1. A method for polishing an integrated circuit comprising a dielectric layer upon which are formed a plurality of features, the method comprising acts of:
depositing a metallic layer on a surface of a dielectric layer forming at least one of the plurality of features;
polishing a surface of the metallic layer, the act of polishing comprising acts of:
exposing a surface of the metallic layer to an electrolyte solution of an electrochemical cell;
providing a first electrode of the electrochemical cell and having a potential being maintained at a constant voltage in a stable electropolishing region of the electrochemical cell;
maintaining a potential of the integrated circuit, forming an anode of the electrochemical cell; and
providing a second electrode, the second electrode forming a cathode of the electrochemical cell.
2. The method according to claim 1, further comprising an act of depositing, prior to depositing the metallic layer, a non-metallic barrier layer on the surface of the dielectric layer.
3. The method according to claim 1, further comprising an act of removing a portion of the metallic layer that extends above the surface of the dielectric layer.
4. The method according to claim 3, further comprising an act of stopping the act of polishing when the metal extending above the surface of the dielectric layer is substantially removed.
5. The method according to claim 3, further comprising an act of stopping the act of polishing when the surface of the metallic layer is located substantially planar to the surface of the dielectric layer.
6. The method according to claim 1, wherein the stable electropolishing region is associated with a voltage range, and wherein the method further comprises an act of maintaining the potential of the first electrode proximate to a center of the voltage range.
7. The method according to claim 1, wherein the electrolyte solution includes an oxidizing acid, and the method comprises an act of electropolishing the surface of the metallic layer using the oxidizing acid.
8. The method according to claim 7, wherein the oxidizing acid includes at least one of a group comprising phosphoric acid and nitric acid.
9. The method according to claim 7, wherein the oxidizing acid includes at least one of a group comprising othophophoric acid and pyrophosphoric acid.
10. The method according to claim 1, further comprising an act of maintaining electrical contact between the first electrode and the electrolyte solution.
11. The method according to claim 1, wherein the metallic layer includes copper, and the act of polishing comprises an act of removing an overburden of copper by electropolishing a surface of the copper.
The claims below are in addition to those above.
All refrences to claim(s) which appear below refer to the numbering after this setence.
1. An active matrix liquid crystal display device comprising:
a pair of substrates with a liquid crystal layer therebetween;
a plurality of video signal lines and a plurality of scan lines formed on one of the pair of substrates, and a plurality of pixel electrodes connected to one of the video signal lines through an active device; and
a plurality of color filters formed on another of the pair of substrates;
wherein a shield electrode overlaps with the one of the video signal lines in plane view and is arranged between the one of the video signal lines and one of the color filters, and a planarization layer is arranged between one of the pixel electrodes and the shield electrode.
2. An active matrix liquid crystal display device according to claim 1, wherein the shield electrode which overlaps with the one of the video signal lines is at least 9.4 \u03bcm wider than a width of the one of the video signal lines.
3. An active matrix liquid crystal display device according to claim 1, wherein the shield electrode serves as a reference electrode.
4. An active matrix liquid crystal display device according to claim 3, wherein the shield electrode overlaps with both of the one of the video signal lines and one of the scan lines.
5. An active matrix liquid crystal display device according to claim 4, wherein the shield electrode is elongated along the one of the video signal lines at a region of overlap with the one of the video signal lines and is elongated along the one of the scan lines at a region of overlap with the one of the scan lines.
6. An active matrix liquid crystal display device according to claim 5, wherein the shield electrode includes first portions which overlap with respective ones of the video signal lines and a second portion formed between adjacent first portions in a pixel region.
7. An active matrix liquid crystal display device according to claim 6, wherein the first portions of the shield electrode have a width which is at least 9.4 \u03bcm wider than a width of the one of the video signal lines.
8. An active matrix liquid crystal display device according to claim 6, wherein the shield electrode is made of transparent conductor.
9. An active matrix liquid crystal display device according to claim 8, wherein the shield electrode is made of ITO.
10. An active matrix liquid crystal display device according to claim 3, wherein the shield electrode overlaps with the active device.
11. An active matrix liquid crystal display device according to claim 10, wherein the liquid crystal display device is an in-plane switching mode liquid crystal display device.
12. An active matrix liquid crystal display device according to claim 8, wherein the liquid crystal display device is an in-plane switching mode liquid crystal display device.
13. An active matrix liquid crystal display device comprising:
a pair of substrates with a liquid crystal layer therebetween;
a plurality of video signal lines and a plurality of scan lines formed on one of the pair of substrates, and a plurality of pixel electrodes connected to one of the video signal lines through an active device; and
at least one of a shield electrode and a reference electrode which overlaps with the one of the video signal lines in plane view;
wherein when the shield electrode overlaps with one of the video signal lines in plane view, a plurality of color filters are formed on another pair of substrates, and the shield electrode is arranged between the one of the video signal lines and one of the color filters, with a planarization layer being arranged between one of the pixel electrodes and the shield electrodes; and
wherein the reference electrode overlaps with the one of the video signal lines in plane view, the reference electrode has a matrix shape.