1460713161-76741662-2cd2-4e5b-b747-5ad6ef3ee8fc

1. An apparatus for manufacturing an electron source having a plurality of electron-emitting devices, comprising:
(A) a support for supporting a substrate having a first major surface and a second major surface on which a conductor is arranged,
said support including a plurality of fixing means each having a conductive member, and
the first major surface having a plurality of units each formed from a pair of electrodes and a conductive film interposed between the electrodes, and wires connected to the units;
(B) a vessel which has a gas inlet port and an exhaust port, and covers part of the first major surface;
(C) a gas controller for at least one of introducing gas into said vessel and exhausting gas from said vessel; and
(D) a power supply for applying a predetermined potential difference between the conductor on the second major surface and the conductive members of said plurality of fixing means.
2. The apparatus according to claim 1, wherein said support further comprises a temperature controller.
3. The apparatus according to claim 2, wherein said temperature controller includes a plurality of temperature controllers.
4. The apparatus according to claim 3, wherein each of said plurality of temperature controllers is connected to a corresponding one of said plurality of fixing means.
5. The apparatus according to claim 1, wherein each fixing means has a surface in contact with the second major surface, and the surface has a concave portion.
6. The apparatus according to claim 1, wherein each fixing means has an insulating surface, and incorporates the conductive member.
7. The apparatus according to claim 1, further comprising a voltage applier for applying a voltage to the wires on the first major surface.
8. An apparatus for manufacturing an electron source having a plurality of electron-emitting devices, comprising:
(A) a vessel which has a pressure-reducible space, a gas inlet port for introducing gas into the space, and an exhaust port for exhausting the gas from the space;
(B) a support for supporting a substrate having a first major surface and a second major surface on which a conductor is arranged,
said support including a temperature controller and a plurality of fixing means each having a conductive member, and
said support being arranged in the space;
(C) a gas controller for at least one of introducing gas into said vessel and exhausting gas from said vessel; and
(D) a power supply for applying a predetermined potential difference between the conductor on the second major surface and the conductive members of said plurality of fixing means.
9. The apparatus according to claim 8, wherein said temperature controller includes a plurality of temperature controllers.
10. The apparatus according to claim 9, wherein each of said plurality of temperature controllers is connected to a corresponding one of said plurality of fixing means.
11. The apparatus according to claim 8, wherein each fixing means has a surface in contact with the second major surface, and the surface has a concave portion.
12. The apparatus according to claim 8, wherein each fixing means has an insulating surface, and incorporates the conductive member.
13. A method of manufacturing an electron source having a plurality of electron-emitting devices, comprising the steps of:
(A) preparing a substrate having a first major surface and a second major surface opposing the first major surface,
the first major surface having a plurality of units each formed from a pair of electrodes and a conductive film interposed between the electrodes, and wires connected to the units; and
the second major surface having a conductor;

