Author: claimsbot

1. A vertical type semiconductor device, comprising:
a pillar structure having a stacking structure of a conductive layer and a data storage material and formed over a common source region; and
a gate electrode formed to surround the data storage material of the pillar structure,
wherein the data conductive layer and the data storage material are sequentially stacked.
2. The vertical type semiconductor device of claim 1, wherein the data storage material includes a phase-change material.
3. The vertical type semiconductor device of claim 1, wherein the data storage material has a stacking structure of a crystalline phase-change material, an amorphous phase-change material, and a crystalline phase-change material.
4. The vertical type semiconductor device of claim 1, wherein the data storage material includes Perovskite or transition metal oxide.
5. The vertical type semiconductor device of claim 1, wherein the data storage material has a stacking structure of a first barrier metal layer, a Perovskite layer, and a second barrier metal layer or a stacking structure of a first barrier metal layer, a transition metal oxide layer, and a second barrier metal layer.
6. The vertical type semiconductor device of claim 1, further comprising a gate insulating layer formed between the pillar structure and the gate electrode.
7. The vertical type semiconductor device of claim 1, further comprising an interconnection layer formed on the data storage material to be electrically connected to the data storage material.
8. The vertical type semiconductor device of claim 1, further comprising an insulating layer formed on a circumference of the conductive layer.
9. The vertical type semiconductor device of claim 1, wherein the common source region includes a metal layer.
10. The vertical type semiconductor device of claim 1, wherein gate electrodes are electrically connected to each other between cells formed in a first direction and gate electrodes are insulated from each other between cells formed in a second direction different from the first direction.

The claims below are in addition to those above.
All refrences to claim(s) which appear below refer to the numbering after this setence.

1. A laminated core arrangement for an electric machine, comprising:
a laminated core including at least two part cores arranged in an axial direction, each of the part cores having a plurality of polygonal individual sheets, with at least one of the individual sheets being round and disposed between the part cores, said at least one round individual sheet having a diameter which is less than or equal to an inner circle of the polygonal individual sheets; and
permanently-excited magnets disposed around a circumference of the laminated core.
2. The laminated core arrangement of claim 1, wherein the magnets adjacent to the at least one round individual sheet touch each other.
3. The laminated core arrangement of claim 1, wherein the magnets are sized to project beyond the part core at at least one end side of the laminated core.
4. The laminated core arrangement of claim 1, wherein the part cores are rotated in relation to one another.
5. An electric machine, comprising a laminated core arrangement which comprises a laminated core including at least two part cores arranged in an axial direction, each of the part cores having a plurality of polygonal individual sheets, with at least one of the individual sheets being round and disposed between the part cores, said at least one round individual sheet having a diameter which is less than or equal to an inner circle of the polygonal individual sheets, and permanently-excited magnets disposed around a circumference of the laminated core.
6. The electric machine of claim 5, wherein the magnets adjacent to the at least one round individual sheet touch each other.
7. The electric machine of claim 5, wherein the magnets are sized to project beyond the part core at at least one end side of the laminated core.
8. The electric machine of claim 5, wherein the part cores are rotated in relation to one another.

