1. An electron cyclotron resonance ionisation device, comprising:
a sealed vacuum chamber;
an electromagnetic wave injector configured to inject an electromagnetic wave into said sealed vacuum chamber;
a magnetic structure for producing a magnetic field in said sealed vacuum chamber and for generating a plasma along the magnetic field lines, the modulus of said magnetic field forming a magnetic mirror structure having a magnetic field profile that includes two maxima and a minimum between the two maxima, wherein the minimum of the magnetic field profile is equal to or less than a value for which electron cyclotron resonance is achieved so that at least one electron cyclotron resonance region is formed in the chamber;
said sealed vacuum chamber being a waveguide having a length greater than or equal to a guide wavelength corresponding to a frequency of the injected electromagnetic wave, wherein said sealed vacuum chamber comprises a plasma ignited without prior injection of gas, said sealed vacuum chamber being a chamber in which a pressure less than 10\u22124 mbar prevails.
2. The ionisation device according to claim 1, wherein said sealed vacuum chamber is a chamber in which a pressure less than 10\u22126 mbar prevails.
3. The ionisation device according to claim 2, wherein said sealed vacuum chamber is a chamber in which a pressure greater than or equal to 10\u22127 mbar prevails.
4. The ionisation device according to claim 1, wherein said sealed vacuum chamber is a circular waveguide having a diameter greater than or equal to 0.59\u03bb, where \u03bb represents the wavelength of the injected electromagnetic wave.
5. The ionisation device according to claim 1, wherein said injected electromagnetic wave is a high-frequency wave greater than or equal to 6 GHz.
6. The ionisation device according to claim 1, wherein said injected electromagnetic wave is a low-frequency wave less than 6 GHz.
7. The ionisation device according to claim 1, wherein said electromagnetic wave injector comprises a waveguide arranged to inject the high-frequency electromagnetic wave coaxially into the sealed vacuum chamber along the longitudinal axis of said sealed vacuum chamber.
8. The ionisation device according to claim 1, wherein said electromagnetic wave injector comprises a waveguide arranged to inject the high-frequency electromagnetic wave perpendicularly to the longitudinal axis of said sealed vacuum chamber.
9. The ionisation device according to claim 1, comprising, in the proximity of said plasma, at least one negatively polarised electrode.
10. The device according to claim 9, wherein said at least one electrode is hollow in its centre.
11. An ion source comprising:
a vacuum enclosure through which high-energy ions pass;
an ionisation device according to claim 1 capable of ionising neutral particles present inside the vacuum enclosure; and
a positively polarised electrode capable of repelling the particles ionised by the ionisation device and capable of being transparent to the high-energy ions passing through said ion source.
12. The ion source according to claim 11, wherein said positively polarised electrode is at an electric potential selected such that said electric potential does not disturb the formation andor the maintenance of the plasma of said ionisation device.
13. The ion source according to claim 12, wherein said electric potential of said positively polarised electrode is less than or equal to 15 volts.
14. The ion source according to claim 11, comprising a negatively polarised electrode capable of accelerating the particles ionised by the ionisation device.
15. The ion source according to claim 11, comprising an ion generator producing high-energy ions.
16. The ion source according to claim 11, wherein said ion source comprises a pumping arrangement configured to extract the neutral particles and the particles present after neutralisation in the enclosure of said ion source.
17. The ion source according to claim 11, comprising:
an intermediate sealed vacuum chamber;
a first and a second ionisation device capable of ionising neutral particles present inside the ion source; said first and second ionisation devices being positioned on either side of said intermediate sealed vacuum chamber;
an access window in said intermediate vacuum chamber positioned between the first and second ionisation devices for the introduction of particles capable of being ionised by said first and second ionisation devices andor ions capable of interacting with high-energy ions passing through said ion source;
a second positively polarised electrode capable of repelling the particles ionised by the first and second ionisation devices and capable of being transparent to the high-energy ions; said first electrode being positioned upstream of the sealed vacuum chamber of said first ionisation device and said second electrode being positioned downstream of the sealed vacuum chamber of said second ionisation device such that the particles andor the ions remain confined between said two polarised electrodes as long as said particles andor the ions are not redirected towards the outside of said ion source.
