1. A plasma reactor comprising:
a chamber;
a bottom electrode and a top electrode enclosed within said chamber;
a first set of confinement rings substantially parallel to said bottom electrode and said top electrode, and surrounding a first volume between said bottom electrode and said top electrode;
a second set of confinement rings substantially parallel to said bottom electrode and said top electrode, and surrounding a second volume between said bottom electrode and said top electrode, the second volume being greater than the first volume;
a ground extension adjacent to and surrounding said bottom electrode,
wherein said first set of confinement rings and said second set of confinement rings are capable of being independently raised and lowered to extend into a region above said ground extension.
2. The plasma reactor of claim 1, wherein said first set of confinement rings is configured to be lowered when said second set of confinement rings is raised, and said first set of confinement rings is configured to be raised when said second set of confinement rings is lowered.
3. The plasma reactor of claim 1, wherein said first set of confinement rings is configured to be raised when said second set of confinement rings is raised, and said first set of confinement rings is configured to be lowered when said second set of confinement rings is lowered.
4. The plasma reactor of claim 1, wherein said first set of confinement rings and said second set of confinement rings are suspended.
5. The plasma reactor of claim 1, wherein said first set of confinement rings include an adjustable gap between each confinement ring.
6. The plasma reactor of claim 1 wherein said second set of confinement rings include an adjustable gap between each confinement ring.
7. The plasma reactor of claim 1, wherein said first set of confinement rings is adjacent to said top electrode such that an active electrode area ratio is substantially near unity, the active electrode area ratio defined by dividing a cross-section of a plasma in the first volume by a workpiece area supported by said bottom electrode.
8. The plasma reactor of claim 1, wherein said second set of confinement rings is positioned such that an active electrode area is substantially greater than unity, the active electrode area ratio defined by dividing a cross-section of a plasma in the second volume by a workpiece area supported by said bottom electrode.
9. The plasma reactor of claim 1, further comprising a power supply coupled to said bottom electrode, said bottom electrode configured to receive a workpiece.
10. The plasma reactor of claim 9, wherein said power supply generates a plurality of frequencies to said bottom electrode.
11. The plasma reactor of claim 9, wherein said top electrode is grounded.
12. The plasma reactor of claim 1, further comprising a ground extension ring adjacent to said bottom electrode, said ground extension electrically connected to said top electrode and included in an active electrode area ratio, the active electrode area ratio defined by dividing a cross-section of a plasma by a workpiece area supported by said bottom electrode.
13. The plasma reactor of claim 1, further comprising a dielectric ring adjacent and surrounding said bottom electrode.
14. A method for using a plasma reactor having a chamber with a top electrode, a bottom electrode, a first set of confinement rings having a first diameter, a second set of confinement rings having a second diameter, the second diameter greater than the first diameter, a ground extension adjacent to and surrounding the bottom electrode, the method comprising:
selecting a position for said first set of confinement rings and said second set of confinement rings, said first set of confinement rings and said second set of confinement rings capable of being independently raised and lowered to extend into a region above the ground extension.
15. The method of claim 14, wherein said first set of confinement rings is configured to be lowered when said second set of confinement rings is raised, and said first set of confinement rings is configured to be raised when said second set of confinement rings is lowered.
16. The method of claim 14, wherein said first set of confinement rings is configured to be raised when said second set of confinement rings is raised, and said first set of confinement rings is configured to be lowered when said second set of confinement rings is lowered.
17. The method of claim 14, further comprising suspending said first set of confinement rings and said second set of confinement rings.
18. The method of claim 14, further comprising adjusting a gap between each confinement ring in said first set of confinement rings.
19. The method of claim 14, further comprising adjusting a gap between each confinement ring in said second set of confinement rings.
20. The method of claim 14, further comprising disposing said first set of confinement rings adjacent to said top electrode such that an active electrode area ratio is substantially near unity, said active electrode area ratio defined by dividing a cross-section of a plasma in a volume within the first set of confinement rings, the top electrode, and the bottom electrode, by a workpiece area supported by the bottom electrode.
21. The method of claim 14, further comprising supplying power to the bottom electrode, the bottom electrode configured to receive a workpiece.
22. The method of claim 21, further comprising generating a plurality of frequencies to the bottom electrode.
23. The method of claim 14, further comprising grounding the top electrode.
24. The method of claim 14, further comprising surrounding the bottom electrode with an adjacent dielectric ring parallel to the bottom electrode.
25. The method of claim 24, further comprising surrounding the dielectric ring with a ground extension.
26. A plasma reactor comprising:
a chamber;
a bottom electrode and a top electrode enclosed within said chamber;
a first set of confinement rings having a first diameter, substantially parallel to said bottom electrode and said top electrode;
a second set of confinement rings having a second diameter, substantially parallel to said bottom electrode and said top electrode, said second diameter greater than said first diameter; and
a ground extension adjacent to and surrounding said bottom electrode, wherein said first set of confinement rings and said second set of confinement rings are capable of being raised and lowered to extend into a region above said ground extension.
27. The plasma reactor of claim 26, wherein said first set of confinement rings is configured to be lowered when said second set of confinement rings is raised, and said first set of confinement rings is configured to be raised when said second set of confinement rings is lowered.
28. The plasma reactor of claim 26, wherein said first set of confinement rings is configured to be raised when said second set of confinement rings is raised, and said first set of confinement rings is configured to be lowered when said second set of confinement rings is lowered.
29. A plasma reactor comprising:
a chamber;
a bottom electrode and a top electrode enclosed within said chamber;
a ground extension adjacent to and surrounding said bottom electrode,
at least two concentric set of confinement rings, each set of confinement rings configured to be independently raised and lowered to extend into a region above said ground extension.
30. The plasma reactor of claim 29, wherein said first set of confinement rings is configured to be lowered when said second set of confinement rings is raised, and said first set of confinement rings is configured to be raised when said second set of confinement rings is lowered.
31. The plasma reactor of claim 26, wherein said at least two concentric set of confinement rings are configured to be raised and lowered together.
The claims below are in addition to those above.
All refrences to claim(s) which appear below refer to the numbering after this setence.
1. A process for preparing polymer powder from an aqueous polymer dispersion with water-soluble compounds, the fraction of such compounds being smaller than that of said aqueous polymer dispersion and being based on the polymer present in the form of polymer particles insoluble in water, which comprises:
subjecting the aqueous polymer dispersion to membrane filtration in a first step of the process; and
spray drying in a subsequent second step of the process.
2. The process according to claim 1, wherein the polymer has impact-modifying properties in transparent polyvinyl chloride compositions.
3. The process according to claim 1, wherein the aqueous polymer dispersion is subjected to membrane filtration until the content of the water-soluble substances is \u22663% by weight, based on the polymer present in the form of polymer particles insoluble in water.
4. The process according to claim 3, wherein the aqueous polymer dispersion is subjected to membrane filtration until the content of the water-soluble substances is \u22661% by weight, based on the polymer present in the form of polymer particles insoluble in water.
5. The process according to claim 1, wherein the spray drying of the aqueous polymer dispersion takes place in the presence of from 0.01 to 10 parts by weight of an inorganic antiblocking agent with a average particle size of from 0.001 to 20 \u03bcm, based on 100 parts by weight of the polymer present in the form of polymer particles insoluble in water.