1. A dual-shaft synchronous motion device, comprising:
a first shaft (10) and a second shaft (20), the first shaft (10) and the second shaft (20) respectively having a fixed end (10a, 20a) and a pivot end (10b, 20b);
a first rotor (11) and a third rotor (33) disposed on the first shaft (10) and turned synchronously;
a second rotor (22) and a fourth rotor (44) disposed on the second shaft (20) and turned synchronously;
a first tractive member (50) disposed between the first rotor (11) and the second rotor (22); and
a second tractive member (60) disposed between the third rotor (33) and the fourth rotor (44);
the first and second tractive members (50, 60) respectively link the first shaft (10) and the second shaft (20) to turn synchronously in opposite directions;
wherein the first, second, third and fourth rotors (11, 22, 33, 44) are in the form of a roller and each have a cylindrical main body (a) and a shoulder portion (b) formed at two ends of the main body (a).
2. The dual-shaft synchronous motion device as claimed in claim 1, wherein the cylindrical main body (a) has a diameter less than that of the diameter of the shoulder portion (b).
3. The dual-shaft synchronous motion device as claimed in claim 2, wherein the tractive member (50) wound from the first rotor (11) to the second rotor (22) and the tractive member (60) wound from the third rotor (33) to the fourth rotor (44) are wound in opposite directions so that the first shaft (10) and the second shaft (20) are turned in different directions.
4. The dual-shaft synchronous motion device as claimed in claim 3, wherein the first shaft (10) is turned in the range of 0-180 degrees, and the second shaft (20) is turned synchronously and reversely in the range of 0-180 degrees.
5. The dual-shaft synchronous motion device as claimed in claim 1, wherein the first, second, third and fourth rotors (11, 22, 33, 44) each have a shaft hole (c);
the shaft hole (c) corresponds in shape to the pivot ends (10b, 20b) of the first and second shafts (10, 20);
the shaft hole (c) is pivoted with the pivot ends (10b, 20b) of the first and second shafts (10, 20);
the first and third rotors (11, 33) and the first shaft (10) are turned together; and
the second and fourth rotors (22, 44) and the second shaft (20) are turned together.
6. The dual-shaft synchronous motion device as claimed in claim 5, wherein the pivot ends (10b, 20b) and the shaft hole (c) have a rectangular cross-section.
7. The dual-shaft synchronous motion device as claimed in claim 6, wherein the tractive member (50) wound from the first rotor (11) to the second rotor (22) and the tractive member (60) wound from the third rotor (33) to the fourth rotor (44) are wound in opposite directions so that the first shaft (10) and the second shaft (20) are turned in different directions.
8. The dual-shaft synchronous motion device as claimed in claim 7, wherein the first shaft (10) is turned in the range of 0-180 degrees, and the second shaft (20) is turned synchronously and reversely in the range of 0-180 degrees.
9. The dual-shaft synchronous motion device as claimed in claim 5, wherein the first and second tractive members (50, 60) are in the form of a cable and have respective first ends (51, 61) and second ends (52, 62); the first end (51) of the first tractive member (50) is wound and fixed to the main body (a) of the first rotor (11); the second end (52) of the first tractive member (50) is wound and fixed to the main body (a) of the second rotor (22); the first end (61) of the second tractive member (60) is wound and fixed to the main body (a) of the third rotor (33); and the second end (62) of the second tractive member (60) is wound and fixed to the main body (a) of the fourth rotor (44).
10. The dual-shaft synchronous motion device as claimed in claim 9, wherein the main body (a) of each of the first, second, third and fourth rotors (11, 22, 33, 44) has an engaging hole (d); and the first and second ends (51, 61, 52, 62) of the first and second tractive members (50, 60) are inserted through the respective engaging hole (d) and connected with a fixing portion (70).
11. The dual-shaft synchronous motion device as claimed in claim 10, wherein the tractive member (50) wound from the first rotor (11) to the second rotor (22) and the tractive member (60) wound from the third rotor (33) to the fourth rotor (44) are wound in opposite directions so that the first shaft (10) and the second shaft (20) are turned in different directions.