(B) preparing a support,
the support including a plurality of fixing means each having a conductive member;
(C) fixing the substrate to the support by applying a potential difference between the conductive member and the conductor;
(D) arranging the plurality of units in a space defined by the first major surface of the substrate and a vessel by covering part of the first major surface of the substrate with the vessel,
part of the wires being arranged outside the space;
(E) setting a desired atmosphere in the space; and
(F) applying a voltage to the plurality of units via part of the wires outside the space.
14. The method according to claim 13, wherein the step of setting the desired atmosphere in the space comprises the step of evacuating an interior of the space.
15. The method according to claim 13, wherein the step of setting the desired atmosphere in the space comprises the step of introducing gas into the space.
16. The method according to claim 13, wherein the step of fixing the substrate to the support comprises the step of vacuum-chucking the substrate and the support.
17. A method of manufacturing an image display device having an electron source and a fluorescent substance, comprising the steps of:
(A) preparing a substrate having a first major surface and a second major surface opposing the first major surface,
the first major surface having a plurality of units each formed from a pair of electrodes and a conductive film interposed between the electrodes, and wires connected to the units; and
the second major surface having a conductor;
(B) preparing a support,
the support including a plurality of fixing means each having a conductive member;
(C) fixing the substrate to the support by applying a potential difference between the conductive member and the conductor;
(D) arranging the plurality of units in a space defined by the first major surface of the substrate and a vessel by covering part of the first major surface of the substrate with the vessel,
part of the wires being arranged outside the space;
(E) setting a desired atmosphere in the space;
(F) applying a voltage to the plurality of units via part of the wires outside the space;
(G) preparing a second substrate having a fluorescent substance; and
(H) arranging the second substrate and the substrate having on the first major surface the plurality of units to which the voltage is applied, so as to oppose each other via a second space.
18. The method according to claim 17, wherein the step of setting the desired atmosphere in the space comprises the step of evacuating an interior of the space.
19. The method according to claim 17, wherein the step of setting the desired atmosphere in the space comprises the step of introducing gas into the space.
20. The method according to claim 17, wherein the step of fixing the substrate to the support comprises the step of vacuum-chucking the substrate and the support.
21. A method of manufacturing an electron source having a plurality of electron-emitting devices, comprising the steps of:
(A) preparing a vessel which has a pressure-reducible space, a gas inlet port for introducing gas into the space, and an exhaust port for exhausting the gas from the space;
(B) preparing a support in the space, the support including a temperature control means and a plurality of fixing means each having a conductive member;
(C) preparing a substrate having a first major surface and a second major surface opposing the first major surface,
the first major surface having a plurality of units each formed from a pair of electrodes and a conductive film interposed between the electrodes, and wires connected to the units, and
the second major surface having a conductor;
(D) loading the substrate into the space;
(E) fixing the substrate to the support in the space by applying a potential difference between the conductive member and the conductor; and
(F) setting a desired atmosphere in the space, and applying a voltage to the plurality of units via the wires while controlling a temperature of the substrate by the temperature control means.
22. The method according to claim 21, wherein the step of setting the desired atmosphere in the space comprises the step of evacuating an interior of the space.
23. The method according to claim 21, wherein the step of setting the desired atmosphere in the space comprises the step of introducing gas into the space.
24. The method according to claim 21, wherein the step of fixing the substrate to the support comprises the step of vacuum-chucking the substrate and the support.
25. A method of manufacturing an image display device, comprising the steps of:
(A) preparing a vessel which has a pressure-reducible space, a gas inlet port for introducing gas into the space, and an exhaust port for exhausting the gas from the space;
(B) preparing a support in the space,
the support including temperature control means and a plurality of fixing means each having a conductive member;
(C) preparing a substrate having a first major surface and a second major surface opposing the first major surface,
the first major surface having a plurality of units each formed from a pair of electrodes and a conductive film interposed between the electrodes, and wires connected to the units, and
the second major surface having a conductor;
(D) loading the substrate into the space;
(E) fixing the substrate to the support in the space by applying a potential difference between the conductive member and the conductor;
(F) setting a desired atmosphere in the space, and applying a voltage to the plurality of units via the wires while controlling a temperature of the substrate by the temperature control means;
(G) preparing a second substrate having a fluorescent substance; and
(H) arranging the second substrate and the substrate having on the first major surface the plurality of units to which the voltage is applied, so as to oppose each other via a space.
26. The method according to claim 25, wherein the step of setting the desired atmosphere in the space comprises the step of evacuating an interior of the space.
27. The method according to claim 25, wherein the step of setting the desired atmosphere in the space comprises the step of introducing gas into the space.
28. The method according to claim 25, wherein the step of fixing the substrate to the support comprises the step of vacuum-chucking the substrate and the support.
29. A substrate processing method comprising the steps of:
(A) preparing a support including a plurality of fixing means each having a conductive member and temperature control means;
(B) preparing a substrate having a conductor;
(C) fixing the substrate to the support by applying a potential difference between the conductive member and the conductor; and
(D) performing predetermined processing for a surface of the substrate while controlling a temperature of the substrate by the temperature control means.
The claims below are in addition to those above.
All refrences to claim(s) which appear below refer to the numbering after this setence.

