1461163016-dfd7a9df-f84c-4b34-9833-b8969cb7d471

1. A data processing apparatus for processing input data to create processed data for outputting, comprising:
a data processor for processing the input data by predetermined processing and outputting the processed data as output data;
an input data evaluator configured to evaluate the input data and calculate a reliability of the input data;
an output data evaluator configured to evaluate the output data and calculate a reliability of the output data, and
a real time learning portion consisting of a single component configured to learn the processing of the data processor in real time using the reliability of the input data calculated by said input data evaluator and the reliability of the output data calculated by said output data evaluator to create learned processing and control the data processor to process the input data according to the learned processing.
2. A data processing apparatus according to claim 1, further comprising an input data storage unit for storing a predetermined number of time-sequentially input data.
3. A data processing apparatus according to claim 2, wherein said input data evaluator calculates a dispersion of the predetermined number of the time-sequentially input data stored by said input data storage unit and evaluates current input data according to the dispersion.
4. A data processing apparatus according to claim 2, wherein said input data evaluator calculates an average of the predetermined number of the time-sequentially input data stored by said input data storage unit, and evaluates current input data according to an error of each of the input data against the average.
5. A data processing apparatus according to claim 2, wherein said input data evaluator calculates a dispersion and an average of the predetermined number of the time-sequentially input data stored by said input data storage unit; obtains an error of each input data against the average; and evaluates current input data according to the dispersion and a respective error.
6. A data processing apparatus according to claim 1, further comprising an output data storage unit for storing the output data, wherein said data processor adds previous output data stored by said output data storage unit and current input data to obtain the output data corresponding to the current input data.
7. A data processing apparatus according to claim 6, wherein said real time learning portion learns a predetermined weight coefficient according to the reliability of the input data and the reliability of the output data, and
said data processor obtains the output data corresponding to the current input data according to the weight coefficient.
8. A data processing method for processing input data and creating processed data for outputting comprising the steps of:
processing the input data by a predetermined processing method and outputting the processed data as output data;
evaluating the input data and calculating a reliability of the input data; evaluating the output data and calculating a reliability of the output data, and
learning the step of processing the input data in real time in a single component using the calculated reliability of the input data and the calculated reliability of the output data to create a learned processing and the input data is processed by the step of processing the input data by the learned processing.
9. A data processing method according to claim 8, further comprising an input data storing step of storing a predetermined number of time-sequentially input data.
10. A data processing method according to claim 9, wherein, in the step of evaluating the input data, a dispersion of the predetermined number of the time-sequentially input data stored in the input data storing step is calculated and current input data is evaluated according to the dispersion.
11. A data processing method according to claim 9, wherein, in the step of evaluating the input data, an average of the predetermined number of the time-sequentially input data stored in the input data storing step is calculated, and current input data is evaluated according to an error of each input data against the average.
12. A data processing method according to claim 9, wherein, in the step of evaluating the input data, a dispersion and an average of the predetermined number of the input data stored in the input data storing step are calculated; an error of each input data against the average is obtained; and current input data is evaluated according to the dispersion and a respective error.
13. A data processing method according to claim 8, further comprising an output data storing step of storing the output data, wherein, in the step of processing the input data, previous output data stored in the output data storing step and current input data are added to obtain the output data corresponding to the current input data.
14. A data processing method according to claim 13, wherein a predetermined weight coefficient is learned according to the reliability of the input data and the reliability of the output data in the step of learning, and
the output data corresponding to the current input data is obtained according to the weight coefficient in the step of processing the input data.
15. A storage medium storing a computer-controllable program for processing input data and creating processed data for outputting the program comprising the steps of:
processing the input data by a predetermined processing and outputting the processed data as output data;
evaluating the input data and calculating a reliability of the input data;
evaluating the output data and calculating a reliability of the output data, and
learning the step of processing the input data in real time in a single component using the calculated reliability of the input data and the calculated reliability of the output data to create a learned processing, and the input data is processed by the step of processing the input data by the learned processing.

The claims below are in addition to those above.
All refrences to claim(s) which appear below refer to the numbering after this setence.

1. A system for processing a workpiece, comprising:
a first rotor;
a second rotor engageable with the first rotor;
a fluid inlet in at least one of the first and second rotors for applying a liquid onto a workpiece between the first and second rotors;
a drain manifold for draining liquid applied to the workpiece;
a first valve in drain manifold and a first drain fitting associated with the first valve; and
a second valve in the drain manifold and a second drain fitting associated with the second valve.
