1. A surfboard comprising:
a board front, a board midsection, a board tail end, a top side, an underside, and a central axis, wherein the underside comprises an underside right portion and an underside left portion;
at least one fin removably connected to the underside proximate to the board tail end;
a first graduated channel disposed in the underside left portion having a first front end shallower than a first tail end, wherein the first front end is proximate to the board midsection and the first tail end is proximate to the board tail end, and wherein the first graduated channel is substantially parallel to the central axis;
a second graduated channel disposed in the underside right portion having a second front end shallower than a second tail end, wherein the second front end is proximate to the board midsection and the second tail end is proximate to the board tail end, and wherein the second graduated channel is substantially parallel to the central axis; and
a keel disposed in the underside along the central axis separating the first graduated channel and the second graduated channel.
2. The surfboard of claim 1, wherein the at least one fin removably connected to the underside comprises perforations.
3. The surfboard of claim 1, further comprising from two fins to four fins removably connected to the underside.
4. The surfboard of claim 1, further comprising from three fins to four fins connected to the underside in an offset pattern.
5. The surfboard of claim 1, wherein the board tail end has a plane face.
6. The surfboard of claim 1, wherein the board tail end is shaped as a rounded end.
7. The surfboard of claim 1, wherein the board tail end has a shape selected from the group consisting of: a swallow tail, a round tail, a pin tail, a bat wing, a squash tail, or a double wing swallow tail.
8. The surfboard of claim 1, wherein the surfboard has a length ranging from about 3 feet to about 10 feet, a width ranging from about 6 inches to about 18 inches, and a thickness ranging from about 1 inch to about 8 inches.
9. The surfboard of claim 1, wherein the surfboard is generally hollow with at least one baffle formed interior of the surfboard.
10. The surfboard of claim 1, wherein the board front rises from about 3 degrees to about 8 degrees from the central axis, creating a raised board front.
11. The surfboard of claim 10, wherein a graduated V is formed in the raised board front.
12. The surfboard of claim 1, wherein the first graduated channel and the second graduated channel have a length ranging from about 30 percent to about 60 percent of the length of the underside, a width ranging from about 1 inch to about 3 inches, and a graduation in each channel ranging from about 1 degree near the board midsection to about 4 degrees at the board tail end.
13. The surfboard of claim 1, wherein the keel has a height ranging from about 0.25 inches to about 1 inch.
14. The surfboard of claim 13, wherein the keel has a rounded edge that extends no more than about 1 inch above the underside.
The claims below are in addition to those above.
All refrences to claim(s) which appear below refer to the numbering after this setence.
1. An exposure apparatus that exposes a substrate, comprising:
an optical system that includes an emission surface from which an exposure light is emitted;
a first surface that is disposed in at least a part of a surrounding of an optical path of the exposure light emitted from the emission surface;
a second surface that is disposed in at least a part of a surrounding of the first surface and at a position lower than the first surface;
a space portion into which a liquid can flow via a first aperture between the first surface and the second surface and which is opened to the atmosphere via a second aperture different from the first aperture; and
a first recovery portion that recovers at least a part of the liquid flowing into the space portion,
wherein the emission surface, the first surface, and the second surface are opposed to the surface of the substrate in at least a part of the exposure of the substrate, and
wherein the substrate is exposed with the exposure light from the emission surface via the liquid between the emission surface and the surface of the substrate.
2. The exposure apparatus according to claim 1, wherein the first recovery portion recovers the liquid overflowing from the space portion.
3. The exposure apparatus according to claim 1, wherein the first recovery portion includes a first recess portion, which is disposed facing upward, outside the space portion in a radial direction about an optical axis of the optical system and recovers the liquid flowing into the first recess portion.
4. The exposure apparatus according to claim 1, further comprising a top end portion defining a top end of the space portion,
wherein at least a part of the first recovery portion is disposed outside the top end portion in the radial direction about the optical axis of the optical system.
