1. A process chamber liner, comprising:
a cylindrical body;
an inner electromagnetic cosine-theta (cos \u03b8) coil ring including a first plurality of inner coils embedded in the body and configured to generate a magnetic field in a first direction; and
an outer electromagnetic cosine-theta (cos \u03b8) coil ring including a second plurality of outer coils embedded in the body and configured to generate a magnetic field in a second direction orthogonal to the first direction, wherein the outer electromagnetic cos \u03b8 coil ring is disposed concentrically about the inner electromagnetic cos \u03b8 coil ring.
2. The process chamber liner of claim 1, wherein the cylindrical body is electrically grounded.
3. The process chamber liner of claim 1, wherein the cylindrical body is a doubled walled body including an inner wall and an outer wall.
4. The process chamber liner of claim 3, wherein the inner electromagnetic cos \u03b8 coil ring is embedded in the inner wall, and wherein the outer electromagnetic cos \u03b8 coil ring is embedded in the outer wall.
5. The process chamber liner of claim 1, wherein the cylindrical body is fabricated from a conductive metal material.
6. The process chamber liner of claim 1, wherein the first plurality of inner coils includes a first set of inner cos \u03b8 coils, and a second set of inner cos \u03b8 coils disposed on an opposite side of the first set of inner cos \u03b8 coils.
7. The process chamber liner of claim 6, wherein each of the first plurality of inner coils has a saddle coil shape.
8. The process chamber liner of claim 1, wherein the second plurality of outer coils includes a first set of outer cos \u03b8 coils, and a second set of outer cos \u03b8 coils disposed on an opposite side of the first set of outer cos \u03b8 coils.
9. The process chamber liner of claim 8, wherein each of the second plurality of outer coils has a saddle coil shape.
10. The process chamber liner of claim 1, wherein the inner electromagnetic cos \u03b8 coil ring and the outer electromagnetic cos \u03b8 coil ring are configured to generate a constant transverse B-field.
11. A method for controlling a magnetic field in a plasma chamber, comprising:
generating a plasma in the plasma chamber having an internal processing volume;
providing current to at least one of an inner electromagnetic cosine-theta (cos \u03b8) coil ring or an outer electromagnetic cosine-theta (cos \u03b8) coil ring disposed in the plasma chamber to generate a constant transverse B-field;
adjusting at least one of a magnitude or a direction of the current provided to at least one of the inner electromagnetic cos \u03b8 coil ring or the outer electromagnetic cos \u03b8 coil ring to control a direction and a magnitude of the constant transverse B-field generated; and
adjusting a uniformity of the plasma generated by controlling the direction and magnitude of the constant transverse B-field.
12. The method of claim 11, wherein providing current to at least one of the inner electromagnetic cos \u03b8 coil ring or the outer electromagnetic cos \u03b8 coil ring includes:
providing a first current having a first magnitude and a first direction to an inner electromagnetic cos \u03b8 coil ring; and
providing a second current having a second magnitude and a second direction to an outer electromagnetic cos \u03b8 coil ring.
13. The method of claim 12, wherein the inner electromagnetic cos \u03b8 coil ring produces a first magnetic field in a first direction, wherein the outer electromagnetic cos \u03b8 coil ring produces a second magnetic field in a second direction orthogonal to the first direction, and wherein the interaction of the first and second magnetic fields produces the constant transverse B-field.
14. The method of claim 12, wherein controlling the direction and magnitude of the constant transverse B-field includes rotating the constant transverse B-field by adjusting at least one of the first current provided to the inner electromagnetic cos \u03b8 coil ring or the second current provided to outer electromagnetic cos \u03b8 coil ring.
15. The method of claim 11, wherein the inner electromagnetic cos \u03b8 coil ring and the outer electromagnetic cos \u03b8 coil ring are embedded in a chamber liner disposed in the plasma chamber.
16. The method of claim 15, wherein the chamber liner is electrically grounded.
17. The method of claim 15, wherein the chamber liner is a doubled walled liner including an inner wall and an outer wall, wherein the inner electromagnetic cos \u03b8 coil ring is embedded in the inner wall, and wherein the outer electromagnetic cos \u03b8 coil ring is embedded in the outer wall.
