All The Claims

1. A solar cell, comprising:
a substrate of a first conductive type;
an emitter layer of a second conductive type opposite the first conductive type on the substrate;
at least one first electrode on the emitter layer and electrically connected to the emitter layer;
a passivation layer on the substrate, the passivation layer including a plurality of exposing portions to expose respective portions of the substrate; and
an electrode conductive layer on the passivation layer, the electrode conductive layer including a plurality of second electrodes electrically connected to the respective plurality of exposing portions of the substrate,
wherein in each of the plurality of exposing portions, an area of an exposed surface of the substrate is greater than an area of a virtual interface that is coplanar with an interface between the substrate and the passivation layer and which is located over the exposed surface of the substrate.
2. The solar cell of claim 1, wherein each of the plurality of exposing portions includes an indented portion having the exposed surface of the substrate.
3. The solar cell of claim 2, wherein each indented portion has a height ranging from the virtual interface to the substrate, and heights of a plurality of indented portions are approximately equal to one another.
4. The solar cell of claim 3, wherein the height is approximately 1 \u03bcm to 40 \u03bcm.
5. The solar cell of claim 1, wherein an angle of one of the plurality of exposing portions on the passivation layer is different from an angle of another of the plurality of exposing portions on the passivation layer.
6. The solar cell of claim 5, wherein the plurality of exposing portions include at least one exposing portion substantially perpendicular to the passivation layer and at least one exposing portion inclined to the passivation layer,
the at least one exposing portion substantially perpendicular to the passivation layer is positioned substantially in a center of the substrate, and the at least one exposing portion inclined to the passivation layer is positioned at an edge of the substrate, and
an inclined angle between the at least one exposing portion inclined to the passivation layer and the passivation layer decreases as the at least one exposing portion approaches the edge of the substrate.
7. The solar cell of claim 5, wherein a plurality of exposing portions formed in the passivation layer along a first direction have the same angle with respect to the passivation layer, and a plurality of exposing portions formed in the passivation layer along a second direction different from the first direction each have different angles with respect to the passivation layer.
8. The solar cell of claim 7, wherein the plurality of exposing portions formed along the second direction is inclined to the passivation layer, and inclined angles between the plurality of exposing portions formed along the second direction and the passivation layer increase as the exposing portions formed along the second direction approach an edge of the substrate.
9. The solar cell of claim 6, wherein an angle between the at least one exposing portion positioned substantially in the center of the substrate and the at least one exposing portion positioned at the edge of the substrate is within about 45\xb0.
10. The solar cell of claim 1, wherein a width of each of the plurality of exposing portions is approximately 10 \u03bcm to 100 \u03bcm.
11. The solar cell of claim 1, wherein the passivation layer and the emitter layer are positioned on the substrate to be on opposite surfaces of the substrate to each other.
12. The solar cell of claim 1, wherein a number of layers constituting the passivation layer is equal to or greater than 2.
13. The solar cell of claim 1, further comprising a plurality of back surface field layers, wherein the plurality of back surface field layers is formed along respective exposed surfaces of the substrate.
14. A solar cell comprising:
a substrate of a first conductive type;
an emitter layer of a second conductive type opposite the first conductive type on the substrate;
at least one first electrode electrically connected to the emitter layer;
a passivation layer on the substrate, the passivation layer including a plurality of exposing portions to expose respective portions of the substrate, each of the plurality of exposing portions including an indented portion in the substrate having a predetermined height in a direction from a virtual interface to the substrate, the virtual interface being coplanar with an interface between the substrate and the passivation layer and being located over the indented portion of the substrate; and
an electrode conductive layer on the passivation layer, the electrode conductive layer including a plurality of second electrodes electrically connected to the respective portions of the substrate exposed by the exposing portions.
15. The solar cell of claim 14, wherein a shape of each of the plurality of exposing portions at the virtual interface includes a circle, an oval, a polygon, or a stripe.
16. The solar cell of claim 15, wherein each indented portion has a hemispherical shape, a conical shape, or a polygon pyramid shape.
17. The solar cell of claim 14, wherein the predetermined height of the indented portion is approximately 1\u03bcm to 40 \u03bcm.
18. The solar cell of claim 14, wherein a plurality of indented portions include at least two indented portions each having a different shape.
19. The solar cell of claim 14, further comprising a plurality of back surface field layers, wherein the plurality of back surface field layers is formed along respective plurality of exposed surfaces at respective indented portions.
20-28. (canceled)

The claims below are in addition to those above.
All refrences to claims which appear below refer to the numbering after this setence.