5. An exposure apparatus that exposes a substrate, comprising:
an optical system that includes an emission surface from which an exposure light is emitted;
a first surface disposed in at least a part of a surrounding of an optical path of the exposure light emitted from the emission surface;
a second surface that is disposed in at least a part of a surrounding of the first surface;
a space portion into which a liquid can flow via a first aperture between the first surface and the second surface and which is opened to the atmosphere via a second aperture different from the first aperture;
a top end portion defining a top end of the space portion; and
a first recovery portion of which at least a part is disposed outside the top end portion in a radial direction about an optical axis of the optical system and which recovers at least a part of the liquid flowing into the space portion,
wherein the emission surface, the first surface, and the second surface are opposed to the surface of the substrate in at least a part of the exposure of the substrate, and
wherein the substrate is exposed with the exposure light from the emission surface via the liquid between the emission surface and the surface of the substrate.
6. The exposure apparatus according to claim 4, wherein the first recovery portion includes a first recess portion, the bottom of which is formed lower than the top end portion, outside the top end portion in the radial direction about the optical axis of the optical system and recovers the liquid flowing into the first recess portion.
7. The exposure apparatus according to claim 6, wherein the first recovery portion includes a liquid guide portion extending in the radial direction about the optical axis of the optical system from the top end portion, and
wherein the first recess portion is disposed outside the liquid guide portion in the radial direction about the optical axis of the optical system from the top end portion.
8. The exposure apparatus according to claim 3, wherein the first recovery portion includes a recovery port that recovers the liquid flowing into the first recess portion.
9. The exposure apparatus according to claim 8, wherein the recovery port is opposed to the bottom of the first recess portion.
10. The exposure apparatus according to claim 8, wherein the recovery port is disposed in the first recess portion.
11. The exposure apparatus according to claim 9, wherein the recovery port is disposed at the bottom of the first recess portion.
12. The exposure apparatus according to claim 8, further comprising a porous member disposed in the recovery port.
13. The exposure apparatus according to claim 12, wherein a difference in pressure between at one side and at the other side of the porous member is controlled so that only the liquid passes from one side to the other side of the porous member.
14. The exposure apparatus according to claim 8, wherein the recovery port recovers the liquid flowing into the first recess portion along with a gas.
15. The exposure apparatus according to claim 8, wherein a member that includes the first surface and a member that includes the first recess portion are movable relative to each other.
16. The exposure apparatus according to claim 1, wherein the first surface and the second surface cannot recover the liquid.
17. The exposure apparatus according to claim 1, wherein the second surface is lyophobic to the liquid.
18. The exposure apparatus according to claim 1, wherein the first aperture is opposed to the surface of the substrate in at least a part of the exposure of the substrate.
19. The exposure apparatus according to claim 1, further comprising a gas supply port disposed in at least a part of a surrounding of the first aperture.
20. The exposure apparatus according to claim 19, wherein the gas supply port is disposed in the second surface.
21. The exposure apparatus according to claim 19, further comprising a second recess portion that is disposed between the first aperture and the second surface,
wherein the second recess portion is opposed to the surface of the substrate in at least a part of the exposure of the substrate, and
wherein the gas supply port is disposed in the inner surface defining the second recess portion and supplies the gas thereto to enhance the pressure of the second recess portion.
22. The exposure apparatus according to claim 19, further comprising a suction port that is disposed outside the gas supply port in the radial direction about the optical axis of the optical system so as to suck at least one of the liquid and the gas.
23. The exposure apparatus according to claim 1, further comprising a supply port that supplies the liquid to the optical path.
24. The exposure apparatus according to claim 23, wherein the optical system includes an optical member that has the emission surface, and
wherein the supply port is disposed at a position opposed to a surface of the optical member through which the exposure light does not pass.
25. The exposure apparatus according to claim 24, wherein the surface of the optical member through which the exposure light does not pass includes a side surface of the optical member extending to the upside from the edge of the emission surface.
26. The exposure apparatus according to claim 23, wherein the supply port is disposed at a position, which faces a first space facing the first surface, outside the first aperture in the radial direction about the optical axis of the optical system.
27. The exposure apparatus according to claim 1, wherein the optical system includes an optical member that has the emission surface, and
wherein the exposure apparatus further comprises a second recovery portion that recovers the liquid overflowing from a space which faces the side surface of the optical member extending to the upside from the edge of the emission surface.