2. The system of claim 1 further comprising a third valve in the manifold associated with a third drain fitting.
3. The system of claim 2 further comprising a fourth drain valve in the manifold associated with a fourth drain fitting.
4. A system for processing a workpiece, comprising:
a first rotor having a face plate;
a ring-shaped second rotor;
a shift assembly, for moving the first and second rotor together and apart; and
a bowl, with the second rotor positionable in the bowl for processing.
5. The system of claim 4 further comprising a first rotor ring joined with the first rotor, with the second rotor supported on the first rotor ring, and with the shift assembly converting to the first rotor ring.
6. A system for processing a workpiece comprising:
a first rotor;
a second rotor engageable with the first rotor;
an outlet in at least one of the first and second rotors;
a load slot in the side of the first rotor, to allow loading and unloading of a workpiece into the system via horizontal movement of the workpiece.
7. The system of claim 6 further comprising first support pins on the first rotor and second support pins on the second rotor, with the second support pins vertically spaced apart from a workpiece in the system by about 0.005-0.015 inches, when the first and second rotors are brought together into a processing position.
8. The system of claim 6 wherein the first rotor is ring shaped and open in the center.
9. The system of claim 7 further comprising centering pins on at least one of the first and second rotors, outside of circumferential edges of a workpiece in the system, for maintaining the workpiece centered on a spin axis of the rotors.
10. The system of claim 7 further comprising movement means, for moving the first and second rotors towards and away from each other, and for spinning the rotors.
11. The system of claim 10 with the first rotor supported on the movement means.
12. The system of claim 11 further comprising an immersion vessel, and with the second rotor moveable into the immersion vessel via the movement means, for immersion processing at least one side of a workpiece.
13. The system of claim 12 with the immersion vessel having a sidewall including a contour section with an increasing radius of curvature.
14. The system of claim 13 with the sidewall of the contour section having a radius of curvature which increases from 5-15%.

1461163006-0f47c87c-4fdc-4cb4-9a0e-0282f06fb8e9

1. A fan speed control circuit, comprising:
a pulse width modulation (PWM) signal generating circuit for generating a PWM control signal with a sequence of alternating on-time and off-time;
a driving circuit for outputting a driving signal according to the PWM control signal to a fan motor; and
a phase compensation unit connected to the fan motor for delaying or advancing the PWM control signal by a phase angle to synchronize the acting period of the back electromotive force formed by the magnetic flux variation with the off-time of the PWM control signal.
2. The fan speed control circuit as recited in claim 1, wherein the phase compensation unit delays or advances the PWM control signal by a phase angle according to a speed signal fed from the fan motor.
3. The fan speed control circuit as recited in claim 2, wherein the phase compensation unit comprises a phase-locked loop.
4. The fan speed control circuit as recited in claim 3, wherein the phase-locked loop is a phase delay circuit.
5. The fan speed control circuit as recited in claim 4, wherein the phase delay circuit includes an operational amplifier, a transistor, resistors, an inductor and a capacitor, wherein the operational amplifier is respectively coupled to the PWM signal generating circuit, the transistor and one of the resistors.
6. The fan speed control circuit as recited in claim 3, wherein the phase-locked loop is a phase advance circuit.
7. The fan speed control circuit as recited in claim 6, wherein the phase advance circuit includes an operations amplifier, resistors, and a capacitor, wherein one of the resistors and the capacitor are coupled in parallel, and the operational amplifier and one of the resistors are coupled in parallel.
8. The fan speed control circuit as recited in claim 3, further comprising a timer for precisely calculating the magnitude of the phase angle to be delayed or advanced.
9. The fan speed control circuit as recited in claim 1, wherein the phase compensation unit is incorporated in a driver IC.
10. A fan speed control circuit, comprising:
a PWM signal generating circuit for generating a PWM control signal with a sequence of alternating on-time and off-time;
a driving circuit for outputting a driving signal according to the PWM control signal to a fan motor; and
a phase compensation circuit connected between the PWM signal generating circuit and the driving circuit;
wherein the phase compensation circuit is connected to a fan motor for delaying or advancing the PWM control signal by phase angle to synchronize the acting period of the back electromotive force formed by the magnetic flux variation with the off-time of the PWM control signal.
11. The fan speed control circuit as recited in claim 10, wherein the phase compensation circuit is a phase delay circuit or a phase advance circuit.