1-2. (canceled)
3. A method for manufacturing a disposable worn article, the worn article including:
an absorbent body including an absorbent core absorbing body fluid, the absorbent core laminated between a liquid-permeable top sheet and a liquid-impermeable back sheet;
a pair of front flaps extending in a girth direction to be continuous with a front portion of the absorbent body that is adapted to cover a front surface of a torso of a wearer; and
a pair of back flaps extending in the girth direction to be continuous with a back portion of the absorbent body that is adapted to cover a back surface of the torso of the wearer, wherein:
the front flaps and the back flaps each include at least one stretchable non-woven fabric that stretches in the girth direction; and
an entire area of the absorbent core is not covered by the stretchable non-woven fabric,
the method comprising the steps of: obtaining a first and second laminate non-woven fabrics including pieces of the stretchable non-woven fabric arranged intermittently on a continuous non-woven fabric that is continuous in a longitudinal direction and is non-stretchable while the pieces of the stretchable non-woven fabric are being elongated in the longitudinal direction;
successively providing the absorbent bodies so as to span between a first portion of the first laminate non-woven fabric where the stretchable non-woven fabric is absent and a second portion of the second laminate non-woven fabric where the stretchable non-woven fabric is absent, while transferring the first and second laminate non-woven fabrics in parallel to each other and in the longitudinal direction; and
cutting the first and second laminate non-woven fabrics along a virtual cut-off line extending in a width direction perpendicular to the longitudinal direction in areas of the first and second laminate non-woven fabrics between the absorbent bodies, so as to produce individual worn articles,
the method further comprising the steps of: carrying a non-stretchable continuous non-woven fabric for a girth area, from which the pair of front flaps and the pair of back flaps are formed, in the longitudinal direction;
laminating stretchable non-continuous non-woven fabrics, from which the pair of front and back flaps are formed, on the continuous non-woven fabric for the girth area while being elongated in the longitudinal direction so that the stretchable non-continuous non-woven fabrics are arranged intermittently in the longitudinal direction of the continuous non-woven fabric for the girth area; and
cutting off the continuous non-woven fabric for the girth area, together with the stretchable non-continuous non-woven fabrics, along a virtual cut-off line extending in the longitudinal direction, after the lamination, thereby obtaining the first and second laminate non-woven fabrics.
4. (canceled)
5. A method for manufacturing a disposable worn article, the worn article including:
an absorbent body including an absorbent core absorbing body fluid, the absorbent core laminated between a liquid-permeable top sheet and a liquid-impermeable back sheet;
a pair of front flaps extending in a girth direction to be continuous with a front portion of the absorbent body that is adapted to cover a front surface of a torso of a wearer; and
a pair of back flaps extending in the girth direction to be continuous with a back portion of the absorbent body that is adapted to cover a back surface of the torso of the wearer, wherein:
the front flaps and the back flaps each include at least one stretchable non-woven fabric that stretches in the girth direction; and
an entire area of the absorbent core is not covered by the stretchable non-woven fabric,
the method comprising the steps of: cutting off a stretchable continuous non-woven fabric that is continuous in a longitudinal direction and is stretchable in the longitudinal direction along a predetermined wave-shaped virtual cut-off line while carrying the stretchable continuous non-woven fabric in the longitudinal direction, thereby dividing the stretchable continuous non-woven fabric into a first continuous divided non-woven fabric having a first protruding portion and a first depressed portion, and a second continuous divided non-woven fabric having a second depressed portion and a second protruding portion;
spacing apart the first continuous divided non-woven fabric and the second continuous divided non-woven fabric from each other;
changing an arrangement relationship between the first continuous divided non-woven fabric and the second continuous divided non-woven fabric so that the first protruding portion and the second protruding portion oppose each other and the first depressed portion and the second depressed portion oppose each other;
successively providing the absorbent bodies so as to span between the first depressed portion and the second depressed portion or between the first protruding portion and the second protruding portion; and
cutting off the first and second continuous divided non-woven fabrics along a virtual cut-off line extending in a width direction perpendicular to the longitudinal direction between the absorbent bodies, so as to produce individual worn articles.
6. (canceled)
7. A method for manufacturing a disposable worn article, the worn article including:
an absorbent body including an absorbent core absorbing body fluid, the absorbent core laminated between a liquid-permeable top sheet and a liquid-impermeable back sheet;
a pair of front flaps extending in a girth direction to be continuous with a front portion of the absorbent body that is adapted to cover a front surface of a torso of a wearer; and
a pair of back flaps extending in the girth direction to be continuous with a back portion of the absorbent body that is adapted to cover a back surface of the torso of the wearer, wherein:
the front flaps and the back flaps each include at least one stretchable non-woven fabric that stretches in the girth direction; and
an entire area of the absorbent core is not covered by the stretchable non-woven fabric,
the method comprising the steps of: cutting off a stretchable continuous non-woven fabric that is continuous in a longitudinal direction and is stretchable in the longitudinal direction along a predetermined wave-shaped virtual cut-off line while carrying the stretchable continuous non-woven fabric in the longitudinal direction, thereby dividing the stretchable continuous non-woven fabric into a first continuous divided non-woven fabric having a first protruding portion and a first depressed portion, and a second continuous divided non-woven fabric having a second depressed portion and a second protruding portion;
spacing apart the first continuous divided non-woven fabric and the second continuous divided non-woven fabric from each other;
successively providing the absorbent bodies so as to span between the first depressed portion and the second protruding portion or between the first protruding portion and the second depressed portion; and
cutting off the first and second continuous divided non-woven fabrics along a virtual cut-off line extending in a width direction perpendicular to the longitudinal direction between the absorbent bodies, so as to produce individual worn articles.