28. An exposure apparatus that exposes a substrate, comprising:
an optical system that includes an emission surface from which an exposure light is emitted;
a space portion into which a liquid can flow via a first aperture disposed in at least a part of a surrounding of an optical path of the exposure light and which is opened to the atmosphere via a second aperture different from the first aperture; and
a first recovery portion that recovers the liquid from the space portion,
wherein the first recovery portion includes a reservoir portion that collects the liquid from the space portion so as not to return to the space portion,
wherein at least a part of the liquid on the substrate is collected in the reservoir portion via the space portion from the first aperture in at least a part of the exposure of the substrate, and
wherein the substrate is exposed with the exposure light from the emission surface via the liquid between the emission surface and the surface of the substrate.
29. The exposure apparatus according to claim 28, wherein the first recovery portion includes a recovery port that recovers the liquid collected in the reservoir portion.
30. The exposure apparatus according to claim 28, wherein the first aperture is opposed to the surface of the substrate in at least a part of the exposure of the substrate.
31. A device manufacturing method comprising:
exposing a substrate using the exposure apparatus according to claim 1; and
developing the exposed substrate.
32. An exposure method comprising:
opposing a first surface disposed in at least a part of a surrounding of an optical path of an exposure light emitted from an emission surface of an optical system to a substrate with a first gap interposed therebetween and holding a liquid between the first surface and the substrate;
opposing a second surface disposed in at least a part of a surrounding of the first surface to the substrate with a second gap than the first gap;
recovering at least a part of the liquid flowing into a space portion, which is opened to the atmosphere via a second aperture different from a first aperture, from the first aperture between the first surface and the second surface; and
exposing the substrate with the exposure light from the emission surface via the liquid between the emission surface and the substrate.
33. An exposure method comprising:
opposing a first surface disposed in at least a part of a surrounding of an optical path of an exposure light emitted from an emission surface of an optical system to a substrate with a first gap interposed therebetween and holding a liquid between the first surface and the substrate;
opposing a second surface disposed in at least a part of a surrounding of the first surface to the substrate;
recovering at least a part of the liquid flowing into a space portion, which is opened to the atmosphere via a second aperture different from a first aperture, from the first aperture between the first surface and the second surface outside a top end of the space portion in the radial direction about the optical axis of the optical system; and
exposing the substrate with the exposure light from the emission surface via the liquid between the emission surface and the substrate.
34. An exposure method comprising:
filling an optical path of an exposure light between an emission surface of an optical system and a substrate with a liquid;
exposing the substrate with the exposure light from the emission surface via the liquid between the emission surface and the substrate; and
recovering at least a part of the liquid on the substrate from a first aperture disposed in at least a part of a surrounding of the optical path via a space portion opened to the atmosphere via a second aperture different from the first aperture,
wherein the recovering of at least a part of the liquid includes collecting the liquid from the space portion in a reservoir portion so that the recovered liquid does not return to the space portion.
35. A device manufacturing method comprising:
exposing a substrate using the exposure method according to claim 32; and
developing the exposed substrate.
36. An exposure apparatus that exposes a substrate, comprising:
an optical system that includes an emission surface from which an exposure light is emitted;
a first surface that is disposed in at least a part of a surrounding of an optical path of the exposure light emitted from the emission surface;
a first recess portion that is disposed in at least a part of a surrounding of the first surface; and
a first gas supply port that is disposed in the inner surface defining the first recess portion so as to supply a gas,
wherein the surface of the substrate is opposed to the emission surface, the first surface, and the first recess portion in at least a part of the exposure of the substrate, and
wherein the substrate is exposed with the exposure light from the emission surface via the liquid between the emission surface and the surface of the substrate.
37. The exposure apparatus according to claim 36, further comprising a second surface that is disposed in at least a part of a surrounding of the first recess portion and directed in the same direction as the first surface,
wherein the surface of the substrate is opposed to the second surface in at least a part of the exposure of the substrate.
38. The exposure apparatus according to claim 37, wherein the second surface is disposed lower than the first surface.
39. The exposure apparatus according to claim 38, further comprising a second gas supply port disposed in the second surface.
40. The exposure apparatus according to claim 37, wherein the second surface cannot recover the liquid.
41. The exposure apparatus according to claim 37, wherein the second surface is lyophobic to the liquid.
42. The exposure apparatus according to claim 36, further comprising a first recovery port that is disposed between the first surface and the first recess portion in a radial direction about an optical axis of the optical system so as to recover the liquid.
