy substrate.
6. The composition of claim 5, wherein the liquid composition contains: about 0.01 to 10 g of creatine monohydrate; about 750 mg of vitamin E; about 0.01 to 30 mg of vitamin C, about 0.01-20 g of leucine; about 0.01-10 g of GABA; 0.01-10 g of acetylcarnitine; 0.01-5 g of choline; 0.01-10 g of taurine; about 0.01-1200 mg of vitamin D; about 0.01-1200 mgday of calcium, about 0.01-10 g of caffeine; about 0.10-50 g of ribose; at least one or any combination of more than one of the following B vitamins: B1 (thiamine mononitrate) at about 1 to 20 mg; B2 (riboflavin) at about 1 to 20 mg; B3 (niacinamide) 0.01 mg to 10 g); B5 at about 1 to 50 mg; B6 at about 1 to 10 mg; Biotin at about 1 to 300 micrograms; Folic acid at about 1 to 400 micrograms; B12 at about 1 to 1000 micrograms; one or more essential fatty acids; a carbohydrate; and a protein source.
7. The composition of claim 6, wherein the protein source is selected from the group consisting of: whey protein 0.01 to 30 g, soy protein 0.01 to 30 g, casein protein 0.01 to 30 g, albumin 0.01 to 30 g including one or more of the following fat sources: sunflower oil 0.01 to 30 g, canola oil 0.01 to 30 g, safflower 0.01 to 30 g, or medium chain triglycerides.
8. The composition of claim 6, wherein the carbohydrate is selected from the group consisting of: glucose 0.01 to 50 g, sucrose 0.01 to 50 g, lactose 0.01 to 50 g along with 0.01 to 10 g of fibers methylcelluloses (hydroxyproply-, carboxy), pectins, carageenan, acacia, tragacanth, guar, xanthan, arabinogalactan, inulin, konjac flour, and polydextrose.
9. The composition of claim 1, wherein the composition is a concentrated liquid composition for reconstitution with any orally ingestible liquid.
10. The composition of claim 9, wherein the composition contains: 0.01 to 5.00 g of creatine monohydrate; about 500 to 15000 mg of GABA, 0.01-10 g acetylcarnitine; about 0.01-300 mg of R-alpha lipoic acid; about 35 grams of ribose; about 2 g of leucine; about 1 to 50 mg of choline; 20-120 mg of vitamin C (ascorbic acid); at least one or any combination of more than one of the following B vitamins: B1 (thiamine mononitrate) at about 1 to 20 mg; B2 (riboflavin) at about 1 to 20 mg; B3 (niacinamide) at about 5 to 25 mg; B5 at about 1 to 50 mg; B6 at about 1 to 10 mg; Biotin at about 1 to 300 micrograms; Folic acid at about 1 to 400 micrograms; B12 at about 1 to 1000 micrograms; vitamin E at about 0.1-5 mg alpha-tocopherol; taurine at about 0.01-2 g, protein at about 0.1-40 gserving, fat at about 0.01-10 g; and carbohydrate at 0.01 to 27 g.
11. The composition of claim 1, wherein the composition is a solid composition for reconstitution with any orally ingestible liquid or solid.
12. The composition of claim 11, wherein the composition contains: 0.01 to 5.00 g of creatine monohydrate; about 500 to 15000 mg of GABA, 0.01-10 g acetylcarnitine; about 0.01-300 mg of R-alpha lipoic acid; about 35 grams of ribose; about 2 g of leucine; about 1 to 50 mg of choline; 20-120 mg of vitamin C (ascorbic acid); at least one or any combination of more than one of the following B vitamins: B1 (thiamine mononitrate) at about 1 to 20 mg; B2 (riboflavin) at about 1 to 20 mg; B3 (niacinamide) at about 5 to 25 mg; B5 at about 1 to 50 mg; B6 at about 1 to 10 mg; Biotin at about 1 to 300 micrograms; Folic acid at about 1 to 400 micrograms; B12 at about 1 to 1000 micrograms; vitamin E at about 0.1-5 mg alpha-tocopherol; taurine at about 0.01-2 g, protein at about 0.1-40 gserving, fat at about 0.01-10 g; and carbohydrate at about 6-9% (g100 mL).