8. (canceled)

1. A propellant holder for being releasably mounted in a setting tool having a receptacle (15) for receiving the propellant holder (20) and a data communication interface (31) provided in a predetermined region of the receptacle (15), the propellant holder comprising:
a housing (21) having an interior space (22) for receiving propellant (23);
a data storage identification unit (40) affixed to the housing (21) and in which an actual propellant supply level (27) is stored to be read-out by the data communication interface (31); and
guide means (26) cooperating with respective guide means (126) provided in the predetermined region of the receptacle (15) to enable the data communication interface (31) to read-out the propellant supply level (27) stored in the data storage identification unit (40);
wherein the guide means (126) secures the propellant holder (20) in a predetermined position.
2. The propellant holder of claim 1, wherein the guide means (26) cooperates with the respective guide means (126) provided in the predetermined region of the receptacle (15) for securing the propellant holder (20) in the predetermined position in the predetermined region of the receptacle (15) to enable the data communication interface (31) to read-out the propellant supply level (27) stored in the data storage identification unit (40).
3. An explosion-driven setting tool, comprising:
a setting mechanism (12) driven by a propellant (23);
ignition means (18) for igniting the propellant (23);
a receptacle (15) for receiving a propellant holder (20);
a display (50) for displaying a propellant supply level (27) in the propellant holder (20);
a data communication interface (31) for receiving data from and transmitting data to a data storage identification unit (40) and located in a predetermined region of the receptacle (15), the receptacle (15) having guide means (126) cooperating with guide means (26) of the propellant holder to enable the data communication interface (31) to read-out the propellant supply level (27) stored in the data storage identification unit (40) of the propellant holder (20); and
a data processing unit (30) operationally connected with the data communication interface (31) and the display (50);
wherein the guide means (126) secures the propellant holder (20) in a predetermined position.
4. An explosion-driven setting tool, comprising:
a setting mechanism (12) driven by a propellant (23);
ignition means (18) for igniting the propellant (23);
a receptacle (15) for receiving a propellant holder (20), with the propellant holder (2) having a housing (21) with an interior space (22) for receiving propellant (23), and a data storage identification unit (40) in which a propellant supply level (27) is stored for being read-out;
a display (50) for displaying the propellant supply level (27);
a data communication interface (31) for receiving identification data read-out from the data storage identification unit (40) and provided in a predetermined region of the receptacle (15), the receptacle (15) having guide means (126) cooperating with guide means (26) of the propellant holder to enable the data communication interface (31) to read-out the propellant supply level (27) stored in the data storage identification unit (40); and
a data processing unit (30) for receiving the identification data from the data communication interface (31) and connected with the display (50) for communicating the propellant supply level (27) thereto;
wherein the guide means (126) secures the propellant holder (20) in a predetermined position.
The claims below are in addition to those above.
All refrences to claims which appear below refer to the numbering after this setence.

1. A method of reducing an aspect ratio of a trench, comprising the steps of:
forming a trench in a substrate;
using HDP-CVD to form a conformal first oxide layer on a surface of the trench;
forming a conformal first nitride layer on the first oxide layer;
removing part of the first nitride layer to cause the first nitride layer to be lower than a top surface of the substrate; and
using a BOE solution to remove the first nitride layer and part of the first oxide layer, thus forming a remaining first oxide layer on the surface of the trench at a lower portion.
2. The method according to claim 1, further comprising at least one cycle of the steps of:
using HDP-CVD to form a conformal second oxide layer on the remaining first oxide layer and the surface of the trench;
forming a conformal second nitride layer on the second oxide layer;
removing part of the second nitride layer to cause the second nitride layer to be lower than a top surface of the substrate; and
using a BOE solution to remove the second nitride layer and part of the second oxide layer, thus forming a remaining second oxide layer on the remaining first oxide layer.