18. The ion source according to claim 15, comprising a particle separator positioned between the ion generator and the ionisation device.
19. A method for igniting an electron cyclotron resonance plasma in the sealed vacuum chamber of an ionisation device, the method comprising igniting said plasma by particles present in said sealed vacuum chamber without prior injection into said chamber of an igniting gas, wherein said ionisation device includes
the sealed vacuum chamber;
an electromagnetic wave injector configured to inject an electromagnetic wave into said sealed vacuum chamber;
a magnetic structure for producing a magnetic field in said sealed vacuum chamber and for generating a plasma along the magnetic field lines, the modulus of said magnetic field forming a magnetic mirror structure having a magnetic field profile that includes two maxima and a minimum between the two maxima, wherein the minimum of the magnetic field profile is equal to or less than a value for which electron cyclotron resonance is achieved so that at least one electron cyclotron resonance region is formed in the chamber;
said sealed vacuum chamber being a waveguide having a length greater than or equal to a guide wavelength corresponding to a frequency of the injected electromagnetic wave, wherein said sealed vacuum chamber comprises a plasma ignited without prior injection of gas, said sealed vacuum chamber being a chamber in which a pressure less than 10\u22124 mbar prevails.
The claims below are in addition to those above.
All refrences to claim(s) which appear below refer to the numbering after this setence.
1. A compound of formula (I):
wherein
each of R1 and R8, independently, is C1-C10 alkyl, C3-C20 cycloalkyl, C3-C20 heterocycloalkyl, aryl, or heteroaryl; or R1 and R8 form C1-C10 alkyl, C3-C20 cycloalkyl, C3-C20 heterocycloalkyl, aryl, or heteroaryl;
each of R2, R3, R6, and R7, independently, is H, C1-C10 alkyl, C3-C20 cycloalkyl, C3-C20 heterocycloalkyl, aryl, or heteroaryl; or R2 and R3, together with the two carbon atoms to which they are attached, form C4-C20 cycloalkyl, C4-C20 heterocycloalkyl, aryl, or heteroaryl; or R6 and R7, together with the two carbon atoms to which they are attached, form C4-C20 cycloalkyl, C4-C20 heterocycloalkyl, aryl, or heteroaryl;
each of R4 and R5, independently, is C1-C10 alkyl, C3-C20 cycloalkyl, C3-C20 heterocycloalkyl, aryl, or heteroaryl;
X\u2212 is a halide ion, a hydroxide ion, a tetrafluoroboric acid ion, a nitric acid ion, a hexaflorophosphoric acid ion, a tetrakis(3,5-bis(trifluoromethyl)phenyl)boronic acid ion, a sulfuric acid ion, a phosphoric acid ion, a citric acid ion, a methanesulfonic acid ion, a trifluoroacetic acid ion, a malic acid ion, a tartaric acid ion, a fumaric acid ion, a glutamic acid ion, a glucuronic acid ion, a lactic acid ion, a glutaric acid ion, a maleic acid ion, an acetic acid ion, or a p-toluenesulfonic acid ion; and
at least one of the four carbon atoms to which R2, R3, R6, and R7 are attached has an R or S configuration.
2. The compound of claim 1, wherein R1 is identical to R8, R2 is identical to R7, R3 is identical to R6, and R4 is identical to R5.
3. The compound of claim 2, wherein all the carbon atoms to which R2, R3, R6, and R7 are attached have an R or S configuration.
4. The compound of claim 3, wherein all the carbon atoms to which R2, R3, R6, and R7 are attached have an R configuration, or all of them have a S configuration.
5. The compound of claim 4, wherein each of R2, R3, R6, and R7, independently, is aryl or heteroaryl.
6. The compound of claim 4, wherein R2 and R3, together with the two carbon atoms to which they are attached, form C4-C20 cycloalkyl; and R6 and R7, together with the two carbon atoms to which they are attached, form C4-C20 cycloalkyl.