12. A fan speed control circuit, comprising:
a fan motor; and
a phase compensation unit for receiving a PWM control signal and delaying or advancing the PWM control signal by phase angle to synchronize the acting period of the back electromotive force formed by the magnetic flux variation with the off-time of the PWM control signal and outputting the processed PWM control signal to the motor.
13. The fan speed control circuit as recited in claim 12, wherein the phase compensation unit delays or advances the PWM control signal by a phase angle according to a speed signal fed from the fan motor.
14. The fan speed control circuit as recited in claim 13, wherein the phase compensation unit comprises a phase-locked loop.
15. The fan speed control circuit as recited in claim 14, wherein the phase-locked loop is a phase delay circuit.
16. The fan speed control circuit as recited in claim 15, wherein the phase delay circuit includes an operational amplifier, a transistor, resistors, an inductor and a capacitor, wherein the operational amplifier is respectively coupled to the PWM signal generating circuit, the translator and one of the resistors.
17. The fan speed control circuit as recited in claim 14, wherein the phase-locked loop is a phase advance circuit.
18. The fan speed control circuit as recited in claim 17, wherein the phase advance circuit includes an operations amplifier, resistors, and a capacitor, wherein one of the resistors and the capacitor are coupled in parallel, and the operational amplifier and one of the resistors are coupled in parallel.
19. The fan speed control circuit a recited in claim 14, further comprising a timer for precisely calculating the magnitude of the phase angle to be delayed or advanced.
20. The fan speed control circuit as recited in claim 12, wherein the phase compensation unit is incorporated in a driver IC.

The claims below are in addition to those above.
All refrences to claim(s) which appear below refer to the numbering after this setence.

1. A method of batching substrates in an automated processing tool, comprising:
selecting a first container containing a first group of substrates;
simultaneously transferring each substrate of said first group of substrates into a processing container in a batching station of said automated processing tool;
selecting a second container containing a second group of substrates;
selecting less than all substrates of said second group of substrates; and
individually transferring only selected substrates of said second group of substrates to said processing container to form a third group of substrates.
2. The method of claim 1, further including:
while in said processing container, simultaneously processing each substrate of said third group of substrates through one or more processing stations of said automated processing tool;
after said processing, simultaneously returning each substrate of said first group of substrates to said first container; and
after said processing, individually returning each selected substrate of said less than all substrates of said second group of substrates to said second container.
3. The method of claim 2, further including:
before said simultaneously processing each substrate of said third group of substrates, removing said first and second groups of substrates from said first and second containers and temporarily storing said first and second groups of substrates in a buffer of said processing tool.
4. The method of claim 1, wherein:
said selecting less than all substrates of said second group of substrates is based on process recipe information associated with said first and second groups of substrates.
5. The method of claim 4, wherein a first process recipe for said first group of substrates is the same as a second process recipe for said second group of substrates.
6. The method of claim 1, wherein said selecting less than all substrates of said second group of substrates is based on a number of substrates in said second container and positions of substrates within said second container.
7. The method of claim 1, further including:
while in said processing container, simultaneously processing each substrate of said third group of substrates through one or more tanks, each tank of said one or more tanks containing a material independently selected from the group consisting of aqueous acids, aqueous bases, water, aqueous etchants, organic solvents at room temperature, organic solvents heated above room temperatures, organic solvent vapors, sulfuric acid, nitric acid, phosphoric acid, acetic acid, hydrofluoric acid, hydrofluoric acid mixed with ammonium fluoride aqueous tetramethyl ammonium hydroxide, ammonium hydroxide, basic photoresist developers alcoholic potassium hydroxide solutions, alcohols, esters, ketones, acetates, N-methylpyrrolidone, aliphatic solvents, cyclic solvents, benzene derivatives, fluoridated solvents, chlorinated solvents and combinations thereof.
8. A method of batching substrates in an automated processing tool, comprising:
selecting, from a storage area of said processing tool, a first container containing a first group of substrates;
simultaneously transferring each substrate of said first group of substrates into a processing container in a batching station of said automated processing tool;
determining a process recipe of said first group of substrates;
determining if a second container in said storage area includes substrates having said process recipe;
if said second container including substrates having said process recipe exists, either (i) when all substrates of said second container do not have said process recipe, selecting only substrates of said second container having said process recipe; and individually transferring only those substrates of said second container having said process recipe to said processing container to form a third group of substrates, or (ii) when all substrates of said second container have said process recipe, selecting all substrates of said second container and simultaneously transferring all substrates of said second container into said processing container to form said third group of substrates; and
wherein said selecting in (i) is further based on a number of substrates in said second container and the position of each substrate within said second container and said selecting in (ii) is further based on a number of substrates in said second container and the position of each substrate within said second container.