What is claimed is:

1. A process for joining endless polymer materials, in which by means of a laser beam the upper material is shone through by the laser beam and, at the contact surface between the upper material, which is transparent to the laser beam, and the lower material, which is opaque to the laser beam, the two materials are melted and joined to each other under pressure, the laser beam and the materials to be joined being moved relative to each other, wherein in order to produce a welded seam running in the longitudinal direction at the contact surface, a process zone (P) is provided, in which the material is heated continuously to the melting temperature (Tm) in a preheating zone (I) by means of laser beams and is subsequently melted in a melting zone (II).
2. The process as claimed in claim 1, wherein the materials are already pressed together in the area of the irradiation zone (D) of the laser beam (2).
3. The process as claimed in claim 2, wherein a linear process zone (P) is provided, which is preferably produced, at least partly, by means of a curtain-like collimated laser beam (2).
4. The process as claimed in claim 3, wherein a following point-like laser beam is additionally provided in the melting zone (II).
5. The process as claimed in claim 2, wherein the materials are guided through two contrarotating rollers (17, 18) that press against each other, the laser beam (12) being brought into the irradiation zone by a first roller (17) that is transparent to the laser beam.
6. The process as claimed in claim 5, wherein the second roller (18) is easily deformed at the circumference by the first roller (17).
7. The process as claimed in claim 5, wherein the joined materials are subsequently rolled up in the direction of curvature corresponding to the first roller (17).
8. The process as claimed in claim 5, wherein the first roller (17) is cleaned on the outer surface before making contact with the materials.
9. The process as claimed in claim 1, wherein the welding structure is influenced by means of a mask in the first roller.
10. The process as claimed in claim 5, wherein the contact pressure is determined by means of pressure sensors arranged on or in the area of the surface of the second roller (18).
11. The process as claimed in claim 3, wherein the temperature is measured by means of a pyrometer after the process zone (P).
12. An apparatus for joining polymer materials by means of a laser beam (12), which shines through the upper material (13) on account of the transparency of the latter and, at the contact surface with the lower material (14), which absorbs the laser beam, heats the materials and melts them, and a device for pressing the materials together, wherein in order to join endless materials, the latter are guided through two contrarotating rollers (17, 18) that press against each other, the first roller (17) being constructed from a material that is transparent to a laser beam and is tubular, and the second roller (18) being constructed from a material that can be deformed easily at the surface, and devices (11) for producing at least one laser beam (12) at the contact surface being arranged in the first roller (17).
13. The apparatus as claimed in claim 12, wherein a device (7) for the IR measurement of the temperature is arranged in the first roller (17), and is preferably designed such that it can be moved with regard to the measurement point.
14. The apparatus as claimed in claim 12, wherein the devices (11) produce a linear laser beam (12) which is arranged in the direction of movement of the materials in the contact zone.
15. The apparatus as claimed in claim 13, wherein the devices (11) produce a point-like laser beam after the linear laser beam in the direction of movement in the contact zone.
16. The apparatus as claimed in claim 12, which comprises a cleaning device (19) on the outer circumference of the first roller (17).

1460713153-f2a5ac61-c90f-4be6-9d2e-255efe3a3adf

1-16. (canceled)
17. A compound having the formula
wherein R is selected from the group consisting of: bromo, iodo, and CF3\u2014(CF2)n\u2014SO2\u2014O\u2014, where n is an integer from 0 to 8.
18. The compound of claim 17, wherein R is bromo.
19. The compound of claim 17, wherein R is iodo.
20. The compound of claim 17, wherein R is CF3\u2014(CF2)n\u2014SO2\u2014O\u2014 and n is 0.
21. The compound of claim 17, wherein R is CF3\u2014(CF2)n\u2014SO2\u2014O\u2014 and n is 1.
22. The compound of claim 17, wherein R is CF3\u2014(CF2)n\u2014SO2\u2014O\u2014 and n is 8.
23. A pharmaceutical composition, comprising a compound having the formula
wherein R is selected from the group consisting of: bromo, iodo, and CF3\u2014(CF2)n\u2014SO2\u2014O\u2014, where n is an integer from 0 to 8; and a pharmaceutically acceptable adjuvant andor diluent.
24. The pharmaceutical composition of claim 23, wherein R is bromo.
25. The pharmaceutical composition of claim 23, wherein R is iodo.
26. The pharmaceutical composition of claim 23, wherein R is CF3\u2014(CF2)n\u2014SO2\u2014)\u2014 and n is 0.
27. The pharmaceutical composition of claim 23, wherein R is CF3\u2014(CF2)n\u2014SO2\u2014O\u2014 and n is 1.
28. The pharmaceutical composition of claim 23, wherein R is CF3\u2014(CF2)n\u2014SO2\u2014O\u2014 and n is 8.
29. A pharmaceutical composition, comprising escitalopram and a compound having the formula
wherein R is selected from the group consisting of: bromo, iodo, and CF3\u2014(CF2)n\u2014SO2\u2014O\u2014, where n is an integer from 0 to 8; and a pharmaceutically acceptable adjuvant andor diluent.
The claims below are in addition to those above.
All refrences to claim(s) which appear below refer to the numbering after this setence.

