1. A device for detecting fluorescent trace material in a medium surrounding a contact assembly, comprising:
a source of electromagnetic radiation;
a detector for sensing the level of fluorescent radiation generated by the fluorescent trace material in response to the electromagnetic radiation source;
an optically-transmissive conduit providing a means for transmitting electromagnetic radiation from the electromagnetic radiation source to the surrounding medium and a means for transmitting fluorescent radiation between the surrounding medium and the detector; and
a connector on the optically-transmissive conduit configured to engage an access port to an enclosure of the contact assembly.
2. The detection device of claim 1, wherein the electromagnetic radiation source is an ultraviolet light emitting source.
3. The detection device of claim 1, wherein the electromagnetic radiation source emits electromagnetic radiation with a broad-band wave-length.
4. A device for detecting fluorescent trace material in a medium surrounding a contact assembly, comprising:
a source of electromagnetic radiation;
a detector for sensing the level of fluorescent radiation generated by the fluorescent trace material in response to the electromagnetic radiation source;
a first optical guide component for directing electromagnetic radiation from the electromagnetic radiation source to at least a portion of the surrounding medium; and
a second optical guide component for directing fluorescent radiation from the fluorescent trace material in the surrounding medium to the detector; and
a connector on the first optical guide component configured to engage an access port to an enclosure of the contact assembly.
5. The detection device of claim 4, wherein the electromagnetic radiation source is an ultraviolet light emitting source.
6. The detection device of claim 4, wherein the electromagnetic radiation source emits broad-band electromagnetic radiation with a wave-length of about 254 nm.
The claims below are in addition to those above.
All refrences to claim(s) which appear below refer to the numbering after this setence.
1. A laminated structure comprising:
a laminated piece having a plurality of piezoelectric material layers and a plurality of electrode layers stacked in a predetermined sequence, said plurality of electrode layers including a first electrode layer provided with a first insulating region and a second electrode layer provided with a second insulating region at a position different from that of the first insulating region;
a first interconnection line electrically connected to the first electrode layer while passing through the second insulating region provided in the second electrode layer; and
a second interconnection line electrically connected to the second electrode layer while passing through the first insulating region provided in the first electrode layer,
wherein said laminated piece further has at least one of a piezoelectric material layer provided as a lowermost layer and a piezoelectric material layer provided as an uppermost layer, and
wherein at least one of the first and second interconnection lines extends to an intermediate part of either one of the piezoelectric material layer disposed as the lowermost layer and the piezoelectric material layer disposed as the uppermost layer.
2. A laminated structure according to claim 1, wherein said at least one of the piezoelectric material layer disposed as the lowermost layer and the piezoelectric material layer disposed as the uppermost layer is thicker than each of said plurality of piezoelectric material layers.
3. A laminated structure according to claim 1, wherein each of said first and second interconnection lines has a diameter of not larger than 30 \u03bcm.
4. A laminated structure comprising:
a laminated piece having a plurality of piezoelectric material layers and a plurality of electrode layers stacked in a predetermined sequence, said plurality of electrode layers including a first electrode layer provided with a first insulating region and a second electrode layer provided with a second insulating region at a position different from that of the first insulating region;
a first interconnection line electrically connected to the first electrode layer while passing through the second insulating region provided in the second electrode layer; and
a second interconnection line electrically connected to the second electrode layer while passing through the first insulating region provided in the first electrode layer,
wherein at least one of the first and second interconnection lines is formed to extend along an edge of said laminated piece.
5. A laminated structure according to claim 4, wherein the first and second interconnection lines are formed of a metal material with which through-holes formed in said laminated piece are filled up.
6. A laminated structure according to claim 4, wherein each of said first and second interconnection lines has a diameter of not larger than 30 \u03bcm.
7. A laminated structure according to claim 4, wherein said laminated piece further has at least one of a piezoelectric material layer provided as a lowermost layer and a piezoelectric material layer provided as an uppermost layer.