43. The exposure apparatus according to claim 42, wherein the liquid is recovered from the first recovery port by connecting the first recovery port to a vacuum source.
44. The exposure apparatus according to claim 36, further comprising:
a space portion into which the liquid can flow from a first aperture between the first surface and the first recess portion and which is opened to the atmosphere via a second aperture different from the first aperture; and
a recovery portion that recovers at least a part of the liquid flowing into the space portion.
45. The exposure apparatus according to claim 44, wherein the recovery portion recovers the liquid overflowing from the space portion.
46. The exposure apparatus according to claim 44, further comprising a top end portion that defines a top end of the space portion,
wherein at least a part of the recovery portion is disposed outside the top end portion in the radial direction about the optical axis of the optical system.
47. The exposure apparatus according to claim 44, wherein the recovery portion includes a second recess portion disposed outside the space portion in the radial direction about the optical axis of the optical system so as to be directed to the upside and recovers the liquid flowing into the second recess portion.
48. The exposure apparatus according to claim 47, wherein the recovery portion includes a liquid guide portion extending in the radial direction about the optical axis of the optical system from the top end portion defining the top end of the space portion, and
wherein the second recess portion is disposed outside the liquid guide portion in the radial direction about the optical axis of the optical system.
49. The exposure apparatus according to claim 47, wherein the recovery portion includes a second recovery port that recovers the liquid flowing into the second recess portion.
50. The exposure apparatus according to claim 49, wherein the second recovery port is opposed to the bottom of the second recess portion.
51. The exposure apparatus according to claim 49, wherein the second recovery port is disposed in the second recess portion.
52. The exposure apparatus according to claim 51, wherein the second recovery port is disposed at the bottom of the second recess portion.
53. The exposure apparatus according to claim 49, further comprising a porous member disposed in the second recovery port.
54. The exposure apparatus according to claim 53, wherein a difference in pressure between at one side and at the other side of the porous member is controlled so that only the liquid passes from one side to the other side of the porous member.
55. The exposure apparatus according to claim 49, wherein the second recovery port recovers the liquid flowing into the second recess portion along with a gas.
56. The exposure apparatus according to claim 36, further comprising a supply port that supplies the liquid to the optical path.
57. The exposure apparatus according to claim 56, wherein the optical system includes an optical member having the emission surface, and
wherein the supply port is disposed at a position opposed to a surface of the optical member through which the exposure light does not pass.
58. The exposure apparatus according to claim 57, wherein the surface of the optical member through which the exposure light does not pass includes a side surface of the optical member extending to the upside from the edge of the emission surface andor in the radial direction about the optical axis of the optical system.
59. The exposure apparatus according to claim 58, wherein the optical system includes an optical member that has the emission surface and a holding member holding the optical member, and
wherein the side surface includes at least one of the surface of the optical member and the surface of the holding member.
60. The exposure apparatus according to claim 56, wherein the supply port is disposed at a position, which faces a first space facing the first surface, outside the first surface in the radial direction about the optical axis of the optical system.
61. A device manufacturing method comprising:
exposing a substrate using the exposure apparatus according to claim 36; and
developing the exposed substrate.
62. An exposure method comprising:
causing a substrate to move so that an emission surface of an optical system and a first surface disposed in at least a part of a surrounding of an optical path of an exposure light emitted from the emission surface of the optical system are opposed to the substrate;
supplying a gas from a first gas supply port disposed in an inner surface defining a first recess portion disposed in at least a part of a surrounding of the first surface to increase a pressure of the first recess portion; and
exposing the substrate with the exposure light from the emission surface via a liquid between the emission surface and the substrate.
63. A device manufacturing method comprising:
exposing a substrate using the exposure method according to claim 62; and
developing the exposed substrate.
64. An exposure apparatus that exposes a substrate, comprising:
an optical system that includes an emission surface from which an exposure light is emitted;
a first surface that is disposed in at least a part of a surrounding of an optical path of the exposure light emitted from the emission surface;
a supply port which is disposed in at least a part of a surrounding of the first surface so as to face a space which the first surface faces and which supplies a liquid to the space so as to fill the optical path with the liquid; and
a recovery portion that recovers at least a part of the liquid being supplied from the supply port and flowing via a first aperture into a space portion which a side surface of the optical system extending to the upside from the edge of the emission surface andor in a radial direction about an optical axis of the optical system faces,
wherein the surface of the substrate disposed below the emission surface is opposed to the emission surface and the first surface in at least a part of the exposure of the substrate, and
wherein the substrate is exposed with the exposure light from the emission surface via the liquid between the emission surface and the surface of the substrate.