13. The composition of claim 11, wherein the composition contains: a complex carbohydrate source of approximately 20 g; a protein source of approximately 15 g; 3 g of fat (medium chain triglycerides); 5 g of creatine phosphate; 5 g of leucine; 5 g of GABA; 5 g of acetylcarnitine; 500 mg of choline 5 g of taurine; 500 mg vitamin D and Calcium; and 10 g of ribose.
14. The composition of claim 11, wherein the solid composition is in the form of a powdergranular mix
15. The composition of claim 11, wherein the solid composition is retained within a container selected from the group consisting of: water permeable cellulose containers; plastic or dissolvable pouches; and plastic containers.
16 The composition of claim 1, wherein the fat source is one that demonstrates and one or more of the following characteristics: high percentage of diacylglycerols (DAGs), high percentage of medium-chain triglycerides (MCTS), non-hydrogenated, and lacks trans-fats.
17. The composition of claim 16, wherein the fat source is selected from the group consisting of: canola, sunflower, soy, and other plant derived oils.
18. The composition of claim 1, wherein the protein source is a vegetable-based protein or an animal based protein, or a combination of the two.
19. The composition of claim 18, wherein the vegetable based protein is provided from any one or more of the following: spelt, quinoa, amaranth, buckwheat, and black rice.
20. The composition of claim 1, further comprising any or more of the following ingredients: vitamin A, vitamin K, para-aminobenzoic acid, niacin, inositol, biotin, magnesium, iron, zinc, copper, manganese, sodium, potassium, calcium, selenium, chromium, molybdenum, chlorine, fluorine, phosphorus, sulfur, iodine, L-arginine (6-21 gday), proprionyl-L-carnitine (0.50-5 gday), coenzyme Q10 (0.01-80 mgday), and taurine (0.5-3 gday), gamma amino butyric acid 0.01-10 gday, acetylcarnitine (0.01-10 gday), bilberry, cascara, cat’s claw, cayenne, cranberry, devil’s claw, dong quai, echinacea, evening primrose oil, feverfew, garlic, ginger, ginkgo, Asian ginseng, Siberian ginseng, goldenseal, gotu kola, grape seed, green tea, hawthorn, kava, licorice, milk thistle, noni, saw palmetto, St. John’s wort, valerian, melatonin, damiana, yerbe mate, guarana, and red yeast rice.
21. The composition of claim 1, further comprising any one or more flavoring compounds selected from the group consisting of: beef, lamb, chicken, turkey, fish, mint, peppermint, spearmint, cinnamon, nutmeg, cloves, ginger, wintergreen, vanilla, fruit, fruit extracts and essences, peppers, chili pepper, chocolate, caramel, sarsaparilla, sassafras, salt, wild cherry, ginger, nutmeg, honey, malt, grain flavors, paprika, and garlic.

1-17. (canceled)
18. A pharmaceutical composition for orally administering progesterone to a subject in need thereof comprising:
suspended progesterone;
solubilized progesterone;
a carrier, the carrier comprising a C6-C14 medium chain oil; and
a non-ionic surfactant.
19. The pharmaceutical composition of claim 18, wherein the carrier comprises at least one of mono-, di-, triglycerides, and combinations thereof, wherein the at least one mono-, di-, and triglycerides are predominantly C6-C12 fatty acid chain lengths.
20. The pharmaceutical composition of claim 19, wherein the at least one mono-, di-, and triglycerides are predominantly about >50 wt % C6-C12 fatty acid chain lengths.
21. The pharmaceutical composition of claim 19, wherein the medium chain oils are predominantly about >50 wt % C6-C12 mono- and diglycerides.
22. The pharmaceutical composition of claim 19, wherein the medium chain oils are predominantly about <10 wt % C6-C12 triglycerides.
23. The pharmaceutical composition of claim 18, wherein the non-ionic surfactant comprises C8 to C18 fatty acid esters of glycerol and polyethylene glycol and has an HLB value of about 15.