18. An apparatus for processing a substrate, comprising:
a process chamber having an internal processing volume;
a substrate support disposed in the process chamber to support a substrate when disposed therein;
an inner electromagnetic cosine-theta (cos \u03b8) coil ring including a first plurality of inner coils configured to generate a magnetic field in a first direction; and
an outer electromagnetic cosine-theta (cos \u03b8) coil ring including a second plurality of outer coils configured to generate a magnetic field in a second direction orthogonal to the first direction, wherein the outer electromagnetic cos \u03b8 coil ring is disposed concentrically about the inner electromagnetic cos \u03b8 coil ring.
19. The apparatus of claim 18, wherein the inner electromagnetic cos \u03b8 coil ring and the outer electromagnetic cos \u03b8 coil ring are embedded in a cylindrical body of a liner disposed in the internal processing volume of the process chamber.
20. The apparatus of claim 18, further comprising:
a first power supply coupled to the inner electromagnetic cos \u03b8 coil ring configured to supply a first current to the first plurality of inner coils;
a second power supply coupled to the outer electromagnetic cos \u03b8 coil ring configured to supply a second current to the second plurality of outer coils; and
a controller communicatively coupled to the first and second power supplies, wherein the controller is configured to adjust at least one of magnitude or a direction of at least one of the first or second currents to control a magnitude and direction of a constant transverse B-field produced by the inner electromagnetic cos \u03b8 coil ring and the outer electromagnetic cos \u03b80 coil ring.
The claims below are in addition to those above.
All refrences to claim(s) which appear below refer to the numbering after this setence.
1. A method of migrating threads between a plurality of processors of a computing environment, said method comprising:
monitoring, by a hardware controller of the computing environment, a plurality of processors to obtain information regarding a plurality of threads on the plurality of processors, the monitoring detecting a change in a state of a thread on a processor of the plurality of processors, the change in state indicating a change from an active state to a state other than the active state;
determining, based on detecting the change in the state of the thread, whether at least one thread of the plurality of threads is to be migrated from at least one processor to at least one other processor to transform one or more processors of the plurality of processors from a multithreaded processing mode to a single thread processor mode, wherein the determining analyzes a plurality of factors including:
types of threads executing on the plurality of processors, the types of threads including one or more of active, inactive, retiring, or entering inactive threads; and
whether movement of the at least one thread transforms the one or more processors to single thread processor mode; and
based on the determining, providing an indication by the hardware controller to an entity of the computing environment that the at least one thread is to be migrated from the at least one processor to the at least one other processor to enable at least one processor of the one or more processors to transform from a multithreading processor mode to a single thread processor mode.
2. The method of claim 1, wherein the providing the indication comprises providing an indication that the thread changing from the active state is to be migrated, and wherein subsequent to migration, the processor from which the thread is migrated has no threads thereon enabling an active thread to be migrated there such that the processor from which the thread is migrated and another processor from which the active thread is migrated are processing in a single thread processor mode.
3. The method of claim 1, wherein the detecting the change in state of the thread comprises detecting that the thread is entering an inactive state.
4. The method of claim 3, wherein the thread entering the inactive state comprises the thread entering a sleeping state.
5. The method of claim 1, wherein the entity comprises a hypervisor of the computing environment or an operating system of a processor of the computing environment.
6. The method of claim 1, further comprising:
detecting by the hardware controller that an active thread is to be moved from one processor to another processor; and
providing an indication to the entity or another entity that the active thread is to be moved.
7. The method of claim 6, wherein the detecting that the active thread is to be moved is based on a migration of one or more threads from the another processor resulting in the another processor having no threads.
8. The method of claim 7, wherein the detecting that the active thread is to be moved is further based on a determination that movement of the active thread transforms the one processor to a single thread processor mode.
9. The method of claim 1, further comprising moving the at least one thread from the at least one processor to the at least one other processor.
10. The method of claim 9, further comprising moving one or more active threads, if any, from a selected processor of the at least one other processor, wherein the selected processor exclusively includes inactive threads or threads entering an inactive state.