7. The compound of claim 4, wherein each of R1, R4, R5, and R8, independently, is C1-C10 alkyl.
8. The compound of claim 1, wherein the compound is one of Compounds 1a, 1b, 1c, 1d, 1e, and 1f as shown below:
9. The compound of claim 1, wherein R1 is identical to R8, each of R2 and R7 is H, and R4 is identical to R5.
10. The compound of claim 9, wherein all the carbon atoms to which R3 and R6 are attached have an R or S configuration.
11. The compound of claim 10, wherein each of R3 and R6, independently, is aryl or heteroaryl.
12. The compound of claim 10, wherein each of R1, R4, R5, and R8, independently, is C1-C10 alkyl.
13. The compound of claim 1, wherein R1 is identical to R8, each of R3 and R6 is H, and R4 is identical to R5.
14. The compound of claim 13, wherein all the carbon atoms to which R2 and R7 are attached have an R or S configuration.
15. The compound of claim 14, wherein each of R2 and R7, independently, is aryl or heteroaryl.
16. The compound of claim 14, wherein each of R1, R4, R5, and R8, independently, is C1-C10 alkyl.
17. A method of preparing a compound of formula (I):
the method comprising:
reacting a compound of formula (II):
with a compound of formula (III):
wherein
each of R1 and R8, independently, is C1-C10 alkyl, C3-C20 cycloalkyl, C3-C20 heterocycloalkyl, aryl, or heteroaryl; or R1 and R8 form C1-C10 alkyl, C3-C20 cycloalkyl, C3-C20 heterocycloalkyl, aryl, or heteroaryl;
each of R2, R3, R6, and R7, independently, is H, C1-C10 alkyl, C3-C20 cycloalkyl, C3-C20 heterocycloalkyl, aryl, or heteroaryl; or R2 and R3, together with the two carbon atoms to which they are attached, form C4-C20 cycloalkyl, C4-C20 heterocycloalkyl, aryl, or heteroaryl; or R6 and R7, together with the two carbon atoms to which they are attached, form C4-C20 cycloalkyl, C4-C20 heterocycloalkyl, aryl, or heteroaryl;
each of R4 and R5, independently, is C1-C10 alkyl, C3-C20 cycloalkyl, C3-C20 heterocycloalkyl, aryl, or heteroaryl;
X\u2212 is a halide ion, a hydroxide ion, a tetrafluoroboric acid ion, a nitric acid ion, a hexaflorophosphoric acid ion, a tetrakis(3,5-bis(trifluoromethyl)phenyl)boronic acid ion, a sulfuric acid ion, a phosphoric acid ion, a citric acid ion, a methanesulfonic acid ion, a trifluoroacetic acid ion, a malic acid ion, a tartaric acid ion, a fumaric acid ion, a glutamic acid ion, a glucuronic acid ion, a lactic acid ion, a glutaric acid ion, a maleic acid ion, an acetic acid ion, or a p-toluenesulfonic acid ion; and
at least one of the four carbon atoms to which R2, R3, R6, and R7 are attached has an R or S configuration.
18. The method of claim 17, wherein the compound of formula (I) is one of Compounds 1a, 1b, 1c, 1d, 1e, and 1f as shown below:
19. A method of preparing a chiral compound of formula (IV):
the method comprising:
reacting an enone of formula (V):
with a Schiff base of formula (VI):
in the presence of a catalyst,
wherein
R11 is H, C1-C10 alkyl, C3-C20 cycloalkyl, C3-C20 heterocycloalkyl, aryl, or heteroaryl;
each of R12 and R13, independently, is H, C1-C10 alkyl, C3-C20 cycloalkyl, C3-C20 heterocycloalkyl, aryl, or heteroaryl; or R12 and R13, together with the carbon atom to which they are attached, is C3-C20 cycloalkyl, or C3-C20 heterocycloalkyl;
each of R14 and R15, independently, is H, C1-C10 alkyl, C3-C20 cycloalkyl, C3-C20 heterocycloalkyl, aryl, or heteroaryl; or R14 and R15, together with the carbon atom to which they are attached, is C3-C20 cycloalkyl, or C3-C20 heterocycloalkyl;
R16 is C1-C10 alkyl, C3-C20 cycloalkyl, C3-C20 heterocycloalkyl, aryl, or heteroaryl; and
the catalyst is a compound of claim 1.
20. The method of claim 19, wherein the catalyst is one of Compounds 1a, 1b, 1c, 1d, 1e, and 1f as shown below: