1. A system for performing arthroscopic surgery, said system comprising:
an arthroscopic instrument suitable for performing an arthroscopic surgical procedure; and
an atraumatic sheath having an inner diameter sized and dimensioned to permit fluid flow between the inner surface of the sheath and an outer surface of the arthroscopic instrument disposed within the sheath, said sheath further having a plurality of ribs extending inwardly from an inner surface of said sheath and running longitudinally along said sheath;
wherein said ribs define lumens between the outer surface of the arthroscopic instrument and the inner surface of the sheath;
wherein the atraumatic sheath is adapted to be removably disposed over the arthroscopic instrument.
2. The system of claim 1 wherein the sheath is characterized by an outer surface, wherein said outer surface is provided with a smooth coating.
3. The system of claims 1 or 2 wherein the inner surface of the sheath is provided with a non-slip coating.
4. The system of claim 1 further comprising a fluid source in fluid communication with one or more outer lumens in the sheath.
5. The system of claim 1 or claim 4 further comprising a vacuum source.
6. The system of claims 1, 4, or 5 further comprising a control system controlling the inflow and outflow of fluid to the surgical site.
7. The system of claim 1 further comprising check valves coupled to the inner surface of said sheath within the outer lumens.
8. The system of claim 1 further comprising a first set of fittings disposed on the proximal end of the sheath and a second set of fittings disposed on the arthroscopic instrument, wherein the first and second sets of fittings are adapted for releasable coupling, whereby the sheath is secured to the arthroscopic instrument when the first and second sets of fittings are secured together.
9. The system of claim 1 wherein the atraumatic sheath is characterized by a distal portion, said distal portion having a plurality of holes in fluid communication with one or more lumens and the surgical site.
10. The system of claim 1 wherein said ribs further comprise flanges.
11. The system of claim 1 wherein said ribs further comprise extensions.
12. The system of claim 1 wherein the outflow of fluid equals or exceeds the inflow.
13. An atraumatic sheath comprising:
a tube characterized by a distal portion, a proximal portion, an outer surface, an inner surface, an inner diameter and an outer diameter;
wherein the inner diameter of said tube is sized and dimensioned to permit fluid flow between the inner surface of the tube and an outer surface of an arthroscopic instrument when the arthroscopic instrument is disposed within the tube; and
a plurality of ribs extending inwardly from the inner surface of the tube and running longitudinally along the tube;
wherein said ribs further define lumens between the outer surface of the arthroscopic instrument and inner surface of the tube.
14. The atraumatic sheath of claim 13 wherein said ribs further comprise flanges, said flanges forming a seal between the ribs and the outer surface of an arthroscopic instrument when the arthroscopic instrument is disposed within the sheath.
15. The atraumatic sheath of claim 13 wherein said ribs further comprise extensions, said extensions forming a seal between the ribs and the outer surface of an arthroscopic instrument when the arthroscopic instrument is disposed within the sheath.
16. The atraumatic sheath of claim 13 further comprising check valves coupled to the inner surface of the tube within the outer lumens, said anti-backflow gates operable to prevent the back flow of fluid within the lumens.
17. The atraumatic sheath of claim 13 wherein said distal portion further comprises a plurality of holes in fluid communication with one or more outer lumens and a surgical site.
18. The atraumatic sheath of claim 13 further comprising a plurality of circumferential ridges, said ridges disposed on the outer surface of the proximal portion of the tube.
19. A method of performing arthroscopic surgery, said method comprising the steps of:
providing a system for performing arthroscopic surgery, said system comprising:
an arthroscopic instrument suitable for performing an arthroscopic surgical procedure;
an atraumatic sheath having an inner diameter sized and dimensioned to permit fluid flow between the inner surface of the sheath and an outer surface of the arthroscopic instrument disposed within the sheath, said sheath further having a plurality of ribs extending inwardly from an inner surface of said sheath and running longitudinally along said sheath;
wherein said ribs define outer lumens between an outer surface of the arthroscopic instrument and the inner surface of the sheath, said lumens facilitating the inflow and outflow of fluid to and from a surgical site;
wherein the atraumatic sheath is adapted to be removably disposed over the arthroscopic instrument.
placing the arthroscopic instrument inside the sheath; and
performing an arthroscopic surgical procedure with the system for performing arthroscopic surgery.
20. The method of claim 19 further comprising the step of providing substantially simultaneous inflow and outflow of fluid to an arthroscopic surgical site.
21. The method of claim 19 further comprising the step of providing substantially simultaneous inflow and outflow of fluid to an arthroscopic surgical site wherein the outflow of fluid is at a rate equal to or exceeding the inflow rate of fluid.
22. A tissue retention device comprising:
a sleeve having an outer surface and a bore extending therethrough, said bore having an inner diameter so sized and dimensioned as to frictionally fit over an outer diameter of an arthroscopic surgical instrument; and
a ridge disposed on the outer surface of the sleeve to prevent the surgical instrument from being easily removed from a surgical site.
23. A tissue retention device of claim 22 wherein said ridge is helical and shaped as a thread.
24. A tissue retention device of claim 22 wherein said ridge is circumferential.
25. A tissue retention device of claim 22 further comprising a plurality of circumferential ridges disposed on the outer surface of the sleeve.
26. A tissue retention device of claim 22 wherein the sleeve of the device comprises a sterilizeable elastomer.
27. A device for use with an arthroscopic sheath comprising:
a sleeve having an outer surface and a bore extending therethrough, said bore having an inner diameter so sized and dimensioned as to frictionally fit over an outer diameter of an arthroscopic sheath; and
a ridge disposed on the outer surface of the sleeve to prevent the surgical instrument from being easily removed from a surgical site.
28. A tissue retention device of claim 27 wherein said ridge is helical and shaped as a thread.
29. A tissue retention device of claim 27 wherein said ridge is circumferential.
30. A tissue retention device of claim 27 further comprising a plurality of circumferential ridges disposed on the outer surface of the sleeve.
31. A tissue retention device of claim 27 wherein the sleeve of the device comprises a sterilizeable elastomer.
The claims below are in addition to those above.
All refrences to claim(s) which appear below refer to the numbering after this setence.
1. A hardmask composition comprising
an organosilane polymer prepared by the reaction of one or more compounds of Formula I
Si(OR1)(OR2)(OR3)R4\u2003\u2003(I)
wherein R1, R2 and R3 are each independently selected from the group consisting of alkyl, acetoxy and oxime; and R4 is selected from the group consisting of hydrogen, alkyl, aryl and arylalkyl; and
wherein the organosilane polymer has a polydispersity in a range of about 1.1 to about 2.
2. The hardmask composition according to claim 1, wherein R1, R2 and R3 are each independently selected from the group consisting of C1-C5 alkyl, acetoxy and oxime; and R2 is selected from the group consisting of hydrogen, C1-C5 alkyl, aryl and arylalkyl.
3. The hardmask composition according to claim 1, wherein the reaction of the one or more compounds of Formula I is performed in the presence of an acid catalyst.
4. The hardmask composition according to claim 3, wherein the acid catalyst comprises at least one acid selected from the group consisting of nitric acid, sulfuric acid, p-toluenesulfonic acid monohydrate, diethyl sulfate, 2,4,4,6-tetrabromocyclohexadienone, benzoin tosylate, 2-nitrobenzyl tosylate and alkyl esters of organic sulfonic acids.
5. The hardmask composition according to claim 3, wherein the organosilane polymer is prepared by reacting the one or more compounds of Formula (I) in an amount in a range of about 1 to about 99 parts by weight in the presence of the acid catalyst in an amount in a range of about 0.001 to about 5 parts by weight.
6. The hardmask composition according to claim 1, wherein the organosilane polymer comprises the structure of Formula II
wherein R4\u2032, R4\u2033, R4\u2032\u2033 and R4\u2033\u2033 are each independently selected from the group consisting of hydrogen, alkyl, aryl and arylalkyl.
7. The hardmask composition according to claim 1, wherein the organosilane polymer has a molecular weight in a range of about 1,000 to about 50,000 gmol.
8. The hardmask composition according to claim 1, further comprising an organic solvent.
9. A method of forming a semiconductor device comprising
forming a material layer on a substrate;
forming a organic hardmask layer on the material layer;
forming an antireflective hardmask layer from the antireflective hardmask composition according to claim 1 on the organic hardmask layer;
forming a photosensitive imaging layer on the antireflective hardmask layer;
patternwise exposing the imaging layer to radiation to form a pattern of radiation-exposed regions in the imaging layer;
selectively removing portions of the imaging layer, the antireflective hardmask and the organic hardmask layer to expose portions of the material layer; and
etching the exposed portions of the material layer to form a patterned material layer.
10. The method according to claim 9, wherein selectively removing portions of the imaging layer, the antireflective hardmask layer and the organic hardmask layer comprises
selectively removing portions of the imaging layer to expose portions of the antireflective hardmask layer,
selectively removing portions of the antireflective hardmask layer to expose portions of the organic hardmask layer, and
selectively removing portions of the organic hardmask layer to expose portions of the material layer.
11. A semiconductor integrated circuit device produced by the method according to claim 9.