9. The method of claim 8, further including:
while in said processing container, simultaneously processing each substrate of said third group of substrates through one or more processing stations of said automated processing tool;
after said processing, simultaneously returning each substrate originally from said first container back to said first container; and
after said processing, individually returning each substrate originally from said second container back to said second container.
10. The method of claim 9, further including:
before said simultaneously processing each substrate of said third group of substrates, removing said first and second groups of substrates from said first and second containers and temporarily storing said first and second groups of substrates in a buffer of said processing tool.
11. The method of claim 8, wherein said selecting said first container is based on a priority of said first container, an amount of time said first container has been in a storage area of said automated process tool or not allowing a process window to expire.
12. The method of claim, 8 further including when two or more potential second containers exist, selecting said second container, based on a priority of said second container, an amount of time said second container has been in a storage area of said automated process tool or not allowing a process window to expire.
13. The method of claim 8, further including:
while in said processing container, simultaneously processing each substrate of said third group of substrates through one or more tanks, each tank of said one or more tanks containing a material independently selected from the group consisting of aqueous acids, aqueous bases, water, aqueous etchants, organic solvents at room temperature, organic solvents heated above room temperatures, organic solvent vapors, sulfuric acid, nitric acid, phosphoric acid, acetic acid, hydrofluoric acid, hydrofluoric acid mixed with ammonium fluoride aqueous tetramethyl ammonium hydroxide, ammonium hydroxide, basic photoresist developers alcoholic potassium hydroxide solutions, alcohols, esters, ketones, acetates, N-methylpyrrolidone, aliphatic solvents, cyclic solvents, benzene derivatives, fluoridated solvents, chlorinated solvents and combinations thereof.
14. A computer system comprising a processor, an addressdata bus coupled to said processor, and a computer-readable memory unit coupled to communicate with said processor, said memory unit containing instructions that when executed by the processor implement a method of batching substrates in an automated processing tool, said method comprising the computer implemented steps of:
selecting a first container containing a first group of substrates;
transmitting a control signal to simultaneously transfer all substrates of said first group of substrates into a processing container in a batching station of said automated processing tool;
selecting a second container containing a second group of substrates;
selecting less than all substrates of said second group of substrates; and
transmitting a control signal to individually transfer only selected substrates of said second group of substrates to said processing container to form a third group of substrates.
15. The computer system of claim 14, the method further including the steps of:
transmitting control signals to, while in said processing container, simultaneously process each substrate of said third group of substrates through one or more processing stations of said automated processing tool;
after said processing, transmitting control signals to simultaneously return all substrates of said first group of substrates to said first container; and
after said processing, transmitting control signals to individually return each selected substrate of said less than all substrates of said second group of substrates to said second container.
16. The computer system of claim 15, the method further including the step of:
before said transmitting control signals to simultaneously processing each substrate of said third group of substrates, transmitting control signals to remove said first and second groups of substrates from said first and second containers and temporarily store said first and second groups of substrates in a buffer of said processing tool.
17. The computer system of claim 14, wherein said method step of selecting less than all substrates of said second group of substrates is based on process recipe information associated with said first and second groups of substrates.
18. The computer system of claim 17, wherein a first process recipe for said first group of substrates is the same as a second process recipe for said second group of substrates.
19. The computer system of claim 14, wherein said method step of said selecting less than all substrates of said second group of substrates is based on a number of substrates in said second container and positions of substrate within said second container.
20. The computer system of claim 14, further including the method step of:
between said selecting a first container and said transmitting control signals to simultaneously transfer all substrates of said first group of substrates, determining an actual number of wafers in said first container and selecting a multi-finger end-effector for performing said transferring, said selecting said multi-finger end-effector based on said actual number of substrates in said first container being equal to a number of wafers indicated as being in said first container in a job command issued to said automated process tool by a production control system.
