1. A mobile device, comprising:
a base portion that includes a guide base;
a slider portion that includes a sliding plate, wherein the slider portion is slidably engaged with the base portion and moves relative to the base portion; and
a cover plate that is slidably engaged with the guide base of the base portion and the sliding plate of the slider portion, wherein the cover plate is configured to selectively cover a slot defined in the sliding plate;
wherein when the slider portion moves from a closed position to an open position, the cover plate moves in substantially the same direction as the slider portion due to a friction coefficient between the cover plate and the sliding plate being greater than a friction coefficient between the cover plate and the guide base.
2. The mobile device according to claim 1, wherein the cover plate is further configured to transition from a compressed state to a release state as the slider portion moves from the closed position to the open position.
3. The mobile device according to claim 2, wherein the cover plate further comprises one or more flexible connectors that cause the cover plate to move from the compressed state to the release state, and when the cover plate is in the release state, the cover plate is substantially flush with surfaces of the sliding plate that surround the slot of the sliding plate.
4. The mobile device according to claim 3, wherein the cover plate includes a body and one or more legs and the flexible connectors connect the body with the legs.
5. The mobile device according to claim 4, wherein the guide base includes one or more rails and the cover plate includes one or more corresponding fins that are positioned on the legs, wherein the fins engage the rails and slide along the rails as the cover plate and the slider portion move in the same direction.
6. The mobile device according to claim 2, wherein the cover plate and the slider portion move in an x-direction when the slider portion moves from the closed position to the open position and the cover plate also moves in a y-direction when the slider portion moves from the closed position to the open position, wherein the x-direction and the y-direction are substantially perpendicular to one another.
7. The mobile device according to claim 1, wherein the guide base also defines a slot and the slot of the sliding plate and the slot of the guide base are configured to receive a flexible circuit.
8. The mobile device according to claim 1, wherein the cover plate includes a plastic section and a metal section and the friction coefficient between the plastic section of the cover plate and the sliding plate is greater than the friction coefficient between the metal section of the cover plate and the guide base.
9. The mobile device according to claim 8, wherein the plastic section includes a beveled edge and the sliding plate also includes a beveled edge, wherein the beveled edge of the sliding plate contacts and pushes the beveled edge of the cover plate when the slider portion is moved back to the closed position.
10. The mobile device according to claim 1, wherein the slider portion includes a display and the base portion includes a keypad, wherein the keypad is hidden when the slider portion is in the closed position.
11. A mobile device, comprising:
a base portion;
a slider portion that is slidably engaged with the base portion, wherein the slider portion moves from a closed position to an open position to provide operator access to a user interface component of the base portion;
a sliding plate that is part of the slider portion, wherein the sliding plate includes an exposable surface defining a slot, wherein the sliding plate moves along with the slider portion from the closed position to the open position; and
a cover plate, wherein the cover plate is engaged with the sliding plate such that the cover plate moves along with the sliding plate;
wherein the cover plate moves from a compressed state to a release state when the sliding plate moves to the open position such that the cover plate is substantially flush with the exposable surface of the sliding plate when the cover plate is in the release state.
12. The mobile device according to claim 11, wherein the base portion includes a guide base and the cover plate includes a body and one or more legs, wherein the body is in contact with the sliding plate and the legs are in contact with the guide base.
13. The mobile device according to claim 12, wherein a friction coefficient between the body and the sliding plate is greater than a friction coefficient between the legs and the guide base.
14. The mobile device according to claim 13, wherein the cover plate further includes one or more flexible connectors that connect the body with the legs and the flexible connectors assist in moving the cover plate from the compressed state to the release state.
15. The mobile device according to claim 14, wherein the flexible connectors are positioned at a non-orthogonal angle with respect to the body and the legs.
16. The mobile device according to claim 12, wherein the body and the legs are made of metal and at least part of the metal of the body is covered with plastic.
17. The mobile device according to claim 11, further comprising a flexible circuit that is connected to both the base portion and the slider portion and wherein the cover plate at least partially covers the flexible circuit when the slider portion is in the open position.
18. A method of operating a mobile device, comprising:
sliding a slider portion of the mobile device relative to a base portion from a closed position to an open position;
sliding a cover plate along with the slider portion by overcoming a friction coefficient between the cover plate and a guide base of the base portion but not overcoming a friction coefficient between the cover plate and a sliding plate of the slider portion; and
moving the cover plate from a compressed state to a release state as the slider portion moves to the open position such that the cover plate is substantially flush with surfaces of the sliding plate.
19. The method according to claim 18, further comprising accessing a keypad that is part of the base portion.
20. The method according to claim 18, further comprising sliding the slider portion back to the closed position and moving the cover plate back to a compressed state.
The claims below are in addition to those above.
All refrences to claim(s) which appear below refer to the numbering after this setence.