65. The exposure apparatus according to claim 64, wherein the first aperture includes an opening through which the exposure light passes, and
wherein at least a part of the liquid supplied from the supply port flows into the space portion via the first aperture.
66. The exposure apparatus according to claim 64, wherein the supply port is flush with the first surface.
67. The exposure apparatus according to claim 64, further comprising a second surface disposed in at least a part of a surrounding of the first surface and disposed lower than the first surface,
wherein the surface of the substrate disposed below the emission surface is opposed to the second surface in at least a part of the exposure of the substrate.
68. The exposure apparatus according to claim 67, wherein the supply port is disposed lower than the first surface.
69. The exposure apparatus according to claim 67, wherein the supply port is disposed between the first surface and the second surface.
70. The exposure apparatus according to claim 69, further comprising a third surface which is disposed between the first surface and the second surface and which faces the space,
wherein the supply port is disposed in the third surface.
71. The exposure apparatus according to claim 70, wherein the third surface is substantially parallel to the optical axis of the optical system.
72. The exposure apparatus according to claim 67, wherein the second surface is lyophobic to the liquid.
73. The exposure apparatus according to claim 64, wherein the space portion is opened to the atmosphere via a second aperture different from the first aperture.
74. The exposure apparatus according to claim 64, wherein the recovery portion recovers the liquid overflowing from the space portion.
75. The exposure apparatus according to claim 64, further comprising a top end portion defining a top end of the space portion,
wherein at least a part of the recovery portion is disposed outside the top end portion in the radial direction about the optical axis of the optical system.
76. The exposure apparatus according to claim 64, wherein the recovery portion includes a recess portion disposed outside the space portion in the radial direction about the optical axis of the optical system so as to be directed to the upside and recovers the liquid flowing into the recess portion.
77. The exposure apparatus according to claim 76, wherein the recovery portion includes a liquid guide portion extending in the radial direction about the optical axis of the optical system from the top end portion defining the top end of the space portion, and
wherein the recess portion is disposed outside the liquid guide portion in the radial direction about the optical axis of the optical system.
78. The exposure apparatus according to claim 76, wherein the bottom of the recess portion is disposed lower than the top end portion.
79. The exposure apparatus according to claim 76, wherein the recovery portion includes a recovery port recovering the liquid flowing into the frecess portion.
80. The exposure apparatus according to claim 79, wherein the recovery port is disposed in the recess portion.
81. The exposure apparatus according to claim 79, further comprising a porous member that is disposed in the recovery port.
82. The exposure apparatus according to claim 81, wherein a difference in pressure between at one side and at the other side of the porous member is controlled so that only the liquid passes from one side to the other side of the porous member.
83. The exposure apparatus according to claim 79, wherein the recovery port recovers the liquid flowing into the recess portion along with a gas.
84. The exposure apparatus according to claim 64, further comprising a gas supply port that is disposed in at least a part of a surrounding of the supply port.
85. The exposure apparatus according to claim 64, wherein the optical system includes an optical member having the emission surface and a holding member holding the optical member, and
wherein the side surface includes at least one of the surface of the optical member and the surface of the holding member.
86. A device manufacturing method comprising:
exposing a substrate using the exposure apparatus according to claim 64; and
developing the exposed substrate.
87. An exposure method comprising:
causing a substrate to move so that an emission surface of an optical system and a first surface disposed in at least a part of a surrounding of an optical path of an exposure light emitted from the emission surface of the optical system are opposed to the substrate;
supplying a liquid to a space between the first surface and the substrate from a supply port disposed in at least a part of a surrounding of the first surface to face the space and filling the optical path between the emission surface and the substrate with the liquid;
recovering at least a part of the liquid being supplied from the supply port and flowing into a space portion which a side surface of the optical system extending to the upside from the edge of the emission surface andor in a radial direction about an optical axis of the optical system faces; and
exposing the substrate with the exposure light from the emission surface via the liquid between the emission surface and the surface of the substrate.