21. The computer system of claim 14, further including the method step of:
between said selecting a second container and said transmitting control signals to individually transfer each substrate of said second group of substrates, determining an actual number of wafers in said first container and selecting a single-finger end-effector for performing said transferring, said selecting said single-finger end-effector based on said actual number of substrates in said first container being greater than a number of wafers indicated as being in said first container in a job command issued to said automated process tool by a production control system.
22. A computer system comprising a processor, an addressdata bus coupled to said processor, and a computer-readable memory unit coupled to communicate with said processor, said memory unit containing instructions that when executed by the processor implement a method batching substrates in an automated processing tool, said method comprising the computer implemented steps of:
selecting, from a storage area of said processing tool, a first container containing a first group of substrates;
transmitting control signals to simultaneously transfer all substrates of said first group of substrates into a processing container of a batching station of said automated processing tool;
determining a process recipe of said first group of substrates;
determining if a second container in said storage area includes substrates having said process recipe;
if said second container includes substrates having said process recipe exists, either (i) when all substrates of said second container do not have said process recipe, selecting only substrates of said second group of substrates having said process recipe and transmitting control signals to individually transfer only those substrates of said second container having said process recipe to said processing container to form a third group of substrates, or (ii) when all substrates of said second container have said process recipe, transmitting control signals to simultaneously transfer all substrates of said second container of substrates into said processing container to form said third group of substrates; and
wherein said selecting in (i) is further based on a number of substrates in said second container and the position of each substrate within said second container and said selecting in (ii) is further based on a number of substrates in said second container and the position of each substrate within said second container.
23. The computer system of claim 22, the method further including the steps of:
transmitting control signals to, while in said processing container, simultaneously process all substrates of said third group of substrates through one or more processing stations of said automated processing tool;
after said processing, transmitting control signals to simultaneously return each substrate originally from said first container back to said first container; and
after said processing, transmitting control signals to individually return each substrate originally from said second container back to said second container.
24. The computer system of claim 23, the method further including the step of:
before said transmitting control signals to simultaneously process each substrate of said third group of substrates, transmitting control signals to remove said first and second groups of substrates from said first and second containers and temporarily store said first and second groups of substrates in a buffer of said processing tool.
25. The computer system of claim 22, wherein said method step of selecting said first container is based on a priority of said first container, an amount of time said first container has been in a storage area of said automated process tool or not allowing a process window to expire.
26. The computer system of claim 22, wherein said method step of selecting said second container is based on a priority of said first container, an amount of time said first container has been in a storage area of said automated process tool or not allowing a process window to expire.
27. The computer system of claim 22, further including the method step of:
before said transmitting control signals to transfer all substrates of said first group of substrates into a batching station, selecting a multi-finger end-effector for performing said simultaneously transferring each substrate of said first group of substrates into a batching station, said selecting said multi-finger end-effector based on a number of substrates in said first container being equal to a number of wafers indicated as being in said first container in a job command issued to said automated process tool by a production control system.
28. The computer system of claim 22, the method steps further including in (i):
selecting a single-finger end-effector for performing said transferring, said selecting said single-finger end-effector based on said number of substrates in said second container being greater than a number of wafers indicated as being in said second container in a job command issued to said automated process tool by a production control system.
29. The computer system of claim 22, the method steps further including in (ii):
selecting a multi-finger end-effector for performing said transferring, said selecting said multi-finger end-effector based on said number of substrates in said second container being greater than a number of wafers indicated as being in said second container in a job command issued to said automated process tool by a production control system.
30. A computer program product comprising a computer useable medium including a computer readable program therein, wherein the computer readable program when executed on a computer causes the computer to:
select, from a storage area of a processing tool, a first container containing a first group of substrates;
transmit control signals to said processing tool simultaneously transfer all substrates of said first group of substrates into a processing container in a batching station of said automated processing tool;
determine a process recipe of said first group of substrates;
determine if a second container in said storage area includes substrates having said process recipe;
determine if a second container in said storage area includes substrates having said process recipe;
if said second container exists, determine a number of substrates in said second container and the position of each substrate within said second container; and
if said second container includes substrates having said process recipe exists, either (i) when all substrates of said second container do not have said process recipe, issuing instruction to said processing tool to select only substrates of said second group of substrates having said process recipe and to transmit control signals to individually transfer only those substrates of said second container having said process recipe to said processing container to form a third group of substrates, or (ii) when all substrates of said second container have said process recipe, issuing instructions to said processing tool to transmit control signals to simultaneously transfer all substrates of said second container of substrates into said processing container to form said third group of substrates.