3. A method of reducing an aspect ratio of a trench, comprising the steps of:
(a) providing a substrate;
(b) forming a trench in the substrate;
(c) using HDP-CVD to form a conformal first oxide layer on a surface of the trench;
(d) forming a conformal first nitride layer on the first oxide layer;
(e) forming a first photoresist layer in part of the trench to cover part of the first nitride layer, wherein the first photoresist layer is lower than a top surface of the substrate;
(f) using the first photoresist layer as a mask, removing part of the first nitride layer;
(g) removing the first photoresist layer; and
(h) using a BOE solution to remove the first nitride layer and part of the first oxide layer, thus forming a remaining first oxide layer on the surface of the trench at a lower portion.
4. The method according to claim 3, further comprising at least one cycle of the steps of:
(i) using HDP-CVD to form a conformal second oxide layer on the remaining first oxide layer and the surface of the trench;
(j) forming a conformal second nitride layer on the second oxide layer;
(k) forming a second photoresist layer in part of the trench to cover part of the second nitride layer, wherein the second photoresist layer is lower than a top surface of the substrate;
(l) using the second photoresist layer as a mask, removing part of the second nitride layer;
(m) removing the second photoresist layer; and
(n) using the BOE solution to remove the second nitride layer and part of the second oxide layer, thus forming a remaining second oxide layer on the remaining first oxide layer.
5. The method according to claim 4, wherein the second photoresist layer is at least 1000 \u212b lower than a top surface of the substrate.
6. The method according to claim 3, wherein the first photoresist layer is at least 1000 \u212b lower than a top surface of the substrate.
7. The method according to claim 3, wherein the formation of the trench comprises the steps of:
forming a shield layer on part of the substrate; and
using the shield layer as a mask, etching part of the substrate to define the trench therein.
8. The method according to claim 7, wherein the shield layer comprises a pad oxide layer and a silicon nitride layer.
9. The method according to claim 3, further comprising, prior to forming the first oxide layer, a step of:
forming a conformal linear layer on the surface of the trench.
10. The method according to claim 3, wherein the first oxide layer is a SiO2 layer.
11. The method according to claim 3, wherein the nitride layer is a Si3N4 layer formed by LP-CVD.
12. The method according to claim 3, wherein an etching rate of the first oxide layer with the BOE solution is 280\u02dc320 \u212bmin, and an etching rate of the first nitride layer with the BOE solution is 8\u02dc12 \u212bmin.
13. The method according to claim 12, wherein a thickness of the first oxide layer is 200\u02dc300 \u212b, and a thickness of the first nitride layer is 40\u02dc50 \u212b.
14. A method of reducing an aspect ratio of a trench, comprising the steps of:
(a) providing a silicon substrate;
(b) forming a trench in the silicon substrate
(c) using HDP-CVD to form a conformal first oxide layer on a surface of the trench, wherein a thickness of the first oxide layer is 200\u02dc300 \u212b;
(d) forming a conformal first nitride layer on the first oxide layer, wherein a thickness of the first nitride layer is 40\u02dc50 \u212b;
(e) forming a first photoresist layer in part of the trench to cover part of the first nitride layer, wherein the first photoresist layer is at least 1000 \u212b lower than a top surface of the substrate;
(f) using the first photoresist layer as a mask, removing part of the first nitride layer;
(g) removing the first photoresist layer; and
(h) using a BOE solution to remove the first nitride layer and part of the first oxide layer, thus forming a remaining first oxide layer on the surface of the trench at a lower portion, wherein an etching rate of the first oxide layer with the BOE solution is 280\u02dc320 \u212bmin, and an etching rate of the first nitride layer with the BOE solution is 8\u02dc12 \u212bmin.
15. The method according to claim 14, further comprising at least one cycle of the steps of:
(i) using HDP-CVD to form a conformal second oxide layer on the remaining first oxide layer and the surface of the trench;
(j) forming a conformal second nitride layer on the second oxide layer;
(k) forming a second photoresist layer in part of the trench to cover part of the second nitride layer, wherein the second photoresist layer is at least 1000 \u212b lower than a top surface of the substrate;
(l) using the second photoresist layer as a mask, removing part of the second nitride layer;
(m) removing the second photoresist layer; and
(n) using the BOE solution to remove the second nitride layer and part of the second oxide layer, thus forming a remaining second oxide layer on the remaining first oxide layer.
16. The method according to claim 14, wherein the formation of the trench comprises the steps of:
forming a shield layer on part of the silicon substrate; and
using the shield layer as a mask, etching part of the silicon substrate to define the trench therein.
17. The method according to claim 16, wherein the shield layer comprises a pad oxide layer and a silicon nitride layer.
18. The method according to claim 14, further comprising, prior to forming the first oxide layer, a step of:
forming a conformal linear layer on the surface of the trench.
19. The method according to claim 14, wherein the first oxide layer is a SiO2 layer.
20. The method according to claim 14, wherein the nitride layer is a Si3N4 layer formed by LP-CVD.