12. The dual-shaft synchronous motion device as claimed in claim 11, wherein the first shaft (10) is turned in the range of 0-180 degrees, and the second shaft (20) is turned synchronously and reversely in the range of 0-180 degrees.
13. The dual-shaft synchronous motion device as claimed in claim 9, wherein the tractive member (50) wound from the first rotor (11) to the second rotor (22) and the tractive member (60) wound from the third rotor (33) to the fourth rotor (44) are wound in opposite directions so that the first shaft (10) and the second shaft (20) are turned in different directions.
14. The dual-shaft synchronous motion device as claimed in claim 13, wherein the first shaft (10) is turned in the range of 0-180 degrees, and the second shaft (20) is turned synchronously and reversely in the range of 0-180 degrees.
15. The dual-shaft synchronous motion device as claimed in claim 5, wherein the tractive member (50) wound from the first rotor (11) to the second rotor (22) and the tractive member (60) wound from the third rotor (33) to the fourth rotor (44) are wound in opposite directions so that the first shaft (10) and the second shaft (20) are turned in different directions.
16. The dual-shaft synchronous motion device as claimed in claim 15, wherein the first shaft (10) is turned in the range of 0-180 degrees, and the second shaft (20) is turned synchronously and reversely in the range of 0-180 degrees.
17. The dual-shaft synchronous motion device as claimed in claim 1, wherein the tractive member (50) wound from the first rotor (11) to the second rotor (22) and the tractive member (60) wound from the third rotor (33) to the fourth rotor (44) are wound in opposite directions so that the first shaft (10) and the second shaft (20) are turned in different directions.
18. The dual-shaft synchronous motion device as claimed in claim 17, wherein the first shaft (10) is turned in the range of 0-180 degrees, and the second shaft (20) is turned synchronously and reversely in the range of 0-180 degrees.
19. The dual-shaft synchronous motion device as claimed in claim 1, wherein after the first rotor (11) is turned 180 degrees along with the first shaft (10), the length of the first tractive member (50), wound on the first rotor (11), is at least equal to a half of the periphery of the first rotor (11).
20. The dual-shaft synchronous motion device as claimed in claim 1, wherein after the first rotor (11) is turned 180 degrees, the length of the first end (51) of the first tractive member (50), wound on the first rotor (11), is greater than a periphery distance that the first rotor (11) is turned 90 degrees.
21. The dual-shaft synchronous motion device as claimed in claim 1, wherein after the fourth rotor (44) is turned 180 degrees along with the second shaft (20), the length of the second tractive member (60), wound on the fourth rotor (44), is at least equal to a half of the periphery of the fourth rotor (44).
22. The dual-shaft synchronous motion device as claimed in claim 1, wherein after the fourth rotor (44) is turned 180 degrees, the length of the second end (62) of the second tractive member (60), wound on the fourth rotor (44), is equal greater than a periphery distance that the fourth rotor (44) is turned 90 degrees.
23. The dual-shaft synchronous motion device as claimed in claim 1, wherein the first shaft (10) and the second shaft (20) are mounted in a casing (30).
24. The dual-shaft synchronous motion device as claimed in claim 1, wherein the fixed ends (10a, 20a) of the first and second shafts (10, 20) cooperate with a fixed seat for the first and second shafts (10, 20) to be fixed to a display module (91) and a machine body module (92) of an electronic article (90).
25. The dual-shaft synchronous motion device as claimed in claim 24, wherein the display module (91) drives the first shaft (10) to turn in the range of 0-180 degrees, and the second shaft (20) and the machine body module (92) are turned synchronously and reversely in the range of 0-180 degrees.
26. The dual-shaft synchronous motion device as claimed in claim 1, wherein the first, second, third and fourth rotors (11, 22, 33, 44) and the first and second tractive members (50, 60) in cooperation with a fixture assembly (80) are assembled on the first shaft (10) and the second shaft (20).
27. The dual-shaft synchronous motion device as claimed in claim 1, wherein the first shaft (1) drives the first and third rotors (11, 33), the first tractive member (50) brings the second rotor (22) to turn reversely relative to the first rotor (11), and the fourth rotor (44) makes the second tractive member (60) drive the third rotor (33).