24. The pharmaceutical composition of claim 18, wherein the total suspended progesterone and solubilized progesterone comprises from about 25 mg to about 200 mg of progesterone.
25. The pharmaceutical composition of claim 24, wherein the total suspended progesterone and solubilized progesterone is one of the group consisting of 75 mg and 150 mg.
26. The pharmaceutical composition of claim 18, wherein the composition is formulated as a gelatin capsule.
27. The pharmaceutical composition of claim 18, wherein the composition provides increased bioavailability compared to micronized progesterone suspended in peanut oil.
28. A method comprising:
administering to a subject having endometrial hyperplasia a pharmaceutical composition comprising:
suspended progesterone;
solubilized progesterone;
a carrier; and
a non-ionic surfactant;
wherein the carrier comprises a C6-C14 medium chain oil.
29. The method of claim 28, wherein the carrier comprises at least one of mono-, di-, triglycerides, and combinations thereof, wherein the at least one mono-, di-, and triglycerides are predominantly C6-C12 fatty acid chain lengths.
30. The pharmaceutical composition of claim 28, wherein the total suspended progesterone and solubilized progesterone comprises from about 25 mg to about 200 mg of progesterone.
31. The method of claim 28, wherein the composition is formulated as a gelatin capsule.
32. The method of claim 28, wherein the composition comprises increased bioavailability compared to micronized progesterone suspended in peanut oil.
33. A method comprising:
administering to a subject in need of treatment for amenorrhea a pharmaceutical composition comprising:
suspended progesterone;
solubilized progesterone;
a carrier; and
a non-ionic surfactant;
wherein the carrier comprises a C6-C14 medium chain oil.
34. The method of claim 33, wherein the carrier comprises at least one of mono-, di-, triglycerides, and combinations thereof, wherein the at least one mono-, di-, and triglycerides are predominantly C6-C12 fatty acid chain lengths.
35. The pharmaceutical composition of claim 33, wherein the total suspended progesterone and solubilized progesterone comprises from about 25 mg to about 200 mg of progesterone.
36. The method of claim 33, wherein the composition is formulated as a gelatin capsule.
37. The method of claim 33, wherein the composition comprises increased bioavailability compared to micronized progesterone suspended in peanut oil.

The claims below are in addition to those above.
All refrences to claim(s) which appear below refer to the numbering after this setence.

1. A method of forming a FinFET transistor above a semiconductor substrate, wherein the method comprises:
performing at least one etching process so as to define first and second fins in said substrate;
forming a raised isolation post structure between said first and second fins, said raised isolation post structure having an upper surface that is at a level that is approximately equal to or greater than a level of an upper surface of each of said first and second fins, said raised isolation post structure partially defining a first space between said raised isolation post structure and said first fin and a second space between said raised isolation post structure and said second fin, wherein a depth of said first and second spaces defines a final fin height of said respective first and second fins; and
after forming said raised isolation post structure, forming a gate structure around a portion of each of said first and second fins and around a portion of said raised isolation post structure, wherein at least portions of said gate structure are positioned in said first and second spaces.
2. The method of claim 1, wherein forming said gate structure comprises:
depositing a high-k gate insulation material on and in contact with said first and second fins and on and in contact with said raised isolation post structure; and
depositing a work function adjusting metal layer on and in contact with said high-k gate insulation layer.
3. The method of claim 1, wherein forming said gate structure comprises forming said gate structure such that it fills said first and second spaces.
4. The method of claim 1, wherein said upper surface of said raised isolation post structure is level with said upper surface of each of said first and second fins.
5. The method of claim 1, wherein forming said raised isolation post structure between said first and second fins comprises:
forming a liner layer on said first and second fins and above a bottom surface of a trench between said first and second fins, said liner layer defining a recess;
forming a layer of insulating material above said liner layer and in said recess defined by said liner layer; and
performing at least one planarization process on at least said layer of insulating material to thereby define said raised isolation post structure positioned within said recess defined by said liner layer.
6. The method of claim 5, wherein said at least one planarization process is performed until it stops on an upper surface of said liner layer.