88. The exposure method according to claim 87, wherein at least a part of the liquid supplied from the supply port is recovered via an aperture through which the exposure light passes and the space portion.
89. A device manufacturing method comprising:
exposing a substrate using the exposure method according to claim 87; and
developing the exposed substrate.
90. An exposure apparatus that exposes a substrate, comprising:
an optical system that includes an emission surface from which an exposure light is emitted;
a first surface that is disposed in at least a part of a surrounding of an optical path of the exposure light emitted from the emission surface;
a second surface that is disposed in at least a part of a surrounding of the first surface;
a first space portion which a side surface of the optical system extending to the upside from the edge of the emission surface andor in a radial direction about the optical axis of the optical system faces;
a second space portion into which a liquid can flow from a first aperture disposed between the first surface and the second surface and which is opened to the atmosphere via a second aperture different from the first aperture; and
a recovery portion of which at least a part is disposed at a position opposed to the side surface of the optical system and which recovers at least a part of the liquid flowing into the second space portion from the first aperture via the second aperture,
wherein the surface of the substrate is opposed to the emission surface, the first surface, and the second surface in at least a part of the exposure of the substrate, and
wherein the substrate is exposed with the exposure light from the emission surface via the liquid between the emission surface and the surface of the substrate.
91. The exposure apparatus according to claim 90, wherein the first space portion includes a first portion and a second portion, and
wherein at least a part of the recovery portion is opposed to a side surface of the optical system in the second portion.
92. The exposure apparatus according to claim 91, further comprising a liquid supply port facing the first portion of the first space portion,
wherein the liquid from the liquid supply port is supplied to the optical path.
93. The exposure apparatus according to claim 91, further comprising an antivibration device that prevents at least a part of the liquid flowing into the second space portion from flowing from the second portion into the first portion.
94. The exposure apparatus according to claim 91, wherein the antivibration device includes a wall portion having an opposing surface opposed to the side surface of the optical system, and
wherein a gap between the opposing surface of the wall portion and the side surface of the optical system is smaller than the gap formed in the wall portion close to the second portion.
95. The exposure apparatus according to claim 94, wherein at least one of the opposing surface of the wall portion and the side surface of the optical system facing the opposed to the opposing surface is lyophobic to the liquid.
96. The exposure apparatus according to claim 91, wherein the first portion extends in the radial direction and to the upside.
97. An exposure apparatus for exposing a substrate, comprising:
an optical system that includes an emission surface from which an exposure light is emitted;
a first surface that is disposed in at least a part of a surrounding of an optical path of the exposure light emitted from the emission surface;
a second surface that is disposed in at least a part of a surrounding of the first surface;
a first space portion which a side surface of the optical system extending to the upside from the edge of the emission surface andor in a radial direction about an optical axis of the optical system faces and which is opened to the atmosphere;
a second space portion into which a liquid can flow from a first aperture disposed between the first surface and the second surface; and
a recovery portion that recovers at least a part of the liquid flowing into the second space portion from the first aperture via the second aperture facing the first space portion,
wherein the surface of the substrate is opposed to the emission surface, the first surface, and the second surface in at least a part of the exposure of the substrate, and
wherein the substrate is exposed with the exposure light from the emission surface via the liquid between the emission surface and the surface of the substrate.
98. The exposure apparatus according to claim 97, wherein the first space portion includes a first portion and a second portion, and
wherein the second aperture faces the second portion.
99. The exposure apparatus according to claim 98, further comprising a liquid supply port that faces the first portion of the first space portion,
wherein the liquid from the liquid supply port is supplied to the optical path.
100. The exposure apparatus according to claim 98, further comprising an antivibration device that prevents at least a part of the liquid flowing into the second space portion from flowing from the second portion into the first portion.
101. The exposure apparatus according to claim 98, wherein the antivibration device includes a wall portion having an opposing surface opposed to the side surface of the optical system, and
wherein a gap between the opposing surface of the wall portion and the side surface of the optical system is smaller than the gap formed in the wall portion close to the second portion.
102. The exposure apparatus according to claim 101, wherein at least one of the opposing surface of the wall portion and the side surface of the optical system facing the opposed to the opposing surface is lyophobic to the liquid.