The claims below are in addition to those above.
All refrences to claim(s) which appear below refer to the numbering after this setence.

What is claimed is:

1. A scanning exposure apparatus comprising:
a master stage for scanning a master;
a substrate stage for scanning a substrate,
transfer means for supplyingrecovering the substrate tofrom said substrate stage, and positioning means for relatively positioning the substrate and the master, and
scanning velocity determination means for determining a scanning velocity so as to maximize the number of substrates that can be exposed per unit time.
2. The apparatus according to claim 1, characterized in that said scanning velocity determining means determines, as a scanning velocity in actual exposure operation, a lowest one of
a maximum scanning velocity determined from apparatus performance: Vmax,
a scanning velocity determined from an exposure illuminance and a required exposure amount: Vd, and
a scanning velocity at which the number of substrates that can be processed per unit time is maximized, which is determined from the transfer pattern size, a layout of the transfer pattern on the substrate, said transfer means, said master scanning means, said substrate stage scanning means, and said positioning means: Vt.
3. The apparatus according to claim 1, characterized in that said light source is a light source for emitting pulsed light, and said scanning velocity determining means determines, as a scanning velocity in actual exposure operation, a lowest one of
a maximum scanning velocity determined from apparatus performance: Vmax,
a scanning velocity determined from an exposure illuminance and a required exposure amount: Vd,
a scanning velocity determined from the minimum number of pulses which is required for integration to ensure a uniform exposure amount: Vp, and
a scanning velocity at which the number of substrates that can be processed per unit time is maximized, which is determined from the transfer pattern size, a layout of the transfer pattern on the substrate, said transfer means, said master scanning means, said substrate stage scanning means, and said positioning means: Vt.
4. The apparatus according to claim 3, characterized in that the scanning velocity Vp satisfies
VpWsPminfmax
where Ws is a width of an illumination area, on the substrate in a non-scanning direction, which illuminates part of the transfer pattern, fmax is a maximum frequency of pulsed light emitted from said light source, and Pmin is the minimum number of pulses required for integration to ensure a uniform exposure amount on the substrate.
5. The apparatus according to claim 2, characterized in that the scanning velocity Vd satisfies
VdImaxDW
where Imax is a maximum exposure illuminance, and D is a required exposure amount determined by a photosensitive material.
6. The apparatus according to claim 2, characterized in that the scanning velocity Vt satisfies
Vscan.min{square root}{square root over ( )}Lacceldecel(acceldecel)Vtg(Vscan.min)
where accel is an average acceleration with which an increase in scanning velocity from 0 to Vt is achieved, decel with which a decrease in scanning velocity from Vt to 0 is achieved, L is a length on the substrate which is scanned at a constant velocity in one scanning operation, and g( ) is an arbitrary function.
7. The apparatus according to claim 2, characterized in that the scanning velocity Vt is calculated by simulation to maximize the number of substrates that can be processed per unit time on the basis of the transfer pattern size, a layout of the transfer pattern on the substrate, and conditions in said master scanning means, said substrate stage scanning means, said transfer means, and said positioning means.
8. The apparatus according to claim 2, characterized in that the scanning velocity Vt is changed for each transfer pattern in accordance with the transfer pattern size and the layout of the transfer pattern on the substrate.
9. The apparatus according to claim 8, characterized in that the scanning velocity Vt changes in accordance with a length that is scanned at a constant velocity for each shot area in one scanning operation.
10. A device manufacturing method of manufacturing a device, characterized by comprising:
the step of coating a substrate with a resist;
the step of drawing a pattern on the substrate by using an exposure apparatus; and
the step of developing the substrate,
the exposure apparatus including
a master stage for scanning a master;
a substrate stage for scanning a substrate,
transfer means for supplyingrecovering the substrate tofrom the substrate stage, and
positioning means for relatively positioning the substrate and the master, and
scanning velocity determination means for determining a scanning velocity so as to maximize the number of substrates that can be exposed per unit time.
11. A semiconductor device manufacturing method characterized by comprising:
the step of installing manufacturing apparatuses for various processes, including an exposure apparatus, in a semiconductor manufacturing factory; and
the step of manufacturing a semiconductor device by a plurality of processes using the manufacturing apparatuses,
the exposure apparatus including
a master stage for scanning a master;
a substrate stage for scanning a substrate,
transfer means for supplyingrecovering the substrate tofrom the substrate stage, and
positioning means for relatively positioning the substrate and the master, and
scanning velocity determination means for determining a scanning velocity so as to maximize the number of substrates that can be exposed per unit time.
12. The method according to claim 11, characterized by further comprising:
the step of connecting a local area network to the manufacturing apparatuses; and
the step of performing data communication of information about at least one of the manufacturing apparatuses between the local area network and an external network outside the semiconductor manufacturing apparatuses.
13. The method according to claim 12, characterized in that a database provided by a vendor or user of the exposure apparatus is accessed via the external network to obtain maintenance information of the manufacturing apparatus by data communication, or production management is performed by data communication between the semiconductor manufacturing factory and another semiconductor manufacturing factory via the external network.
14. A semiconductor manufacturing factory characterized by comprising:
manufacturing apparatuses for various processes including an exposure apparatus;
a local area network for connecting said manufacturing apparatuses; and
a gateway which allows the local area network to access an external network outside the factory,
wherein information about at least one of said manufacturing apparatuses can be communicated, and
the exposure apparatus including
a master stage for scanning a master;
a substrate stage for scanning a substrate,
transfer means for supplyingrecovering the substrate tofrom said substrate stage, and
positioning means for relatively positioning the substrate and the master, and
scanning velocity determination means for determining a scanning velocity so as to maximize the number of substrates that can be exposed per unit time.
15. A maintenance method for an exposure apparatus which is installed in a semiconductor manufacturing factory and exposes a substrate to a pattern, characterized by comprising:
the step of causing a vendor or user of the exposure apparatus to provide a maintenance database connected to an external network of the semiconductor manufacturing factory;
the step of authorizing access from the semiconductor manufacturing factory to the maintenance database via the external network; and
the step of transmitting maintenance information accumulated in the maintenance database to the semiconductor manufacturing factory via the external network,
the exposure apparatus including:
a master stage for scanning a master;
a substrate stage for scanning a substrate,
transfer means for supplyingrecovering the substrate tofrom the substrate stage, and
positioning means for relatively positioning the substrate and the master, and
scanning velocity determination means for determining a scanning velocity so as to maximize the number of substrates that can be exposed per unit time.
16. The apparatus according to claim 1, characterized in that the apparatus further comprises a display, a network interface, and a computer for executing network software, and performs data communication of maintenance information of the apparatus via a computer network.
17. The apparatus according to claim 16, characterized in that the network software is connected to an external network of a factory where the exposure apparatus is installed, provides on said display a user interface for accessing a maintenance database provided by a vendor or user of the exposure apparatus, and enables obtaining information from the database via the external network.