1. A method of modulating a base band signal for provision to at least one power amplifier comprising the steps of:
receiving a base band signal provided as two Cartesian signals,
separately mapping signal samples of each received Cartesian signal for forming two intermediary signals,
where each sample of both Cartesian signals
has been sampled using a common sampling interval, and
is mapped to a corresponding intermediary signal section having one of a limited number of signal levels, said signal levels including only two non-zero levels that are separated from and provided symmetrically around zero,
mapping each intermediary signal section of a corresponding intermediary signal to a segment of a corresponding pulse train, where said segment covers said sampling interval, said mapping being performed through providing

a positive pulse in one half of the segment if the corresponding signal section has a positive signal level or
a positive pulse in another half of the segment if the corresponding signal section has a negative signal level,
forming a train of pulses made up of the pulse train segments for each intermediary signal,
delaying the pulses of one of the trains in relation to the other train, and
combining the two trains for provision to at least one power amplifier.
2. The method according to claim 1, wherein the step of separately mapping signal samples of each received Cartesian signal for forming two intermediary signals is performed using Delta-Sigma modulation.
3. The method according to claim 1, wherein a pulse for a positive signal section is provided in a first slot of the corresponding half and a pulse for a negative signal section is provided in a first slot of the corresponding half in each segment.
4. The method according to claim 3, wherein the step of delaying involves shifting a pulse with a quarter of a segment.
5. The method according to claim 1, wherein one of the intermediary signal levels is a zero level and no pulses are formed for this zero level.
6. The method according to claim 5, wherein the step of mapping intermediary signal sections to pulse train sections comprises creating an empty segment for each intermediary signal section having said zero level.
7. The method according to claim 1, wherein each segment in which pulses are provided further includes two pulses, an additional negative pulse in said other half if the corresponding signal section has a positive signal level or an additional negative pulse in said one half if the corresponding signal section has a negative signal level.
8. The method according to claim 7, further comprising the step of separating negative pulses from positive pulses of the combined trains for provision to separate power amplifiers.
9. The method according to claim 8, further comprising the step of separately amplifying the separated positive and negative pulses and combining these amplified pulses in order to provide an output signal.
10. A modulating device for modulating a base band signal for provision to at least one power amplifier and comprising:
an input for receiving a base band signal provided as two Cartesian signals,
a first and second mapping unit, each arranged to,
map signal samples of a corresponding received Cartesian signal for forming two intermediary signals,
where each sample of both Cartesian signals has been sampled using a common sampling interval, and
said mapping involves mapping a signal sample to a corresponding intermediary signal section having one of a limited number of signal levels including only two non-zero levels that are separated from and provided symmetrically around zero,
a first and a second processing unit, each arranged to,
map each intermediary section of a corresponding intermediary signal to a segment of a corresponding pulse train, where each segment covers said sampling interval and said mapping involves providing
a positive pulse in one half of the segment if the corresponding signal section has a positive signal level or
a positive pulse in another half of the segment if the corresponding signal section has a negative signal level, and

form a train of pulses made up of the signal train segments for the corresponding intermediary signal,

a delay unit arranged to delay the pulses of one of the trains in relation to the other train, and
a combining unit arranged to combine the two trains for provision to at least one power amplifier.
11. The modulating device according to claim 10, wherein each first and second processing unit when performing said mapping is further arranged to provide an additional negative pulse in said other half of the segment if the corresponding signal section has a positive signal level or an additional negative pulse in said one half of the segment if the corresponding signal section has a negative signal level.
12. The modulating device according to claim 10, wherein the first and second mapping units are Delta-Sigma modulators.
13. A switched-mode power amplifying device comprising the modulating device according to claim 10 and at least one switched power amplifier.
14. A radio transmission device comprising a modulating device according to claim 10.
15. The radio transmission device according to claim 14, wherein it is a base station.
16. The radio transmission device according to claim 14, wherein it is a mobile station.