1. A polymer, comprising:
a chemical structure (1)
wherein R1 represents a hydrogen or a methyl group; R2 represents at least one selected from the group consisting of a hydrogen, an alkyl group, an alkenyl group, an alkoxy group and an aryl group; Y represents a space group having 2 to 6 carbons; Z represents an ethylene monomer having at least one of a hydroxy group and a carboxyl group; the expressions m(m+n)=0.1 to 0.7 and n(m+n)=0.3 to 0.9 are satisfied; and a mass average molecular weight of the polymer is 5,000 to 100,000.
2. The polymer of claim 1, wherein R1, Y and Z represent a cyclopentyl group, a propyl group and methacrylic acid, respectively.
3. The polymer of claim 1, wherein the R1, Y and Z represent an isobutyl group, a propyl group and methacrylic acid, respectively.
4. The polymer of claim 1, wherein R1, Y and Z represent a cyclopentyl group, a propyl group and 2-hydroxyethyl methacrylic acid, respectively.
5. The polymer of claim 1, wherein R1, Y and Z represent a cyclopentyl group, a propyl group and methacrylic acid, respectively; and the polymer includes a comonomer formed of 2-hydroxyethyl methacrylic acid.
6. A top coating layer, comprising the polymer according to claim 1.
7. A top coating composition, comprising:
a solvent having 4 to 12 carbons; and
the polymer according to claim 1,
wherein the polymer has a percentage of solution by mass (mass %) of 1% to 10% of a total weight of the composition.
8. The top coating composition of claim 7, wherein the solvent is at least one selected from the group consisting of 4-methyl-2-pentanol, isobutanol, isooctanol and decane.
9. The top coating composition of claim 7, wherein the solvent is a mixed solution including 95% of decane and 5% of an alcohol-series solvent.
10. The top coating composition of claim 7, wherein the mass % is 3% to 5% of the total weight of the composition.
11. The top coating composition of claim 7, wherein R1, Y and Z represent a cyclopentyl group, a propyl group and methacrylic acid, respectively.
12. The top coating composition of claim 7, wherein R1, Y, and Z represent an isobutyl group, a propyl group and methacrylic acid, respectively.
13. The top coating composition of claim 7, wherein R1, Y, and Z represent a cyclopentyl group, a propyl group and 2-hydroxyethyl methacrylic acid, respectively.
14. The top coating composition of claim 7, wherein R1, Y and Z represent a cyclopentyl group, a propyl group and methacrylic acid, respectively, and the polymer includes a comonomer formed of 2-hydroxyethyl methacrylic acid.
15. An immersion lithography process, comprising:
forming a photoresist layer on a wafer;
forming a top coating layer on the photoresist layer, wherein the top coating layer includes a polymer having a chemical structure (1)
wherein R1 represents a hydrogen or a methyl group; R2 represents at least one selected from the group consisting of a hydrogen, an alkyl group, an alkenyl group, an alkoxy group, and an aryl group; Y represents a space group having 2 to 6 carbons; Z represents an ethylene monomer having at least one of a hydroxy group and a carboxyl group; the expressions m(m+n)=0.1 to 0.7 and n(m+n)=0.3 to 0.9 are satisfied; and a mass average molecular weight of the polymer is 5,000 to 100,000;
immersing the wafer in water;
performing an exposure process on the photoresist layer; and
forming a photoresist pattern by removing the top coating layer and an unexposed portion of the photoresist layer or the exposed photoresist layer with a developer.
16. The immersion lithography process of claim 15, wherein forming the top coating layer includes:
coating the photoresist layer with a top coating composition including the polymer dissolved in a solvent having 4 to 12 carbons; and
performing a baking process on the coated photoresist layer,
wherein the polymer has a percentage of solution by mass (mass %) of 1% to 10% of a total weight of the composition.
17. The immersion lithography process of claim 16, wherein the solvent is at least one selected from the group consisting of 4-methyl-2-pentanol, isobutanol, isooctanol and decane.
18. The immersion lithography process of claim 16, wherein the solvent is a mixed solution including 95% of decane and 5% of an alcohol-series solvent.
19. The immersion lithography process of claim 16, wherein the mass % is 3% to 5% of the total weight of the composition.
20. The immersion lithography process of claim 15, wherein R1, Y and Z represent a cyclopentyl group, a propyl group and methacrylic acid, respectively.
21. The immersion lithography process of claim 15, wherein R1, Y and Z represent an isobutyl group, a propyl group and methacrylic acid, respectively.
22. The immersion lithography process of claim 15, wherein R1, Y and Z represent a cyclopentyl group, a propyl group and 2-hydroxyethyl methacrylic acid, respectively.
23. The immersion lithography process of claim 15, wherein R1, Y and Z represent a cyclopentyl group, a propyl group and methacrylic acid, respectively, and the polymer includes a comonomer formed of 2-hydroxyethyl methacrylic acid.