103. The exposure apparatus according to claim 98, wherein the first portion extends in the radial direction and to the upside.
104. The exposure apparatus according to claim 90, wherein the second surface is disposed lower than the first surface.
105. The exposure apparatus according to claim 90, wherein the recovery portion recovers the liquid overflowing from the second space portion.
106. The exposure apparatus according to claim 90, further comprising a top end portion that defines a top end of the second space portion,
wherein at least a part of the recovery portion is disposed outside the top end portion in the radial direction about the optical axis of the optical system.
107. The exposure apparatus according to claim 90, wherein the recovery portion includes a recess portion, which is disposed to the upside, outside the top end portion defining the top end of the second space portion in a radial direction about the optical axis of the optical system and recovers the liquid flowing into the recess portion.
108. The exposure apparatus according to claim 107, wherein the recovery portion includes a liquid guide portion extending in the radial direction about the optical axis of the optical system from the top end portion defining the top end of the second space portion, and
wherein the recess portion is disposed outside the liquid guide portion in the radial direction about the optical axis of the optical system from the top end portion.
109. The exposure apparatus according to claim 107, wherein the recess portion includes a bottom lower than the top end portion.
110. The exposure apparatus according to claim 107, wherein the recovery portion includes a recovery port recovering the liquid flowing into the recess portion.
111. The exposure apparatus according to claim 110, wherein the recovery port is disposed in the recess portion.
112. The exposure apparatus according to claim 110, wherein the recovery port is disposed at the bottom of the recess portion.
113. The exposure apparatus according to claim 110, further comprising a porous member disposed in the recovery port.
114. The exposure apparatus according to claim 113, wherein a difference in pressure between at one side and at the other side of the porous member is controlled so that only the liquid passes from one side to the other side of the porous member.
115. The exposure apparatus according to claim 110, wherein the recovery port recovers the liquid flowing into the recess portion along with a gas.
116. The exposure apparatus according to claim 90, wherein the second surface is lyophobic to the liquid.
117. The exposure apparatus according to claim 90, wherein the first aperture is opposed to the surface of the substrate in at least a part of the exposure of the substrate.
118. The exposure apparatus according to claim 90, further comprising a gas supply port disposed in at least a part of a surrounding of the first aperture.
119. The exposure apparatus according to claim 118, wherein the gas supply port is disposed in the second surface.
120. The exposure apparatus according to claim 90, wherein the optical system includes an optical member having the emission surface and a holding member holding the optical member, and
wherein the side surface includes at least one of the surface of the optical member and the surface of the holding member.
121. A device manufacturing method comprising:
exposing a substrate using the exposure apparatus according to claim 90; and
developing the exposed substrate.
122. An exposure method comprising:
causing a substrate to move so that an emission surface of an optical system and a first surface disposed in at least a part of a surrounding of an optical path of an exposure light emitted from the emission surface of the optical system are opposed to the substrate;
exposing the substrate with the exposure light from the emission surface via a liquid between the emission surface and the surface of the substrate; and
recovering at least a part of the liquid flowing into a space portion, which is opened to the atmosphere via a second aperture different from a first aperture, from the first aperture between the first surface and a second surface disposed in at least a part of a surrounding of the first surface via the second aperture by the use of a recovery portion which a side surface of the optical system extending to the upside from the edge of the emission surface andor in a radial direction about an optical axis of the optical system faces.
123. An exposure method comprising:
causing a substrate to move so that an emission surface of an optical system and a first surface disposed in at least a part of a surrounding of an optical path of an exposure light emitted from the emission surface of the optical system are opposed to the substrate;
exposing the substrate with the exposure light from the emission surface via a liquid between the emission surface and the surface of the substrate; and
recovering at least a part of the liquid flowing into a second space portion, which is opened to the atmosphere via a second aperture different from a first aperture, from the first aperture between the first surface and a second surface disposed in at least a part of a surrounding of the first surface via the second aperture facing a first space portion which a side surface of the optical system extending to the upside from the edge of the emission surface andor in a radial direction about an optical axis of the optical system faces.
124. A device manufacturing method comprising:
exposing a substrate using the exposure method according to claim 122; and
developing the exposed substrate.