7. The method of claim 5, wherein said at least one planarization process is performed until it stops on said upper surfaces of said first and second fins.
8. The method of claim 5, further comprising performing at least one etching process to remove at least some portions of said liner layer positioned on said first and second fins.
9. The method of claim 1, wherein forming said gate structure around a portion of each of said first and second fins and around a portion of said raised isolation post structure comprises depositing a layer of a work function adjusting metal material with a target thickness of about one-half of an overall target thickness of said work function adjusting metal material in a gate cavity and in said first and second spaces.
10. A method of forming a FinFET transistor above a semiconductor substrate, wherein the method comprises:
performing at least one etching process so as to define a plurality of trenches in said substrate that define first and second fins in said substrate;
forming a liner layer on said fins and in the trench between said first and second fins, said liner layer defining a recess;
forming a layer of insulation material between said first and second fins and in said recess defined by said liner layer;
forming a sacrificial gate structure above said first and second fins, said liner layer and said layer of insulating material;
forming a sidewall spacer adjacent said sacrificial gate structure;
removing said sacrificial gate structure so as to define a gate cavity between said sidewall spacers and to expose said liner layer and said layer of insulating material within said gate cavity;
performing an etching process on said exposed portion of said liner layer within said gate cavity so as to remove portions of said liner layer positioned on each of said first and second fins, thereby resulting in the formation of a raised isolation post structure between said first and second fins and a first space and a second space between said raised isolation post structure and said first and second fins, respectively; and
forming a replacement gate structure around a portion of each of said first and second fins and around a portion of said raised isolation post structure within said gate cavity, wherein at least portions of said replacement gate structure are positioned in said first and second spaces.
11. The method of claim 10, wherein forming said replacement gate structure comprises:
depositing a high-k gate insulation material on and in contact with said first and second fins and on and in contact with said raised isolation post structure; and
depositing a work function adjusting metal layer on and in contact with said high-k gate insulation layer.
12. The method of claim 10, wherein forming said replacement gate structure comprises forming said replacement gate structure such that it fills said first and second spaces.
13. The method of claim 10, wherein said raised isolation post structure has an upper surface that is at a level that is approximately equal to or greater than a level of an upper surface of each of said first and second fins.
14. The method of claim 10, wherein an upper surface of said raised isolation post structure is level with an upper surface of each of said first and second fins.
15. The method of claim 10, wherein forming said liner layer and forming said layer of insulation material comprises:
forming said liner layer on said first and second fins and above a bottom surface of the trench between said first and second fins;
forming said layer of insulating material above said liner layer and in said recess defined by said liner layer; and
performing at least one planarization process on at least said layer of insulating material.
16. The method of claim 15, wherein said at least one planarization process is performed until it stops on an upper surface of said liner layer.
17. The method of claim 15, wherein said at least one planarization process is performed until it stops on said upper surfaces of said first and second fins.
18. The method of claim 10, wherein forming said replacement gate structure around a portion of each of said first and second fins and around a portion of said raised isolation post structure comprises depositing a layer of a work function adjusting metal material with a target thickness of about one-half of an overall target thickness of said work function adjusting metal material in a gate cavity and in said first and second spaces.
19. A method of forming a FinFET transistor above a semiconductor substrate, wherein the method comprises:
performing at least one etching process so as to define first and second fins in said substrate;
forming a raised isolation post structure between said first and second fins, said raised isolation post structure having an upper surface that is at a level that is approximately equal to or greater than a level of an upper surface of each of said first and second fins, said raised isolation post structure partially defining a first space between said raised isolation post structure and said first fin and a second space between said raised isolation post structure and said second fin; and
forming a gate structure around a portion of each of said first and second fins and around a portion of said raised isolation post structure, at least portions of said gate structure being positioned in said first and second spaces, wherein forming said gate structure comprises depositing a layer of a work function adjusting metal material with a target thickness of about one-half of an overall target thickness of said work function adjusting metal material in a gate cavity and in said first and second spaces.
20. The method of claim 1, wherein said gate structure is a replacement gate structure, the method further comprising removing a sacrificial gate structure from above said first and second fins prior to forming said raised isolation post structure.