8. A laminated structure comprising:
a plurality of laminated pieces arrayed in two dimensions, each of said plurality of laminated pieces having a plurality of piezoelectric material layers and a plurality of electrode layers stacked in a predetermined sequence, said plurality of electrode layers including a first electrode layer provided with a first insulating region and a second electrode layer provided with a second insulating region at a position different from that of the first insulating region;
a first plurality of interconnection lines each electrically connected to the first electrode layer while passing through the second insulating region provided in the second electrode layer; and
a second plurality of interconnection lines each electrically connected to the second electrode layer while passing through the first insulating region provided in the first electrode layer, and
an insulating material packed among said plurality of laminated pieces,
wherein at least ones of said first plurality of interconnection lines and said second plurality of interconnection lines are disposed to pass through boundaries between said insulating material and said plurality of laminated pieces.
9. A method of manufacturing a laminated structure, said method comprising the steps of:
(a) forming a laminated piece by stacking a plurality of piezoelectric material layers and a plurality of electrode layers in a predetermined sequence, said plurality of electrode layers including a first electrode layer provided with a first insulating region and a second electrode layer provided with a second insulating region at a position different from that of the first insulating region;
(b) forming, after step (a), at least one through-hole to penetrate the first electrode layer while passing through the second insulating region provided in the second electrode layer;
(c) forming, after step (a), at least one through-hole to penetrate the second electrode layer while passing through the first insulating region provided in the first electrode layer; and
(d) filling up the through-holes formed at steps (b) and (c) with a metal material to form at least one interconnection line electrically connected to the first electrode layer and at least one interconnection line electrically connected to the second electrode layer.
10. A method of manufacturing a laminated structure, said method comprising the steps of:
(a) forming a laminated piece by stacking a plurality of piezoelectric material layers and a plurality of electrode layers in a predetermined sequence, said plurality of electrode layers including a first electrode layer provided with a first group of insulating regions and a second electrode layer provided with a second group of insulating regions at positions different from those of the first group of insulating regions;
(b) forming a plurality of through-holes to penetrate the first electrode layer while respectively passing through the second group of insulating regions provided in the second electrode layer;
(c) forming a plurality of through-holes to penetrate the second electrode layer while respectively passing through the first group of insulating regions provided in the first electrode layer;
(d) filling up the pluralities of through-holes formed at steps (b) and (c) with a metal material to form a plurality of interconnection lines electrically connected to the first electrode layer and form a plurality of interconnection lines electrically connected to the second electrode layer;
(e) forming at least one trench in said laminated piece to partially divide said laminated piece; and
(f) packing an insulating material into said at least one trench formed at step (e).
11. A method of manufacturing a laminated structure according to claim 10, further comprising the step of:
cutting said laminated piece to separate said laminated piece into a plurality of parts to be held by the insulating material.
12. A method of manufacturing a laminated structure, said method comprising the steps of:
(a) forming a laminated piece by stacking a plurality of piezoelectric material layers and a plurality of electrode layers in a predetermined sequence, said plurality of electrode layers including a first electrode layer provided with a first group of insulating regions and a second electrode layer provided with a second group of insulating regions at positions different from those of the first group of insulating regions;
(b) forming at least one trench in said laminated piece to partially divide said laminated piece;
(c) packing an insulating material into said at least one trench formed at step (b);
(d) forming a plurality of through-holes to respectively pass through boundaries between the insulating material and the divided first electrode layers and boundaries between the insulating material and the second group of insulating regions provided in the divided second electrode layers;
(e) forming a plurality of through-holes to respectively pass through boundaries between the insulating material and the divided second electrode layers and boundaries between the insulating material and the first group of insulating regions provided in the divided first electrode layers; and
(f) filling up the pluralities of through-holes formed at steps (d) and (e) with a metal material to form a plurality of interconnection lines electrically connected to the divided first electrode layers respectively and form a plurality of interconnection lines electrically connected to the divided second electrode layers respectively.
13. A method of manufacturing a laminated structure according to claim 12, further comprising the step of:
cutting said laminated piece to separate said laminated piece into a plurality of parts to be held by the insulating material.